公开(公告)号：US06730454B2

公开(公告)日：2004-05-04

申请号：US10124087

申请日：2002-04-16

申请人： Dirk Pfeiffer ,  Marie Angelopoulos ,  Katherina Babich ,  Phillip Brock ,  Wu-Song Huang ,  Arpan P. Mahorowala ,  David R. Medeiros ,  Ratnam Sooriyakumaran

发明人： Dirk Pfeiffer ,  Marie Angelopoulos ,  Katherina Babich ,  Phillip Brock ,  Wu-Song Huang ,  Arpan P. Mahorowala ,  David R. Medeiros ,  Ratnam Sooriyakumaran

IPC分类号： G03F700

CPC分类号： H01L21/0276 ,  G03F7/0045 ,  G03F7/0757 ,  G03F7/091 ,  Y10S430/151

摘要： Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions of the invention are advantageously useful with shorter wavelength lithographic processes and/or have minimal residual acid content.

摘要翻译： 存在具有发色团部分和透明部分的含SiO聚合物的抗反射组合物是光刻工艺中有用的抗反射硬掩模组​​合物。 这些组合物提供突出的光学，机械和蚀刻选择性，同时适用于使用旋涂应用技术。 本发明的组合物有利地用于较短波长的光刻工艺和/或具有最小的残留酸含量。

公开(公告)号：US06653045B2

公开(公告)日：2003-11-25

申请号：US09785609

申请日：2001-02-16

申请人： Marie Angelopoulos ,  Ari Aviram ,  Wu-Song Huang ,  Ranee W. Kwong ,  Robert N. Lang ,  Qinghuang Lin ,  Wayne M. Moreau

发明人： Marie Angelopoulos ,  Ari Aviram ,  Wu-Song Huang ,  Ranee W. Kwong ,  Robert N. Lang ,  Qinghuang Lin ,  Wayne M. Moreau

IPC分类号： G03F7004

CPC分类号： G03F7/0757 ,  G03F7/0045 ,  Y10S430/106

摘要： A negative resist composition, comprising: (a) silicon-containing polymer with pendant fused moieties selected from the group consisting of fused aliphatic moieties, homocyclic fused aromatic moieties, and heterocyclic fused aromatic and sites for reaction with a crosslinking agent, (b) an acid-sensitive crosslinking agent, and (c) a radiation-sensitive acid generator is provided. The resist composition is used to form a patterned material layer in a substrate.

摘要翻译： 负性抗蚀剂组合物，其包含：（a）具有选自稠合脂族部分，稠环稠合芳族部分和杂环稠合芳族化合物的侧链稠合部分和与交联剂反应的位点的含硅聚合物，（b） 酸敏感性交联剂，和（c）辐射敏感性酸发生剂。 抗蚀剂组合物用于在基材中形成图案化的材料层。

公开(公告)号：US06641971B2

公开(公告)日：2003-11-04

申请号：US09882234

申请日：2001-06-15

申请人： Wu-Song Huang ,  David R. Medeiros

发明人： Wu-Song Huang ,  David R. Medeiros

IPC分类号： G03F7023

CPC分类号： G03F7/0758 ,  G03F7/0045 ,  Y10S430/106

摘要： A chemically amplified resist composition comprises an aqueous base soluble polymer or copolymer having one or more polar functional groups, wherein at least one of the functional groups is protected with a cycloaliphatic silyl ketal group but may also include other protecting groups as well as unprotected acidic functionalities. A ratio of protected to unprotected acidic functionalities is preferably selected to most effectively modulate a solubility of the resist composition in an aqueous base or other developer. The resist composition further comprises an acid generator, preferably a photoacid generator (PAG), and a casting solvent, and may also include other components, such as, a base additive and/or surfactant.

摘要翻译： 化学放大抗蚀剂组合物包含具有一个或多个极性官能团的碱性水溶性聚合物或共聚物，其中至少一个官能团用脂环族甲硅烷基缩酮基团保护，但也可包括其它保护基团以及未保护的酸性官能团 。 优选选择被保护的与未保护的酸性官能度的比例以最有效地调节抗蚀剂组合物在碱性水溶液或其它显影剂中的溶解度。 抗蚀剂组合物还包含酸产生剂，优选光酸产生剂（PAG）和浇铸溶剂，并且还可以包括其它组分，例如碱添加剂和/或表面活性剂。

