-
公开(公告)号:US20220068861A1
公开(公告)日:2022-03-03
申请号:US17523787
申请日:2021-11-10
申请人: Intel Corporation
IPC分类号: H01L23/00 , H01L27/08 , H01L23/48 , H01L23/538
摘要: A packaged semiconductor die with a bumpless die-package interface and methods of fabrication are described. For example, a semiconductor package includes a substrate having a land side with a lowermost layer of conductive vias. A semiconductor die is embedded in the substrate and has an uppermost layer of conductive lines, one of which is coupled directly to a conductive via of the lowermost layer of conductive vias of the substrate. In another example, a semiconductor package includes a substrate having a land side with a lowermost layer of conductive vias. A semiconductor die is embedded in the substrate and has an uppermost layer of conductive lines with a layer of conductive vias disposed thereon. At least one of the conductive lines is coupled directly to a conductive via of the semiconductor die which is coupled directly to a conductive via of the lowermost layer of conductive vias of the substrate.
-
2.
公开(公告)号:US20230420400A1
公开(公告)日:2023-12-28
申请号:US18244689
申请日:2023-09-11
申请人: Intel Corporation
IPC分类号: H01L23/00 , H01L27/08 , H01L23/48 , H01L23/538
CPC分类号: H01L24/09 , H01L27/08 , H01L24/19 , H01L24/97 , H01L23/481 , H01L23/5384 , H01L23/5386 , H01L23/552
摘要: A packaged semiconductor die with a bumpless die-package interface and methods of fabrication are described. For example, a semiconductor package includes a substrate having a land side with a lowermost layer of conductive vias. A semiconductor die is embedded in the substrate and has an uppermost layer of conductive lines, one of which is coupled directly to a conductive via of the lowermost layer of conductive vias of the substrate. In another example, a semiconductor package includes a substrate having a land side with a lowermost layer of conductive vias. A semiconductor die is embedded in the substrate and has an uppermost layer of conductive lines with a layer of conductive vias disposed thereon. At least one of the conductive lines is coupled directly to a conductive via of the semiconductor die which is coupled directly to a conductive via of the lowermost layer of conductive vias of the substrate.
-
公开(公告)号:US20170225946A1
公开(公告)日:2017-08-10
申请号:US15493982
申请日:2017-04-21
申请人: Intel Corporation
发明人: Weng Hong TEH , Robert L. SANKMAN
CPC分类号: B81C1/00087 , B81B7/0006 , B81B7/0074 , B81B2201/0264 , B81B2201/038 , B81B2203/0315 , B81B2207/012 , B81B2207/07 , B81C1/00134 , B81C1/0023 , B81C2203/019 , H01L23/48 , H01L23/5389 , H01L24/24 , H01L24/82 , H01L2224/0401 , H01L2224/04105 , H01L2224/16135 , H01L2224/32225 , H01L2224/32245 , H01L2224/73204 , H01L2224/73259 , H01L2224/73267 , H01L2224/82047 , H01L2224/821 , H01L2224/92244 , H01L2224/97 , H01L2924/10253 , H01L2924/12042 , H01L2924/1461 , H01L2924/15311 , H05K1/185 , H01L2924/00 , H01L2224/16225 , H01L2224/82
摘要: An apparatus including a die including a first side and an opposite second side including a device side with contact points and lateral sidewalls defining a thickness of the die; a build-up carrier coupled to the second side of the die, the build-up carrier including a plurality of alternating layers of conductive material and insulating material, wherein at least one of the layers of conductive material is coupled to one of the contact points of the die; and at least one device within the build-up carrier disposed in an area void of a layer of patterned conductive material. A method and an apparatus including a computing device including a package including a microprocessor are also disclosed.
