公开(公告)号：US20180123308A1

公开(公告)日：2018-05-03

申请号：US15858219

申请日：2017-12-29

Applicant: GIGAPHOTON INC.

Inventor： Minoru TANIYAMA ,  Hakaru MIZOGUCHI ,  Osamu WAKABAYASHI

IPC: H01S3/038 ,  H01S3/086 ,  H01S3/104 ,  H01S3/134 ,  H01S3/0971

CPC classification number: H01S3/038 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/0385 ,  H01S3/0804 ,  H01S3/08059 ,  H01S3/086 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/134 ,  H01S3/136 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2308 ,  H01S2301/20

Abstract: A laser unit may include a laser chamber including a pair of discharge electrodes that are opposed to each other in a first direction with an electrode gap interposed in between and are configured to provide a discharge width in a second direction, orthogonal to the first direction, smaller than the electrode gap; and an optical resonator including a first optical member and a second optical member that are opposed to each other in a third direction orthogonal to both the first direction and the second direction with the discharge electrodes interposed in between, and configured to amplify laser light generated between the discharge electrodes and output amplified laser light, the optical resonator satisfying the following expression to configure a stable resonator in the second direction: 0

公开(公告)号：US20170203238A1

公开(公告)日：2017-07-20

申请号：US15476502

申请日：2017-03-31

Applicant: Gigaphoton Inc.

Inventor： Takanobu ISHIHARA ,  Hakaru MIZOGUCHI

IPC: B01D29/01 ,  B01D29/15 ,  H01L21/027 ,  B01D29/11 ,  B01D39/20 ,  B05B9/03 ,  B01D29/05 ,  B01D29/23

CPC classification number: B01D29/014 ,  B01D29/012 ,  B01D29/05 ,  B01D29/111 ,  B01D29/15 ,  B01D29/23 ,  B01D39/2003 ,  B01D2201/0423 ,  B01D2201/188 ,  B01D2201/325 ,  B01D2239/065 ,  B01D2239/10 ,  B01D2239/1216 ,  B05B9/03 ,  H01L21/027 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A target generation device may include a filter structure, a flange, a tank unit, and a nozzle section. The flange may accommodate the filter structure and contain a flow path passing through the filter structure. The tank unit may contain a space in communication with the flow path in the flange and store a predetermined target material. The nozzle section may be provided to the flange and in communication with the space in the tank unit through the flow path in the flange. The filter structure according to one embodiment of the present disclosure may include a filter of a porous material and a socket integrally formed with the filter.

公开(公告)号：US20160172814A1

公开(公告)日：2016-06-16

申请号：US15040645

申请日：2016-02-10

Applicant: GIGAPHOTON INC.

Inventor： Takashi SUGANUMA ,  Hakaru MIZOGUCHI ,  Osamu WAKABAYASHI

IPC: H01S3/00 ,  G03F7/20 ,  H01S3/23 ,  G02B27/28 ,  H05G2/00 ,  H01S3/038

CPC classification number: H01S3/005 ,  G02B27/286 ,  G03F7/70033 ,  G03F7/70041 ,  H01S3/038 ,  H01S3/2316 ,  H05G2/008

Abstract: There is provided a laser unit that may include: a master oscillator configured to output a linear-polarized laser light beam; a first polarization device disposed in a light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a polarization direction of the linearly-polarized incident laser light beam; a second polarization device disposed in the light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a direction of the polarization axis of the first polarization device; and a laser amplifier disposed between the first polarization device and the second polarization device in the light path of the linear-polarized laser light beam and including a pair of discharge electrodes disposed to oppose each other, an opposing direction of the pair of discharge electrodes being substantially aligned with the direction of the polarization axis of the first polarization device.

Abstract translation: 提供了一种激光单元，其可以包括：主振荡器，被配置为输出线偏振激光束; 设置在所述线偏振激光的光路中并具有基本上与所述线偏振的入射激光的偏振方向对准的偏振轴的第一偏振光装置; 设置在所述线偏振激光的光路中并具有基本上与所述第一偏振装置的偏振轴的方向对准的偏振轴的第二偏振装置; 以及激光放大器，其设置在所述线偏振激光的光路中的所述第一偏振光装置与所述第二偏振光装置之间，并且包括一对相对设置的放电电极，所述一对放电电极的相反方向为 基本上与第一偏振装置的偏振轴的方向对准。

公开(公告)号：US20150351211A1

公开(公告)日：2015-12-03

申请号：US14824270

申请日：2015-08-12

Applicant: GIGAPHOTON INC.

