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21.发明授权公开(公告)号：US11735447B2
公开(公告)日：2023-08-22
申请号：US17075321
申请日：2020-10-20
Applicant: Applied Materials, Inc.
Inventor： Kartik Santhanam , Kartik Shah , Wolfgang Aderhold , Martin Hilkene , Stephen Moffatt
IPC: H01L21/67 , G05B19/406 , G06N20/00
CPC classification number: H01L21/67276 , G05B19/406 , G06N20/00 , G05B2219/45031
Abstract: Embodiments disclosed herein include a processing tool for semiconductor processing. In an embodiment, the processing tool comprises a chamber, and a plurality of witness sensors integrated with the chamber. In an embodiment, the processing tool further comprises a drift detection module. In an embodiment, data from the plurality of witness sensors is provided to the drift detection module as input data. In an embodiment, the processing tool further comprises a dashboard for displaying output data from the drift detection module.
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22.发明授权公开(公告)号：US11586794B2
公开(公告)日：2023-02-21
申请号：US16944012
申请日：2020-07-30
Applicant: Applied Materials, Inc.
Inventor： Stephen Moffatt , Sheldon R. Normand , Dermot P. Cantwell
IPC: G06F30/398 , G06F30/367 , H01L21/66
Abstract: Embodiments disclosed herein include a semiconductor manufacturing tool with a hybrid model and methods of using the hybrid model for processing wafers and/or developing process recipes. In an embodiment, a method for developing a semiconductor manufacturing process recipe comprises selecting one or more device outcomes, and querying a hybrid model to obtain a process recipe recommendation suitable for obtaining the device outcomes. In an embodiment, the hybrid process model comprises a statistical model and a physical model. In an embodiment, the method may further comprise executing a design of experiment (DoE) on a set of wafers to validate the process recipe recommended by the hybrid process model.
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公开(公告)号：USD959490S1
公开(公告)日：2022-08-02
申请号：US29754188
申请日：2020-10-07
Applicant: Applied Materials, Inc.
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公开(公告)号：US10370762B2
公开(公告)日：2019-08-06
申请号：US15359090
申请日：2016-11-22
Applicant: Applied Materials, Inc.
Inventor： Stephen Moffatt
Abstract: Embodiments of the disclosure provide a method and apparatus for depositing a layer on a substrate. In one embodiment, the method includes exposing a surface of the substrate disposed within a processing chamber to a fluid precursor, directing an electromagnetic radiation generated from a radiation source to a light scanning unit such that the electromagnetic radiation is deflected and scanned across the surface of the substrate upon which a material layer is to be formed, and initiating a deposition process with the electromagnetic radiation having a wavelength selected for photolytic dissociation of the fluid precursor to deposit the material layer onto the surface of the substrate. The radiation source may comprise a laser source, a bright light emitting diode (LED) source, or a thermal source. In one example, the radiation source is a fiber laser producing output in the ultraviolet (UV) wavelength range.
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公开(公告)号：US10109514B2
公开(公告)日：2018-10-23
申请号：US15675825
申请日：2017-08-14
Applicant: Applied Materials, Inc.
Inventor： Kim Vellore , Dinesh Kanawade , Stephen Moffatt , Aaron Miller , Leonid M. Tertitski , Norman L. Tam , Michael Liu , Colin Fox
Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.
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Patent Agency Ranking
公开(公告)号：US10094618B2
公开(公告)日：2018-10-09
申请号：US15366908
申请日：2016-12-01
Applicant: Applied Materials, Inc.
Inventor： Stephen Moffatt , Aaron Muir Hunter
Abstract: A method and apparatus for annealing semiconductor substrates is disclosed. The apparatus has an annealing energy source and a substrate support, with a shield member disposed between the annealing energy source and the substrate support. The shield member is a substantially flat member having a dimension larger than a substrate processed on the substrate support, with a window covering a central opening in the substantially flat member. The central opening has a gas inlet portal and a gas outlet portal, each in fluid communication with a gas inlet plenum and gas outlet plenum, respectively. A connection member is disposed around the central opening and holds the window over the central opening. Connection openings in the connection member are in fluid communication with the gas inlet plenum and gas outlet plenum, respectively, through a gas inlet conduit and a gas outlet conduit formed through the connection member.
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27.发明授权公开(公告)号：US10074538B2
公开(公告)日：2018-09-11
申请号：US15186499
申请日：2016-06-19
Applicant: Applied Materials, Inc.
