公开(公告)号：US08242443B2

公开(公告)日：2012-08-14

申请号：US12860363

申请日：2010-08-20

申请人： Yusuke Ominami ,  Yasuhiro Gunji ,  Yoshiyuki Shichida

发明人： Yusuke Ominami ,  Yasuhiro Gunji ,  Yoshiyuki Shichida

IPC分类号： H01J37/26 ,  H01J37/244

CPC分类号： G01R31/307

摘要： A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.

摘要翻译： 具有噪声减除​​功能的半导体器件检查装置包括电子枪，用于保持样品的级，用于检测从样品放出的信号的主检测器，以及用于检测从样品产生的噪声的至少一个或多个副检测器， 装置，从而可以获得其中从样品或装置中产生的放电引起的噪声从信号中去除的图像。 噪声减除函数从主检测器检测到的信号中减去由副检测器检测到的噪声，以消除或降低信号中的噪声。

公开(公告)号：US08207513B2

公开(公告)日：2012-06-26

申请号：US12615955

申请日：2009-11-10

申请人： Yuko Sasaki ,  Yasuhiro Gunji ,  Zhaohui Cheng

发明人： Yuko Sasaki ,  Yasuhiro Gunji ,  Zhaohui Cheng

IPC分类号： G21K5/10

CPC分类号： H01J37/28 ,  H01J37/153 ,  H01J37/21 ,  H01J37/222 ,  H01J37/265 ,  H01J2237/141 ,  H01J2237/1532 ,  H01J2237/21 ,  H01J2237/221 ,  H01J2237/2817

摘要： A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.

摘要翻译： 提供具有高分辨率和宽扫描区域（观察视场）的带电粒子束装置。 该装置具有用于调节焦点的单元，用于调节散光的单元，用于控制和检测扫描位置的单元，以及控制器，用于与扫描位置互锁地控制焦点调节和像散调整，由此确保相容性 在高分辨率和广域的观察视野之间。

公开(公告)号：US07348558B2

公开(公告)日：2008-03-25

申请号：US11404610

申请日：2006-04-13

申请人： Masahiro Watanabe ,  Hiroyuki Shinada ,  Atsuko Takafuji ,  Masami Iizuka ,  Yasuhiro Gunji ,  Kouichi Hayakawa ,  Masayoshi Takeda

发明人： Masahiro Watanabe ,  Hiroyuki Shinada ,  Atsuko Takafuji ,  Masami Iizuka ,  Yasuhiro Gunji ,  Kouichi Hayakawa ,  Masayoshi Takeda

IPC分类号： G01N23/00

CPC分类号： G01R31/307 ,  H01J37/153 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/2817

摘要： According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.

摘要翻译： 根据本发明，用于自动调整带电粒子束装置中的像散的技术。 根据本发明的实施例可以提供一种带电粒子束装置和自动像散调节方法，其能够通过在多个像散校正量和焦点校正量中找到多个像散校正量和焦点校正量来在相对短的时间段内自动校正散光和焦点 来自相对较少数量的二维图像的单一操作。 具体实施例可以执行这种自动聚焦，同时最小化对受试样品造成的损害。 实施例包括用于通过使用带电粒子束来进行检查，测量和以相对高的精度制造的带电粒子光学系统。

公开(公告)号：US07030394B2

公开(公告)日：2006-04-18

申请号：US10980096

申请日：2004-11-02

申请人： Masahiro Watanabe ,  Hiroyuki Shinada ,  Atsuko Takafuji ,  Masami Iizuka ,  Yasuhiro Gunji ,  Kouichi Hayakawa ,  Masayoshi Takeda

发明人： Masahiro Watanabe ,  Hiroyuki Shinada ,  Atsuko Takafuji ,  Masami Iizuka ,  Yasuhiro Gunji ,  Kouichi Hayakawa ,  Masayoshi Takeda

IPC分类号： G01B11/00

CPC分类号： G01R31/307 ,  H01J37/153 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/2817

摘要： According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.

