公开(公告)号：US12121925B2

公开(公告)日：2024-10-22

申请号：US18506799

申请日：2023-11-10

Applicant: Applied Materials, Inc.

Inventor： Kangkang Wang ,  Yaseer Arafath Ahamed ,  Yige Gao ,  Benjamin B. Riordon ,  Rami Hourani ,  James D. Strassner ,  Ludovic Godet ,  Thinh Nguyen

IPC: B05C1/00 ,  B05C1/02 ,  B05C13/00 ,  B05D1/00 ,  B05D5/06

CPC classification number: B05C1/006 ,  B05C1/027 ,  B05C13/00 ,  B05D1/002 ,  B05D5/061

Abstract: An optical device coating assembly is provided. The optical device coating assembly includes a substrate support operable to retain an optical device substrate. The coating assembly further includes a first actuator connected to the substrate support. The first actuator is configured to rotate the substrate support. The coating assembly includes a holder configured to hold a coating applicator against an edge of the optical device substrate when the optical device substrate is rotated on the substrate support and a second actuator operable to apply a force on the holder in a direction towards the substrate support. The second actuator is a constant force actuator.

公开(公告)号：US12077860B2

公开(公告)日：2024-09-03

申请号：US17366832

申请日：2021-07-02

Applicant: Applied Materials, Inc.

Inventor： Andrew Ceballos ,  Ludovic Godet ,  Karl J. Armstrong ,  Rami Hourani

IPC: G02B1/10 ,  C23C16/455 ,  C23C16/56

CPC classification number: C23C16/45563 ,  C23C16/56 ,  G02B1/10

Abstract: Embodiments of the present disclosure generally relate to methods and materials for optical device fabrication. More specifically, embodiments described herein provide for optical film deposition methods and materials to expand the process window for amorphous optical film deposition via incorporation of dopant atoms by suppressing the crystal growth of optical materials during deposition. By enabling amorphous films to be deposited at higher temperatures, significant cost savings and increased throughput are possible.

公开(公告)号：US12044963B2

公开(公告)日：2024-07-23

申请号：US16941304

申请日：2020-07-28

Applicant: Applied Materials, Inc.

Inventor： Amita Joshi ,  Ian Matthew McMackin ,  Rami Hourani ,  Yingdong Luo ,  Sivapackia Ganapathiappan ,  Ludovic Godet

IPC: G03F7/00 ,  B29C59/00 ,  B29C71/02 ,  B29C71/04 ,  C01G23/04 ,  C01G25/02 ,  C01G33/00 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G03F7/0002 ,  B29C59/005 ,  B29C71/02 ,  B29C71/04 ,  C01G23/043 ,  C01G25/02 ,  C01G33/00 ,  B82Y10/00 ,  B82Y40/00 ,  C01P2004/64

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition contains one or more types of nanoparticles, one or more surface ligands, one or more solvents, one or more additives, and one or more acrylates.

公开(公告)号：US12044821B2

公开(公告)日：2024-07-23

申请号：US16877158

申请日：2020-05-18

Applicant: Applied Materials, Inc.

Inventor： Sage Toko Garrett Doshay ,  Rutger Meyer Timmerman Thijssen ,  Ludovic Godet ,  Chien-An Chen ,  Pinkesh Rohit Shah

IPC: G03F7/00 ,  G02B1/00

CPC classification number: G02B1/002 ,  G03F7/0002

Abstract: Embodiments described herein relate to methods for fabricating optical devices. The methods described herein enable the fabrication of one or more optical devices on a substrate with apertures surrounding each of the optical devices having a plurality of structures. One embodiment of the methods described herein includes disposing an aperture material layer on a surface of a substrate, disposing a structure material layer over the apertures and the surface of the substrate, disposing a hardmask over the apertures and the structure material layer, disposing a patterned photoresist over the hardmask, the patterned photoresist defining exposed hardmask portions, removing the exposed hardmask portions to expose structure portions of the structure material layer, and removing the structure portions to form a plurality of structures between the apertures over regions of the surface of the substrate.

公开(公告)号：US12019242B2

公开(公告)日：2024-06-25

申请号：US17876195

申请日：2022-07-28

Applicant: Applied Materials, Inc.

Inventor： Yangyang Sun ,  Jinxin Fu ,  Ludovic Godet

IPC: G02B27/01

CPC classification number: G02B27/0172 ,  G02B27/0176

Abstract: Embodiments described herein provide for metrology tools and methods of obtaining a full-field optical field of an optical device to determine multiple metrology metrics of the optical device. A metrology tool is utilized to split a light beam into a first light path and a second light path. The first light path and the second light path are combined into a combined light beam and delivered to the detector. The detector measures the intensity of the combined light beam. A first equation and second equation are utilized in combination with the intensity measurements to determine an amplitude and phase ψ at a reference point directly adjacent to a second surface of the at least one optical device.

公开(公告)号：US11899366B2

公开(公告)日：2024-02-13

申请号：US17468536

申请日：2021-09-07

Applicant: Applied Materials, Inc.

