公开(公告)号：US20140057453A1

公开(公告)日：2014-02-27

申请号：US13985012

申请日：2012-02-10

申请人： John Madocks ,  Walter Seaman

发明人： John Madocks ,  Walter Seaman

IPC分类号： C23C16/50

CPC分类号： C23C16/50 ,  C23C16/02 ,  C23C16/18 ,  C23C16/401 ,  C23C16/403 ,  C23C16/45563 ,  C23C16/509 ,  C23C16/54

摘要： A process for plasma deposition of a coating is provided that includes exposure of a surface of a substrate to a source of adsorbate molecules to form a protective layer on the surface. The protective layer is then exposed in-line to a plasma volume to react the protective film to form the coating. This process occurs without an intermediate evacuation to remove the adsorbate molecules prior to contact with the plasma volume. As a result, kinetic ion impact damage to the surface is limited while efficient operation of the plasma deposition system continues.

摘要翻译： 提供了一种用于等离子体沉积涂层的方法，其包括将基底表面暴露于被吸附物质分子源以在表面上形成保护层。 然后将保护层在线暴露于等离子体体积以使保护膜反应以形成涂层。 在与等离子体体积接触之前，没有中间抽真空去除被吸附物质分子。 结果，对等离子体沉积系统的有效操作继续进行，限制了对表面的动力学离子冲击损伤。

公开(公告)号：US07932678B2

公开(公告)日：2011-04-26

申请号：US10571214

申请日：2004-09-13

申请人： John Madocks

发明人： John Madocks

IPC分类号： C23C16/00 ,  C23C14/00 ,  H01J7/24 ,  H05B31/26 ,  C25B9/00 ,  C25B11/00 ,  C25B13/00

CPC分类号： H05H1/14 ,  C23C8/36 ,  C23C14/35 ,  H01J37/3266 ,  H01J37/3402

摘要： A magnetic mirror plasma source includes a gap separating a substrate from a cathode. A mirror magnetic field extends between the substrate and the cathode through the gap. The magnetic field lines at a proximal surface of the substrate are at least two times as strong as those field lines entering the cathode. An anode is disposed such that a closed loop electron Hall current containment region is formed within the magnetic field.

摘要翻译： 磁镜等离子体源包括将衬底与阴极分开的间隙。 反射镜磁场通过间隙在衬底和阴极之间延伸。 衬底近端表面的磁场线至少是进入阴极的场线的两倍。 阳极设置成使得在磁场内形成闭环电子霍尔电流容纳区域。

公开(公告)号：US07294283B2

公开(公告)日：2007-11-13

申请号：US10475548

申请日：2002-04-10

申请人： John Madocks

发明人： John Madocks

IPC分类号： C23C14/35 ,  C23C16/00

CPC分类号： H01J37/3266 ,  C23C14/351 ,  C23C14/562 ,  C23C16/503 ,  C23C16/509 ,  C23C16/545 ,  H01J37/3277 ,  H01J37/3405 ,  H05H1/50 ,  H05H2001/485

摘要： The preferred embodiments described herein provide a Penning discharge plasma source. The magnetic and electric field arrangement, similar to a Penning discharge, effectively traps the electron Hall current in a region between two surfaces. When a substrate (10) is positioned proximal to at least one of the electrodes (11, 12) and is moved relative to the plasma, the substrate (10) is plasma treated, coated or otherwise modified depending upon the process gas used and the process pressure. This confinement arrangement produces dramatic results not resembling known prior art. Using this new source, many applications for PECVD, plasma etching, plasma treating, sputtering or other plasma processes will be substantial improved or made possible. In particular, applications using flexible webs (10) are benefited.