摘要翻译： 根据本发明，用于自动调整带电粒子束装置中的像散的技术。 根据本发明的实施例可以提供一种带电粒子束装置和自动像散调节方法，其能够通过在多个像散校正量和焦点校正量中找到多个像散校正量和焦点校正量来在相对短的时间段内自动校正散光和焦点 来自相对较少数量的二维图像的单一操作。 具体实施例可以执行这种自动聚焦，同时最小化对受试样品造成的损害。 实施例包括用于通过使用带电粒子束来进行检查，测量和以相对高的精度制造的带电粒子光学系统。

公开(公告)号：US20060076490A1

公开(公告)日：2006-04-13

申请号：US11234313

申请日：2005-09-26

申请人： Yasuhiro Gunji ,  Taku Ninomiya ,  Ryuichi Funatsu ,  Yoshikazu Inada ,  Kenjirou Yamamoto ,  Mari Nozoe

发明人： Yasuhiro Gunji ,  Taku Ninomiya ,  Ryuichi Funatsu ,  Yoshikazu Inada ,  Kenjirou Yamamoto ,  Mari Nozoe

IPC分类号： G21K7/00

CPC分类号： G01R31/305 ,  H01J37/222 ,  H01J37/244 ,  H01J37/268 ,  H01J37/28 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594 ,  H01J2237/2817

摘要： An inspection method and an inspection apparatus using an electron beam enabling more detailed and quantitative evaluation at a high throughput level. The method comprises the steps of irradiating, based on previously prepared information concerning a defect position on the surface of a sample, the defect and its vicinity with an electron beam a plurality of times at predetermined intervals; detecting an electron signal secondarily generated from the sample surface by the electron beam; imaging an electron signal detected by the previously specified n-th or later electron beam irradiation; and measuring the resistance or a leakage amount of the defective portion of the sample surface in accordance with the degree of charge relaxation by monitoring the charge relaxation state of the sample surface based on the electron beam image information.

摘要翻译： 使用电子束的检查方法和检查装置能够在高通量水平下进行更详细和定量的评估。 该方法包括以预定间隔以电子束多次照射预先准备的关于样品表面上的缺陷位置的信息，缺陷及其附近的信息的步骤; 通过电子束检测从样品表面二次产生的电子信号; 对由先前指定的第n或更晚的电子束照射检测的电子信号成像; 并且通过基于电子束图像信息监测样品表面的电荷弛豫状态，根据电荷弛豫程度来测量样品表面的缺陷部分的电阻或泄漏量。

公开(公告)号：US20060060781A1

公开(公告)日：2006-03-23

申请号：US11114203

申请日：2005-04-26

申请人： Masahiro Watanabe ,  Masayoshi Takeda ,  Koichi Hayakawa ,  Yasuhiro Gunji

发明人： Masahiro Watanabe ,  Masayoshi Takeda ,  Koichi Hayakawa ,  Yasuhiro Gunji

IPC分类号： G21K7/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/15 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/2482 ,  H01J2237/31793 ,  H01J2237/31798

摘要： Charged-particle beam arrangements (e.g., apparatus and methods) for automatically correcting astigmatism and for height detection.

摘要翻译： 用于自动校正像散和高度检测的带电粒子束布置（例如，装置和方法）。

公开(公告)号：US20050263703A1

公开(公告)日：2005-12-01

申请号：US11176344

申请日：2005-07-08

申请人： Takashi Hiroi ,  Asahiro Kuni ,  Masahiro Watanabe ,  Chie Shishido ,  Hiroyuki Shinada ,  Yasuhiro Gunji ,  Atsuko Takafuji

发明人： Takashi Hiroi ,  Asahiro Kuni ,  Masahiro Watanabe ,  Chie Shishido ,  Hiroyuki Shinada ,  Yasuhiro Gunji ,  Atsuko Takafuji

IPC分类号： G01N23/04 ,  G01N23/20 ,  G01N23/225 ,  G01Q30/04 ,  G02F1/13 ,  G06T1/00 ,  G21K7/00 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/2817

摘要： A pattern inspection method and apparatus in which a charged particle beam is irradiated onto a surface of a specimen on which a pattern is formed, plural sensors simultaneously detect secondary particles emanated from the surface of the specimen by the irradiation, signals outputted from each sensor of the plural sensors which simultaneously detect the secondary particles are added, an image of the surface of the specimen on which the pattern is obtained from the added signals, and the image is processed to detect a defect of the pattern.

