公开(公告)号：US20150093692A1

公开(公告)日：2015-04-02

申请号：US14567468

申请日：2014-12-11

Applicant: FUJIFILM CORPORATION

Inventor： Shuhei YAMAGUCHI

IPC: G03F7/038 ,  G03F7/027 ,  G03F7/20

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: There is provided a pattern forming method including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (A) to (C), (A) a resin capable of increasing polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, (B) a compound capable of generating acid upon irradiation with an actinic ray or radiation, and (C) a salt having a conjugate base structure of an acid having a pKa of −2 or more in a molecule thereof and substantially not capable of decomposing by an actinic ray or radiation, (b) exposing the film, and (c) developing the exposed film using a developer containing an organic solvent to form a negative pattern.

Abstract translation: 提供了一种图案形成方法，其包括：（a）通过光化射线敏感或辐射敏感性树脂组合物形成膜，所述组合物含有（A）至（C），（A）能够通过 酸，以降低在含有机溶剂的显影剂中的溶解性，（B）在用光化射线或辐射照射时能够产生酸的化合物，和（C）具有pKa为-2的酸的共轭碱结构的盐 或更多，并且基本上不能通过光化射线或辐射分解，（b）曝光该膜，和（c）使用含有有机溶剂的显影剂显影曝光的膜以形成负型图案。

公开(公告)号：US20140242505A1

公开(公告)日：2014-08-28

申请号：US14272034

申请日：2014-05-07

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Kei YAMAMOTO ,  Fumihiro YOSHINO

IPC: G03F7/038

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern forming method including: (i) a process of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a Resin (P) including a non-acid-decomposable Repeating Unit (b1) represented by a following General Formula (b1) and a repeating unit including a group capable of being decomposed by acid and generating a polar group, and a Compound (B) capable of generating an acid through irradiation of actinic rays or irradiation; (ii) a process of exposing the film using actinic rays or radiation with a wavelength of equal to or less than 200 nm; and (iii) a process of developing the exposed film using a developer including an organic solvent containing a hetero atom and carbon atoms having 7 or more carbon atoms to forming a negative tone pattern.

Abstract translation: 一种图案形成方法，包括：（i）使用含有由以下通式表示的非酸可分解重复单元（b1）的树脂（P）的光化射线敏感性或辐射敏感性树脂组合物形成膜的方法 式（b1）和包含能够被酸分解并产生极性基团的基团的重复单元和能够通过光化射线照射或照射而产生酸的化合物（B）; （ii）使用光化射线或波长等于或小于200nm的辐射使膜曝光的方法; 和（iii）使用包含含有杂原子的有机溶剂和具有7个或更多个碳原子的碳原子的显影剂显影曝光的膜以形成负色调图案的方法。

公开(公告)号：US20140234762A1

公开(公告)日：2014-08-21

申请号：US14272996

申请日：2014-05-08

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Michihiro SHIRAKAWA ,  Shohei KATAOKA ,  Shoichi SAITOH ,  Fumihiro YOSHINO

IPC: G03F7/038

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern forming method including: a process of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin including a Repeating Unit (a1) having a group capable of being decomposed by acid and generating a carboxyl group, and a compound capable of generating acid through irradiation of actinic rays or radiation; a process of exposing the film; and a process of developing the exposed film using a developer including an organic solvent to form a negative tone pattern, wherein the value X obtained by substituting the number of each atom included in the Repeating Unit (a1) after being decomposed by acid and generating a carboxyl group in the following formula is 0

Abstract translation: 一种图案形成方法，包括：使用含有具有能够被酸分解并产生羧基的基团的重复单元（a1）的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的方法，以及 能够通过光化射线或辐射照射产生酸的化合物; 曝光电影的过程; 以及使用包含有机溶剂的显影剂显影曝光的薄膜以形成负色调图案的方法，其中通过用酸分解后将重复单元（a1）中包含的每个原子的数目取代而得到的值X，并产生 下式中的羧基为0

公开(公告)号：US20240241444A1

公开(公告)日：2024-07-18

申请号：US18426343

申请日：2024-01-30

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI

IPC: G03F7/039 ,  G03F7/004

CPC classification number: G03F7/0392 ,  G03F7/0045

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: a resin (A) that has a specific repeating unit and whose polarity increases by the action of an acid; and an acidic compound (F) having an iodine atom. The resin (A) is a different compound from the acidic compound (F), and the acidic compound (F) is a nonionic compound.