摘要翻译： 本文所述的优选实施例提供了Penning放电等离子体源。 与Penning放电类似的磁场和电场布置有效地捕获两个表面之间的区域中的电子霍尔电流。 当衬底（10）位于至少一个电极（11,12）附近并相对于等离子体移动时，根据所使用的工艺气体等离子体处理，涂覆或以其它方式进行改性， 过程压力。 这种限制安排产生了与现有技术相似的戏剧性结果。 使用这种新的来源，PECVD，等离子体蚀刻，等离子体处理，溅射或其他等离子体工艺的许多应用将大大改进或可能。 特别地，使用柔性网（10）的应用受益。

公开(公告)号：US20060152162A1

公开(公告)日：2006-07-13

申请号：US10528386

申请日：2003-09-19

申请人： John Madocks

发明人： John Madocks

IPC分类号： H01J7/24

CPC分类号： H05H1/46 ,  H01J27/146 ,  H01J37/32009 ,  H01J37/32357 ,  H01J37/3266 ,  H01J2237/0815 ,  H05H1/48

摘要： A plasma source which includes a discharge cavity having a first width, where that discharge cavity includes a top portion, a wall portion, and a nozzle disposed on the top portion and extending outwardly therefrom, where the nozzle is formed to include an aperture extending through the top portion and into the discharge cavity, wherein the aperture has a second width, where the second width is less than the first width. The plasma source further includes a power supply, a conduit disposed in the discharge cavity for introducing an ionizable gas therein, and at least one cathode electrode connected to the power supply, where that cathode electrode is capable of supporting at least one magnetron discharge region within the discharge cavity. The plasma source further includes a plurality of magnets disposed adjacent the wall portion, where that plurality of magnets create a null magnetic field point within the discharge cavity.

摘要翻译： 一种等离子体源，其包括具有第一宽度的排出腔，其中所述排出腔包括顶部，壁部分和设置在顶部上并从其向外延伸的喷嘴，其中所述喷嘴形成为包括延伸穿过的孔 顶部并进入排出腔，其中孔具有第二宽度，其中第二宽度小于第一宽度。 等离子体源还包括电源，设置在放电腔中的用于在其中引入可电离气体的导管和连接到电源的至少一个阴极，其中阴极能够支撑至少一个磁控管放电区域 放电腔。 等离子体源还包括邻近壁部设置的多个磁体，其中多个磁体在放电腔内形成零磁场点。

公开(公告)号：US09103018B2

公开(公告)日：2015-08-11

申请号：US12776706

申请日：2010-05-10

申请人： John Madocks ,  Mark A. George

发明人： John Madocks ,  Mark A. George

IPC分类号： H01J37/34 ,  C23C14/08 ,  C23C14/34

CPC分类号： C23C14/085 ,  C23C14/3407 ,  H01J37/3408 ,  H01J37/3426 ,  H01J37/3435 ,  H01J37/3497

摘要： A sputter coating apparatus for sputter coating a substrate in a processing chamber includes a target of sputter coating material supported within the processing chamber. The target has a sputtering surface and a back surface. The target is affixed to a backing plate such that the back surface of the target is disposed adjacent to a first surface of the backing plate. The backing plate is in fluid communication with a source of cooling fluid. The target back surface has a first layer selected to have a high thermal emissivity coefficient. The backing plate first surface carries a second layer having a high emissivity coefficient. The target back surface first layer and the backing plate first surface second layer provide enhanced heat transfer between the target and the backing plate via thermal radiation.

摘要翻译： 用于在处理室中溅射涂覆基板的溅射涂覆设备包括支撑在处理室内的溅射涂层材料的靶。 靶具有溅射表面和背面。 靶材固定到背板上，使得靶材的后表面邻近背板的第一表面设置。 背板与冷却流体源流体连通。 目标后表面具有被选择为具有高热辐射率系数的第一层。 背板第一表面承载具有高发射率系数的第二层。 目标背面第一层和背板第一表面第二层通过热辐射提供靶和背板之间的增强的热传递。

