中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

48 records (took 0.023 seconds)

    Charged particle beam device
    21.
    发明授权
    Charged particle beam device 有权

    公开(公告)号：US10832890B2

    公开(公告)日：2020-11-10

    申请号：US16364898

    申请日：2019-03-26

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Masato Suzuki ,  Satoshi Tomimatsu ,  Makoto Sato ,  Tatsuya Asahata

    IPC: H01J37/305 ,  H01J37/20

    Abstract: To automatically repeat an operation of isolating a sample piece, which is formed by processing a sample with an ion beam, and transferring the sample piece to a sample piece holder, a charged particle beam device includes a computer configured to perform control so that, without rotating a needle with which the sample piece is fixed to the sample piece holder, a deposition film deposited on the needle is irradiated with a charged particle beam from a charged particle beam irradiation optical system.

    Automatic sample preparation apparatus
    22.
    发明授权
    Automatic sample preparation apparatus 有权

    公开(公告)号：US10677697B2

    公开(公告)日：2020-06-09

    申请号：US16139545

    申请日：2018-09-24

    Applicant: Hitachi High-Tech Science Corporation

    Inventor： Atsushi Uemoto ,  Tatsuya Asahata ,  Makoto Sato ,  Yo Yamamoto

    IPC: H01J27/10 ,  H01J37/18 ,  G01N1/32 ,  G01N1/44 ,  G01N1/28 ,  H01J37/31 ,  H01J37/317

    Abstract: According to one embodiment, an automatic sample preparation apparatus includes: a charged particle beam irradiation optical system configured to perform irradiation with a charged particle beam; a sample stage configured to move with the sample placed thereon; a sample piece transfer device for holding and transferring the sample piece separated and extracted from the sample; a sample piece holder-fixing bed configured to hold a sample piece holder to which the sample piece is transferred; a gas supply portion configured to irradiate gas forming a deposition film with the charged particle beam; and a computer configured to control the charged particle beam irradiation optical system, the sample piece transfer device, and the gas supply portion to transfer and stop the sample piece held by the sample piece transfer device with a gap between the sample piece holder and the sample piece, and connect the sample piece to the sample piece holder.

    Portable information terminal, beam irradiation system, and program
    23.
    发明授权
    Portable information terminal, beam irradiation system, and program 有权

    公开(公告)号：US10485087B2

    公开(公告)日：2019-11-19

    申请号：US15936183

    申请日：2018-03-26

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Takuma Aso ,  Atsushi Uemoto ,  Tatsuya Asahata ,  Masato Suzuki

    IPC: H05H7/00 ,  G21K5/00

    Abstract: A portable information terminal is separated from a charged particle beam irradiation apparatus for performing processing of a sample by irradiating the sample with a charged particle beam. The portable information terminal performs operation of a first operation item at a desired position and includes a display controller causing a display unit to display an image containing a graphical user interface (GUI) capable of operating the first operation item based on operation by a user, the first operation item being one or more operation items among a plurality of items operable in the charged particle beam irradiation apparatus.

    AUTOMATIC SAMPLE PREPARATION APPARATUS
    24.
    发明申请
    AUTOMATIC SAMPLE PREPARATION APPARATUS 审中-公开

    公开(公告)号：US20190025167A1

    公开(公告)日：2019-01-24

    申请号：US16139545

    申请日：2018-09-24

    Applicant: Hitachi High-Tech Science Corporation

    Inventor： Atsushi Uemoto ,  Tatsuya Asahata ,  Makoto Sato ,  Yo Yamamoto

    IPC: G01N1/44 ,  G01N1/28 ,  H01J37/31 ,  H01J37/317

    Abstract: According to one embodiment, an automatic sample preparation apparatus includes: a charged particle beam irradiation optical system configured to perform irradiation with a charged particle beam; a sample stage configured to move with the sample placed thereon; a sample piece transfer device for holding and transferring the sample piece separated and extracted from the sample; a sample piece holder-fixing bed configured to hold a sample piece holder to which the sample piece is transferred; a gas supply portion configured to irradiate gas forming a deposition film with the charged particle beam; and a computer configured to control the charged particle beam irradiation optical system, the sample piece transfer device, and the gas supply portion to transfer and stop the sample piece held by the sample piece transfer device with a gap between the sample piece holder and the sample piece, and connect the sample piece to the sample piece holder.

    Charged particle beam apparatus
    25.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US09318303B2

    公开(公告)日：2016-04-19

    申请号：US14470183

    申请日：2014-08-27

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Xin Man ,  Tatsuya Asahata ,  Atsushi Uemoto

    IPC: H01J37/305 ,  G01Q70/16 ,  H01J37/317 ,  H01J37/20 ,  H01J37/244

    CPC classification number: H01J37/317 ,  H01J37/20 ,  H01J37/244 ,  H01J37/252 ,  H01J37/3056 ,  H01J2237/20214 ,  H01J2237/2067 ,  H01J2237/2445 ,  H01J2237/24585 ,  H01J2237/25 ,  H01J2237/2555 ,  H01J2237/2561

    Abstract: A charged particle beam apparatus includes an electron beam irradiation unit that irradiates a sample with electron beams along a first irradiation axis. A rotation stage holds the sample and has a rotation axis in a direction perpendicular to the first irradiation axis. An ion beam irradiation unit irradiates the sample with ion beams along a second irradiation axis that is substantially parallel to the rotation axis to process the sample into a needle shape. A detection unit detects at least one of charged particles and X rays generated via the sample by the irradiation with the ion beams or the electron beams, and a gaseous ion beam irradiation unit irradiates the sample with gaseous ion beams. A control unit controls the apparatus to incrementally rotate the rotation stage repeatedly by a predetermined angle to rotate the rotation stage by 360° in conjunction with irradiating the entire surface of the needle-shaped sample in a circumferential direction with the gaseous ion beams to remove ions implanted during processing the sample by the ion beams.

