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    Lithography contamination control
    13.
    发明授权
    Lithography contamination control 有权

    公开(公告)号：US11662668B2

    公开(公告)日：2023-05-30

    申请号：US17461744

    申请日：2021-08-30

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Chieh Hsieh ,  Tai-Yu Chen ,  Cho-Ying Lin ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

    IPC: G03F7/20 ,  H05G2/00 ,  G02B17/06

    CPC classification number: G03F7/70925 ,  G02B17/0663 ,  G03F7/70033 ,  G03F7/70491 ,  G03F7/70808 ,  H05G2/008

    Abstract: A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.

    In-line inspection and clean for immersion lithography
    15.
    发明授权
    In-line inspection and clean for immersion lithography 有权

    公开(公告)号：US09658536B2

    公开(公告)日：2017-05-23

    申请号：US14189975

    申请日：2014-02-25

    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

    Inventor： Tung-Li Wu ,  Heng-Hsin Liu ,  Jui-Chun Peng

    IPC: G03F7/20

    CPC classification number: G03F7/70341 ,  G03F7/70925

    Abstract: An immersion lithography apparatus includes a lens system, an immersion hood, a wafer stage, an inspection system and a cleaning fluid supplier. The lens system is configured to project a pattern onto a wafer. The immersion hood is configured to confine an immersion fluid between the lens system and the wafer, and includes a peripheral hole configured to suck up the immersion fluid. The wafer stage is configured to position the wafer under the lens system. The inspection system is configured to detect whether there is contamination in the peripheral hole. The cleaning fluid supplier is coupled to the inspection system and configured to supply a cleaning fluid through the peripheral hole to remove the contamination, in which the inspection system and the cleaning fluid supplier are coupled to the wafer stage.

    Flexible wafer leveling design for various orientation of line/trench
    16.
    发明授权
    Flexible wafer leveling design for various orientation of line/trench 有权
    灵活的晶圆调平设计，适用于各种定向/沟槽

    公开(公告)号：US09228827B2

    公开(公告)日：2016-01-05

    申请号：US13913584

    申请日：2013-06-10

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Kuo-Hung Chao ,  Heng-Hsin Liu ,  Jui-Chun Peng

    IPC: G03F7/20 ,  G01B11/06 ,  G03F9/00

    CPC classification number: G01B11/0608 ,  G03F9/7026 ,  G03F9/7034

    Abstract: The present disclosure relates to a photolithography system having an ambulatory projection and/or detection gratings that provide for high quality height measurements without the use of an air gauge. In some embodiments, the photolithography system has a level sensor having a projection source that generates a measurement beam that is provided to a semiconductor substrate via a projection grating. A detector is positioned to receive a measurement beam reflected from the semiconductor substrate via a detection grating. An ambulatory element selectively varies an orientation of the projection grating and/or the detection grating to improve the measurement of the level sensor. By selectively varying an orientation of the projection and/or detection gratings, erroneous measurements of the level sensor can be eliminated.

    Abstract translation: 本公开涉及一种具有移动式投影和/或检测光栅的光刻系统，其提供高质量的高度测量而不使用空气规。 在一些实施例中，光刻系统具有液位传感器，该液位传感器具有产生经由投影光栅提供给半导体基板的测量光束的投影源。 检测器被定位成经由检测光栅接收从半导体衬底反射的测量光束。 移动元件选择性地改变投影光栅和/或检测光栅的取向以改进液位传感器的测量。 通过选择性地改变投影和/或检测光栅的取向，可以消除液位传感器的错误测量。

    Litho cluster and modulization to enhance productivity
    17.
    发明授权
    Litho cluster and modulization to enhance productivity 有权
    Litho集群和模块化以提高生产力

    公开(公告)号：US09196515B2

    公开(公告)日：2015-11-24

    申请号：US14551302

    申请日：2014-11-24

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： I-Hsiung Huang ,  Heng-Hsin Liu ,  Heng-Jen Lee ,  Chin-Hsiang Lin

    IPC: H01L21/67 ,  H01J37/317 ,  H01J37/32 ,  H01J37/16 ,  H01J37/20 ,  G03F7/16 ,  G03F7/30 ,  G03F7/20 ,  H01L21/677

    CPC classification number: H01L21/67225 ,  G03F7/16 ,  G03F7/30 ,  G03F7/70991 ,  H01J37/16 ,  H01J37/20 ,  H01J37/3174 ,  H01J37/32899 ,  H01L21/67276 ,  H01L21/67745

    Abstract: The present disclosure relates to a lithographic tool arrangement for semiconductor workpiece processing. The lithographic tool arrangement groups lithographic tools into clusters, and selectively transfers a semiconductor workpiece between a plurality of lithographic tools of a first type in a first cluster to a plurality of lithographic tools of a second type in a second cluster. The selective transfer is achieved though a transfer assembly, which is coupled to a defect scan tool that identifies defects generated in the lithographic tool of the first type. The disclosed lithographic tool arrangement also utilizes shared structural elements such as a housing assembly, and shared functional elements such as gases and chemicals. The lithographic tool arrangement may consist of baking, coating, exposure, and development units configured to provide a modularization of these various components in order to optimize throughput and efficiency for a given lithographic fabrication process.

    Abstract translation: 本公开涉及一种用于半导体工件加工的平版印刷工具装置。 光刻工具装置将光刻工具组合成簇，并且将半导体工件在第一簇中的第一类型的多个光刻工具之间选择性地传输到第二簇中的第二类型的光刻工具。 通过转移组件实现选择性转移，转移组件耦合到识别第一类型的光刻工具中产生的缺陷的缺陷扫描工具。 所公开的平版印刷工具装置还利用共同的结构元件，例如壳体组件和诸如气体和化学品的共享功能元件。 光刻工具装置可以包括被配置成提供这些各种部件的模块化的烘烤，涂覆，曝光和显影单元，以便为给定的光刻制造工艺优化产量和效率。

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