Doherty amplifier circuits
    22.
    发明授权

    公开(公告)号:US10050588B2

    公开(公告)日:2018-08-14

    申请号:US15596416

    申请日:2017-05-16

    Applicant: NXP B.V.

    Abstract: A Doherty amplifier circuit comprising: a splitter having: a splitter-input-terminal for receiving an input signal; a main-splitter-output-terminal; and a peaking-splitter-output-terminal; a main-power-amplifier having a main-power-input-terminal and a main-power-output-terminal, wherein; the main-power-input-terminal is connected to the main-splitter-output-terminal; and the main-power-output-terminal is configured to provide a main-power-amplifier-output-signal; a peaking-power-amplifier having a peaking-power-input-terminal and a peaking-power-output-terminal, wherein: the peaking-power-input-terminal is connected to the peaking-splitter-output-terminal; and the peaking-power-output-terminal is configured to provide a peaking-power-amplifier-output-signal. The splitter, the main-power-amplifier and the peaking-power-amplifier are provided by means of an integrated circuit.

    Bipolar transistor
    23.
    发明授权
    Bipolar transistor 有权
    双极晶体管

    公开(公告)号:US09570546B2

    公开(公告)日:2017-02-14

    申请号:US14852385

    申请日:2015-09-11

    Applicant: NXP B.V.

    Abstract: A semiconductor device comprising a bipolar transistor and a method of making the same. A power amplifier including a bipolar transistor. The bipolar transistor includes a collector including a laterally extending drift region. The also includes a base located above the collector. The bipolar transistor further includes an emitter located above the base. The bipolar transistor also includes a doped region having a conductivity type that is different to that of the collector. The doped region extends laterally beneath the collector to form a junction at a region of contact between the doped region and the collector. The doped region has a non-uniform lateral doping profile. A doping level of the doped region is highest in a part of the doped region closest to a collector-base junction of the bipolar transistor.

    Abstract translation: 一种包括双极晶体管的半导体器件及其制造方法。 一种功率放大器,包括双极晶体管。 双极晶体管包括具有横向延伸漂移区的集电极。 还包括位于收集器上方的基座。 双极晶体管还包括位于基极上方的发射极。 双极晶体管还包括具有不同于集电极的导电类型的掺杂区域。 掺杂区域在集电极下方横向延伸以在掺杂区域和集电极之间的接触区域处形成结。 掺杂区域具有非均匀的横向掺杂分布。 在最接近双极晶体管的集电极 - 基极结的掺杂区域的一部分中,掺杂区域的掺杂水平最高。

    Method of manufacturing IC comprising a bipolar transistor and IC
    25.
    发明授权
    Method of manufacturing IC comprising a bipolar transistor and IC 有权
    制造包括双极晶体管和IC的IC的方法

    公开(公告)号:US09431524B2

    公开(公告)日:2016-08-30

    申请号:US14524365

    申请日:2014-10-27

    Applicant: NXP B.V.

    Abstract: Disclosed is a method of manufacturing an integrated circuit comprising a bipolar transistor, the method comprising providing a substrate (10) comprising a pair of first isolation regions (12) separated from each other by an active region (11) comprising a collector impurity said bipolar transistor; forming a base layer stack (14, 14′) over said substrate; forming a further stack of a migration layer (15) having a first migration temperature and an etch stop layer (20) over said base layer stack (14); forming a base contact layer (16) having a second migration temperature over the further stack, the second migration temperature being higher than the first migration temperature; etching an emitter window (28) in the base contact layer over the active region, said etching step terminating at the etch stop layer; at least partially removing the etch stop layer, thereby forming cavities (29) extending from the emitter window in between the base contact layer and the redistribution layer; and exposing the resultant structure to the first migration temperature in a hydrogen atmosphere, thereby filling the cavities with the migration layer material. An IC comprising such a bipolar transistor is also disclosed.

