公开(公告)号：US20130187058A1

公开(公告)日：2013-07-25

申请号：US13648887

申请日：2012-10-10

Applicant: FEI COMPANY

Inventor： Lynwood W. Swanson ,  Gregory A. Schwind ,  Sean Kellogg ,  Kun Liu

IPC: G01T1/29

CPC classification number: H01J37/00 ,  G01T1/29 ,  H01J37/02 ,  H01J37/073 ,  H01J2237/06316 ,  H01J2237/06341 ,  H01J2237/065

Abstract: The state of an emitter can be determined by measurements of how the current changes with the extraction voltage. A field factor β function is determined by series of relatively simple measurements of charged particles emitted at different conditions. The field factor can then be used to determine derived characteristics of the emission that, in the prior art, were difficult to determine without removing the source from the focusing column and mounting it in a specialized apparatus. The relations are determined by the source configuration and have been found to be independent of the emitter shape, and so emission character can be determined as the emitter shape changes over time, without having to determine the emitter shape and without having to redefine the relation between the field factor and the series of relatively simple measurements, and the relationships between the field factor and other emission parameters.

Abstract translation: 发射极的状态可以通过测量电流如何随提取电压而变化来确定。 场因子β函数由在不同条件下发射的带电粒子的一系列相对简单的测量来确定。 然后可以使用场因子来确定发射的导出特性，在现有技术中难以确定，而不需要从聚焦柱移除源并将其安装在专门的装置中。 关系由源配置确定，并且已经被发现与发射体形状无关，因此发射体形状随着时间的推移而被确定，而不必确定发射体形状，而不必重新定义发射体形状之间的关系 场因子和一系列相对简单的测量，以及场因子与其他发射参数之间的关系。

公开(公告)号：US08330344B2

公开(公告)日：2012-12-11

申请号：US12586792

申请日：2009-09-28

Applicant: Hiroshi Yasuda ,  Takeshi Haraguchi ,  Hiroshi Shimoyama ,  Hidekazu Murata

Inventor： Hiroshi Yasuda ,  Takeshi Haraguchi ,  Hiroshi Shimoyama ,  Hidekazu Murata

IPC: H01J29/50 ,  H01J29/00

CPC classification number: H01J37/063 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/06316 ,  H01J2237/06375 ,  H01J2237/065

Abstract: An electron gun includes: an electron source; an accelerating electrode; an extraction electrode for extracting electrons from an electron emission surface of the electron source; a suppressor electrode for suppressing emission of electrons from a side surface of the electron source; and an electron beam converging unit for converging an electron beam of thermal field emission electrons emitted from the electron emission surface by applying an electric field to the electron emission surface. The electron beam converging unit is an electrostatic lens electrode which is placed between the extraction electrode and the accelerating electrode and having an opening portion in its center. A voltage is applied to the electrostatic lens electrode to converge the electron beam.

Abstract translation: 电子枪包括：电子源; 加速电极; 用于从电子源的电子发射表面提取电子的提取电极; 用于抑制从电子源的侧表面发射电子的抑制电极; 以及电子束会聚单元，用于通过向电子发射表面施加电场而会聚从电子发射表面发射的热场发射电子的电子束。 电子束会聚单元是放置在提取电极和加速电极之间并且在其中心具有开口部分的静电透镜电极。 电压施加到静电透镜电极以会聚电子束。

公开(公告)号：US08212224B2

公开(公告)日：2012-07-03

申请号：US12389838

申请日：2009-02-20

Applicant: Akiko Fujisawa ,  Hiroyuki Kobayashi ,  Eiko Nakazawa

Inventor： Akiko Fujisawa ,  Hiroyuki Kobayashi ,  Eiko Nakazawa

IPC: G21K5/10 ,  H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/26 ,  H01J2237/024 ,  H01J2237/065 ,  H01J2237/1501 ,  H01J2237/2802

Abstract: The present invention provides a charged particle beam device which can effectively restrain misalignment of an optical axis even if a position of an anode is changed. The present invention is a charged particle beam device comprising a cathode provided with a charged particle source which emits a charged particle, an anode which applies an electric field to the emitted charged particle, a charged particle beam deflector which deflects an orbit of a charged particle beam having passed the anode, and a charged particle beam detector which detects the charged particle beam from a sample to which the charged particle is irradiated, wherein a distance changing mechanism which changes a distance between the cathode and the anode, corresponding to a charged particle amount emitted from the charged particle source and a deflection amount control mechanism which detects a condition of the deflector under which the charged particle dose detected from the sample scanned by deflecting the charged particle beam in the changed distance becomes a desired size and controls deflection of the deflector at sample measurement on the basis of the condition are provided.

