公开(公告)号：US20240288773A1

公开(公告)日：2024-08-29

申请号：US18636755

申请日：2024-04-16

Applicant: JSR CORPORATION

Inventor： Masato DOBASHI ,  Hiroyuki KOMATSU ,  Eiji YONEDA ,  Satoshi DEI ,  Kengo EHARA ,  Sho YOSHINAKA ,  Takashi KATAGIRI

IPC: G03F7/11 ,  G03F7/075 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/11 ,  G03F7/0752 ,  G03F7/322 ,  H01L21/0275

Abstract: A method includes: applying a composition for forming a resist underlayer film directly or indirectly to a substrate to form a resist underlayer film; applying a composition for forming a resist film to the resist underlayer film to form a resist film; exposing the resist film to radiation; and developing the exposed resist film. The composition for forming a resist underlayer film includes: a polymer including a partial structure represented by formula (i); and a solvent. In the formula (i), Y1 is a sulfonyl group, a carbonyl group, or an alkanediyl group; Y2 is a sulfonyl group, a carbonyl group, or a single bond; when Y1 is an alkanediyl group, Y2 is a sulfonyl group or a carbonyl group, and when Y2 is a single bond, Y1 is a sulfonyl group or a carbonyl group; R1 is a monovalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US20230259032A1

公开(公告)日：2023-08-17

申请号：US18138873

申请日：2023-04-25

Applicant: JSR CORPORATION

Inventor： Miki TAMADA ,  Ryo KUMEGAWA ,  Hiroyuki KOMATSU ,  Motohiro SHIRATANI ,  Ken MARUYAMA ,  Sosuke OSAWA

IPC: G03F7/11 ,  C08F112/08 ,  C08F120/14 ,  C09D125/06 ,  C09D133/12

CPC classification number: G03F7/11 ,  C08F112/08 ,  C08F120/14 ,  C09D125/06 ,  C09D133/12 ,  C08F2810/40

Abstract: A composition includes: at least one polymer represented by formula (1), formula (2), or both; and a solvent. A1 and A2 are each independently a structural unit having 2 or more carbon atoms; a plurality of A's are the same or different and a plurality of A2s are the same or different; n1 and n2 are each independently an integer of 2 to 500; R1, R2, and R3 are each independently an organic group having 1 or more carbon atoms, or R1 and R2 taken together represent a ring together with X1, Y1, and P; R1 and R2 are the same or different; X1, Y1, and Y2 are each independently a single bond, —O—, or —NR4—; R4 is an organic group having 1 or more carbon atoms; and Z1 and Z2 are each independently hydrogen or an organic group having 1 to 15 carbon atoms.

公开(公告)号：US20210082689A1

公开(公告)日：2021-03-18

申请号：US17018169

申请日：2020-09-11

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Motohiro SHIRATANI

IPC: H01L21/027 ,  H01L21/02 ,  C08F8/00 ,  H01L21/321

Abstract: A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.

公开(公告)号：US20200087530A1

公开(公告)日：2020-03-19

申请号：US16528151

申请日：2019-07-31

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Miki TAMADA ,  Hitoshi OSAKI ,  Tomoki NAGAI

IPC: C09D125/04 ,  C09D7/20 ,  C09D7/40

Abstract: A modification method of a surface of a substrate includes: applying a composition on a surface of a metal substrate, and heating a coating film formed by the applying, wherein the composition contains: a polymer having a first structural unit that includes an aromatic ring, and a second structural unit that includes an ethylenic double bond; a thermal acid generating agent; and a solvent, wherein the polymer has a functional group capable of bonding to a metal atom in the metal substrate.

公开(公告)号：US20190198316A1

公开(公告)日：2019-06-27

申请号：US16288354

申请日：2019-02-28

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Tomohiro ODA ,  Hitoshi OSAKI ,  Masafumi HORI ,  Takehiko NARUOKA

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/311

CPC classification number: H01L21/0271 ,  C08L25/06 ,  C08L33/10 ,  C08L2203/206 ,  C08L2312/02 ,  H01L21/02118 ,  H01L21/02282 ,  H01L21/02334 ,  H01L21/02359 ,  H01L21/28 ,  H01L21/285 ,  H01L21/31133

Abstract: A method for selectively modifying a base material surface, includes applying a composition on a surface of a base material to form a coating film. The coating film is heated. The base material includes a surface layer which includes a first region including a metal. The composition includes a first polymer and a solvent. The first polymer includes at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with the metal. It is preferred that the base material further includes a second region comprising substantially only a non-metal, and the method further includes, after the heating, removing with a rinse agent a portion formed on the second region, of the coating film. The metal is preferably a constituent of a metal substance, an alloy, an oxide, an electrically conductive nitride or a silicide.

