RECOATER BRACKET FOR ADDITIVE MANUFACTURING
    141.
    发明申请

    公开(公告)号:US20180065319A1

    公开(公告)日:2018-03-08

    申请号:US15255760

    申请日:2016-09-02

    CPC classification number: B33Y30/00 B05C11/02 B29C64/214 B29K2105/0058

    Abstract: A mounting apparatus for a recoater rail of an additive manufacturing machine includes: a bracket including: a body having first and second ends; first and second flanges extending from the first and second ends respectively, the body and flanges cooperatively forming a C-shape; a first jack screw mounted to the first flange, the first jack screw extending parallel to the body; and a second jack screw mounted to the second flange, the second jack screw extending parallel to the body.

    Substrate liquid processing apparatus

    公开(公告)号:US09842751B2

    公开(公告)日:2017-12-12

    申请号:US14922441

    申请日:2015-10-26

    CPC classification number: H01L21/6708 B05B1/28 B05C11/02 H01L21/67051

    Abstract: Disclosed is a substrate liquid processing apparatus. The apparatus includes: a substrate holding unit configured to hold a substrate horizontally; a nozzle configured to eject a processing liquid in a transversal direction toward a liquid arrival target position set on the substrate held by the substrate holding unit from an ejection port which is located at an injection position spaced away from the liquid arrival target position by a predetermined distance horizontally; and a liquid receiving unit provided below the nozzle to receive the processing liquid dropping from the ejection port of the nozzle.

    SUBSTRATE LIQUID PROCESSING APPARATUS
    147.
    发明申请
    SUBSTRATE LIQUID PROCESSING APPARATUS 有权
    基板液体加工设备

    公开(公告)号:US20160114345A1

    公开(公告)日:2016-04-28

    申请号:US14922441

    申请日:2015-10-26

    CPC classification number: H01L21/6708 B05B1/28 B05C11/02 H01L21/67051

    Abstract: Disclosed is a substrate liquid processing apparatus. The apparatus includes: a substrate holding unit configured to hold a substrate horizontally; a nozzle configured to eject a processing liquid in a transversal direction toward a liquid arrival target position set on the substrate held by the substrate holding unit from an ejection port which is located at an injection position spaced away from the liquid arrival target position by a predetermined distance horizontally; and a liquid receiving unit provided below the nozzle to receive the processing liquid dropping from the ejection port of the nozzle.

    Abstract translation: 公开了一种基板液体处理装置。 该装置包括:基板保持单元,被配置为水平地保持基板; 喷嘴,被配置为从设置在由所述基板保持单元保持的所述基板上的液体到达目标位置朝向从所述液体到达目标位置隔开预定的喷射口的喷出口喷射处理液, 水平距离 以及液体接收单元,设置在喷嘴下方,以接收从喷嘴的喷射口落下的处理液。

    METHOD AND DEVICE FOR DOSING AND COATING
    150.
    发明申请
    METHOD AND DEVICE FOR DOSING AND COATING 有权
    用于涂料和涂料的方法和装置

    公开(公告)号:US20140023790A1

    公开(公告)日:2014-01-23

    申请号:US14002742

    申请日:2012-03-03

    Applicant: Karlsson Hakan

    Inventor: Karlsson Hakan

    Abstract: The present invention relates to an applicator arrangement comprising base support arrangement, a supply unit for supply of coating liquid/slurry, an applicator device, and a metering device, wherein said supply unit comprises a distribution pipe which is supported on said support body by means of a bearing arrangement arranged to enable axial expansion and contraction of said distribution pipe.

    Abstract translation: 本发明涉及一种包括基部支撑装置的涂抹器装置,用于供应涂布液体/浆料的供应单元,涂抹器装置和计量装置,其中所述供应单元包括分配管,其通过装置被支撑在所述支撑体上 布置成能够使所述分配管的轴向膨胀和收缩的轴承装置。

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