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11.发明申请公开(公告)号：US20160202615A1
公开(公告)日：2016-07-14
申请号：US14836422
申请日：2015-08-26
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： KAB-JONG SEO , Hi-Kuk Lee , Jae-Hyuk Chang , Ki-Beom Lee
IPC: G03F7/20
CPC classification number: G03F7/70141 , G03F7/7005 , G03F7/704
Abstract: A maskless exposure device includes a plurality of exposure heads, each exposure head including a digital micro-mirror device configured to scan an exposure beam to a substrate, the exposure heads being disposed in staggered first and second rows, a plurality of reflecting members disposed on side surfaces of the exposure heads and having reflecting surfaces parallel with each other, a light emitting part configured to light to the reflecting members, and a light receiving part configured to receive light via the reflecting members.
Abstract translation: 无掩模曝光装置包括多个曝光头，每个曝光头包括配置成将曝光光束扫描到基板的数字微镜装置，曝光头设置在交错的第一和第二行中，多个反射部件设置在 曝光头的侧表面并且具有彼此平行的反射表面，被配置为对反射构件发光的发光部，以及被配置为经由反射构件接收光的光接收部。
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12.发明申请ETCHANT COMPOSITION AND MANUFACTURING METHOD FOR THIN FILM TRANSISTOR USING THE SAME 审中-公开使用该薄膜晶体管的蚀刻组合物和制造方法公开(公告)号：US20150214072A1
公开(公告)日：2015-07-30
申请号：US14679787
申请日：2015-04-06
Applicant: SAMSUNG DISPLAY CO., LTD. , DONGJIN SEMICHEM CO., LTD.
Inventor： BONG-KYUN KIM , Hong Sick Park , Wang Woo Lee , Young Min Moon , Seung Ho Yoon , Young Joo Choi , Sang-Woo Kim , Ki-Beom Lee , Dae-Woo Lee , Sam-Young Cho
IPC: H01L21/465 , C09K13/06 , C09K13/00 , C23F1/30
CPC classification number: H01L21/465 , C09K13/00 , C09K13/06 , C23F1/30 , H01L21/32134 , H01L29/66969 , H01L29/7869
Abstract: An etchant composition includes ammonium persulfate (((NH4)2)S2O8), an azole-based compound, a water-soluble amine compound, a sulfonic acid-containing compound, a nitrate-containing compound, a phosphate-containing compound, a chloride-containing compound, and residual water.
Abstract translation: 蚀刻剂组合物包括过硫酸铵（（（NH4）2）S2O8），唑类化合物，水溶性胺化合物，含磺酸化合物，含硝酸盐化合物，含磷酸盐化合物，氯化物 含有化合物和残留水。
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13.发明授权Photoresist composition, method of manufacturing a polarizer and method of manufacturing a display substrate using the same 有权光致抗蚀剂组合物，偏振片的制造方法以及使用其制造显示基板的方法公开(公告)号：US09076697B2
公开(公告)日：2015-07-07
申请号：US14453710
申请日：2014-08-07
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Ki-Beom Lee , Dae-Hwan Jang , Atsushi Takakuwa
CPC classification number: H01L27/1288 , G02B1/12 , G02B5/3058 , G02F1/133528 , G02F2001/133548 , G03F7/0002 , G03F7/0007 , G03F7/031 , G03F7/0757
Abstract: A photoresist composition includes about 65% by weight to about 80% by weight of a mono-functional monomer, about 5% by weight to about 20% by weight of a di-functional monomer, about 1% by weight to about 10% by weight of a multi-functional monomer including three or more functional groups, about 1% by weight to about 5% by weight of a photoinitiator, and less than about 1% by weight of a surfactant, each based on a total weight of the photoresist composition.
Abstract translation: 光致抗蚀剂组合物包括约65重量％至约80重量％的单官能单体，约5重量％至约20重量％的二官能单体，约1重量％至约10重量％ 重量的包含三个或更多个官能团的多官能单体，约1重量％至约5重量％的光引发剂和小于约1重量％的表面活性剂，各自基于光致抗蚀剂的总重量 组成。
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14.发明授权Etchant composition and manufacturing method for thin film transistor using the same 有权使用其的薄膜晶体管的蚀刻剂组成和制造方法公开(公告)号：US09023735B2
公开(公告)日：2015-05-05
申请号：US13728348
申请日：2012-12-27
Applicant: Samsung Display Co., Ltd.