Abstract translation: 本发明提供一种带电粒子束装置，即使改变阳极的位置，也能够有效地抑制光轴的未对准。 本发明是一种带电粒子束装置，它包括一个阴极，该阴极设有带电粒子源，该粒子源发射一个带电粒子，一个向发射的带电粒子施加电场的阳极，一个带电粒子束偏转器，它使带电粒子的轨道偏转 通过阳极的光束和从被照射带电粒子的样品检测带电粒子束的带电粒子束检测器，其中改变对应于带电粒子的阴极和阳极之间的距离的距离改变机构 从所述带电粒子源发射的量;以及偏转量控制机构，其检测所述偏转器的状态，在所述偏转量条件下，通过使所述带电粒子束在变化的距离偏转而被扫描的样本中检测到的带电粒子剂量成为期望的尺寸， 提供了基于条件的样品测量的偏转器。

公开(公告)号：US20120062094A1

公开(公告)日：2012-03-15

申请号：US13322025

申请日：2010-04-14

Applicant: Mikio Ichihashi ,  Tadashi Onishi ,  Shunichi Watanabe ,  Keiji Tamura

Inventor： Mikio Ichihashi ,  Tadashi Onishi ,  Shunichi Watanabe ,  Keiji Tamura

IPC: H01J29/48 ,  H01J29/00

CPC classification number: H01J37/063 ,  H01J37/073 ,  H01J37/141 ,  H01J2237/06316 ,  H01J2237/06341 ,  H01J2237/065 ,  H01J2237/26

Abstract: The present invention has an object to provide a cold cathode field-emission electron gun with low aberration, to thereby provide a high-brightness electron gun even in the case of a large current. The present invention provides a field-emission electron gun which extracts an electron beam from a cathode and converges the extracted electron beam, the field-emission electron gun including: a magnetic field lens which is provided such that the cathode is disposed inside of a magnetic field of the lens; and an extraction electrode for extracting electrons from the cathode, the extraction electrode being formed into a cylindrical shape without an aperture structure. The present invention can provide an electron gun having a function of converging an electron beam using a magnetic field, the electron gun which is capable of reducing an incidental electrostatic lens action and has small aberration and high brightness.

Abstract translation: 本发明的目的是提供一种具有低像差的冷阴极场致发射电子枪，从而即使在大电流的情况下也提供高亮度电子枪。 本发明提供一种场致发射电子枪，其从阴极提取电子束并使所提取的电子束会聚，该场发射电子枪包括：磁场透镜，其被设置为使得阴极设置在磁性 镜头领域; 以及用于从阴极提取电子的引出电极，所述引出电极形成为没有孔结构的圆筒形状。 本发明可以提供一种电子枪，其具有使用磁场会聚电子束的功能，该电子枪能够减少偶然的静电透镜作用并且具有小的像差和高亮度。

公开(公告)号：US20100078557A1

公开(公告)日：2010-04-01

申请号：US12570112

申请日：2009-09-30

Applicant: Volker Drexel ,  Ulrich Mantz ,  Bernd Irmer ,  Christian Penzkofer

Inventor： Volker Drexel ,  Ulrich Mantz ,  Bernd Irmer ,  Christian Penzkofer

IPC: G21K5/00 ,  G01N23/00 ,  C23C14/00 ,  C23C14/30

CPC classification number: H01J37/065 ,  H01J1/3044 ,  H01J37/06 ,  H01J2201/30415 ,  H01J2201/30446 ,  H01J2201/30476 ,  H01J2237/06316 ,  H01J2237/06375 ,  H01J2237/065 ,  Y10T29/49888

Abstract: A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.

Abstract translation: 电子束源的尖端包括承载涂层的芯。 该涂层由具有比形成芯的表面的材料更大的导电性的材料形成。

公开(公告)号：US07579051B2

公开(公告)日：2009-08-25

申请号：US11351497

申请日：2006-02-10

Applicant: Makoto Yoshida

Inventor： Makoto Yoshida

IPC: H05H1/32 ,  H01J9/02 ,  H01L21/00

CPC classification number: H01J9/025 ,  H01J31/127 ,  H01J2201/3165 ,  H01J2237/06341 ,  H01J2237/065 ,  H01J2237/2614

Abstract: A method for manufacturing an electron emitter, the method includes discharging a droplet of a function liquid containing a material for forming the conductive film onto a discharge surface of the substrate by a droplet discharge device to adhere a liquid-state object to at least part of an area in which the conductive film is to be formed, drying the liquid-state to form the conductive film, and forming an electron emission section in the conductive film by applying an current between the pair of element electrodes, wherein when accompanied by the drying to form the conductive film, the discharging forms the liquid-state object in a shape having a constricted part for forming a latent image section that has a relatively thin film thickness in a portion for forming the electron emitter.