Inventor： Hakaru MIZOGUCHI ,  Yasufumi KAWASUJI ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G03F7/20 ,  G21K1/06

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/7085 ,  G21K1/067 ,  H05G2/003 ,  H05G2/005

Abstract: Provided is an extreme ultraviolet light generating apparatus that may include: a chamber containing one or more kinds of gases; a light concentration optical system provided in an optical path of pulsed laser light outputted from a laser unit, and configured to concentrate the pulsed laser light into a concentrated beam; and an image pickup section provided at a position out of the optical path of the pulsed laser light, and configured to pick up a plasma emission image that is an image of plasma emission in the chamber. The plasma emission is caused by application of the concentrated beam to the one or more kinds of gases in the chamber.

Abstract translation: 提供一种极紫外光发生装置，其可以包括：容纳一种或多种气体的室; 光浓缩光学系统，其设置在从激光单元输出的脉冲激光的光路中，并且将脉冲激光聚焦成浓缩光束; 以及摄像部，其设置在所述脉冲激光的光路外的位置处，并且被配置为拾取作为所述室中的等离子体发射的图像的等离子体发射图像。 等离子体发射是通过将浓缩的束施加到腔室中的一种或多种气体而引起的。

公开(公告)号：US20140008552A1

公开(公告)日：2014-01-09

申请号：US13929668

申请日：2013-06-27

Applicant: Gigaphoton Inc.

Inventor： Hiroshi UMEDA ,  Taku YAMAZAKI ,  Hakaru MIZOGUCHI ,  Toshihiro NISHISAKA

IPC: G03F7/20

CPC classification number: H05G2/008 ,  G03F7/20 ,  G03F7/70033 ,  H05G2/001 ,  H05G2/006

Abstract: A target supply apparatus mounted in a chamber in which extreme ultraviolet light is generated by introducing a target material and a laser beam into the chamber may include a target generator having a nozzle, a first pipe configured to cover the nozzle, a cover opening provided in the first pipe to allow the target material to pass through the first pipe, and a first valve configured to open and close the cover opening.

Abstract translation: 安装在通过将目标材料和激光束引入室中而产生极紫外光的室中的目标供给装置可以包括具有喷嘴的目标发生器，被配置为覆盖喷嘴的第一管， 允许目标材料通过第一管的第一管和构造成打开和关闭盖开口的第一阀。

公开(公告)号：US20130135601A1

公开(公告)日：2013-05-30

申请号：US13681744

申请日：2012-11-20

Applicant: Gigaphoton Inc.

Inventor： Shinji OKAZAKI ,  Hakaru MIZOGUCHI ,  Junichi FUJIMOTO ,  Takashi MATSUNAGA ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI

IPC: G03B27/52

CPC classification number: G03B27/522 ,  G03F7/70408

Abstract: A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.

Abstract translation: 双光束干涉装置可以包括其上可以设置晶片的晶片台，分束器，用于将第一激光分离成具有沿晶片表面内的第一方向延伸的光束强度分布的第二和第三激光， 以及将第二和第三激光引导到晶片上的光学系统。 从垂直于第一方向的第二方向照射第二激光，从与第一方向垂直但与第二方向不同的第三方向照射第三激光，从而引起第二和第三激光的干涉 光在晶圆上。 该装置增加了双光束干涉曝光的精度。

公开(公告)号：US20220376455A1

公开(公告)日：2022-11-24

申请号：US17817839

申请日：2022-08-05

Applicant: Gigaphoton Inc.

Inventor： Yoichi SASAKI ,  Kouji KAKIZAKI ,  Hakaru MIZOGUCHI

IPC: H01S3/036 ,  H01S3/038 ,  G03F7/20

Abstract: A laser device according to an aspect of the present disclosure includes a chamber into which laser gas is introduced; a pair of electrodes arranged in the chamber; a power source configured to apply a voltage between the electrodes; a nozzle structure which includes an internal passage for receiving the laser gas and a slit connected to the internal passage and is configured to generate flow of the laser gas between the electrodes due to the laser gas blowing out from the slit; a gas flow path which has a suction port through which the laser gas in the chamber is suctioned and introduces, to the nozzle structure, the laser gas suctioned through the suction port; and a blower device configured to cause the laser gas to blow toward the internal passage of the nozzle structure through the gas flow path.

