公开(公告)号：US08961853B2

公开(公告)日：2015-02-24

申请号：US13375361

申请日：2010-06-04

Applicant: Chad A. Mirkin ,  Wooyoung Shim ,  Adam B. Braunschweig ,  Xing Liao ,  Jinan Chai ,  Jong Kuk Lim ,  Gengfeng Zheng ,  Zijian Zheng

Inventor： Chad A. Mirkin ,  Wooyoung Shim ,  Adam B. Braunschweig ,  Xing Liao ,  Jinan Chai ,  Jong Kuk Lim ,  Gengfeng Zheng ,  Zijian Zheng

IPC: B29C59/02 ,  G03F7/00 ,  B81C1/00 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G03F7/0002 ,  B81B2203/0361 ,  B81B2207/056 ,  B81C1/00111 ,  B81C1/0046 ,  B81C2201/0154 ,  B81C2201/0185 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/732

Abstract: Disclosed are methods of lithography using a tip array having a plurality of pens attached to a backing layer, where the tips can comprise a metal, metalloid, and/or semi-conducting material, and the backing layer can comprise an elastomeric polymer. The tip array can be used to perform a lithography process in which the tips are coated with an ink (e.g., a patterning composition) that is deposited onto a substrate upon contact of the tip with the substrate surface. The tips can be easily leveled onto a substrate and the leveling can be monitored optically by a change in light reflection of the backing layer and/or near the vicinity of the tips upon contact of the tip to the substrate surface.

Abstract translation: 公开了使用具有连接到背衬层的多个笔的尖端阵列的光刻方法，其中尖端可以包括金属，准金属和/或半导电材料，并且背衬层可以包括弹性体聚合物。 尖端阵列可用于执行光刻工艺，其中尖端涂覆有当尖端与衬底表面接触时沉积到衬底上的油墨（例如，图案化组合物）。 尖端可以容易地平整到基底上，并且可以通过背衬层的光反射的变化和/或在尖端与基底表面接触时靠近尖端附近来光学地监测流平。

公开(公告)号：US08828520B2

公开(公告)日：2014-09-09

申请号：US12165880

申请日：2008-07-01

Applicant: Cristian A. Bolle ,  Flavio Pardo

Inventor： Cristian A. Bolle ,  Flavio Pardo

IPC: B32B3/00 ,  B81C1/00

CPC classification number: H01L21/30604 ,  B81B2201/047 ,  B81B2203/0118 ,  B81B2203/0307 ,  B81B2203/0361 ,  B81B2203/0384 ,  B81B2207/056 ,  B81C1/00015 ,  B81C1/00039 ,  B81C1/00531 ,  B81C1/00539 ,  H01L21/3065 ,  Y10T428/24479

Abstract: As discussed herein, there is presented an apparatus comprising micro-posts. The apparatus includes a substrate having a planar surface, a plurality of micro-posts located on the planar surface, wherein each micro-post has a base portion on the planar surface and a post portion located on a top surface of the corresponding base portion, and wherein side surfaces of the base portions intersect the planar surface at oblique angles.

Abstract translation: 如本文所讨论的，提供了一种包括微柱的装置。 该装置包括具有平坦表面的基底，位于平坦表面上的多个微柱，其中每个微柱在平坦表面上具有基部，并且位于相应基部的顶表面上的柱部分， 并且其中所述基部的侧表面以倾斜角与所述平坦表面相交。

公开(公告)号：US08691362B2

公开(公告)日：2014-04-08

申请号：US13738844

申请日：2013-01-10

Applicant: Alcatel-Lucent USA Inc.