Inventor： Bong-Kyun Kim , Hong Sick Park , Wang Woo Lee , Young Min Moon , Seung Ho Yoon , Young Joo Choi , Sang-Woo Kim , Ki-Beom Lee , Dae-Woo Lee , Sam-Young Cho
IPC: H01L21/461 , H01L21/465 , H01L29/66 , H01L21/3213 , H01L29/786
CPC classification number: H01L21/465 , C09K13/00 , C09K13/06 , C23F1/30 , H01L21/32134 , H01L29/66969 , H01L29/7869
Abstract: An etchant composition includes ammonium persulfate (((NH4)2)S2O8), an azole-based compound, a water-soluble amine compound, a sulfonic acid-containing compound, a nitrate-containing compound, a phosphate-containing compound, a chloride-containing compound, and residual water.
Abstract translation: 蚀刻剂组合物包括过硫酸铵（（（NH4）2）S2O8），唑类化合物，水溶性胺化合物，含磺酸化合物，含硝酸盐化合物，含磷酸盐化合物，氯化物 含有化合物和残留水。
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15.发明授权公开(公告)号：US09000439B2
公开(公告)日：2015-04-07
申请号：US13678313
申请日：2012-11-15
Applicant: Samsung Display Co., Ltd.
Inventor： Dae-Young Lee , Ki-Beom Lee , Kyu-Young Kim , Nam-Ok Jung , Gug-Rae Jo
CPC classification number: H01L27/124 , G02F1/13439 , H01L21/28 , H05K1/02 , H05K1/09
Abstract: A homogenous thin film layer is patterned into a transparent conductive portion and a non-conductive portion without use of etching through the thin film. Instead, conductive fine-wires which are convertible in one embodiment into non-conductive fine-wires are selectively converted into the non-conductive form. In an alternate embodiment, the homogenous thin film layer which includes conductive fine-wires is provided in a curable liquid form and selected portions of the liquid formed are cured into being affixed to substrate. Remaining portions can be washed away. In the case of display devices using transparent electrodes, a thin thin-film transistor array substrate is provided where the initially homogenous thin film which is and then converted into patterned conductive and non-conductive sections forms the pixel-electrodes and/or common electrode of the display device.
Abstract translation: 均匀的薄膜层被图案化成透明导电部分和非导电部分，而不用蚀刻通过薄膜。 相反，在一个实施例中可转换成非导电细线的导电细线被选择性地转换成非导电形式。 在替代实施例中，包括导电细线的均匀薄膜层以可固化液体形式提供，并且所形成的液体的选定部分固化成固定到基底。 剩余部分可以被冲走。 在使用透明电极的显示装置的情况下，提供薄薄膜晶体管阵列基板，其中初始均匀的薄膜然后转换成图案化的导电和非导电部分形成像素电极和/或公共电极 显示设备。
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Patent Agency Ranking
16.发明授权公开(公告)号：US08980528B2
公开(公告)日：2015-03-17
申请号：US13765132
申请日：2013-02-12
Applicant: Samsung Display Co., Ltd.
Inventor： Ki-Beom Lee , Chang-Hoon Kim , Su-Yeon Sim , Sang-Hyn Lee , Hi-Kuk Lee
CPC classification number: G03F7/033 , G03F7/0007 , G03F7/028 , G03F7/029 , G03F7/031 , G03F7/032 , G03F7/105 , G03F7/20 , G03F7/2051
Abstract: A photoresist composition including: about 5% by weight to about 10% by weight of a binder resin; about 5% by weight to about 10% by weight of a photo-polymerization monomer; about 1% by weight to about 5% by weight of a photo initiator, which is activated by a light having a peak wavelength from about 400 nm to about 410 nm; about 5% by weight to about 10% by weight of a black-coloring agent, each based on a total weight of the photoresist composition; and a solvent.
