Apparatus and method for providing improved user interface between multiple network devices
    12.
    发明授权
    Apparatus and method for providing improved user interface between multiple network devices 有权
    用于在多个网络设备之间提供改进的用户界面的设备和方法

    公开(公告)号:US07484015B2

    公开(公告)日:2009-01-27

    申请号:US11603189

    申请日:2006-11-22

    IPC分类号: G06F3/00 G06F3/048

    摘要: A method and apparatus for providing a user interface is provided. The apparatus includes a transmitting/receiving unit-that receives a instruction signal transmitted by a control device, and a control unit in communication with the transmitting/receiving unit that determines whether devices connected to an audio-video (AV) network can be operated according to the instruction signal that is received, wherein the control device includes a first button that is operable to display a list menu that lists the devices connected to the AV network on a display, and a second button that is operable to display a function menu of at least one function corresponding to the devices on the display.

    摘要翻译: 提供了一种用于提供用户界面的方法和装置。 该装置包括:接收由控制装置发送的指示信号的发送/接收单元;以及与发送/接收单元通信的控制单元,其确定连接到音频 - 视频(AV)网络的装置是否可以根据 所述控制装置包括第一按钮,所述第一按钮可操作以显示列出在显示器上连接到所述AV网络的设备的列表菜单,以及第二按钮,其可操作以显示功能菜单 至少一个对应于显示器上的设备的功能。

    Method and apparatus of recognizing face using 2nd-order independent component analysis (ICA)/principal component analysis (PCA)
    13.
    发明授权
    Method and apparatus of recognizing face using 2nd-order independent component analysis (ICA)/principal component analysis (PCA) 有权
    使用二阶独立分量分析(ICA)/主成分分析(PCA)识别面部的方法和装置

    公开(公告)号:US07164781B2

    公开(公告)日:2007-01-16

    申请号:US10377752

    申请日:2003-03-04

    IPC分类号: G06K9/00

    摘要: A method and apparatus for recognizing and searching for a face using 2nd-order independent component analysis (ICA) are provided. The method includes performing PCA on an input original image and generating a low-pass filtered image by removing high-frequency component from the original image, subtracting the low-pass filtered image from the original image and obtaining residual image having only frequency-components, and performing ICA on the residual image and generating feature information corresponding to the original image. While an original ICA subtracts independent components (i.e., independent basis components) from gray scale images, the proposed 2nd-order ICA is robust to illumination variation since it is applied to make the remaining images correspond to high pass frequency components.

    摘要翻译: 提供了使用二阶独立分量分析(ICA)识别和搜索面部的方法和装置。 该方法包括在输入原始图像上执行PCA,并通过从原始图像中去除高频分量并从原始图像中减去低通滤波图像并获得仅具有频率分量的残差图像来生成低通滤波图像, 对剩余图像执行ICA并产生与原始图像相对应的特征信息。 虽然原始ICA从灰度图像中减去独立分量(即独立基础分量),但是所提出的二阶ICA对照明变化是鲁棒的,因为它被应用于使剩余的图像对应于高通频率分量。

    Photosensitive polymer containing Si, Ge or Sn and resist composition comprising the same
    14.
    发明授权
    Photosensitive polymer containing Si, Ge or Sn and resist composition comprising the same 有权
    含有Si,Ge或Sn的光敏聚合物和包含其的抗蚀剂组合物

    公开(公告)号:US06677100B2

    公开(公告)日:2004-01-13

    申请号:US09950799

    申请日:2001-09-13

    IPC分类号: G03C173

    摘要: A photosensitive polymer including a copolymer of an acrylate or methacrylate monomer having a group indicated by the following formula (I), a comonomer selected from a maleic anhydride monomer and a cyclic vinyl ether monomer, and a resist composition including the same. In the formula, R1, R2, R3, and R4 are independently a hydrogen atom, a C1-C4 alkyl group, a C1-C4 alkoxy group, a phenyl group, a benzyl group, a phenoxy group, or —M(R′)3, M is Si, Ge, Sn, or OSi, and each R′ independently is a C1-C4 alkyl group, a C1-C4 alkoxy group, a phenyl group, or a phenoxy group.

    摘要翻译: 包括具有由下式(I)表示的基团的丙烯酸酯或甲基丙烯酸酯单体,选自马来酸酐单体和环状乙烯基醚单体的共聚单体的共聚物的光敏聚合物和包含该共聚物的抗蚀剂组合物。在式 ,R 1,R 2,R 3和R 4独立地为氢原子,C 1 -C 4烷基,C 1 -C 4烷氧基,苯基,苄基,苯氧基或-M(R')3, M是Si,Ge,Sn或OSi,每个R'独立地是C1-C4烷基,C1-C4烷氧基,苯基或苯氧基。

    Photosensitive lithocholate derivative and chemically amplified photoresist composition containing the same
    15.
    发明授权
    Photosensitive lithocholate derivative and chemically amplified photoresist composition containing the same 失效
    光敏酚醛衍生物和含有它们的化学放大光致抗蚀剂组合物

    公开(公告)号:US06497987B1

    公开(公告)日:2002-12-24

    申请号:US09662653

    申请日:2000-09-14

    IPC分类号: G03C173

    摘要: A photosensitive compound, and a chemically amplified photoresist composition containing the photosensitive compound, maintain transparency even when exposed to a short-wavelength light source of 193 nm or below, and exhibit improved adhesion to an underlying film or substrate, improved wettability to a developing solution and improved resistance to dry etching. The photosensitive compound includes a carboxylic acid protected with a protective group capable of being deprotected with an acid and has a hydroxy at position No. 3 substituted with a hydrophillic aliphatic compound or a hydrophillic alicyclic compound.