Inventor： Joanna Aizenberg ,  Thomas N. Krupenkin ,  Oleksandr Sydorenko ,  Joseph Ashley Taylor

IPC: C09D5/00

CPC classification number: C09D5/00 ,  B81B3/0089 ,  B81B2201/06 ,  B81B2203/0361 ,  B82Y30/00 ,  Y10T428/24 ,  Y10T428/24174 ,  Y10T428/24273 ,  Y10T428/24355 ,  Y10T428/24496 ,  Y10T428/24612 ,  Y10T428/2462 ,  Y10T428/31511 ,  Y10T428/31663

Abstract: An apparatus includes a substrate having a top surface, a substantially regular array of raised structures located over the top surface, and a layer located on the top surface between the structures. Distal surfaces of the structures are farther from the top surface than remaining portions of the structures. The layer is able to contract such that the distal surfaces of the structures protrude through the layer. The layer is able to swell such that the distal surfaces of the structures are closer to the top surface of the substrate than one surface of the layer.

Abstract translation: 一种装置包括具有顶表面，位于顶表面上方的基本上规则的凸起结构阵列的基底和位于结构之间的顶表面上的层。 结构的远端表面比结构的剩余部分远离顶表面。 该层能够收缩，使得结构的远端表面突出穿过该层。 该层能够膨胀，使得结构的远端表面比该层的一个表面更靠近衬底的顶表面。

公开(公告)号：US20140001432A1

公开(公告)日：2014-01-02

申请号：US13539070

申请日：2012-06-29

Applicant: Mark D. Hall ,  Mehul D. Shroff

Inventor： Mark D. Hall ,  Mehul D. Shroff

IPC: H01L21/02 ,  H01L29/66 ,  B82Y40/00

CPC classification number: H01L29/0676 ,  B60C23/00 ,  B81B1/00 ,  B81B2203/0361 ,  B82Y20/00 ,  B82Y30/00 ,  B82Y40/00 ,  G01L9/06 ,  G01N33/0031 ,  G02B6/107 ,  G02B6/126 ,  G02B2006/12097 ,  H01L21/3086 ,  H01L29/0665 ,  H01L29/66 ,  H01L33/18 ,  H01L41/1132 ,  H01L43/02

Abstract: A disclosed method of fabricating a hybrid nanopillar device includes forming a mask on a substrate and a layer of nanoclusters on the hard mask. The hard mask is then etched to transfer a pattern formed by the first layer of nanoclusters into a first region of the hard mask. A second nanocluster layer is formed on the substrate. A second region of the hard mask overlying a second region of the substrate is etched to create a second pattern in the hard mask. The substrate is then etched through the hard mask to form a first set of nanopillars in the first region of the substrate and a second set of nanopillars in the second region of the substrate. By varying the nanocluster deposition steps between the first and second layers of nanoclusters, the first and second sets of nanopillars will exhibit different characteristics.

Abstract translation: 公开的制造混合纳米柱装置的方法包括在基底上形成掩模和硬掩模上的纳米团簇层。 然后蚀刻硬掩模以将由第一层纳米团簇形成的图案转移到硬掩模的第一区域中。 在基板上形成第二纳米团簇层。 蚀刻覆盖衬底的第二区域的硬掩模的第二区域，以在硬掩模中产生第二图案。 然后将衬底通过硬掩模蚀刻以在衬底的第一区域中形成第一组纳米柱，并在衬底的第二区域中形成第二组纳米柱。 通过改变第一和第二层纳米团簇之间的纳米团簇沉积步骤，第一组和第二组纳米颗粒将呈现不同的特征。

公开(公告)号：US20130309451A1

公开(公告)日：2013-11-21

申请号：US13951180

申请日：2013-07-25

Applicant: LG CHEM, LTD.

Inventor： Tae-Su KIM ,  Hyeon CHOI ,  Bu-Gon SHIN ,  Jae-Jin KIM ,  Jong-Byung LEE ,  Su-Jin KIM

IPC: C03C15/00

CPC classification number: C03C15/00 ,  B81B2203/0361 ,  B81C1/00206 ,  Y10T428/24355

Abstract: There is provided a superhydrophobic substrate comprising a plurality of protrusions having a pseudo random distribution on one surface thereof, an average interval between respective protrusions among the plurality of protrusions being greater than an interval between light beam wave peaks of light within the visible spectrum, allowing the substrate to have durability and transparency secured therein.