    Abstract translation: 公开了一种制造包括双极晶体管的集成电路的方法,所述方法包括提供包括一对第一隔离区(12)的衬底(10),所述第一隔离区(12)通过包含集电极杂质的有源区(11)彼此分离,所述有源区 晶体管 在所述衬底上形成基层叠层(14,14'); 在所述基层堆叠(14)上方形成具有第一迁移温度和蚀刻停止层(20)的迁移层(15)的另一叠层; 形成具有超过另一堆叠的第二迁移温度的基底接触层(16),所述第二迁移温度高于所述第一迁移温度; 在所述有源区上蚀刻所述基极接触层中的发射极窗口(28),所述蚀刻步骤终止于所述蚀刻停止层; 至少部分地去除所述蚀刻停止层,从而形成从所述基底接触层和所述再分布层之间的所述发射窗延伸的空腔(29) 并在氢气氛中将所得结构暴露于第一迁移温度,由此用迁移层材料填充空腔。 还公开了包括这种双极晶体管的IC。

    Bipolar transistor manufacturing method, bipolar transistor and integrated circuit
    27.
    发明授权
    Bipolar transistor manufacturing method, bipolar transistor and integrated circuit 有权
    双极晶体管制造方法,双极晶体管和集成电路

    公开(公告)号:US08946042B2

    公开(公告)日:2015-02-03

    申请号:US14177880

    申请日:2014-02-11

    Applicant: NXP B.V.

    CPC classification number: H01L29/732 H01L29/66242 H01L29/7378

    Abstract: Disclosed is a method of manufacturing a bipolar transistor, comprising providing a substrate (10) comprising a first isolation region (12) separated from a second isolation region by an active region (11) comprising a collector impurity; forming a layer stack over said substrate, said layer stack comprising a base layer (14, 14′), a silicon capping layer (15) over said base layer and a silicon-germanium (SiGe) base contact layer (40) over said silicon capping layer; etching the SiGe base contact layer to form an emitter window (50) over the collector impurity, wherein the silicon emitter cap layer is used as etch stop layer; forming sidewall spacers (22) in the emitter window; and filling the emitter window with an emitter material (24). A bipolar transistor manufactured in accordance with this method and an IC comprising one or more of such bipolar transistors are also disclosed.

    Abstract translation: 公开了一种制造双极晶体管的方法,包括提供包括通过包括集电极杂质的有源区(11)与第二隔离区分离的第一隔离区(12)的衬底(10) 在所述衬底上形成层堆叠,所述层堆叠包括在所述基底层上方的基底层(14,14'),硅覆盖层(15)和位于所述硅上的硅 - 锗(SiGe)基底接触层(40) 盖层; 蚀刻SiGe基极接触层以在集电极杂质上形成发射极窗口(50),其中硅发射极盖层用作蚀刻停止层; 在发射器窗口中形成侧壁间隔物(22); 以及用发射体材料(24)填充发射器窗口。 还公开了根据该方法制造的双极晶体管和包括一个或多个这样的双极晶体管的IC。

    METHOD OF MANUFACTURING A BIPOLAR TRANSISTOR, BIPOLAR TRANSISTOR AND INTEGRATED CIRCUIT
    30.
    发明申请
    METHOD OF MANUFACTURING A BIPOLAR TRANSISTOR, BIPOLAR TRANSISTOR AND INTEGRATED CIRCUIT 有权
    制造双极晶体管,双极晶体管和集成电路的方法

    公开(公告)号:US20140327110A1

    公开(公告)日:2014-11-06

    申请号:US14259550

    申请日:2014-04-23

    Applicant: NXP B.V.

    Abstract: Consistent with an example embodiment, a bipolar transistor comprises an emitter region vertically separated from a collector region in a substrate by a base region. The bipolar transistor further comprises a field plate electrically connected to the emitter region; the field plate extends from the emitter region along the base region into the collector region and the field plate is laterally electrically insulated from the base region and the collector region by a spacer. The spacer comprises an electrically isolating material that includes a silicon nitride layer and is vertically electrically isolated from the substrate by a further electrically isolating material.

    Abstract translation: 与示例实施例一致,双极晶体管包括通过基极区域与衬底中的集电极区域垂直分离的发射极区域。 双极晶体管还包括电连接到发射极区的场板; 场板沿着基极区域从发射极区域延伸到集电极区域,并且场板通过间隔物与基极区域和集电极区域横向电绝缘。 间隔物包括电绝缘材料,其包括氮化硅层,并通过另外的电绝缘材料与衬底垂直电隔离。

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