公开(公告)号：US06472332B1

公开(公告)日：2002-10-29

申请号：US09723243

申请日：2000-11-28

Applicant: Arthur M. Gooray ,  George J. Roller ,  Joseph M. Crowley ,  Paul C. Galambos ,  Frank J. Peter ,  Kevin R. Zavadil ,  Richard C. Givler ,  Randy J. Shul ,  Christi Willison Gober

Inventor： Arthur M. Gooray ,  George J. Roller ,  Joseph M. Crowley ,  Paul C. Galambos ,  Frank J. Peter ,  Kevin R. Zavadil ,  Richard C. Givler ,  Randy J. Shul ,  Christi Willison Gober

IPC: H01L21302

CPC classification number: H01L21/3088 ,  B41J2/16 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B81B2201/038 ,  H01L21/30655

Abstract: Structures for use in conjunction with surface micromachined structures are formed using a two-step etching process. In various exemplary embodiments, the two-step etching process comprises a modified Bosch etch. According to various exemplary embodiments of the two-step etch, first mask and second masks are used to prepare a layer for etching one or more desired structures. The first mask is used to define at least one large feature. The second mask is used to define at least one small feature (small as compared to the at least one large feature). The second mask is formed over the first mask which is formed over the layer. In the first etching step, the at least one small feature is etched into the layer. Then, the second mask is removed using the chemical rinsing agent. In the second etching step, the at least one large feature is etched into the layer such that the at least one small feature propagates further into the layer ahead of the at least one large feature. The first mask is then removed. Other surface micromachined methods and structures are provided as well.

Abstract translation: 与表面微加工结构结合使用的结构使用两步蚀刻工艺形成。 在各种示例性实施例中，两步蚀刻工艺包括经修改的博世蚀刻。 根据两步蚀刻的各种示例性实施例，使用第一掩模和第二掩模来制备蚀刻一个或多个所需结构的层。 第一个掩模用于定义至少一个大的特征。 第二个掩模用于定义至少一个小特征（与至少一个大特征相比较小）。 第二掩模形成在形成在该层上的第一掩模上。 在第一蚀刻步骤中，至少一个小特征被蚀刻到该层中。 然后，使用化学漂洗剂除去第二面罩。 在第二蚀刻步骤中，至少一个大特征被蚀刻到层中，使得至少一个小特征进一步传播到至少一个大特征之前的层中。 然后删除第一个面具。 还提供了其他表面微加工方法和结构。

公开(公告)号：US06338249B1

公开(公告)日：2002-01-15

申请号：US09549381

申请日：2000-04-13

Applicant: Minfan Pai ,  Norman C. Tien

Inventor： Minfan Pai ,  Norman C. Tien

IPC: F01B2910

CPC classification number: F01B29/10 ,  B81B3/0024 ,  B81B2201/038 ,  B81B2203/051 ,  F03G7/065

Abstract: A vibromotor (10) includes a polysilicon surface-micromachined substrate. A movable guided element is slidably mounted on the substrate. At least one thermal actuator (20) has an impact head (40) and an anchoring end. The anchoring end pivotally disposed on the substrate external to a side of the movable guided element controls the movement of the movable guided element by electrothermally biasing the impact head (40) to tap against the movable guided element.

Abstract translation: 振动电动机（10）包括多晶硅表面微加工衬底。 可动引导元件可滑动地安装在基板上。 至少一个热致动器（20）具有冲击头（40）和锚定端。 枢转地设置在可移动导向元件的侧面上的基板上的锚定端部通过电热偏置冲击头（40）以抵靠可动导向元件来控制可动导向元件的运动。

公开(公告)号：US06329738B1

公开(公告)日：2001-12-11

申请号：US09537936

申请日：2000-03-29

Applicant: Elmer S. Hung ,  Erik R. Deutsch ,  Stephen D. Senturia

Inventor： Elmer S. Hung ,  Erik R. Deutsch ,  Stephen D. Senturia

IPC: H02N100

CPC classification number: B81B3/0037 ,  B81B2201/038 ,  B81B2203/053 ,  H02N1/006