公开(公告)号：US20230393473A1

公开(公告)日：2023-12-07

申请号：US18449475

申请日：2023-08-14

Applicant: FUJIFILM Corporation

Inventor： Taro MIYOSHI ,  Shuhei YAMAGUCHI ,  Eiji FUKUZAKI ,  Tomoaki YOSHIOKA

IPC: G03F7/039

CPC classification number: G03F7/039

Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition having excellent sensitivity to exposure. Another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, which relate to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition contains a resin which is decomposed by action of acid to increase polarity, in which at least one of a requirement that the actinic ray-sensitive or radiation-sensitive resin composition further contains a compound represented by Formula (1), or a requirement that the resin which is decomposed by action of acid to increase polarity has a residue formed by removing one hydrogen atom from the compound represented by Formula (1) is satisfied.

公开(公告)号：US20160282720A1

公开(公告)日：2016-09-29

申请号：US15176345

申请日：2016-06-08

Applicant: FUJIFILM Corporation

Inventor： Koutarou TAKAHASHI ,  Tomotaka TSUCHIMURA ,  Shuhei YAMAGUCHI ,  Natsumi YOKOKAWA ,  Hidehiro MOCHIZUKI

IPC: G03F7/038 ,  G03F7/32 ,  G03F1/78 ,  G03F7/20 ,  G03F1/24 ,  G03F1/50

CPC classification number: G03F7/038 ,  G03F1/24 ,  G03F1/50 ,  G03F1/78 ,  G03F7/0382 ,  G03F7/2059 ,  G03F7/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an alkali-soluble resin (A) having a phenolic hydroxyl group, and a crosslinking agent (C) having two or more hydroxymethyl groups or alkoxymethyl groups in total within the molecule, wherein the composition contains a crosslinking agent (C1) having a molecular weight of 420 or more and also having two to four hydroxymethyl groups or alkoxymethyl groups in total within the molecule in a proportion of 60 mol % to 100 mol % based on the total amount of the crosslinking agent (C) including the crosslinking agent (C1), and in which the total concentration of the hydroxymethyl groups or the alkoxymethyl groups of the crosslinking agent (C) relative to 1 g of the solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 0.30 mmol/g or more.

Abstract translation: 光化射线敏感或辐射敏感性树脂组合物包括具有酚羟基的碱溶性树脂（A）和在分子内总共具有两个或多个羟甲基或烷氧基甲基的交联剂（C），其中 组合物含有分子量为420以上的交联剂（C1），并且在分子内总共具有2〜4个羟甲基或烷氧基甲基，比例为60〜100摩尔％ 包含交联剂（C1）的交联剂（C），其中交联剂（C）的羟甲基或烷氧基甲基的总浓度相对于光化射线敏感或辐射中的固体含量1g 敏感性树脂组合物为0.30mmol / g以上。

公开(公告)号：US20160280621A1

公开(公告)日：2016-09-29

申请号：US15176762

申请日：2016-06-08

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Hidehiro MOCHIZUKI ,  Koutarou TAKAHASHI ,  Shuhei YAMAGUCHI

IPC: C07C43/178 ,  G03F1/50 ,  C07C41/14 ,  G03F7/20 ,  G03F7/32 ,  G03F7/038 ,  G03F1/76

CPC classification number: C07C43/1788 ,  C07C41/09 ,  C07C41/14 ,  C07C41/22 ,  C07D239/10 ,  G03F1/50 ,  G03F1/76 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/2059 ,  G03F7/322 ,  G03F7/325 ,  C07C43/23

Abstract: The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R1 and R6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R2 and R5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R3 and R4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R3 and R4 may be bonded to each other to form a ring.

公开(公告)号：US20160070174A1

公开(公告)日：2016-03-10

申请号：US14938061

申请日：2015-11-11

Applicant: FUJIFILM CORPORATION

Inventor： Shuhei YAMAGUCHI ,  Kei YAMAMOTO ,  Shohei KATAOKA

IPC: G03F7/32 ,  G03F7/20 ,  G03F7/038 ,  G03F7/16

CPC classification number: G03F7/325 ,  C08F220/28 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/20

Abstract: Disclosed is a pattern forming method including forming an active light sensitive or radiation sensitive film by coating a substrate with an active light sensitive or radiation sensitive resin composition; exposing the active light sensitive or radiation sensitive film; and forming a negative type pattern by developing the exposed active light sensitive or radiation sensitive film using a developer which includes an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) which includes a repeating unit (a) which has an acidic group and a lactone structure and of which, due to a polarity thereof being increased by an action of an acid, a solubility decreases with respect to a developer which includes an organic solvent.