    Abstract translation: 带电粒子束装置包括：电子束照射单元，其沿着第一照射轴照射具有电子束的样品。 旋转台保持样品并且在垂直于第一照射轴的方向上具有旋转轴。 离子束照射单元沿着与旋转轴线大致平行的第二照射轴向离子束照射样品，以将样品处理成针状。 检测单元通过用离子束或电子束的照射检测通过样品产生的带电粒子和X射线中的至少一种，气体离子束照射单元用气体离子束照射样品。 控制单元控制装置以使预定角度重复地旋转旋转台，以使旋转台旋转360°，同时用气态离子束沿圆周方向照射针状样品的整个表面以除去离子 在通过离子束处理样品期间植入。

    Composite charged particle beam apparatus and thin sample processing method
    27.
    发明授权
    Composite charged particle beam apparatus and thin sample processing method 有权
    复合带电粒子束装置和薄样品处理方法

    公开(公告)号：US09190243B2

    公开(公告)日：2015-11-17

    申请号：US14012019

    申请日：2013-08-28

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Tatsuya Asahata ,  Hidekazu Suzuki ,  Shota Torikawa

    IPC: H01J37/30 ,  H01J37/02 ,  H01J37/20 ,  H01J37/28

    CPC classification number: H01J37/3005 ,  H01J37/02 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/20207 ,  H01J2237/28 ,  H01J2237/3174 ,  H01J2237/31745 ,  H01J2237/31749

    Abstract: A composite charged particle beam apparatus includes a FIB column for irradiating a thin sample with a FIB and a GIB column for irradiating the thin sample with a GIB. The thin sample is placed on a sample stage, and a tilt unit tilts the thin sample about a tilt axis of the sample stage, the tilt axis being orthogonal to the FIB irradiation axis and being located inside a plane formed by the FIB irradiation axis and the GIB irradiation axis. A tilt sample holder is mounted on the sample stage and fixes the thin sample such that a cross-sectional surface of the thin sample is tilted at a constant angle with respect to the GIB irradiation axis and the azimuth angle of the GIB column can be changed by rotation of the sample stage.

    Abstract translation: 复合带电粒子束装置包括用于用FIB照射薄样品的FIB柱和用于用GIB照射薄样品的GIB柱。 薄样品被放置在样品台上，并且倾斜单元围绕样品台的倾斜轴倾斜薄样品，倾斜轴正交于FIB照射轴并位于由FIB照射轴形成的平面内， GIB辐照轴。 将倾斜样品保持器安装在样品台上并固定薄样品，使得薄样品的横截面相对于GIB照射轴线以一定角度倾斜，并且可以改变GIB柱的方位角 通过样品台的旋转。

    Automatic sample preparation apparatus
    29.
    发明授权
    Automatic sample preparation apparatus 有权

    公开(公告)号：US11835438B2

    公开(公告)日：2023-12-05

    申请号：US17373932

    申请日：2021-07-13

    Applicant: Hitachi High-Tech Science Corporation

    Inventor： Atsushi Uemoto ,  Tatsuya Asahata ,  Makoto Sato ,  Yo Yamamoto

    IPC: G01N1/44 ,  G01N1/28 ,  H01J37/31 ,  H01J37/317

    CPC classification number: G01N1/44 ,  G01N1/28 ,  H01J37/31 ,  H01J37/317

    Abstract: An automatic sample preparation apparatus that automatically prepares a sample piece from a sample and includes a focused ion beam irradiation optical system, an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam, a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample, a detector configured to detect secondary charged particles emitted from an irradiation object, and a computer configured to recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and drive the sample piece transfer device, wherein the image data includes a reference mark.

    Focused ion beam apparatus
    30.
    发明授权
    Focused ion beam apparatus 有权

    公开(公告)号：US11482398B2

    公开(公告)日：2022-10-25

    申请号：US17028488

    申请日：2020-09-22

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Haruyuki Ishii ,  Atsushi Uemoto ,  Tatsuya Asahata

    IPC: H01J37/20 ,  H01J37/28

    Abstract: The focused ion beam apparatus includes: an electron beam column; a focused ion beam column; a sample stage; a coordinate acquisition unit configured to acquire, when a plurality of irradiation positions to which the focused ion beam is to be applied are designated on a sample, plane coordinates of each of the irradiation positions; a movement amount calculation unit configured to calculate, based on the plane coordinates, a movement amount by which the sample stage is to be moved to a eucentric height so that the eucentric height matches an intersection position at which the electron beam and the focused ion beam match each other at each of the irradiation positions; and a sample stage movement control unit configured to move, based on the movement amount, the sample stage to the eucentric height at each of the irradiation positions.

Patent Agency Ranking