Abstract: There is provided an electrostatically-controllable actuator having a stationary electrode, with an actuating element separated from the stationary electrode by an actuation gap. The actuating element includes a mechanically constrained support region, a deflection region free to be deflected through the actuation gap, and a conducting actuation region extending from about the support region to the deflection region. A commonality in area between the actuation region and the stationary electrode is selected to produce controlled and stable displacement of the deflection region over a displacement range, e.g., extending to a specified point in the actuation gap, when an actuation voltage is applied between the actuation region and the stationary electrode. This range of stable displacement, which can be stable bending, can extend to a point greater than about ⅓ of the actuation gap, or even through the full actuation gap. As a result, the invention overcomes the limitation of ⅓ gap actuation of conventional electrostatic actuation configurations.

Abstract translation: 提供了具有固定电极的静电可控致动器，其中致动元件通过致动间隙与固定电极分离。 致动元件包括机械约束的支撑区域，可自由偏转通过致动间隙的偏转区域以及从支撑区域延伸到偏转区域的导电致动区域。 选择致动区域和固定电极之间的区域中的共同点，以便在致动电压施加在致动区域之间时在偏移范围（例如延伸到致动间隙中的特定点）处产生受控且稳定的偏转区域位移 区域和固定电极。 可稳定弯曲的这种稳定位移范围可以延伸到大于致动间隙的大约1/3的点，或者甚至延伸到完全致动间隙。 结果，本发明克服了传统的静电致动构造的1/3间隙致动的限制。

公开(公告)号：US20010048265A1

公开(公告)日：2001-12-06

申请号：US09827858

申请日：2001-04-05

Inventor： Samuel Lee Miller ,  Paul Jackson McWhorter ,  Murray Steven Rodgers ,  Jeffry J. Sniegowski ,  Stephen M. Barnes

IPC: H02N001/00

CPC classification number: B81B3/004 ,  B81B3/0062 ,  B81B2201/038 ,  B81B2201/045 ,  B81B2203/0136 ,  B81B2203/0307 ,  B81B2203/053 ,  B81B2203/058 ,  G02B6/122 ,  G02B6/3518 ,  G02B6/357 ,  G02B6/358 ,  G02B6/3584 ,  G02B26/0841 ,  G02B2006/12104 ,  G11B7/0927 ,  H02N1/006 ,  H02N1/008

Abstract: A microelectromechanical (MEM) apparatus is disclosed which has a platform that can be elevated above a substrate and tilted at an arbitrary angle using a plurality of flexible members which support the platform and control its movement. Each flexible member is further controlled by one or more MEM actuators which act to bend the flexible member. The MEM actuators can be electrostatic comb actuators or vertical zip actuators, or a combination thereof. The MEM apparatus can include a mirror coating to form a programmable mirror for redirecting or switching one or more light beams for use in a projection display. The MEM apparatus with the mirror coating also has applications for switching light beams between optical fibers for use in a local area fiber optic network, or for use in fiber optic telecommunications or data communications systems.

Abstract translation: 公开了一种微机电（MEM）装置，其具有能够在基板上升高并以任意角度倾斜的平台，该平台使用支撑平台并控制其运动的多个柔性构件。 每个柔性构件由一个或多个用于弯曲柔性构件的MEM致动器进一步控制。 MEM致动器可以是静电梳状致动器或垂直拉链致动器，或其组合。 MEM装置可以包括镜面涂层以形成用于重定向或切换用于投影显示器的一个或多个光束的可编程镜子。 具有镜面涂层的MEM装置还具有用于在用于局域光纤网络的光纤之间切换光束或用于光纤电信或数据通信系统的应用。