Abstract translation: 公开了一种图案形成方法，包括通过用活性光敏或辐射敏感性树脂组合物涂布基底来形成活性光敏或辐射敏感膜; 暴露有源光敏或辐射敏感膜; 并使用包括有机溶剂的显影剂，通过显影曝光的有源光敏感或感光膜形成负型图案，其中活性光敏或辐射敏感性树脂组合物含有包含重复单元（a）的树脂（A） ），其具有酸性基团和内酯结构，并且由于其极性由于酸的作用而增加，相对于包含有机溶剂的显影剂，溶解度降低。

公开(公告)号：US20150331314A1

公开(公告)日：2015-11-19

申请号：US14811926

申请日：2015-07-29

Applicant: FUJIFILM CORPORATION

Inventor： Shuhei YAMAGUCHI ,  Takamitsu TOMIGA ,  Fumihiro YOSHINO ,  Hajime FURUTANI ,  Michihiro SHIRAKAWA ,  Mitsuhiro FUJITA

IPC: G03F7/004 ,  C07D409/02 ,  G03F7/32 ,  C07C311/48 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07C311/48 ,  C07C381/12 ,  C07C2601/16 ,  C07D409/02 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a group capable of decomposing by an action of an acid to produce a polar group, (C1) a compound containing a group capable of generating a first acidic functional group upon irradiation with an actinic ray or radiation and a group capable of generating a second acidic functional group different from the first acidic functional group upon irradiation with an actinic ray or radiation, and (C2) at least one compound containing two or more groups selected from the group consisting of the groups capable of generating the structures represented by the specific formulae upon irradiation with an actinic ray or radiation.

Abstract translation: 提供了一种光化射线敏感性或辐射敏感性树脂组合物，其包含：（A）具有能够通过酸的作用分解以产生极性基团的基团的树脂，（C1）含有能够产生的基团的化合物 通过光化射线或辐射照射后的第一酸性官能团和能够产生与光化射线或辐射照射时不同于第一酸性官能团的第二酸性官能团的基团，和（C2）至少一种含有两个 或更多选自由能够产生由光化射线或辐射照射的特定化学式表示的结构的基团组成的组。

公开(公告)号：US20150168830A1

公开(公告)日：2015-06-18

申请号：US14633721

申请日：2015-02-27

Applicant: FUJIFILM CORPORATION

Inventor： Akiyoshi GOTO ,  Akinori SHIBUYA ,  Shohei KATAOKA ,  Shuhei YAMAGUCHI ,  Tomoki MATSUDA ,  Keita KATO

IPC: G03F7/027 ,  G03F7/20 ,  C07D327/06 ,  C07D279/12 ,  G03F7/038 ,  C07D217/08 ,  C07D335/02 ,  C07D333/46 ,  C07C323/21 ,  G03F7/30 ,  C07D411/04

CPC classification number: G03F7/027 ,  C07C309/12 ,  C07C309/19 ,  C07C311/09 ,  C07C323/21 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  C07D217/02 ,  C07D217/08 ,  C07D279/12 ,  C07D285/15 ,  C07D295/067 ,  C07D295/26 ,  C07D319/14 ,  C07D327/02 ,  C07D327/06 ,  C07D333/46 ,  C07D335/02 ,  C07D339/08 ,  C07D411/04 ,  C07D413/04 ,  C07D417/04 ,  C07D493/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by Formula (1): wherein R1 represents a polycyclic aromatic group or a polycyclic heterocyclic aromatic group, R2 represents a (n+2)-valent saturated hydrocarbon group. R3 represents a (m+2)-valent saturated hydrocarbon group, R4 and R5 each independently represent a substituent, Q represents a linking group containing a heteroatom, m and n each independently represent an integer of 0 to 12, when n is 2 or more, R4's may be the same or different, R4's may be linked to each other to form a non-aromatic ring together with R2, when m is 2 or more, R5's may be the same or different, and R5's may be linked to each other to form a non-aromatic ring together with R3, and X− represents a non-nucleophilic anion.

Abstract translation: 提供了含有由式（1）表示的化合物的光化射线敏感或辐射敏感性树脂组合物：其中R1表示多环芳基或多环杂环芳基，R2表示（n + 2）价饱和烃 组。 R3表示（m + 2）价饱和烃基，R4和R5各自独立地表示取代基，Q表示含有杂原子的连接基，m和n各自独立地表示0〜12的整数，n为2或 更多的是，R4可以相同或不同，R4可以彼此连接，与R2一起形成非芳香环，当m为2以上时，R5可以相同或不同，R5可以相互连接 另外与R3一起形成非芳香环，X-表示非亲核阴离子。