Inventor： Viachslav Babayan ,  Douglas A. Buchberger, Jr. ,  Qiwei Liang ,  Ludovic Godet ,  Srinivas D. Nemani ,  Daniel J. Woodruff ,  Randy Harris ,  Robert B. Moore

IPC: G03F7/16 ,  G03F7/26 ,  G03F7/38 ,  H01L21/67 ,  G03F7/40 ,  H01L21/687 ,  G03F7/20

CPC classification number: G03F7/2035 ,  G03F7/168 ,  G03F7/26 ,  G03F7/38 ,  G03F7/40 ,  H01L21/67017 ,  H01L21/67103 ,  H01L21/68764

Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. A pedestal may be disposed within the processing volume and a first electrode may be coupled to the pedestal. A moveable stem may extend through the chamber body opposite the pedestal and a second electrode may be coupled to the moveable stem. In certain embodiments, a fluid containment ring may be coupled to the pedestal and a dielectric containment ring may be coupled to the second electrode.

公开(公告)号：US11867931B2

公开(公告)日：2024-01-09

申请号：US17448619

申请日：2021-09-23

Applicant: Applied Materials, Inc.

Inventor： Kang Luo ,  Xiaopei Deng ,  Daihua Zhang ,  Ludovic Godet

IPC: G02B5/18 ,  G03F7/00 ,  G03F7/16

CPC classification number: G02B5/1857 ,  G03F7/0005 ,  G03F7/16

Abstract: Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to optical devices and methods of manufacturing optical devices having optical device structures with at least one of varying depths or refractive indices across the surface of a substrate. According to certain embodiments, an inkjet process is used to deposit a volumetrically variable optical device that is etched to form a diffractive optic element (DOE). Volumetrically variable can relate to the thickness of the optical device, or the relative volume of two or more diffractive materials deposited in combination. According to other embodiments, a single-profile DOE is deposited on a substrate and an inkjet process deposits a volumetrically variable organic material over the DOE. The DOE and organic material are etched to modify the profile of the structure, after which the organic material is removed, leaving the modified-profile DOE.

公开(公告)号：US11748875B2

公开(公告)日：2023-09-05

申请号：US17492826

申请日：2021-10-04

Applicant: Applied Materials, Inc.

Inventor： Yangyang Sun ,  Jinxin Fu ,  Kazuya Daito ,  Ludovic Godet

IPC: G06T7/00 ,  G06T7/90 ,  G06T7/80 ,  G01J1/42 ,  G02B27/01 ,  G01J1/44 ,  G01N21/958 ,  H04N23/56 ,  H04N23/74 ,  H04N23/90

CPC classification number: G06T7/001 ,  G01J1/42 ,  G01J1/44 ,  G01N21/958 ,  G02B27/0172 ,  G06T7/80 ,  G06T7/90 ,  H04N23/56 ,  H04N23/74 ,  H04N23/90 ,  G01J2001/4247 ,  G01N2021/9583 ,  G02B2027/014 ,  G02B2027/0112 ,  G02B2027/0118 ,  G02B2027/0138 ,  G06T2207/10024 ,  G06T2207/30108

Abstract: Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of see-through metrics for optical devices.

公开(公告)号：US11669012B2

公开(公告)日：2023-06-06

申请号：US16798261

申请日：2020-02-21

Applicant: Applied Materials, Inc.

Inventor： Yongan Xu ,  Ludovic Godet

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0005 ,  G03F7/0043 ,  G03F7/038 ,  G03F7/2022

Abstract: In one embodiment, a method of fabricating a device having at least two features of differing heights comprises: depositing a resist over a substrate; determining a topography pattern for the at least two features of the device; determining an exposure pattern for the at least two features of the device; exposing a first area of the resist with a first dose of light, the first area corresponding to a first feature of the at least two features; exposing a second area of the resist with a second dose of light that is different from the first dose of light, the second area corresponding to a second feature of the at least two features; and developing the resist.

公开(公告)号：US11524392B2

公开(公告)日：2022-12-13

申请号：US17237533

申请日：2021-04-22

Applicant: Applied Materials, Inc.

Inventor： Yaseer Arafath Ahamed ,  Kangkang Wang ,  Benjamin B. Riordon ,  James D. Strassner ,  Ludovic Godet

IPC: B25B11/00 ,  G02B6/10 ,  G02B1/00

Abstract: Embodiments described herein provide for devices and methods for retaining optical devices. The devices and methods described herein provide for retention of the substrate without contacting sensitive portions of the substrate. The devices and methods utilize retention pads or vacuum pins to contact the exclusion zones i.e., inactive areas of the substrate to retain the substrate and prevent the substrate from moving laterally. Additionally, a holding force retains the substrate in the vertical direction, without contacting the substrate. The methods provide for adjusting the devices to account for multiple geometries of the substrate. The methods further provide for adjusting the devices, such as adjusting a gap between the optical device and a suction pad, to alter the holding force of the devices on the optical devices.