Abstract translation: 提供了一种超疏水性基板，其包括在其一个表面上具有伪随机分布的多个突起，多个突起之间的各个突起之间的平均间隔大于可见光谱内的光束波峰之间的间隔，允许 该基底具有固定在其中的耐久性和透明性。

公开(公告)号：US08524092B2

公开(公告)日：2013-09-03

申请号：US12448243

申请日：2007-12-14

Applicant: Metin Sitti ,  Seok Kim

Inventor： Metin Sitti ,  Seok Kim

IPC: C25F3/00

CPC classification number: C09J7/00 ,  A44B18/0049 ,  B29C33/3842 ,  B29C33/424 ,  B29C33/52 ,  B29C39/34 ,  B29C39/36 ,  B29C39/42 ,  B29L2031/756 ,  B81B2203/0361 ,  B81C99/0085 ,  B81C2201/034 ,  C09J9/00 ,  C09J2201/626 ,  Y10T428/23957 ,  Y10T428/2933 ,  Y10T428/2935 ,  Y10T428/2976

Abstract: A dry adhesive and a method of forming a dry adhesive. The method includes forming an opening through an etch layer and to a barrier layer, expanding the opening in the etch layer at the barrier layer, filling the opening with a material, removing the barrier layer from the material in the opening, and removing the etch layer from the material in the opening.

Abstract translation: 干燥粘合剂和形成干燥粘合剂的方法。 该方法包括通过蚀刻层和阻挡层形成开口，在阻挡层处扩展蚀刻层中的开口，用材料填充开口，从开口中的材料移除阻挡层，以及去除蚀刻 从开口的材料层。

公开(公告)号：US20120286402A1

公开(公告)日：2012-11-15

申请号：US13105910

申请日：2011-05-12

Applicant: Chin-Te Kuo ,  Yi-Nan Chen ,  Hsien-Wen Liu

Inventor： Chin-Te Kuo ,  Yi-Nan Chen ,  Hsien-Wen Liu

IPC: H01L29/06 ,  H01L21/302 ,  H01L23/48

CPC classification number: H01L21/0337 ,  B81B2203/0361 ,  B81B2203/0392 ,  B81C1/00103 ,  H01L21/0338 ,  H01L21/28123

Abstract: A cuboidal protuberant structure is provided. The cuboidal protuberant structure includes a substrate and a protrusion disposed on the substrate. The protrusion has a vertical side wall with a rounded corner, a protuberant width and a protuberant length. At least one of the protuberant width and the protuberant length is not greater than 33 nm.

Abstract translation: 提供立方形隆起结构。 立方体隆起结构包括基板和设置在基板上的突起。 突起具有垂直侧壁，其具有圆角，突出宽度和突出长度。 突出宽度和突出长度中的至少一个不大于33nm。

公开(公告)号：US20120225243A1

公开(公告)日：2012-09-06

申请号：US13470459

申请日：2012-05-14

Applicant: Dan B. Millward

Inventor： Dan B. Millward

IPC: B32B7/00 ,  B32B3/30

CPC classification number: H01L21/3086 ,  B81B2203/0361 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0337 ,  H01L21/76879 ,  H01L23/544 ,  H01L2924/0002 ,  Y10T428/24182 ,  Y10T428/24612 ,  H01L2924/00

Abstract: Methods for fabricating sublithographic, nanoscale arrays of openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. Embodiments of the invention use a self-templating or multilayer approach to induce ordering of a self-assembling block copolymer film to an underlying base film to produce a multilayered film having an ordered array of nanostructures that can be removed to provide openings in the film which, in some embodiments, can be used as a template or mask to etch openings in an underlying material layer.