Inventor： Bruce E. Adams , Aaron Muir Hunter , Stephen Moffatt
IPC: C30B1/02 , H01L21/02 , H01L21/268
CPC classification number: H01L21/02686 , H01L21/02521 , H01L21/268
Abstract: Apparatus and methods of treating a substrate with an amorphous semiconductor layer, or a semiconductor layer having small crystals, to form large crystals in the substrate are described. A treatment area of the substrate is identified and melted using a progressive melting process of delivering pulsed energy to the treatment area. The treatment area is then recrystallized using a progressive crystallization process of delivering pulsed energy to the area. The pulsed energy delivered during the progressive crystallization process is selected to convert the small crystals into large crystals as the melted material freezes.
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公开(公告)号：US20170365288A1
公开(公告)日：2017-12-21
申请号：US15627124
申请日：2017-06-19
Applicant: Applied Materials, Inc.
Inventor： Majeed A. Foad , Jacob Newman , Jose Antonio Marin , Daniel J. Hoffman , Stephen Moffatt , Steven Verhaverbeke
IPC: G11B5/82 , C23C16/00 , C23F1/00 , H01L21/673 , G11B5/855 , G11B5/84 , H01L21/677 , H01L21/687 , C23C14/48 , C23C14/50
CPC classification number: G11B5/82 , C23C14/48 , C23C14/50 , C23C16/00 , C23F1/00 , G11B5/84 , G11B5/855 , H01L21/673 , H01L21/677 , H01L21/687
Abstract: Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on a substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective layer and a lubricant layer are deposited over the patterned magnetic layer. The patterning is accomplished through a number of processes that expose substrates to energy of varying forms. Apparatus and methods disclosed herein enable processing of two major surfaces of a substrate simultaneously, or sequentially by flipping. In some embodiments, magnetic properties of the substrate surface may be uniformly altered by plasma exposure and then selectively restored by exposure to patterned energy.
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29.发明授权Methods for photo-excitation of precursors in epitaxial processes using a rotary scanning unit 有权使用旋转扫描单元在外延工艺中对前体进行光激发的方法公开(公告)号：US09499909B2
公开(公告)日：2016-11-22
申请号：US14186837
申请日：2014-02-21
Applicant: Applied Materials, Inc.
Inventor： Stephen Moffatt
CPC classification number: C23C16/483 , C23C16/28 , C23C16/45504 , C30B25/02 , C30B25/165 , C30B30/00 , H01L21/02521 , H01L21/0262
Abstract: Embodiments of the invention provide a method and apparatus for depositing a layer on a substrate. In one embodiment, the method includes exposing a surface of the substrate disposed within a processing chamber to a fluid precursor, directing an electromagnetic radiation generated from a radiation source to a light scanning unit such that the electromagnetic radiation is deflected and scanned across the surface of the substrate upon which a material layer is to be formed, and initiating a deposition process with the electromagnetic radiation having a wavelength selected for photolytic dissociation of the fluid precursor to deposit the material layer onto the surface of the substrate. The radiation source may comprise a laser source, a bright light emitting diode (LED) source, or a thermal source. In one example, the radiation source is a fiber laser producing output in the ultraviolet (UV) wavelength range.
Abstract translation: 本发明的实施例提供了一种用于在衬底上沉积层的方法和装置。 在一个实施例中，该方法包括将设置在处理室内的衬底的表面暴露于流体前体，将从辐射源产生的电磁辐射引导到光扫描单元，使得电磁辐射被偏转并扫描横过表面 要在其上形成材料层的衬底，并且开始沉积过程，其中电磁辐射具有选择用于光解离流体前体的波长，以将材料层沉积到衬底的表面上。 辐射源可以包括激光源，亮发光二极管（LED）源或热源。 在一个示例中，辐射源是在紫外（UV）波长范围内产生输出的光纤激光器。
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公开(公告)号：US09341858B2
公开(公告)日：2016-05-17
申请号：US14180010
申请日：2014-02-13
Applicant: Applied Materials, Inc.
Inventor： Stephen Moffatt
CPC classification number: G02B27/48 , B23K26/0622 , B23K26/0624 , B23K26/0626 , B23K26/0648 , F21V5/002 , F21V5/004 , F21V5/007 , G02B3/0056 , G02B5/021 , G02B5/0278 , G02B5/04 , G02B27/10 , H01L21/67115 , H01S3/0057
Abstract: Embodiments described herein provide apparatus and methods for processing semiconductor substrates with uniform laser energy. A laser pulse or beam is directed to a spatial homogenizer, which may be a plurality of lenses arranged along a plane perpendicular to the optical path of the laser energy, an example being a microlens array. The spatially uniformized energy produced by the spatial homogenizer is then directed to a refractive medium that has a plurality of thicknesses. Each thickness of the plurality of thicknesses is different from the other thicknesses by at least the coherence length of the laser energy.
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