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    METHODS FOR FORMING COMPOSITIONS CONTAINING GLASS
    11.
    发明申请
    METHODS FOR FORMING COMPOSITIONS CONTAINING GLASS 审中-公开
    用于形成包含玻璃的组合物的方法

    公开(公告)号：US20100071418A1

    公开(公告)日：2010-03-25

    申请号：US12526900

    申请日：2008-02-27

    Applicant: Thierry Luc Alain Dannoux ,  Paulo Gaspar Jorge Marques ,  Robert Michael Morena ,  Cameron Wayne Tanner

    Inventor： Thierry Luc Alain Dannoux ,  Paulo Gaspar Jorge Marques ,  Robert Michael Morena ,  Cameron Wayne Tanner

    IPC: C03B17/00

    CPC classification number: C03B11/084 ,  B81B2201/051 ,  B81C99/0085 ,  B81C2201/019 ,  B81C2201/036 ,  C03B2215/07

    Abstract: Methods for molding glass and glass composites, including providing a first structure having a first surface, providing a second structure having a second surface, the second surface being patterned and porous, and disposing between the first and second surfaces an amount of a composition comprising a glass, then heating together the first and second structures and the first amount of the composition sufficiently to soften the first amount of the composition such that the first and second structures, under gravity or an otherwise applied force, move toward each other, such that the pattern of the second surface is formed into the first amount of the composition, then cooling the composition sufficiently to stabilize it, the second structure comprising porous carbon having an open porosity of at least 5% and wherein the amount of the composition is removable from the second surface, without damage to the amount of the composition or to the second surface, such that the second surface is in condition for re-use.

    Abstract translation: 用于模制玻璃和玻璃复合材料的方法，包括提供具有第一表面的第一结构，提供具有第二表面的第二结构，第二表面被图案化和多孔化，并且在第一表面和第二表面之间设置一定量的组合物， 玻璃，然后将第一和第二结构和第一量的组合物充分加热以软化第一量的组合物，使得第一和第二结构在重力或以其他方式施加的力下朝向彼此移动，使得 将第二表面的图案形成为第一量的组合物，然后充分冷却组合物以使其稳定，第二结构包括具有至少5％的开放孔隙率的多孔碳，并且其中组合物的量可从 第二表面，而不损害组合物的量或第二表面，使得第二表面是 在重新使用的条件下。

    Method for manufacturing microstructures having multiple microelements with through-holes
    12.
    发明授权
    Method for manufacturing microstructures having multiple microelements with through-holes 有权
    具有多个具有通孔的微量元素的微结构的制造方法

    公开(公告)号：US07578954B2

    公开(公告)日：2009-08-25

    申请号：US10373251

    申请日：2003-02-24

    Applicant: Vladimir Gartstein ,  Faiz Feisal Sherman

    Inventor： Vladimir Gartstein ,  Faiz Feisal Sherman

    IPC: B29C43/02 ,  B29C1/48

    CPC classification number: B81C1/00111 ,  A61M37/0015 ,  A61M2037/003 ,  A61M2037/0053 ,  B26F1/24 ,  B26F1/26 ,  B81B2201/055 ,  B81C2201/034 ,  B81C2201/036

    Abstract: A method is provided for manufacturing microstructures of the type which contain a substrate and an array of protruding microelements with through-holes, which are used in penetrating layers of skin. The microelements are embossed or pressed into an initial substrate structure, which in some embodiments is formed from extruded polymeric material, and in some cases from two layers of polymer that are co-extruded. The through-holes are formed from filled through-cylinders of a second material that is removed after the embossing or pressing step; in other instances, the through-holes are left hollow during the embossing or pressing step.