    摘要翻译: 含有该光敏化合物的光敏化合物和化学放大型光致抗蚀剂组合物即使在暴露于193nm以下的短波长光源时也保持透明性,并且显示出对下层膜或基材的改善的粘合性,改善了对显影液的润湿性 并提高了耐干腐蚀性。 感光性化合物包括被保护基保护的羧酸,该保护基能够用酸去保护,并且在3位的羟基被亲水性脂族化合物或亲水脂环化合物取代。

    Methods of forming patterns for semiconductor devices
    19.
    发明授权
    Methods of forming patterns for semiconductor devices 有权
    形成半导体器件图形的方法

    公开(公告)号:US08361905B2

    公开(公告)日:2013-01-29

    申请号:US12581298

    申请日:2009-10-19

    摘要: Provided are methods of forming patterns of semiconductor devices, whereby patterns having various widths may be simultaneously formed, and a pattern density may be doubled by a double patterning process in a portion of the semiconductor device. A dual mask layer is formed on a substrate. A variable mask layer is formed on the dual mask layer. A first photoresist pattern having a first thickness and a first width in the first region, and a second photoresist pattern having a second thickness greater than the first thickness and a second width wider than the first width in the second region are formed on the variable mask layer. A first mask pattern and a first variable mask pattern are formed in the first region, and a second mask pattern and a second variable mask pattern are formed in the second region, by sequentially etching the variable mask layer and the dual mask layer by using, as etch masks, the first photoresist pattern and the second photoresist pattern. First spacers covering side walls of the first mask pattern and second spacers covering side walls of the second mask pattern are formed. The first mask pattern is removed, and then the substrate is etched in the first region and the second region by using the first spacers as an etch mask in the first region, and the second mask pattern and the second spacers as an etch mask in the second region.

    摘要翻译: 提供了形成半导体器件的图案的方法,由此可以同时形成具有各种宽度的图案,并且在半导体器件的一部分中通过双重图案化工艺可以使图案密度加倍。 在基板上形成双掩模层。 在双掩模层上形成可变掩模层。 在第一区域中具有第一厚度和第一宽度的第一光致抗蚀剂图案和具有大于第一厚度的第二厚度的第二光致抗蚀剂图案和宽于第二区域中的第一宽度的第二宽度形成在可变掩模 层。 在第一区域中形成第一掩模图案和第一可变掩模图案,并且通过使用可变掩模层和双掩模层依次蚀刻第二区域中的第二掩模图案和第二可变掩模图案, 作为蚀刻掩模,第一光致抗蚀剂图案和第二光致抗蚀剂图案。 形成覆盖第一掩模图案的侧壁的第一间隔物和覆盖第二掩模图案的侧壁的第二间隔物。 去除第一掩模图案,然后通过在第一区域中使用第一间隔物作为蚀刻掩模在第一区域和第二区域中蚀刻衬底,并且在第二区域中将第二掩模图案和第二间隔物作为蚀刻掩模 第二区。

    MDCT domain post-filtering apparatus and method for quality enhancement of speech
    20.
    发明申请
    MDCT domain post-filtering apparatus and method for quality enhancement of speech 失效
    MDCT域后置滤波装置及语音质量提升方法

    公开(公告)号:US20090150143A1

    公开(公告)日:2009-06-11

    申请号:US12155542

    申请日:2008-06-05

    IPC分类号: G10L21/00 G10L19/00

    CPC分类号: G10L19/26 G10L19/0212

    摘要: A post-filtering apparatus and method for speech enhancement in a modified discrete cosine transform (MDCT) domain are disclosed. In the apparatus and method, previous and current MDCT coefficients are used for obtaining a speech spectrum coefficient similar to a real speech spectrum, and a convex function is used for transforming the speech spectrum coefficient and obtaining a post-filter coefficient so that difference can increase in the case where the speech spectrum coefficient is small but decrease in the case where the coefficient is large. Then, the post-filter coefficient is applied to the MDCT coefficient. With this configuration, both the current and previous MDCT values are used, so that it is possible to obtain a spectrum coefficient similar to the real speech spectrum and to obtain a more accurate filter coefficient. Further, the coefficient is adaptively transformed through the convex function, thereby enhancing speech quality.

    摘要翻译: 公开了一种用于修正的离散余弦变换(MDCT)域中的语音增强的后置滤波装置和方法。 在该装置和方法中,先前和当前的MDCT系数被用于获得类似于真实语音频谱的语音频谱系数,并且使用凸函数来变换语音频谱系数并获得后置滤波器系数,使得差值可以增加 在语音频谱系数小的情况下,在系数大的情况下减少。 然后,将后滤波器系数应用于MDCT系数。 利用该配置,使用当前和先前的MDCT值,使得可以获得与真实语音频谱相似的频谱系数并获得更准确的滤波器系数。 此外,系数通过凸函数自适应地变换,从而提高语音质量。