Abstract translation: 一种光致抗蚀剂组合物，其包含：约5重量％至约10重量％的粘合剂树脂; 约5重量％至约10重量％的光聚合单体; 约1重量％至约5重量％的光引发剂，其由具有约400nm至约410nm的峰值波长的光活化; 约5重量％至约10重量％的黑色着色剂，各自基于光致抗蚀剂组合物的总重量; 和溶剂。
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17.发明申请ETCHANT COMPOSITION AND MANUFACTURING METHOD FOR THIN FILM TRANSISTOR USING THE SAME 有权使用该薄膜晶体管的蚀刻组合物和制造方法公开(公告)号：US20140038348A1
公开(公告)日：2014-02-06
申请号：US13728348
申请日：2012-12-27
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Bong-Kyun Kim , Hong Sick Park , Wang Woo Lee , Young Min Moon , Seung Ho Yoon , Young Joo Choi , Sang-Woo Kim , Ki-Beom Lee , Dae-Woo Lee , Sam-Young Cho
IPC: H01L21/465 , H01L29/66
CPC classification number: H01L21/465 , C09K13/00 , C09K13/06 , C23F1/30 , H01L21/32134 , H01L29/66969 , H01L29/7869
Abstract: An etchant composition includes ammonium persulfate (((NH4)2)S2O8), an azole-based compound, a water-soluble amine compound, a sulfonic acid-containing compound, a nitrate-containing compound, a phosphate-containing compound, a chloride-containing compound, and residual water.
Abstract translation: 蚀刻剂组合物包括过硫酸铵（（（NH4）2）S2O8），唑类化合物，水溶性胺化合物，含磺酸化合物，含硝酸盐化合物，含磷酸盐化合物，氯化物 含有化合物和残留水。
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18.发明授权公开(公告)号：US09921488B2
公开(公告)日：2018-03-20
申请号：US14612648
申请日：2015-02-03
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jun-Ho Sim , Jung-In Park , Ki-Beom Lee , Hi-Kuk Lee , Hyun-Seok Kim , Kab-Jong Seo , Sang-Hyun Yun , Sang-Hyun Lee , Jung-Chul Heo , Jong-Joo Kim , Chang-Hoon Kim
CPC classification number: G03F7/70641 , G02B26/0833 , G03F7/2053 , G03F7/70291 , G03F7/70383 , G03F7/70391
Abstract: A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.
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公开(公告)号：US09535333B2
公开(公告)日：2017-01-03
申请号：US14836422
申请日：2015-08-26
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Kab-Jong Seo , Hi-Kuk Lee , Jae-Hyuk Chang , Ki-Beom Lee
CPC classification number: G03F7/70141 , G03F7/7005 , G03F7/704
Abstract: A maskless exposure device includes a plurality of exposure heads, each exposure head including a digital micro-mirror device configured to scan an exposure beam to a substrate, the exposure heads being disposed in staggered first and second rows, a plurality of reflecting members disposed on side surfaces of the exposure heads and having reflecting surfaces parallel with each other, a light emitting part configured to light to the reflecting members, and a light receiving part configured to receive light via the reflecting members.
Abstract translation: 无掩模曝光装置包括多个曝光头，每个曝光头包括配置成将曝光光束扫描到基板的数字微镜装置，曝光头设置在交错的第一和第二行中，多个反射部件设置在 曝光头的侧表面并且具有彼此平行的反射表面，被配置为对反射构件发光的发光部，以及被配置为经由反射构件接收光的光接收部。
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20.发明申请MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD 有权无障碍曝光装置，由MASKING曝光装置制造的无障碍曝光方法和显示基板以及MASKLESS曝光方法公开(公告)号：US20160054660A1
公开(公告)日：2016-02-25
申请号：US14664770
申请日：2015-03-20
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Sang-Hyun Lee , Hyun-Seok Kim , Jung-Chul Heo , Hi-Kuk Lee , Sang-Hyun Yun , Ki-Beom Lee , Chang-Hoon Kim , Jung-In Park , Kab-Jong Seo , Jun-Ho Sim , Jae-Hyuk Chang
IPC: G03F7/20 , H01L27/12 , H01L29/786
CPC classification number: G03F7/70291 , G03F7/70508 , H01L27/124 , H01L27/1285 , H01L29/41733 , H01L29/78696
Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.
Abstract translation: 无掩模曝光装置包括具有数字微镜装置的曝光头，数字微镜装置被配置为通过反射来自曝光源的源光束将曝光光束扫描到衬底; 以及系统控制部，被配置为通过利用图形数据系统文件来控制数字微镜装置。 图形数据系统文件在平面图中包括源电极，漏电极和源极和漏电极之间的沟道部分的数据。 通道部分包括沿垂直于曝光头的扫描方向的方向延伸的第一部分。 通道部分的第一部分的宽度被定义为曝光光束的脉冲事件产生的倍数。
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