公开(公告)号：US06171886B2

公开(公告)日：2001-01-09

申请号：US09109124

申请日：1998-06-30

Applicant: Syamal K. Ghosh ,  Edward P. Furlani ,  Dilip K. Chatterjee

Inventor： Syamal K. Ghosh ,  Edward P. Furlani ,  Dilip K. Chatterjee

IPC: H01L2714

CPC classification number: H01F7/1615 ,  B81B3/0035 ,  B81B2201/038 ,  B81B2203/053 ,  H01F7/122

Abstract: A method of making micro-actuator devices including a silicon wafer, a magnet positioned inside an insulated actuating chamber having electrical coil wound around its circumference thereby forming an electromagnet assemblage. A plurality of etched holes in silicon wafer receives the electromagnet assemblage and is adapted to produce a magnetic field in response to an applied current that acts on the magnet to cause the axial reciprocating motion of the magnet.

Abstract translation: 一种制造微型致动器装置的方法，其包括硅晶片，位于绝缘致动室内部的磁体，该绝缘驱动室具有围绕其圆周缠绕的电线圈，从而形成电磁体组件。 硅晶片中的多个蚀刻孔接收电磁体组合，并且适于响应于作用在磁体上的施加电流产生磁场以引起磁体的轴向往复运动。

公开(公告)号：US20190241427A1

公开(公告)日：2019-08-08

申请号：US16270374

申请日：2019-02-07

Applicant: The Board of Trustees of the Leland Stanford Junior University

Inventor： Sandra Manosalvas-Kjono ,  Ronald Quan ,  Olav Solgaard

IPC: B81B7/00 ,  B81B7/02 ,  B81B3/00 ,  B81C99/00

CPC classification number: B81B7/008 ,  B81B3/0021 ,  B81B7/02 ,  B81B2201/038 ,  B81B2201/042 ,  B81C99/003

Abstract: Aspects are directed to a MEMS device configurable to receive signals from a first, a second, a third, and a fourth signal source operating at a first, a second, a third, and a fourth frequency, respectively. The MEMS device may be configured to combine the first signal with the second signal generating a first combined signal, and to combine the third signal with the fourth signal generating a second combined signal. The first combined signal may be coupled to the first terminal of the MEMS device while the second combined signal may be coupled to the second terminal of the MEMS device. The first common terminal may be configured to produce an output associated with the second and fourth frequencies. The MEMS device may be further configured to derive from the produced output a signal indicative of nonlinearities or of changes in capacitance related to the MEMS device.

公开(公告)号：US20170225946A1

公开(公告)日：2017-08-10

申请号：US15493982

申请日：2017-04-21

Applicant: Intel Corporation

Inventor： Weng Hong TEH ,  Robert L. SANKMAN

IPC: B81C1/00 ,  B81B7/00

CPC classification number: B81C1/00087 ,  B81B7/0006 ,  B81B7/0074 ,  B81B2201/0264 ,  B81B2201/038 ,  B81B2203/0315 ,  B81B2207/012 ,  B81B2207/07 ,  B81C1/00134 ,  B81C1/0023 ,  B81C2203/019 ,  H01L23/48 ,  H01L23/5389 ,  H01L24/24 ,  H01L24/82 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/16135 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/73204 ,  H01L2224/73259 ,  H01L2224/73267 ,  H01L2224/82047 ,  H01L2224/821 ,  H01L2224/92244 ,  H01L2224/97 ,  H01L2924/10253 ,  H01L2924/12042 ,  H01L2924/1461 ,  H01L2924/15311 ,  H05K1/185 ,  H01L2924/00 ,  H01L2224/16225 ,  H01L2224/82

Abstract: An apparatus including a die including a first side and an opposite second side including a device side with contact points and lateral sidewalls defining a thickness of the die; a build-up carrier coupled to the second side of the die, the build-up carrier including a plurality of alternating layers of conductive material and insulating material, wherein at least one of the layers of conductive material is coupled to one of the contact points of the die; and at least one device within the build-up carrier disposed in an area void of a layer of patterned conductive material. A method and an apparatus including a computing device including a package including a microprocessor are also disclosed.