Abstract translation: 提供了使用自组装嵌段共聚物制造亚光刻，纳米级开口阵列和线性微通道的方法，以及由这些方法形成的膜和器件。 本发明的实施方案使用自模板或多层方法来诱导自组装嵌段共聚物膜对下面的基底膜的排序，以产生具有可排除以在膜中提供开口的纳米结构的有序阵列的多层膜， 在一些实施例中，可以用作模板或掩模来蚀刻下层材料层中的开口。

公开(公告)号：US20120145988A1

公开(公告)日：2012-06-14

申请号：US13146880

申请日：2009-01-29

Applicant: Nathaniel J. Quitoriano ,  Theodore I. Kamins

Inventor： Nathaniel J. Quitoriano ,  Theodore I. Kamins

IPC: H01L29/06 ,  H01L21/20 ,  B82Y99/00 ,  B82Y40/00

CPC classification number: B81C1/0015 ,  B81B2203/0118 ,  B81B2203/0361

Abstract: A nanoscale apparatus (100) includes a nanoshell (110) extending from a substrate (102) and an epitaxial connection (120) between the substrate and an end (112) of the nanoshell adjacent to the substrate. A nanoscale sensor (200) includes surfaces (204, 206) extending relatively perpendicular to each other, a nanoshell (210) extending from one of the surfaces, and a detector (220) that monitors motion of the nanoshell relative to another of the surfaces spaced from the nanoshell by a gap (208). A method (300) of making a nanoscale apparatus includes growing (310) a nanowire on a surface; forming (320) a core-shell composite nanostructure; exposing (330) an end of the nanowire opposite to the surface with a FIB; and removing (340) the nanowire core from the exposed end, such that a nanoshell having a hollow region is attached to the surface. A material of the nanoshell (110, 210) excludes sp2-bonded carbon materials.

Abstract translation: 纳米尺度装置（100）包括从衬底（102）延伸的纳米壳（110）和衬底之间的外延连接（120）和与衬底相邻的纳米壳的端部（112）。 纳米尺度传感器（200）包括彼此相对垂直延伸的表面（204,206），从其中一个表面延伸的纳米壳（210）以及监测纳米壳相对于另一表面的运动的检测器（220） 与纳米壳间隔开间隙（208）。 制造纳米级装置的方法（300）包括在表面上生长（310）纳米线; 形成（320）核 - 壳复合纳米结构; 用FIB将（330）与该表面相对的纳米线的一端暴露（330） 以及从所述暴露端去除（340）所述纳米线芯，使得具有中空区域的纳米壳附接到所述表面。 纳米壳（110,210）的材料不包括sp2结合的碳材料。

公开(公告)号：US08148264B2

公开(公告)日：2012-04-03

申请号：US12711992

申请日：2010-02-24

Applicant: Michael D. Henry ,  Andrew P. Homyk ,  Axel Scherer ,  Sameer Walavalkar

Inventor： Michael D. Henry ,  Andrew P. Homyk ,  Axel Scherer ,  Sameer Walavalkar

IPC: H01L21/44 ,  H01L29/40

CPC classification number: B81C1/00111 ,  B01J19/0046 ,  B01J2219/00504 ,  B01J2219/00664 ,  B81B1/006 ,  B81B2203/0361 ,  B81B2207/056 ,  B81C2201/0112 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2201/0159 ,  G01N1/405 ,  H01L21/3065 ,  H01L21/30655 ,  H01L21/3081 ,  H01L21/3086 ,  Y10T436/25375

Abstract: Methods for fabrication of high aspect ratio micropillars and nanopillars are described. Use of alumina as an etch mask for the fabrication methods is also described. The resulting micropillars and nanopillars are analyzed and a characterization of the etch mask is provided.

Abstract translation: 描述了用于制造高纵横比微柱和纳米柱的方法。 还描述了使用氧化铝作为制造方法的蚀刻掩模。 分析所得到的微柱和纳米柱，并提供蚀刻掩模的表征。