公开(公告)号：US06925418B2

公开(公告)日：2005-08-02

申请号：US10409277

申请日：2003-04-09

申请人： Kazunari Fujiyama ,  Toshihiro Fujiwara ,  Kazuhiro Saito ,  Taiji Hirawawa ,  Satoshi Nagai ,  Hitoshi Kichise ,  Mitsuyoshi Okazaki ,  Hirotsugu Kodama ,  Seiichi Asatsu ,  Masanori Minowa ,  Takayuki Iwahashi ,  Shigeru Harada ,  Mamoru Sudo ,  Fumiharu Ishii

发明人： Kazunari Fujiyama ,  Toshihiro Fujiwara ,  Kazuhiro Saito ,  Taiji Hirawawa ,  Satoshi Nagai ,  Hitoshi Kichise ,  Mitsuyoshi Okazaki ,  Hirotsugu Kodama ,  Seiichi Asatsu ,  Masanori Minowa ,  Takayuki Iwahashi ,  Shigeru Harada ,  Mamoru Sudo ,  Fumiharu Ishii

IPC分类号： G06Q50/00 ,  G05B23/02 ,  G06Q50/10 ,  G06F11/30 ,  G06F15/00

CPC分类号： G06Q10/06

摘要： An apparatus for maintaining plant equipment incorporates an input unit to receive information on targets and ranges of plant equipment to be maintained and a failure-event tree breakdown unit to perform tree-breakdown on failures to be expected from events to be inspected. A failure-unreliability function calculation unit calculates unreliability of each item in failure-event tree breakdown and a failure-derived monetary loss calculation unit multiplies each unreliability and a cost of recovery from each event in accordance with the failure-event tree breakdown. A preventive maintenance expense calculation unit calculates preventive maintenance expenses for preventing failure events and a maintenance decision-making unit decides maintenance timing and technique through comparison between the recovery cost and the preventive maintenance expense.

摘要翻译： 用于维护设备设备的装置包括输入单元以接收关于待维护的设备设备的目标和范围的信息，以及故障事件树分解单元，以对要被检查的事件预期的故障执行树状分解。 故障不可靠性函数计算单元计算故障事件树故障中的每个项目的不可靠性，并且故障导出的货币损失计算单元根据故障事件树故障将每个事件的每个不可靠性和恢复成本相乘。 预防性维护费用计算单元计算用于防止故障事件的预防性维护费用，并且维护决策单元通过比较恢复成本和预防性维护费用来决定维护时间和技术。

公开(公告)号：US6046488A

公开(公告)日：2000-04-04

申请号：US985218

申请日：1997-12-04

申请人： Takahiro Kawasaki ,  Shigeru Harada ,  Hiroshi Tobimatsu

发明人： Takahiro Kawasaki ,  Shigeru Harada ,  Hiroshi Tobimatsu

IPC分类号： H01L21/82 ,  H01L21/311 ,  H01L21/768 ,  H01L23/525 ,  H01L23/58 ,  H01L29/00

CPC分类号： H01L21/76801 ,  H01L21/31144 ,  H01L23/5258 ,  H01L23/585 ,  H01L2924/0002

摘要： A semiconductor device allowing the manufacturing process to be simplified and fine structures therein to be readily formed and a manufacturing method thereof are provided. In the semiconductor device, a conductive layer is used as a mask during etching for forming a first opening.

摘要翻译： 能够容易地形成容易形成制造工序的半导体装置及其精细结构及其制造方法。 在半导体器件中，在用于形成第一开口的蚀刻期间，使用导电层作为掩模。

公开(公告)号：US5604380A

公开(公告)日：1997-02-18

申请号：US401804

申请日：1995-03-10

申请人： Hiroyuki Nishimura ,  Hiroshi Adachi ,  Etsushi Adachi ,  Shigeyuki Yamamoto ,  Shintaro Minami ,  Shigeru Harada ,  Toru Tajima ,  Kimio Hagi

发明人： Hiroyuki Nishimura ,  Hiroshi Adachi ,  Etsushi Adachi ,  Shigeyuki Yamamoto ,  Shintaro Minami ,  Shigeru Harada ,  Toru Tajima ,  Kimio Hagi