    Abstract translation: 提供了一种用于制造包含基底的微结构的方法和具有通孔的突出微元件阵列，其用于穿透皮肤层。 微元件被压花或压制成初始的基底结构，其在一些实施方案中由挤出的聚合物材料形成，并且在一些情况下由共挤出的两层聚合物形成。 通孔由在压花或压制步骤之后被去除的第二材料的填充的通孔形成; 在其他情况下，在压花或压制步骤期间，通孔留空。

    Selective and alignment-free molecular patterning of surfaces
    13.
    发明申请
    Selective and alignment-free molecular patterning of surfaces 审中-公开
    表面的选择性和无取向分子图案化

    公开(公告)号：US20040156988A1

    公开(公告)日：2004-08-12

    申请号：US10640413

    申请日：2003-08-12

    Inventor： Neville Z. Mehenti ,  Harvey A. Fishman ,  Stacey Francine Bent

    IPC: B05D005/00 ,  B05C001/00

    CPC classification number: G03F7/0002 ,  B05D1/185 ,  B05D1/283 ,  B41M3/006 ,  B81B2201/0214 ,  B81C1/00206 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C12N11/06 ,  C12N11/08

    Abstract: The present invention is directed towards a method and means for molecularly patterning a surface to promote the patterned attachment of a target adherent. In some preferred embodiments the target adherent is a biological cell, but it can more generally be a biological or chemical species for which attachment at specific sites is desired. The method generally involves using a stamp to microcontact print a first type of molecule on the surface. With the stamp remaining in situ, the process then involves fluidic patterning of a second type of molecule through selected openings defined by selected recesses in the stamp and the surface itself. The second type of molecule should have an adhesion property relative to the target adherent that is complementary to that of the first type of molecule. The stamp is removed only after both the first and second types of molecules have been transferred to the surface.

    Abstract translation: 本发明涉及用于分子图案化表面以促进目标粘附剂的图案化附着的方法和装置。 在一些优选的实施方案中，靶粘附物是生物细胞，但它通常可以是需要在特定部位附着的生物或化学物质。 该方法通常涉及使用印模来微分印刷表面上的第一类型的分子。 当邮票保留在原位时，该方法然后涉及通过由印模和表面本身中的选定凹部限定的选定开口的第二类型分子的流体图案化。 第二类分子应该具有相对于与第一类型分子互补的靶粘附物的粘附性质。 只有在第一种和第二种类型的分子已经转移到表面之后，才能去除印模。

    Nano-size imprinting stamp using spacer technique
    15.
    发明申请
    Nano-size imprinting stamp using spacer technique 有权
    使用间隔技术的纳米尺寸印记邮票

    公开(公告)号：US20030141276A1

    公开(公告)日：2003-07-31

    申请号：US10062952

    申请日：2002-01-31

    Inventor： Heon Lee

    IPC: B32B001/08 ,  B44C001/22

    CPC classification number: B29C59/022 ,  B29C2059/023 ,  B81C99/009 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10T428/24479 ,  Y10T428/2457 ,  Y10T428/24579 ,  Y10T428/24595

    Abstract: A wide-area nano-size imprinting stamp is disclosed. The wide-area nano-size imprinting stamp includes a substrate having a base surface upon which is formed a plurality of micro-features. Each micro-feature includes a plurality of spacers disposed on opposed side surfaces thereof. The spacers extend laterally outward of the opposed side surfaces and the micro-features and the spacers extend outward of the base surface. The micro-features and the spacers are selectively etched to differing heights to define an imprint stamp having an imprint profile. The imprint stamps can be formed on substantially all of a useable area of the substrate and can have complex shapes that vary among the imprint stamps. The imprint stamps can be used as a template for transferring the imprint profile to a mask layer in which the imprint profile will be replicated.

    Abstract translation: 公开了一种广域纳米尺寸印记。 广域纳米尺寸压印印模包括具有基面的基底，在其上形成多个微特征。 每个微特征包括设置在其相对侧表面上的多个间隔物。 间隔件在相对的侧表面的横向外侧延伸，并且微特征和间隔件从基部表面向外延伸。 微特征和间隔物被选择性地蚀刻到不同的高度以限定具有印记轮廓的压印印模。 压印戳可以形成在基板的基本上所有可用的区域上，并且可以具有在压印印记之间变化的复杂形状。 印记戳可用作模板，用于将压印轮廓传送到掩模层，在该掩模层中可以复制压印轮廓。