公开(公告)号：US06543617B2

公开(公告)日：2003-04-08

申请号：US09802471

申请日：2001-03-09

申请人： Marie Angelopoulos ,  Wu-Song Huang ,  Ranee Wai-Ling Kwong ,  David Robert Medeiros ,  Wayne Martin Moreau ,  Karen Elizabeth Petrillo ,  Herman Russell Wendt ,  Christopher Karl Magg

发明人： Marie Angelopoulos ,  Wu-Song Huang ,  Ranee Wai-Ling Kwong ,  David Robert Medeiros ,  Wayne Martin Moreau ,  Karen Elizabeth Petrillo ,  Herman Russell Wendt ,  Christopher Karl Magg

IPC分类号： B65D8500

CPC分类号： G03F7/0012

摘要： The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitvity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.

摘要翻译： 本发明包括一个包装的涂层工件。 包装的涂层工件具有：（1）涂覆有对光辐射，微粒或化学污染物敏感的抗蚀剂膜的工件; （2）密封以封闭涂覆的工件和任选地第一吸气剂的内部阻隔件，以产生密封的第一外壳; 和（3）密封以封闭密封的第一外壳和任选的第二吸气剂的外屏障，只要所包封的涂覆的工件具有至少一个吸气剂，以产生适合于存储至少一个时间段的包装的涂覆的工件 周没有显着损失敏感性，分辨率或性能。 本发明还包括用于制备包装的涂层工件的方法以及将涂覆的工件的存储时间增加至少一周而不会显着降低灵敏度，分辨率或性能的方法。

公开(公告)号：US06503692B2

公开(公告)日：2003-01-07

申请号：US10165582

申请日：2002-06-07

申请人： Marie Angelopoulos ,  Ari Aviram ,  C. Richard Guarnieri ,  Wu-Song Huang ,  Ranee Kwong ,  Wayne M. Moreau

发明人： Marie Angelopoulos ,  Ari Aviram ,  C. Richard Guarnieri ,  Wu-Song Huang ,  Ranee Kwong ,  Wayne M. Moreau

IPC分类号： G03F700

CPC分类号： C08G77/20 ,  C08G77/38 ,  G03F7/0757 ,  G03F7/091 ,  Y10S430/151

摘要： Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.

公开(公告)号：US5733705A

公开(公告)日：1998-03-31

申请号：US730687

申请日：1996-10-11

申请人： Nageshwer Rao Bantu ,  William Ross Brunsvold ,  George Joseph Hefferon ,  Wu-Song Huang ,  Ahmad D. Katnani ,  Mahmoud M. Khofasteh ,  Ratnam Sooriyakumaran ,  Dominic Changwon Yang

发明人： Nageshwer Rao Bantu ,  William Ross Brunsvold ,  George Joseph Hefferon ,  Wu-Song Huang ,  Ahmad D. Katnani ,  Mahmoud M. Khofasteh ,  Ratnam Sooriyakumaran ,  Dominic Changwon Yang

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/039 ,  G03F7/0045

摘要： Proton sponge, berberine, and cetyltrimethyl ammonium hydroxide base compounds are used as additives to chemically amplified photoresists based on modified polyhydroxystyrene (PHS). The base additives scavenge free acids from the photoresist in order to preserve the acid labile moieties on the modified PHS polymer. The base additives are well suited to industrial processing conditions, do not react with the photoacid compounds in the photoresist composition to form byproducts which would hinder photoresist performance, and extend the shelf-life of the photoresist composition. In addition, the proton sponge and berberine base additives have a different absorption spectra than the modified PHS polymer, therefore, the quantity of base additive within the photoresist can be easily assayed and controlled.

摘要翻译： 质子海绵，小檗碱和十六烷基三甲基氢氧化铵碱化合物用作基于改性聚羟基苯乙烯（PHS）的化学放大光致抗蚀剂的添加剂。 基础添加剂清除光致抗蚀剂中的游离酸，以保持改性PHS聚合物上的酸不稳定部分。 碱添加剂非常适合于工业加工条件，不与光致抗蚀剂组合物中的光酸化合物反应以形成将阻碍光致抗蚀剂性能的副产物，并延长光致抗蚀剂组合物的保质期。 此外，质子海绵和小檗碱碱添加剂具有与改性PHS聚合物不同的吸收光谱，因此可以容易地测定和控制光致抗蚀剂内基础添加剂的量。