IPC分类号： H01L21/3205 ,  B32B27/08 ,  C08G77/16 ,  H01L21/312 ,  H01L21/768 ,  H01L23/522 ,  H01L23/532 ,  H01L29/41 ,  H01L29/51

CPC分类号： H01L21/02137 ,  B32B27/08 ,  H01L21/02282 ,  H01L21/02304 ,  H01L21/02362 ,  H01L21/3122 ,  H01L21/76801 ,  H01L21/76826 ,  H01L21/76829 ,  H01L21/76834 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/12044

摘要： In a semiconductor device and a method of fabrication thereof, a resin film forms an interlayer film of the semiconductor device having a multilayer interconnection structure, and is formed by only one coating using coating liquid containing silicone ladder polymers represented by the chemical formula: (HO).sub.2 (R.sub.2 Si.sub.2 O.sub.3).sub.n H.sub.2. As a result, it is possible to improve long-term reliability of electric characteristics or the like, and simplify a process.

摘要翻译： 在半导体器件及其制造方法中，树脂膜形成具有多层互连结构的半导体器件的中间膜，并且仅使用包含由以下化学式表示的硅树脂聚合物的涂布液形成一个涂层：（HO ）2（R2Si2O3）nH2。 结果，可以提高电特性等的长期可靠性，并且简化工艺。

公开(公告)号：US5481137A

公开(公告)日：1996-01-02

申请号：US246375

申请日：1994-05-18

申请人： Shigeru Harada ,  Hisao Masuda ,  Reiji Tamaki

发明人： Shigeru Harada ,  Hisao Masuda ,  Reiji Tamaki

IPC分类号： H01L23/532 ,  H01L23/48 ,  H01L29/34 ,  H01L29/46 ,  H01L29/62

CPC分类号： H01L23/53219 ,  H01L23/532 ,  H01L2924/0002

摘要： In a semiconductor device, an impurity diffused layer serving as an active region is formed in a predetermined region of the surface of a semiconductor substrate of silicon, an underlayer insulating film is formed on the semiconductor substrate for the purpose of protecting and stabilizing the surface of the semiconductor substrate, and an interconnection electrically connected to the impurity diffused layer through a contact hole and formed on an Al-Si-Sn alloy, an Al-Si-Sb alloy or alloys having Ti added to the respective alloys, so that occurrence of an alloy pit and a silicon nodule is prevented. In addition, a completed protective film is formed on the interconnection and the underlayer insulating film and an aperture in a bonding pad region is formed in a predetermined region of the completed protective film, so that the interconnection and the bonding pad are electrically connected to each other. The proportion of silicon and other materials in the alloy are controlled to simultaneously avoid alloy pit and silicon nodule defects both at the contact hole and throughout the alloy conductor.

摘要翻译： 在半导体器件中，在硅的半导体衬底的表面的预定区域中形成用作有源区的杂质扩散层，为了保护和稳定表面的目的，在半导体衬底上形成下层绝缘膜 半导体衬底以及通过接触孔与杂质扩散层电连接并且在Al-Si-Sn合金，Al-Si-Sb合金或其合金上添加有Ti的合金形成的互连，从而发生 防止了合金凹坑和硅结节。 此外，在互连和下层绝缘膜上形成完整的保护膜，并且在完成的保护膜的预定区域中形成焊盘区域中的孔，使得互连和焊盘与每个 其他。 控制合金中硅和其他材料的比例，以同时避免接触孔和整个合金导体中的合金凹坑和硅结节缺陷。

公开(公告)号：US5306947A

公开(公告)日：1994-04-26

申请号：US2398

申请日：1993-01-13

申请人： Hiroshi Adachi ,  Hirozoh Kanegae ,  Hiroshi Mochizuki ,  Masanori Obata ,  Takemi Endoh ,  Kimio Hagi ,  Shigeru Harada ,  Kazuhito Matsukawa ,  Akira Ohhisa ,  Etsushi Adachi

发明人： Hiroshi Adachi ,  Hirozoh Kanegae ,  Hiroshi Mochizuki ,  Masanori Obata ,  Takemi Endoh ,  Kimio Hagi ,  Shigeru Harada ,  Kazuhito Matsukawa ,  Akira Ohhisa ,  Etsushi Adachi

