Superlattice nanopatterning of wires and complex patterns
    12.
    发明授权
    Superlattice nanopatterning of wires and complex patterns 有权
    电线和复杂图案的超晶格纳米图案

    公开(公告)号:US07906775B2

    公开(公告)日:2011-03-15

    申请号:US11633043

    申请日:2006-12-04

    Abstract: Fabrication of metallic or non-metallic wires with nanometer widths and nanometer separation distances without the use of lithography. Wires are created in a two-step process involving forming the wires at the desired dimensions and transferring them to a planar substrate. The dimensions and separation of the wires are determined by the thicknesses of alternating layers of different materials that are in the form of a superlattice. Wires are created by evaporating the desired material onto the superlattice that has been selectively etched to provide height contrast between layers. The wires thus formed upon one set of superlattice layers are then transferred to a substrate.

    Abstract translation: 制造具有纳米宽度和纳米分离距离的金属或非金属线,无需光刻。 电线是以两步法制成的,包括以所需尺寸形成电线并将其转移到平面衬底。 导线的尺寸和间距由超晶格形式的不同材料的交替层的厚度决定。 通过将期望的材料蒸发到已经被选择性蚀刻以提供层之间的高度对比度的超晶格上来产生电线。 然后将由此形成在一组超晶格层上的电线转移到基底。

Patent Agency Ranking