公开(公告)号：US5200112A

公开(公告)日：1993-04-06

申请号：US718079

申请日：1991-06-20

申请人： Marie Angelopoulos ,  Wu-Song Huang ,  Richard D. Kaplan ,  Marie-Annick Le Corre ,  Stanley E. Perreault ,  Jane M. Shaw ,  Michel R. Tissier ,  George F. Walker

发明人： Marie Angelopoulos ,  Wu-Song Huang ,  Richard D. Kaplan ,  Marie-Annick Le Corre ,  Stanley E. Perreault ,  Jane M. Shaw ,  Michel R. Tissier ,  George F. Walker

IPC分类号： C08G61/12 ,  H01B1/12 ,  H01J29/86 ,  H01L23/498 ,  H01L23/60 ,  H05K9/00

CPC分类号： H05K9/0079 ,  C08G61/12 ,  H01B1/125 ,  H01B1/127 ,  H01B1/128 ,  H01J29/868 ,  H01L23/49894 ,  H01L23/60 ,  H05K9/0081 ,  H01L2924/0002

摘要： Structures containing conducting polymers and methods of fabrication thereof. Electrical conductivity can be induced in polymers selected from the group of substituted and unsubstituted polyanilines, polyparaphenylenvinyles, substituted and unsubstituted polythiophenes substituted and unsubstituted poly-p-phenylene sulfides, substituted polyfuranes, substituted polypyrroles, substituted polyselenophene, polyacetylines formed from soluble precursors, combinations thereof and blends thereof with other polymers. The polymer contains a doping precursor, selected from the group of onium salts, iodonium salts, triflate salts, borate salts and tosylate salts and sulfonoxylimides. Conductivity can be selectively induced in the polymer by selectivly doping upon selective exposure to a source of energy such as electromagnetic radiation, an electron beam and heat. The electrically conductive polymers of the present invention are useful as electron discharge layers for electron beam applications, such as, SEM observations, as electromagnetic interference coatings on dielectric surfaces and as electron beam resist which acts as a discharge layer.

摘要翻译： 含有导电聚合物的结构及其制造方法。 可以在选自取代和未取代的聚苯胺，聚对苯二烯基乙烯基，取代和未取代的聚噻吩，取代和未取代的聚对苯硫醚，取代的聚呋喃，取代的聚吡咯，取代的聚硒酚，由可溶性前体形成的聚乙炔，其组合 及其与其它聚合物的共混物。 聚合物含有选自鎓盐，碘鎓盐，三氟甲磺酸盐，硼酸盐和甲苯磺酸盐和磺酰氧基酰亚胺的掺杂前体。 可以通过在选择性地暴露于诸如电磁辐射，电子束和热的能量源之间选择性地掺杂在聚合物中选择性地诱导电导率。 本发明的导电聚合物可用作用于电子束应用的电子放电层，例如SEM观察，作为电介质表面上的电磁干扰涂层和用作放电层的电子束抗蚀剂。

公开(公告)号：US5062896A

公开(公告)日：1991-11-05

申请号：US502090

申请日：1990-03-30

申请人： Wu-Song Huang ,  Igor Y. Khandros ,  Ravi Saraf ,  Leathen Shi

发明人： Wu-Song Huang ,  Igor Y. Khandros ,  Ravi Saraf ,  Leathen Shi

IPC分类号： B23K35/22 ,  B23K35/26 ,  B23K35/36 ,  B23K35/363 ,  B23K101/36 ,  C08K3/08 ,  H05K3/32 ,  H05K3/34

CPC分类号： H05K3/3484 ,  B23K35/26 ,  B23K35/36 ,  C08K3/08 ,  H05K2201/0129 ,  H05K3/321

摘要： An improved solder/polymer fluxless composite paste interconnection material having a low reflow temperature to form electrical contacts having good bonding strength and low contact resistance. The present pastes comprise a major proportion of a meltable metal alloy powder filler, free of noble metals and preferably free of lead, a minor proportion of a solution of a temperature-stable thermoplastic polymer having a softening temperature above the melting temperature of the metal powder filler in a volatile solvent which evaporates during reflow, and a minor proportion of a fluxing agent having a boiling point lower than the reflow temperature of the composition and higher than the melting point of the eutectic alloy powder filler. An oxide-free, partially coalesced metal alloy connection is obtained, which is polymer strengthened and reworkable at a low reflow temperature, per se, or in the presence of polymer solvent.