IPC分类号： H01L21/3205 ,  H01L21/3105 ,  H01L21/312 ,  H01L21/768 ,  H01L23/522 ,  H01L23/532 ,  H01L23/48 ,  H01L29/46 ,  H01L29/54 ,  H01L29/62

CPC分类号： H01L21/02137 ,  H01L21/02282 ,  H01L21/3105 ,  H01L21/31055 ,  H01L21/31058 ,  H01L21/3122 ,  H01L21/76819 ,  H01L23/5329 ,  H01L23/53295 ,  H01L2924/0002

摘要： The present invention is mainly characterized by providing an even surface of an interlayer insulating film for insulating and isolating an upper interconnection and a lower interconnection from each other. A lower interconnection layer is provided on a semiconductor substrate, having a pattern of stepped portions. A silicon type insulating film is provided on the semiconductor substrate so as to cover the lower interconnection layer. A silicon ladder resin film is filled in recessed portions of the surface of the silicon type insulating film for making even the surface of the silicon type insulating film. An upper interconnection layer electrically connected to the lower interconnection layer through a via hole is provided on the silicon type insulating film. The silicon ladder resin film has the structural formula: ##STR1## where R.sub.1 is at least one of a phenyl group and a lower alkyl group, R.sub.2 is at least one of a hydrogen atom and a lower alkyl group, and n is an integer of 20 to 1000.

摘要翻译： 本发明的主要特征在于，提供用于使上部互连和下部互连彼此绝缘和隔离的层间绝缘膜的均匀表面。 下部布线层设置在半导体基板上，具有台阶部分的图案。 在半导体衬底上设置硅绝缘膜，以覆盖下互连层。 硅梯型树脂膜填充在硅型绝缘膜的表面的凹部中，以使硅型绝缘膜的表面均匀。 通过通孔电连接到下互连层的上互连层设置在硅型绝缘膜上。 硅梯树脂膜具有结构式：（*化学结构*）其中R 1为苯基和低级烷基中的至少一个，R 2为氢原子和低级烷基中的至少一个，n为 整数为20〜1000。

公开(公告)号：US4867859A

公开(公告)日：1989-09-19

申请号：US81450

申请日：1987-08-04

申请人： Shigeru Harada ,  Takeshi Noguchi ,  Hiroshi Mochizuki

发明人： Shigeru Harada ,  Takeshi Noguchi ,  Hiroshi Mochizuki

IPC分类号： H01L21/26 ,  C23C14/00 ,  C23C14/22 ,  C23C14/32 ,  H01L21/203

CPC分类号： C23C14/0036 ,  C23C14/32

摘要： An apparatus for forming a thin film on a substrate has a first reaction chamber in which a thin film is formed by gaseous discharge and a second reaction chamber in which reactive atoms are generated. The first and second reaction chambers commuicate with one another through an orifice in the first reaction chamber. The first reaction chamber houses a device for generating a film on a substrate, and the second reaction chamber houses a device for generating reactive atoms. The orifice is disposed in the vicinity of both a film-forming region in the first reaction chamber and a reactive atom-generating region in the second reaction chamber so that reactive atoms from the second reaction chamber will pass through the orifice and enter the film-forming region in the first reaction chamber, combine with particles in the film-forming region to form a chemical compound, and accumulate on the substrate. In preferred embodiments, the reaction chambers are formed by a single housing having a partition which has an orifice therein and which divides the housing into two reaction chambers.

摘要翻译： 在基板上形成薄膜的装置具有通过气体放电形成薄膜的第一反应室和产生反应性原子的第二反应室。 第一和第二反应室通过第一反应室中的孔而彼此通过。 第一反应室容纳用于在基板上产生膜的装置，第二反应室容纳用于产生反应性原子的装置。 孔口设置在第一反应室中的成膜区域和第二反应室中的反应性原子产生区域附近，使得来自第二反应室的反应性原子将通过孔口并进入膜 - 在第一反应室中形成区域与成膜区域中的颗粒结合以形成化合物，并积聚在基材上。 在优选实施例中，反应室由具有在其中具有孔口并将壳体分成两个反应室的隔板的单个壳体形成。

