Abstract:
Circuit-Under-Pad (CUP) device topologies for high-current lateral power switching devices are disclosed, in which the interconnect structure and pad placement are configured for reduced source and common source inductance. In an example topology for a power semiconductor device comprising a lateral GaN HEMT, the source bus runs across a center of the active area, substantially centered between first and second extremities of source finger electrodes, with laterally extending tabs contacting the underlying source finger electrodes. The drain bus is spaced from the source bus and comprises laterally extending tabs contacting the underlying drain finger electrodes. The gate bus is centrally placed and runs adjacent the source bus. Preferably, the interconnect structure comprises a dedicated gate return bus to separate the gate drive loop from the power loop. Proposed CUP device structures provide for lower source and common source inductance and/or higher current carrying capability per unit device area.
Abstract:
Circuit-Under-Pad (CUP) device topologies for high-current lateral power switching devices are disclosed, in which the interconnect structure and pad placement are configured for reduced source and common source inductance. In an example topology for a power semiconductor device comprising a lateral GaN HEMT, the source bus runs across a centre of the active area, substantially centered between first and second extremities of source finger electrodes, with laterally extending tabs contacting the underlying source finger electrodes. The drain bus is spaced from the source bus and comprises laterally extending tabs contacting the underlying drain finger electrodes. The gate bus is centrally placed and runs adjacent the source bus. Preferably, the interconnect structure comprises a dedicated gate return bus to separate the gate drive loop from the power loop. Proposed CUP device structures provide for lower source and common source inductance and/or higher current carrying capability per unit device area.
Abstract:
Large area, high current, lateral GaN power transistors are implemented using an on-chip interconnect topology wherein the transistor is arranged as an array of sections, each section comprising a set of transistor islands; gate and source buses that form each gate drive loop have substantially the same track widths; the source bus runs over or under the gate bus, and the tracks are inductively coupled to provide flux cancellation in the gate drive loop, thereby reducing parasitic inductances. The gate delay in each gate drive loop is reduced, minimizing the gate drive phase difference across the transistor. An overlying current redistribution layer preferably has a track width no greater than that of the underlying source and drain buses, for efficient coupling. This topology provides improved scalability, enabling fabrication of multi-section, large scale, high current lateral GaN transistors with reduced gate drive loop inductance, for improved operational stability.
Abstract:
Packaging solutions for devices and systems comprising lateral GaN power transistors are disclosed, including components of a packaging assembly, a semiconductor device structure, and a method of fabrication thereof. In the packaging assembly, a GaN die, comprising one or more lateral GaN power transistors, is sandwiched between first and second leadframe layers, and interconnected using low inductance interconnections, without wirebonding. For thermal dissipation, the dual leadframe package assembly can be configured for either front-side or back-side cooling. Preferred embodiments facilitate alignment and registration of high current/low inductance interconnects for lateral GaN devices, in which contact areas or pads for source, drain and gate contacts are provided on the front-side of the GaN die. By eliminating wirebonding, and using low inductance interconnections with high electrical and thermal conductivity, PQFN technology can be adapted for packaging GaN die comprising one or more lateral GaN power transistors.
Abstract:
Power switching systems are disclosed comprising driver circuitry for enhancement-mode (E-Mode) GaN power transistors with low threshold voltage. Preferably, a GaN power switch (D3) comprises an E-Mode high electron mobility transistor (HEMT) with a monolithically integrated GaN driver. D3 is partitioned into sections. At least the pull-down and, optionally, the pull-up driver circuitry is similarly partitioned as a plurality of driver elements, each driving a respective section of D3. Each driver element is placed in proximity to a respective section of D3, reducing interconnect track length and loop inductance. In preferred embodiments, the layout of GaN transistor switch and the driver elements, dimensions and routing of the interconnect tracks are selected to further reduce loop inductance and optimize performance. Distributed driver circuitry integrated on-chip with one or more high power E-Mode GaN switches allows closer coupling of the driver circuitry and the GaN switches to reduce effects of parasitic inductances.
Abstract:
Packaging solutions for large area, GaN die comprising one or more lateral GaN power transistor devices and systems are disclosed. Packaging assemblies comprise an interposer sub-assembly comprising the lateral GaN die and a leadframe. The GaN die is electrically connected to the leadframe using bump or post interconnections, silver sintering, or other low inductance interconnections. Then, attachment of the GaN die to the substrate and the electrical connections of the leadframe to contacts on the substrate are made in a single process step. The sub-assembly may be mounted in a standard power module, or alternatively on a substrate, such as a printed circuit board. For high current applications, the sub-assembly also comprises a ceramic substrate for heat dissipation. This packaging scheme provides interconnections with lower inductance and higher current capacity, simplifies fabrication, and enables improved thermal matching of components, compared with conventional wirebonded power modules.
Abstract:
Embedded packaging for devices and systems comprising lateral GaN power transistors is disclosed. The packaging assembly is suitable for large area, high power GaN transistors and comprises an assembly of a GaN power transistor and package components comprising a three level interconnect structure. In preferred embodiments, the three level interconnect structure comprises an on-chip metal layer, a copper redistribution layer and package metal layers, in which there is a graduated or tapered contact area sizing through the three levels for dividing/applying current on-chip and combining/collecting current off-chip, with distributed contacts over the active area of the GaN power device. This embedded packaging assembly provides a low inductance, low resistance interconnect structure suitable for devices and systems comprising large area, high power GaN transistors for high voltage/high current applications.