摘要翻译： 具有低回流温度的改进的焊料/聚合物无焊剂复合糊剂互连材料，以形成具有良好的接合强度和低接触电阻的电触点。 本发明的糊料主要包括不含贵金属，优选不含铅的可熔融金属合金粉末填料的主要部分，较小比例的软化温度高于金属粉末的熔融温度的温度稳定的热塑性聚合物溶液 在回流时蒸发的挥发性溶剂中的填料，以及沸点低于组合物的回流温度并且高于共晶合金粉末填料的熔点的助熔剂的一小部分。 获得无氧化物，部分聚结的金属合金连接，其在低回流温度下或在聚合物溶剂的存在下聚合物增强并可再加工。

公开(公告)号：US08802347B2

公开(公告)日：2014-08-12

申请号：US12613804

申请日：2009-11-06

申请人： Robert D. Allen ,  Phillip J. Brock ,  Kuang-Jung Chen ,  Alexander Friz ,  Wu-Song Huang ,  Ratnam Sooriyakumaran ,  Sally A. Swanson ,  Hoa D. Truong

发明人： Robert D. Allen ,  Phillip J. Brock ,  Kuang-Jung Chen ,  Alexander Friz ,  Wu-Song Huang ,  Ratnam Sooriyakumaran ,  Sally A. Swanson ,  Hoa D. Truong

IPC分类号： G03F7/039 ,  G03F7/11 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38

CPC分类号： C09D143/04 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/094 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/40

摘要： Coating compositions include a polymer including: wherein R1 is a silicon containing moiety, R2 is an acid stable lactone functionality, and R3 is an acid labile lactone functionality; X1, X2, X3 are independently H or CH3; and m and o are non-zero positive integers and n is zero or a positive integer representing the number of repeat units; a photoacid generator; and a solvent. Also disclosed are methods for forming a pattern in the coating composition containing the same.

摘要翻译： 涂料组合物包括聚合物，其包括：其中R1是含硅部分，R2是酸稳定的内酯官能团，R3是酸不稳定的内酯官能团; X 1，X 2，X 3独立地为H或CH 3; 并且m和o是非零正整数，n是零或表示重复单元数的正整数; 光致酸发生器; 和溶剂。 还公开了在含有该图案的涂料组合物中形成图案的方法。

公开(公告)号：US08722307B2

公开(公告)日：2014-05-13

申请号：US13118013

申请日：2011-05-27

申请人： Seiichiro Tachibana ,  Kazumi Noda ,  Masaki Ohashi ,  Takeshi Kinsho ,  Wu-Song Huang ,  Dario L. Goldfarb ,  Wai-Kin Li ,  Martin Glodde

发明人： Seiichiro Tachibana ,  Kazumi Noda ,  Masaki Ohashi ,  Takeshi Kinsho ,  Wu-Song Huang ,  Dario L. Goldfarb ,  Wai-Kin Li ,  Martin Glodde

IPC分类号： G03F7/004 ,  G03F7/11

CPC分类号： G03F7/038 ,  G03F7/0046 ,  G03F7/091

摘要： A composition comprising a polymer comprising repeat units selected from formulae (1) to (4), an aromatic ring-containing polymer, a near-infrared absorbing dye, and a solvent is used to form a near-infrared absorptive film. R1, R7, R9, and R14 are H, methyl, fluorine or trifluoromethyl, R2 to R6 are H, F, trifluoromethyl, —C(CF3)2OR16, alkyl or alkoxy, at least one of R2 to R6 being F or a fluorinated group, R16, R8 and R13 are H or a monovalent organic group, L1 is a single bond or —C(═O)O—, m is 0 or 1, L2 is a di- or trivalent hydrocarbon group, n is 1 or 2, R10 to R12 are H, hydroxyl, halogen or a monovalent organic group, and R15 is a fluorinated C2-C15 hydrocarbon group.

摘要翻译： 包含含有选自式（1）至（4）的重复单元，含芳族环的聚合物，近红外吸收染料和溶剂的聚合物的组合物用于形成近红外吸收膜。 R1，R7，R9和R14是H，甲基，氟或三氟甲基，R2至R6是H，F，三氟甲基，-C（CF3）2OR16，烷基或烷氧基，R2至R6中的至少一个为F或氟化 基团R 16，R 8和R 13为H或一价有机基团，L 1为单键或-C（= O）O-，m为0或1，L 2为二价或三价烃基，n为1或 2，R 10〜R 12为H，羟基，卤素或一价有机基团，R 15为氟代C 2 -C 15烃基。