公开(公告)号：US20130147958A1

公开(公告)日：2013-06-13

申请号：US13818353

申请日：2012-05-23

申请人： Shinji Mitsuta ,  Shigeru Harada ,  Tomikazu Tanuki ,  Eishin Masutani ,  Yukihiro Nakanishi ,  Takeshi Kurihara ,  Dai Tsubone ,  Masaomi Machida

发明人： Shinji Mitsuta ,  Shigeru Harada ,  Tomikazu Tanuki ,  Eishin Masutani ,  Yukihiro Nakanishi ,  Takeshi Kurihara ,  Dai Tsubone ,  Masaomi Machida

IPC分类号： H04N7/18

CPC分类号： H04N7/181 ,  B60K35/00 ,  B60K2350/1096 ,  B60P1/04 ,  B60P1/283 ,  B60Q9/008 ,  B60R1/00 ,  B60R2300/105 ,  B60R2300/301 ,  B60R2300/303 ,  B60R2300/607 ,  B60R2300/802 ,  B60R2300/8093 ,  E02F9/261 ,  G08G1/166 ,  H04N5/23293 ,  H04N5/247 ,  H04N7/18

摘要： A perimeter monitoring device for a work vehicle is configured to monitor a surrounding of the work vehicle and display a monitored result on a display device. The perimeter monitoring device includes cameras, a bird's-eye image display unit, obstacle detecting sensors, a camera image specifying unit, and a camera image displaying unit. The camera image specifying unit is configured to specify one or more camera images in which one or more of obstacles are captured when the one or more of obstacles are detected by the obstacle detecting sensors. The camera image displaying unit is configured to display a relevant camera image in alignment with the bird's-eye image on the display device when a plurality of camera images are specified by the camera image specifying unit, the relevant camera image being ranked in a high priority ranking based on a priority order set in accordance with travelling states.

摘要翻译： 用于工作车辆的周边监控装置被配置为监视工作车辆的周围并且将监视的结果显示在显示装置上。 周边监视装置包括摄像机，鸟瞰图像显示单元，障碍物检测传感器，摄像机图像指定单元和照相机图像显示单元。 相机图像指定单元被配置为指定当障碍物检测传感器检测到一个或多个障碍物时捕获一个或多个障碍物的一个或多个相机图像。 相机图像显示单元被配置为当由相机图像指定单元指定多个相机图像时，在显示装置上显示与鸟瞰图像对准的相关相机图像，相关的相机图像被优先排列 基于根据旅行状态设置的优先级顺序排列。

公开(公告)号：US20120062580A1

公开(公告)日：2012-03-15

申请号：US13113436

申请日：2011-05-23

申请人： Toshiyuki Shimada ,  Shigeru Harada ,  Ryuhei Hata

发明人： Toshiyuki Shimada ,  Shigeru Harada ,  Ryuhei Hata

IPC分类号： G09G5/02

CPC分类号： H04N13/133 ,  H04N13/144 ,  H04N13/15 ,  H04N13/341

摘要： A display device includes a first measurement unit measuring information on luminance of a first image signal to output a first measurement result, a second measurement unit measuring information on a luminance of a second image signal to output a second measurement result, a comparator comparing the first measurement result with the second measurement result to output differential data, a correction amount determination unit determining a correction amount for the first image signal and/or the second image signal based on the differential data, and a correction unit correcting the luminance of the first image signal and/or the second image signal based on the correction amount.

摘要翻译： 显示装置包括测量第一图像信号的亮度信息以输出第一测量结果的第一测量单元，测量关于第二图像信号的亮度的信息以输出第二测量结果的第二测量单元，比较第一测量结果的比较器 测量结果与第二测量结果输出差分数据;校正量确定单元，基于差分数据确定第一图像信号和/或第二图像信号的校正量;以及校正单元，校正第一图像的亮度 信号和/或第二图像信号。