    Process and system for fabrication of patterns on a surface
    17.
    发明授权
    Process and system for fabrication of patterns on a surface 有权
    用于在表面上制作图案的工艺和系统

    公开(公告)号：US08524100B2

    公开(公告)日：2013-09-03

    申请号：US13003484

    申请日：2009-07-03

    Applicant: Graham L. W. Cross ,  Warren McKenzie ,  John B. Pethica

    Inventor： Graham L. W. Cross ,  Warren McKenzie ,  John B. Pethica

    IPC: C03C15/00

    CPC classification number: G03F7/11 ,  B81C1/00634 ,  B81C2201/0143 ,  B81C2201/0159 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0337

    Abstract: The invention provides a system and process of patterning structures on a carbon based surface comprising exposing part of the surface to an ion flux, such that material properties of the exposed surface are modified to provide a hard mask effect on the surface. A further step of etching unexposed parts of the surface forms the structures on the surface. The inventors have discovered that by controlling the ion exposure, alteration of the surface structure at the top surface provides a mask pattern, without substantially removing any material from the exposed surface. The mask allows for subsequent ion etching of unexposed areas of the surface leaving the exposed areas raised relative to the unexposed areas thus manufacturing patterns onto the surface. For example, a Ga+ focussed ion beam exposes a pattern onto a diamond surface which produces such a pattern after its exposure to a plasma etch. The invention is particularly suitable for patterning of clear well-defined structures down to nano-scale dimensions.

    Abstract translation: 本发明提供了一种在碳基表面上构图结构的系统和工艺，包括将表面的一部分暴露于离子通量，使得暴露表面的材料特性被修饰以在表面上提供硬掩模效应。 蚀刻表面的未曝光部分的另一步骤形成表面上的结构。 发明人已经发现，通过控制离子暴露，顶表面上的表面结构的改变提供掩模图案，而基本上不从暴露表面移除任何材料。 该掩模允许对表面的未曝光区域的后续离子蚀刻，离开暴露区域相对于未曝光区域升高，从而将图案制造到表面上。 例如，Ga +聚焦离子束将图案暴露在金刚石表面上，其在暴露于等离子体蚀刻之后产生这种图案。 本发明特别适用于直到纳米级尺寸的清晰明确定义的结构的图案化。

    Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same
    18.
    发明授权
    Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same 有权
    图案转印模具，图案转印装置和使用其的装置制造方法

    公开(公告)号：US07690912B2

    公开(公告)日：2010-04-06

    申请号：US11364631

    申请日：2006-02-27

    Applicant: Toshinobu Tokita ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi ,  Takashi Nakamura

    Inventor： Toshinobu Tokita ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi ,  Takashi Nakamura

    IPC: B29C33/44 ,  B29C35/08

    CPC classification number: B82Y10/00 ,  B81C99/009 ,  B81C2201/0152 ,  B81C2201/036 ,  B82Y40/00 ,  G03F7/0002

    Abstract: One object of the present invention is to provide a pattern transferring mold which can provide a starting area of mold release easily and certainly and a pattern transferring apparatus with the same. A pattern transferring mold is disclosed which is used in a pattern transferring apparatus that brings the mold into contact with a photo-curing resin on a substrate and cures the photo-curing resin by light irradiation to transfer a pattern formed on the mold onto the photo-curing resin. The mold comprises a bottom face which contacts the photo-curing resin, the bottom face portion including a first area in which the pattern is formed and a second area formed outside the first area. The mold has a mold-releasing shape in the second area, the mold-releasing shape providing a starting area of mold release from the cured photo-curing resin.

    Abstract translation: 本发明的一个目的是提供一种图案转印模具，其可以容易且确定地提供脱模的起始区域和具有该图案转印模具的图案转印装置。 公开了一种图案转印模具，其用于使模具与基板上的光固化树脂接触的图案转印装置，并通过光照射固化光固化树脂，以将形成在模具上的图案转印到照片上 固化树脂。 模具包括与光固化树脂接触的底面，底面部分包括形成图案的第一区域和形成在第一区域外部的第二区域。 模具在第二区域具有脱模形状，脱模形状提供了从固化的光固化树脂脱模的起始区域。

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