-
公开(公告)号:US20160284644A1
公开(公告)日:2016-09-29
申请号:US15181226
申请日:2016-06-13
申请人: INTEL CORPORATION
IPC分类号: H01L23/538 , H01L25/00 , H01L25/065
CPC分类号: H01L23/5389 , H01L21/4857 , H01L21/568 , H01L21/76879 , H01L23/3121 , H01L23/3192 , H01L23/5383 , H01L23/5384 , H01L23/5386 , H01L24/13 , H01L24/14 , H01L24/16 , H01L24/19 , H01L24/25 , H01L24/73 , H01L24/82 , H01L25/0657 , H01L25/105 , H01L25/50 , H01L2224/0401 , H01L2224/04105 , H01L2224/12105 , H01L2224/131 , H01L2224/16145 , H01L2224/2501 , H01L2224/73259 , H01L2224/821 , H01L2224/9222 , H01L2225/06513 , H01L2225/06544 , H01L2225/06555 , H01L2225/1035 , H01L2225/1058 , H01L2924/12042 , H01L2924/1431 , H01L2924/1434 , H01L2924/15311 , H01L2924/18162 , H01L2924/014 , H01L2924/00
摘要: Electronic assemblies including substrates and their manufacture are described. One assembly includes a die embedded in a dielectric layer in a multilayer substrate, and a dielectric region embedded in the dielectric layer in the multilayer substrate. The multilayer substrate includes a die side and a land side, with the first dielectric region and the dielectric layer extending to the die side. A plurality of vias are positioned within the first dielectric region, the vias extending to pads on the die side. Other embodiments are described and claimed.
-
公开(公告)号:US20160245841A1
公开(公告)日:2016-08-25
申请号:US15051856
申请日:2016-02-24
申请人: Intel Corporation
发明人: Qing MA , Valluri RAO , Feras EID , Kevin LIN , Weng Hong TEH , Johanna SWAN , Robert SANKMAN
IPC分类号: G01P15/097
CPC分类号: G01P15/097 , G01P15/105 , G01P15/18
摘要: An accelerometer includes a mass, suspended by a beam, and associated conductive paths. Each conductive path is subjected to a magnetic field, such that, when a time varying signal is applied to the conductive paths, a characteristic resonant frequency is produced, and when the mass experiences an acceleration, a respective change in the resonant frequency is produced that may be interpreted as acceleration data. Embodiments include methods of manufacturing an accelerometer and systems and devices incorporating the accelerometer.
摘要翻译: 加速度计包括由梁悬挂的质量块和相关联的导电路径。 每个导电路径受到磁场的影响,使得当对导电路径施加时变信号时,产生特性谐振频率,并且当质量经历加速度时,产生谐振频率的相应变化, 可以解释为加速度数据。 实施例包括制造加速度计的方法和结合有加速度计的系统和装置。
-
公开(公告)号:US20240021562A1
公开(公告)日:2024-01-18
申请号:US18373849
申请日:2023-09-27
申请人: Intel Corporation
发明人: Weng Hong TEH , Chia-Pin CHIU
CPC分类号: H01L24/25 , H01L23/5389 , H01L24/19 , H01L24/24 , H01L23/3107 , H01L25/16 , H01L23/50 , H01L25/18 , H01L23/3114 , H01L2924/15747 , H01L2924/12042 , H01L23/3128 , H01L21/568
摘要: Discussed generally herein are devices that include high density interconnects between dice and techniques for making and using those devices. In one or more embodiments a device can include a bumpless buildup layer (BBUL) substrate including a first die at least partially embedded in the BBUL substrate, the first die including a first plurality of high density interconnect pads. A second die can be at least partially embedded in the BBUL substrate, the second die including a second plurality of high density interconnect pads. A high density interconnect element can be embedded in the BBUL substrate, the high density interconnect element including a third plurality of high density interconnect pads electrically coupled to the first and second plurality of high density interconnect pads.
-
公开(公告)号:US20150014861A1
公开(公告)日:2015-01-15
申请号:US14501003
申请日:2014-09-29
申请人: INTEL CORPORATION
IPC分类号: H01L21/768 , H01L23/00
CPC分类号: H01L23/5389 , H01L21/4857 , H01L21/568 , H01L21/76879 , H01L23/3121 , H01L23/3192 , H01L23/5383 , H01L23/5384 , H01L23/5386 , H01L24/13 , H01L24/14 , H01L24/16 , H01L24/19 , H01L24/25 , H01L24/73 , H01L24/82 , H01L25/0657 , H01L25/105 , H01L25/50 , H01L2224/0401 , H01L2224/04105 , H01L2224/12105 , H01L2224/131 , H01L2224/16145 , H01L2224/2501 , H01L2224/73259 , H01L2224/821 , H01L2224/9222 , H01L2225/06513 , H01L2225/06544 , H01L2225/06555 , H01L2225/1035 , H01L2225/1058 , H01L2924/12042 , H01L2924/1431 , H01L2924/1434 , H01L2924/15311 , H01L2924/18162 , H01L2924/014 , H01L2924/00
摘要: Electronic assemblies including substrates and their manufacture are described. One assembly includes a die embedded in a dielectric layer in a multilayer substrate, and a dielectric region embedded in the dielectric layer in the multilayer substrate. The multilayer substrate includes a die side and a land side, with the first dielectric region and the dielectric layer extending to the die side. A plurality of vias are positioned within the first dielectric region, the vias extending to pads on the die side. Other embodiments are described and claimed.