摘要翻译： 一种图案检查方法和装置，其中带电粒子束照射到形成有图案的样本的表面上，多个传感器同时检测通过照射从样品表面发出的二次颗粒，从每个传感器输出的信号 添加同时检测二次粒子的多个传感器，从附加的信号中添加从其获得图案的样本的表面的图像，并且处理图像以检测图案的缺陷。

公开(公告)号：US20050092930A1

公开(公告)日：2005-05-05

申请号：US10980096

申请日：2004-11-02

申请人： Masahiro Watanabe ,  Hiroyuki Shinada ,  Atsuko Takafuji ,  Masami Lizuka ,  Yasuhiro Gunji ,  Kouichi Hayakawa ,  Masayoshi Takeda

发明人： Masahiro Watanabe ,  Hiroyuki Shinada ,  Atsuko Takafuji ,  Masami Lizuka ,  Yasuhiro Gunji ,  Kouichi Hayakawa ,  Masayoshi Takeda

IPC分类号： G01R31/307 ,  H01J37/153 ,  G01K1/08 ,  G21K5/10 ,  H01J3/14 ,  H01J3/26 ,  H01J37/08

CPC分类号： G01R31/307 ,  H01J37/153 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/2817

摘要： According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.

摘要翻译： 根据本发明，用于自动调整带电粒子束装置中的像散的技术。 根据本发明的实施例可以提供一种带电粒子束装置和自动像散调节方法，其能够通过在多个像散校正量和焦点校正量中找到多个像散校正量和焦点校正量来在相对短的时间段内自动校正散光和焦点 来自相对较少数量的二维图像的单一操作。 具体实施例可以执行这种自动聚焦，同时最小化对受试样品造成的损害。 实施例包括用于通过使用带电粒子束来进行检查，测量和以相对高的精度制造的带电粒子光学系统。

公开(公告)号：US08086022B2

公开(公告)日：2011-12-27

申请号：US12179272

申请日：2008-07-24

申请人： Hiroshi Miyai ,  Yusuke Ominami ,  Yasuhiro Gunji

发明人： Hiroshi Miyai ,  Yusuke Ominami ,  Yasuhiro Gunji

IPC分类号： G06K9/00 ,  G06K9/40 ,  G01N23/00

CPC分类号： G01N23/225 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/24495 ,  H01J2237/2487 ,  H01J2237/2817

摘要： An inspection system uses a scanning electron microscope that detects a high-precision electron beam image, and at the same time removes restrictions for a low sampling rate. A sampled signal is obtained by sampling an analog brightness signal generated by a secondary electron detector at a predetermined sampling rate, and contiguous digital values contained in the sampled signal are added on an N by N digital value basis to generate a digital brightness signal whose frequency is equal to 1/N of the sampling frequency. Each, digital value contained in the digital brightness signal is divided by N to generate a digital signal made of digital values having a number of bits equal to that of the sampled signal and to generate an image signal in which each digital value of the digital signal forms one pixel data.

摘要翻译： 检查系统使用检测高精度电子束图像的扫描电子显微镜，同时消除对低采样率的限制。 通过以预定的采样率对由二次电子检测器产生的模拟亮度信号进行采样来获得采样信号，并且以N×N数值为基础相加在采样信号中包含的连续数字值，以产生数字亮度信号，其频率 等于采样频率的1 / N。 将包含在数字亮度信号中的每个数字值除以N，以产生由具有与采样信号的位数相等的位数的数字值构成的数字信号，并产生其中数字信号的每个数字值 形成一个像素数据。

公开(公告)号：US07999565B2

公开(公告)日：2011-08-16

申请号：US12348586

申请日：2009-01-05

申请人： Yasuhiro Gunji ,  Hiroshi Miyai ,  Shigeya Tanaka

发明人： Yasuhiro Gunji ,  Hiroshi Miyai ,  Shigeya Tanaka

IPC分类号： G01R31/305

CPC分类号： G01N23/203 ,  G01N23/2251 ,  G01N2223/3302 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2817

摘要： A visual inspection apparatus and method using the scanning electron microscope are disclosed. An electron beam is scanned repeatedly on a sample, and an inspection and a reference image are generated by the secondary electrons generated from the sample or reflected electrons. From the differential image between the inspection image and the reference image, a defect is determined. The number of pixels in the generated image along the direction of repetitive scanning by the electron beam can be changed.

摘要翻译： 公开了使用扫描电子显微镜的目视检查装置和方法。 在样品上重复扫描电子束，并且由从样品或反射电子产生的二次电子产生检查和参考图像。 根据检查图像与参考图像之间的差分图像，确定缺陷。 可以改变沿电子束的重复扫描方向产生的图像中的像素数。