公开(公告)号：US08535490B2

公开(公告)日：2013-09-17

申请号：US12602298

申请日：2008-06-06

申请人： John Madocks ,  Patrick Lawrence Morse

发明人： John Madocks ,  Patrick Lawrence Morse

IPC分类号： C23C14/00

CPC分类号： H01J37/342 ,  H01J37/3405 ,  H01J37/3435 ,  H01J37/3497

摘要： A new and useful rotatable sputter magnetron assembly is provided, that addresses the issue of uneven wear of the target electrode tube. According to the principles of the present invention, a rotatable sputter magnetron assembly for use in magnetron sputtering target material onto a substrate comprises a. a longitudinally extending tubular shaped target electrode tube having a longitudinal central axis, b. the target electrode tube extending about a magnet bar that is configured to generate a plasma confining magnetic field adjacent the target electrode tube, c. the magnet bar being held substantially stationary within the target electrode tube, and d. the target electrode tube supported for rotation about its longitudinal central axis and for axial movement along its longitudinal central axis, so that wear of the target electrode tube can be controlled by moving the target electrode tube axially during magnetron sputtering of the target material.

摘要翻译： 提供了一种新的和有用的可旋转溅射磁控管组件，其解决了目标电极管的不均匀磨损的问题。 根据本发明的原理，用于磁控溅射靶材的可旋转溅射磁控管组件包括a。 一个具有纵向中心轴的纵向延伸的管状目标电极管，b。 所述目标电极管围绕磁棒延伸，所述磁棒被配置为产生邻近所述目标电极管的等离子体约束磁场，c。 磁棒基本上固定在目标电极管内，d。 目标电极管被支撑用于围绕其纵向中心轴线旋转并且用于沿其纵向中心轴线轴向运动，使得可以通过在目标材料的磁控溅射期间轴向移动目标电极管来控制目标电极管的磨损。

公开(公告)号：US07259378B2

公开(公告)日：2007-08-21

申请号：US11177984

申请日：2005-07-08

申请人： John Madocks

发明人： John Madocks

IPC分类号： H01J27/00 ,  H05H1/00 ,  H05H1/54

CPC分类号： F03H1/0075 ,  H01J27/143 ,  H05H1/54

摘要： A closed drift ion source which includes a channel having an open end, a closed end, and an input port for an ionizable gas. A first magnetic pole is disposed on the open end of the channel and extends therefrom in a first direction. A second magnetic pole disposed on the open end of the channel and extends therefrom in a second direction, where the first direction is opposite to the second direction. The distal ends of the first magnetic pole and the second magnetic pole define a gap comprising the opening in the first end. An anode is disposed within the channel. A primary magnetic field line is disposed between the first magnetic pole and the second magnetic pole, where that primary magnetic field line has a mirror field greater than 2.

摘要翻译： 闭合漂移离子源，其包括具有开口端，闭合端和用于可电离气体的输入端口的通道。 第一磁极设置在通道的开口端上并沿第一方向从其延伸。 第二磁极，其设置在通道的开口端上，并沿第二方向从第二方向向第二方向延伸。 第一磁极和第二磁极的远端限定包括第一端中的开口的间隙。 阳极设置在通道内。 初级磁场线设置在第一磁极和第二磁极之间，其中初级磁场线具有大于2的反射镜场。

公开(公告)号：US20070026161A1

公开(公告)日：2007-02-01

申请号：US10571214

申请日：2004-09-13

申请人： John Madocks

发明人： John Madocks

IPC分类号： H05H1/24 ,  C23C14/32 ,  C23C14/00

CPC分类号： H05H1/14 ,  C23C8/36 ,  C23C14/35 ,  H01J37/3266 ,  H01J37/3402

摘要： A magnetic mirror plasma (77) source comprises two surfaces separated by a gap wherein one of the surfaces is a wafer (76) and the other surface is a cathode. The apparatus comprises a cover (72), target (83), shunt (74, 81), non-magnetic stage (75), magnet array (80), bias supply (82), and power supply (70). A mirror magnetic field (12) extends between the surfaces through the gap, wherein the magnetic field (78) lines at the substrate surface are at least two times as strong as those field lines entering the cathode. An anode is disposed such that a closed loop electron Hall current containment region is formed within the magnetic field, where with sufficient gas pressure and voltage between the cathode and anode, plasma is formed in the containment region. The result is a novel plasma source that has unique and important advantages enabling advancements in PECVD, etching, sputtering and plasma treatment processes.