公开(公告)号：US20170336282A1

公开(公告)日：2017-11-23

申请号：US15672961

申请日：2017-08-09

Applicant: The University of Tokyo ,  GIGAPHOTON INC.

Inventor： Yohei KOBAYASHI ,  Hakaru MIZOGUCHI ,  Junichi FUJIMOTO ,  Katsunori ISOMOTO ,  Osamu WAKABAYASHI ,  Georg SOUMAGNE

IPC: G01M11/00 ,  G01N21/55

CPC classification number: G01M11/005 ,  G01N21/55 ,  G01N2201/06113 ,  G01N2201/0697 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70591

Abstract: A spheroidal mirror reflectivity measuring apparatus for extreme ultraviolet light may include an extreme ultraviolet light source, an optical system, and a first photosensor. The extreme ultraviolet light source may be configured to output extreme ultraviolet light to a spheroidal mirror that includes a spheroidal reflection surface. The optical system may be configured to allow the extreme ultraviolet light to travel to the spheroidal reflection surface via a first focal position of the spheroidal mirror. The first photosensor may be provided at a second focal position of the spheroidal mirror, and may be configured to detect the extreme ultraviolet light that has passed through the first focal position and then has been reflected by the spheroidal reflection surface.

公开(公告)号：US20170019983A1

公开(公告)日：2017-01-19

申请号：US15278629

申请日：2016-09-28

Applicant: Gigaphoton Inc.

Inventor： Tsukasa HORI ,  Kouji KAKIZAKI ,  Tatsuya YANAGIDA ,  Osamu WAKABAYASHI ,  Hakaru MIZOGUCHI

IPC: H05G2/00 ,  H01S3/23 ,  H01S3/11 ,  H01S3/16 ,  H01S3/00 ,  H01S3/104 ,  H01S3/09 ,  H01S3/223

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/09 ,  H01S3/102 ,  H01S3/104 ,  H01S3/1106 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1673 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2366 ,  H01S3/2391 ,  H05G2/003 ,  H05G2/005

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract translation: 一种系统，包括：室，激光束装置，被配置为产生要被引入到所述腔室中的激光束;激光控制器，用于激光束装置至少控制激光束的光束强度和输出定时;以及目标 供给单元，被配置为将目标材料供应到所述室中，所述目标材料被所述激光束照射以产生极紫外光。

公开(公告)号：US20150249312A1

公开(公告)日：2015-09-03

申请号：US14694743

申请日：2015-04-23

Applicant: GIGAPHOTON INC.

Inventor： Hiroaki TSUSHIMA ,  Hakaru MIZOGUCHI ,  Junichi FUJIMOTO ,  Hiroaki NAKARAI ,  Natsushi SUZUKI

IPC: H01S3/036 ,  H01S3/097 ,  H01S3/223 ,  H01S3/038 ,  H01S3/225

CPC classification number: H01S3/036 ,  F16C19/06 ,  F16C32/0402 ,  F16C32/0406 ,  F16C33/6696 ,  F16C2204/02 ,  F16C2204/10 ,  F16C2204/52 ,  F16C2240/40 ,  F16C2360/46 ,  H01S3/038 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/2232 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256

Abstract: There is provided a laser chamber housing a pair of discharge electrodes and a gas circulation fun, the laser chamber including: a magnetic bearing configured to support a shaft of the gas circulation fan, with the shaft being in non-contact with the magnetic bearing; and a touchdown bearing configured to operate as a bearing when the magnetic bearing is uncontrollable, the touchdown bearing being provided with solid lubricant configured of one or more of an Au plating layer, a Ni-containing plating layer, and a Cu plating layer.

Abstract translation: 提供了容纳一对放电电极和气体循环功能的激光室，所述激光室包括：支撑所述气体循环风扇的轴的磁性轴承，所述轴与所述磁性轴承不接触; 以及触控轴承，其构造为当所述磁性轴承不受控制时作为轴承进行操作，所述触地轴承设置有由Au镀层，含Ni镀层和Cu镀层中的一种或多种构成的固体润滑剂。