公开(公告)号：US20090009665A1

公开(公告)日：2009-01-08

申请号：US12214996

申请日：2008-06-24

申请人： Tomonori Tsutsumi ,  Shigeru Harada

发明人： Tomonori Tsutsumi ,  Shigeru Harada

IPC分类号： H04N5/202

CPC分类号： H04N5/202 ,  H04N9/045

摘要： An image processing apparatus according to an embodiment of the present invention includes a correction interval setting unit for setting a correction interval; a correction interval dividing unit for dividing the correction interval into a black side interval and a white side interval; histogram calculating units for calculating a total number of luminance histograms of the black side interval and the white side interval, respectively; gain setting units for setting gains of a γ curve for raising the luminance and a γ curve for lowering the luminance, respectively; gamma curve generating units for generating a gamma curve for raising the luminance and a gamma curve for lowering the luminance, respectively; a gamma curve combining unit for combining the gamma curve for raising the luminance and the gamma curve for lowering the luminance; and a luminance conversion unit for performing the luminance conversion process using the combined gamma curve.

摘要翻译： 根据本发明的实施例的图像处理装置包括：校正间隔设定单元，用于设定校正间隔; 校正间隔分割单元，用于将校正间隔分成黑色侧间隔和白色侧间隔; 用于计算黑色侧面间隔和白色侧面间隔的亮度直方图的总数的直方图计算单元; 用于设置用于提高亮度的伽马曲线的增益的增益设置单元和用于降低亮度的伽马曲线; 用于产生用于提高亮度的伽马曲线的伽马曲线生成单元和用于降低亮度的伽马曲线; 用于组合用于提高亮度的伽马曲线和用于降低亮度的伽马曲线的伽马曲线组合单元; 以及亮度转换单元，用于使用组合的伽马曲线来执行亮度转换处理。

公开(公告)号：US07283929B2

公开(公告)日：2007-10-16

申请号：US10525754

申请日：2005-09-26

申请人： Kazunari Fujiyama ,  Toshihiro Fujiwara ,  Kazuhiro Saito ,  Taiji Hirasawa ,  Satoshi Nagai ,  Hitoshi Kichise ,  Mitsuyoshi Okazaki ,  Hirotsugu Kodama ,  Masanori Minowa ,  Takayuki Iwahashi ,  Yasunari Akikuni ,  Masao Arimura ,  Kentaro Takagi ,  Seiichi Asatsu ,  Shigeru Harada

发明人： Kazunari Fujiyama ,  Toshihiro Fujiwara ,  Kazuhiro Saito ,  Taiji Hirasawa ,  Satoshi Nagai ,  Hitoshi Kichise ,  Mitsuyoshi Okazaki ,  Hirotsugu Kodama ,  Masanori Minowa ,  Takayuki Iwahashi ,  Yasunari Akikuni ,  Masao Arimura ,  Kentaro Takagi ,  Seiichi Asatsu ,  Shigeru Harada

IPC分类号： G06F9/44

CPC分类号： G05B23/0216 ,  G05B23/0248 ,  G05B23/0278 ,  G05B23/0281 ,  Y02P90/14 ,  Y02P90/26

摘要： An operation-supporting apparatus includes: an operation request input unit that inputs information relating to operation request items of plant equipment; an operating conditions setting unit that converts operation request input information to operating parameters; an operation history creation unit that creates an operation history by chronologically processing the operating parameters; a breakdown statistics database that stores an event tree of the plant equipment; an event simulator that calculates the degree of unreliability corresponding to the operating parameters, the operation request information, and the operation history information, and in compliance with the event tree; a risk-cost calculation unit that calculates risk-cost by determining the aggregate product of the degrees of unreliability and restoration costs; an operating method determination unit that determines whether operating conditions are suitable by comparing the risk-cost with profit gained by continuing operation; and an operating method specification unit that specifies specific operation conditions for the plant equipment.

摘要翻译： 操作支持装置包括：操作请求输入单元，输入与工厂设备的操作请求项有关的信息; 操作条件设置单元，其将操作请求输入信息转换为操作参数; 操作历史创建单元，其通过按时间顺序地处理所述操作参数来创建操作历史; 存储工厂设备的事件树的故障统计数据库; 事件模拟器，其根据所述事件树计算与所述操作参数对应的不可靠程度，所述操作请求信息和所述操作历史信息; 风险成本计算单元，通过确定不可靠程度和恢复成本的总产品来计算风险成本; 操作方法确定单元，其通过将风险成本与通过持续操作获得的利润进行比较来确定操作条件是否合适; 以及指定工厂设备的特定操作条件的操作方法规范单元。