摘要翻译： 磁镜等离子体（77）源包括由间隙分开的两个表面，其中一个表面是晶片（76），另一个表面是阴极。 该装置包括盖（72），目标（83），分路（74,81），非磁性台（75），磁体阵列（80），偏置电源（82）和电源（70）。 镜面磁场（12）在穿过间隙的表面之间延伸，其中在衬底表面处的磁场（78）线是至少是进入阴极的那些场线的两倍。 阳极设置成使得在磁场内形成闭环电子霍尔电流容纳区域，其中在阴极和阳极之间具有足够的气体压力和电压，在容纳区域中形成等离子体。 结果是一种新颖的等离子体源，其具有独特且重要的优点，可实现PECVD，蚀刻，溅射和等离子体处理工艺的进步。

公开(公告)号：US20060177599A1

公开(公告)日：2006-08-10

申请号：US11379349

申请日：2006-04-19

申请人： John Madocks

发明人： John Madocks

IPC分类号： H05H1/24 ,  H01J7/24 ,  C23C16/00

CPC分类号： H05H1/46 ,  C23C14/32 ,  C23C16/513 ,  H01J37/3266

摘要： A pair of plasma beam sources are connected across an AC power supply to alternatively produce an ion beam for depositing material on a substrate transported past the ion beams. Each plasma beam source includes a discharge cavity having a first width and a nozzle extending outwardly therefrom to emit the ion beam. The aperture or outlet of the nozzle has a second width, which second width is less than the first width. An ionizable gas is introduced to the discharge cavity. At least one electrode connected to the AC power supply, alternatively serving as an anode or a cathode, is capable of supporting at least one magnetron discharge region within the discharge cavity when serving as a cathode electrode. A plurality of magnets generally facing one another, are disposed adjacent each discharge cavity to create a magnetic field null region within the discharge cavity.

摘要翻译： 一对等离子体束源连接在交流电源上，以交替地产生用于在经过离子束传送的衬底上沉积材料的离子束。 每个等离子体束源包括具有第一宽度的排出腔和从其向外延伸以喷射离子束的喷嘴。 喷嘴的孔或出口具有第二宽度，该第二宽度小于第一宽度。 将可电离气体引入到排出腔。 连接到AC电源的替代地用作阳极或阴极的至少一个电极能够在用作阴极时支持放电腔内的至少一个磁控管放电区域。 大体上彼此面对的多个磁体邻近每个排出腔设置，以在排出腔内形成磁场零区域。

公开(公告)号：US20060000705A1

公开(公告)日：2006-01-05

申请号：US11171054

申请日：2005-06-30

申请人： Klaus Hartig ,  Steve Smith ,  John Madocks

发明人： Klaus Hartig ,  Steve Smith ,  John Madocks

IPC分类号： C23C14/32

CPC分类号： H01J37/3455 ,  H01J37/3405 ,  H01J37/3423 ,  H01J37/3497

摘要： In some embodiments, the invention includes a cylindrical cathode target assembly for use in sputtering target material onto a substrate that comprises a generally cylindrical target, means for rotating the target about its axis during a sputtering operation, an elongated magnet carried within the target for generation of a plasma-containing magnetic field exterior to but adjacent the target, a framework for supporting the magnet against rotation within the target, and a power train for causing the magnet to oscillate within and axially of the target in a substantially asynchronous manner to promote generally uniform target utilization along its length, as well as its method of use. In some embodiments, the magnet is oscillated in response to rotation of the target.

摘要翻译： 在一些实施例中，本发明包括用于将目标材料溅射到基板上的圆柱形阴极靶组件，该基板包括大致圆柱形的靶，用于在溅射操作期间使靶围绕其轴旋转的装置，用于产生的靶内的细长磁体 位于目标外部但邻近目标的等离子体磁场，用于支撑磁体以防止目标内的旋转的框架和用于使磁体以基本上异步的方式在目标内部和轴向振荡的传动系，以促进一般 沿其长度的均匀目标利用率及其使用方法。 在一些实施例中，磁体响应于目标的旋转而振荡。