公开(公告)号：US09627996B1

公开(公告)日：2017-04-18

申请号：US15075846

申请日：2016-03-21

Applicant: HONDA MOTOR CO., LTD.

Inventor： Atsuo Orita

IPC: H01L41/04 ,  H02N2/06

CPC classification number: H02N2/062 ,  B81B3/007 ,  B81B2201/038 ,  B81B2203/053 ,  H01L41/042 ,  H01L41/0986 ,  H01L41/193

Abstract: A present invention provides a device capable of controlling a variable stiffness mechanism, which has a dielectric elastomer interposed between two members, so as to suppress an increase in the strain of the dielectric elastomer caused by the creep phenomenon. A power source control unit 21 corrects a reference supply voltage Vbase of an output voltage of a power source 10, which is determined on the basis of a desired degree of stiffness of a dielectric elastomer 1, by a feedback manipulated variable determined on the basis of a difference between a desired value of the capacitance of the elastomer 1 and an estimated value thereof, thereby setting a desired value for controlling the output voltage of the power source 10 in order to control the power source 10 according to the desired value for control.

公开(公告)号：US09321634B2

公开(公告)日：2016-04-26

申请号：US14608841

申请日：2015-01-29

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： William J. Gallagher ,  Eugene J. O'Sullivan ,  Naigang Wang

IPC: H01L21/00 ,  B81C1/00 ,  H01L43/14 ,  B81B3/00 ,  H01L43/10 ,  H01L43/12 ,  H01L49/02 ,  H01F41/04

CPC classification number: B81C1/00373 ,  B81B3/0021 ,  B81B2201/038 ,  B81B2203/0118 ,  B81C1/00142 ,  B81C1/00706 ,  B81C2201/0188 ,  H01F41/046 ,  H01L28/10 ,  H01L43/10 ,  H01L43/12 ,  H01L43/14

Abstract: A micro-electromechanical device and method of manufacture are disclosed. A sacrificial layer is formed on a silicon substrate. A metal layer is formed on a top surface of the sacrificial layer. Soft magnetic material is electrolessly deposited on the metal layer to manufacture the micro-electromechanical device. The sacrificial layer is removed to produce a metal beam separated from the silicon substrate by a space.

公开(公告)号：US09303737B2

公开(公告)日：2016-04-05

申请号：US13935589

申请日：2013-07-05

Applicant: Technion Research and Development Foundation Ltd.

Inventor： David Elata ,  Arnon Hirshberg

IPC: F16H21/44 ,  B81B3/00

CPC classification number: F16H21/44 ,  B81B3/0062 ,  B81B2201/038 ,  B81B2203/0118 ,  Y10T74/18888

Abstract: A mechanism and method for motion conversion is disclosed. This mechanism can be easily fabricated using standard bulk micromachining technology. Based on this method with appropriate design, a horizontal, in-plane motion can be converted to a vertical or angular displacement out-of-plane. This design has great advantages in micro devices, which are built from a single layer, i.e. wafer fabrication, where an in-plane force is easy to implement, such as by the use of comb drive mechanisms, but an out-of-plane motion may be hard to achieve. The mechanism comprises a pair of beams of different heights, rigidly connected together at a number of points along their length, such that application of an in-plane force to the double beam structure results in out-of-plane motion of the double beam structure at points distant from the point of application of the force.

Abstract translation: 公开了一种用于运动转换的机构和方法。 这种机制可以使用标准的体积微加工技术轻松制造。 基于这种适当设计的方法，可以将水平的平面内运动转换为平面外的垂直或角位移。 这种设计在微器件中具有巨大的优势，微器件由单层构成，即晶片制造，其中易于实现平面内的力，例如通过使用梳齿驱动机构，但是平面外运动 可能很难实现。 该机构包括一对不同高度的梁，沿着它们的长度在多个点处刚性地连接在一起，使得对双梁结构施加平面内的力导致双梁结构的平面外运动 在远离施加力的点处。