摘要翻译: 描述了包括基板及其制造的电子组件。 一个组件包括嵌入在多层基板中的电介质层中的管芯,以及嵌入多层基板中的介电层中的电介质区域。 多层基板包括裸片侧和接地侧,第一介电区和电介质层延伸到管芯侧。 多个通孔位于第一电介质区域内,通孔延伸到管芯侧的焊盘。 描述和要求保护其他实施例。
-
公开(公告)号:US20240339428A1
公开(公告)日:2024-10-10
申请号:US18749274
申请日:2024-06-20
申请人: Intel Corporation
发明人: Weng Hong TEH , Chia-Pin CHIU
CPC分类号: H01L24/25 , H01L23/3107 , H01L23/3114 , H01L23/50 , H01L23/5389 , H01L24/19 , H01L24/24 , H01L25/16 , H01L25/18 , H01L21/568 , H01L23/3128 , H01L2224/04105 , H01L2224/12105 , H01L2224/16227 , H01L2224/2501 , H01L2224/2505 , H01L2224/2512 , H01L2224/255 , H01L2224/73209 , H01L2224/81005 , H01L2224/92133 , H01L2924/10253 , H01L2924/12042 , H01L2924/141 , H01L2924/1431 , H01L2924/1461 , H01L2924/15151 , H01L2924/15192 , H01L2924/15747 , H01L2924/18161 , H01L2924/18162
摘要: Discussed generally herein are devices that include high density interconnects between dice and techniques for making and using those devices. In one or more embodiments a device can include a bumpless buildup layer (BBUL) substrate including a first die at least partially embedded in the BBUL substrate, the first die including a first plurality of high density interconnect pads. A second die can be at least partially embedded in the BBUL substrate, the second die including a second plurality of high density interconnect pads. A high density interconnect element can be embedded in the BBUL substrate, the high density interconnect element including a third plurality of high density interconnect pads electrically coupled to the first and second plurality of high density interconnect pads.
-
公开(公告)号:US20220130789A1
公开(公告)日:2022-04-28
申请号:US17570255
申请日:2022-01-06
申请人: Intel Corporation
发明人: Weng Hong TEH , Chia-Pin CHIU
摘要: Discussed generally herein are devices that include high density interconnects between dice and techniques for making and using those devices. In one or more embodiments a device can include a bumpless buildup layer (BBUL) substrate including a first die at least partially embedded in the BBUL substrate, the first die including a first plurality of high density interconnect pads. A second die can be at least partially embedded in the BBUL substrate, the second die including a second plurality of high density interconnect pads. A high density interconnect element can be embedded in the BBUL substrate, the high density interconnect element including a third plurality of high density interconnect pads electrically coupled to the first and second plurality of high density interconnect pads.
-
公开(公告)号:US20210043596A1
公开(公告)日:2021-02-11
申请号:US17077996
申请日:2020-10-22
申请人: Intel Corporation
发明人: Weng Hong TEH , Chia-Pin CHIU
摘要: Discussed generally herein are devices that include high density interconnects between dice and techniques for making and using those devices. In one or more embodiments a device can include a bumpless buildup layer (BBUL) substrate including a first die at least partially embedded in the BBUL substrate, the first die including a first plurality of high density interconnect pads. A second die can be at least partially embedded in the BBUL substrate, the second die including a second plurality of high density interconnect pads. A high density interconnect element can be embedded in the BBUL substrate, the high density interconnect element including a third plurality of high density interconnect pads electrically coupled to the first and second plurality of high density interconnect pads.
-
-
-
-
-
-
-
-
-