公开(公告)号：US20150323870A1

公开(公告)日：2015-11-12

申请号：US14702139

申请日：2015-05-01

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Shinya MINEGISHI ,  Takehiko NARUOKA ,  Tomoki NAGAI

IPC: G03F7/20 ,  G03F7/16 ,  C08F293/00

CPC classification number: C08F297/026 ,  C08F293/00 ,  C08L53/00 ,  G03F7/0002 ,  G03F7/039 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20

Abstract: A composition for pattern formation includes a block copolymer. The block polymer includes a first labile group at an end of a main chain of the block copolymer. The first acid liable group is capable of being dissociated by an acid or heat. The composition preferably further contains an acid generator that generates an acid upon application of an energy. The block copolymer is preferably capable of forming a phase separation structure through directed self-assembly. The first labile group is preferably represented by formula (a). R represents a monovalent organic group having 1 to 20 carbon atoms; R′ represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to an atom at the end of the main chain of the block copolymer.

Abstract translation: 用于图案形成的组合物包括嵌段共聚物。 嵌段聚合物包括在嵌段共聚物的主链末端的第一不稳定基团。 第一个易酸性基团能够被酸或热解离。 组合物优选还包含在施加能量时产生酸的酸发生剂。 嵌段共聚物优选能够通过定向自组装形成相分离结构。 第一不稳定基团优选由式（a）表示。 R表示碳原子数1〜20的1价有机基团。 R'表示氢原子或碳原子数1〜20的1价有机基团。 和*表示与嵌段共聚物主链末端的原子的结合位点。

公开(公告)号：US20150253671A1

公开(公告)日：2015-09-10

申请号：US14638610

申请日：2015-03-04

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Shinya MINEGISHI ,  Yuji NAMIE ,  Tomoki NAGAI

IPC: G03F7/20 ,  G03F7/038

CPC classification number: G03F7/038 ,  G03F7/0002 ,  G03F7/0388

Abstract: A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes a crosslinkable group in a side chain thereof. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure.

Abstract translation: 用于图案形成的组合物包括聚合物或包含多种聚合物的聚合物组。 聚合物或聚合物组能够通过定向自组装形成相分离结构。 聚合物组中的聚合物或至少一种聚合物包含其侧链中的可交联基团。 图案形成方法包括使用该组合物在衬底上提供定向的自组装膜。 定向自组装膜包括相分离结构。

公开(公告)号：US20150253663A1

公开(公告)日：2015-09-10

申请号：US14638521

申请日：2015-03-04

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Shinya MINEGISHI ,  Yuji NAMIE ,  Tomoki NAGAI

IPC: G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0397 ,  G03F7/0002

Abstract: A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers, and an acid generator. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes an acid-labile group in a side chain thereof. The acid generator generates an acid upon application of energy. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure.

Abstract translation: 用于图案形成的组合物包括聚合物或包含多种聚合物的聚合物组和酸产生剂。 聚合物或聚合物组能够通过定向自组装形成相分离结构。 聚合物组中的聚合物或至少一种聚合物包括侧链中的酸不稳定基团。 酸发生器在施加能量时产生酸。 图案形成方法包括使用该组合物在衬底上提供定向的自组装膜。 定向自组装膜包括相分离结构。

公开(公告)号：US20250110407A1

公开(公告)日：2025-04-03

申请号：US18910163

申请日：2024-10-09

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Masato DOBASHI ,  Daiki TATSUBO ,  Sho YOSHINAKA ,  Shunpei AKITA ,  Satoshi DEI ,  Eiji YONEDA ,  Kengo EHARA

IPC: G03F7/039 ,  C08F220/30 ,  C08F220/38 ,  C08G61/12 ,  G03F7/00 ,  G03F7/004 ,  G03F7/038 ,  H01L21/027

Abstract: A method for manufacturing a semiconductor substrate includes: applying a composition for forming a resist underlayer film directly or indirectly to a substrate to form a resist underlayer film; applying a composition for forming a resist film to the resist underlayer film to form a resist film; exposing the resist film to radiation; and developing at least the exposed resist film. The composition for forming a resist underlayer film includes a polymer and a solvent. The polymer includes a repeating unit (1) which includes an organic sulfonic acid anion moiety and an onium cation moiety.

公开(公告)号：US20220145113A1

公开(公告)日：2022-05-12

申请号：US17583270

申请日：2022-01-25

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Motohiro SHIRATANI

IPC: C09D125/08 ,  C08F12/08 ,  H01L21/027

Abstract: A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.