Abstract translation: 一种电子发射体的制造方法，其特征在于，包括通过液滴喷出装置将含有形成所述导电膜的材料的功能液滴滴到所述基板的排出面上，使液状物体至少部分 要形成导电膜的区域，干燥液态以形成导电膜，并且通过在一对元件电极之间施加电流而在导电膜中形成电子发射部分，其中当伴随着干燥 为了形成导电膜，放电在形成电子发射体的部分中形成具有用于形成具有相对薄的膜厚度的潜像部分的缩小部分的形状的液态物体。

公开(公告)号：US20080217555A1

公开(公告)日：2008-09-11

申请号：US12100570

申请日：2008-04-10

Applicant: Billy W. Ward ,  Lou Farkas ,  John A. Notte ,  Randall Percival

Inventor： Billy W. Ward ,  Lou Farkas ,  John A. Notte ,  Randall Percival

IPC: H01J27/26

CPC classification number: H01J37/08 ,  H01J27/26 ,  H01J2237/06341 ,  H01J2237/065 ,  H01J2237/0807 ,  H01J2237/28

Abstract: In one aspect the invention provides a gas field ion source assembly that includes an ion source in connection with an optical column such that an ion beam generated at the ion source travels through the optical column. The ion source includes an emitter having a width that tapers to a tip comprising a few atoms. In other aspects, the methods provide for manufacturing, maintaining and enhancing the performance of a gas field ion source including sharpening the tip of the ion source in situ.

Abstract translation: 在一个方面，本发明提供了一种气体离子源组件，其包括与光学柱连接的离子源，使得在离子源处产生的离子束穿过光学柱。 离子源包括具有与包含少量原子的尖端逐渐变细的宽度的发射体。 在其它方面，该方法提供制造，维持和增强气体离子源的性能，包括原位锐化离子源的尖端。

公开(公告)号：US20040124365A1

公开(公告)日：2004-07-01

申请号：US10670556

申请日：2003-09-26

Applicant: LEO Elektronenmikroskopie GmbH

Inventor： Michael Steigerwald

IPC: H01J027/00

CPC classification number: H01J37/075 ,  H01J37/073 ,  H01J37/243 ,  H01J2237/06316 ,  H01J2237/065

Abstract: An electron beam source comprises a source surface illuminated with a photon beam of adjustable intensity. The photon beam assists emission of electrons from the source surface due to a photo effect. An electric extraction field further assists in electron emission. Further, a heater is provided for further assisting in electron emission by a thermionic effect. An electron beam current is measured, and the intensity of the photon beam is adjusted based on the measured electron beam current.

Abstract translation: 电子束源包括用可调强度的光子束照射的源表面。 由于光照效应，光子束有助于来自源表面的电子的发射。 电提取场进一步有助于电子发射。 此外，提供加热器以进一步辅助电子发射通过热离子效应。 测量电子束电流，并且基于测量的电子束电流来调整光子束的强度。

公开(公告)号：US20020145396A1

公开(公告)日：2002-10-10

申请号：US09775762

申请日：2001-02-03

Inventor： Michael Stuart Gordon ,  Samuel Kay Doran

IPC: H01J029/51

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/065

Abstract: A method and a apparatus are provided for operating an E-beam system including an E-beam source for generating an E-beam directed along a column axis and an electrode aligned with the column axis direct the E-beam towards means for measuring the E-beam. A signal proportional to leakage current emitted from the E-beam is generated. When the result of a comparison with a desired value is excessive, an excess leakage signal is generated. The excess leakage signal can be provided as an emergency output signal and/or produce an OFF signal for stopping production of the E-beam by turning OFF voltage/power sources for producing the E-beam in response to the excess leakage signal. Preferably, a filament is heated by an electric current and a cathode is bombarded with electrons from the filament to produce the E-beam. Then a filament control signal is employed for controlling the filament heating current.

Abstract translation: 提供了一种用于操作电子束系统的电子束系统的方法和装置，所述电子束系统包括用于产生沿着列轴线定向的电子束的电子束源和与所述列轴对准的电极，所述电子束系统将所述电子束指向用于测量所述E的装置 -光束。 产生与从电子束发射的泄漏电流成比例的信号。 当与期望值的比较结果过大时，产生过量的泄漏信号。 可以根据过量的泄漏信号，通过关闭用于产生电子束的电压/电源来提供过量的泄漏信号作为紧急输出信号和/或产生用于停止电子束的产生的OFF信号。 优选地，灯丝被电流加热，并且阴极被来自灯丝的电子轰击以产生电子束。 然后使用灯丝控制信号来控制灯丝加热电流。

公开(公告)号：US06333508B1

公开(公告)日：2001-12-25

申请号：US09580530

申请日：2000-05-30

Applicant: Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren K Waskiewicz

Inventor： Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren K Waskiewicz

IPC: H01J37302

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/063 ,  H01J37/12 ,  H01J37/3174 ,  H01J2237/065 ,  H01J2237/12 ,  H01J2237/1205 ,  H01J2237/3175 ,  H01J2237/31774

Abstract: A method and apparatus for controlling beam emittance by placing a quadrupole lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The quadrupole lens array may be three or more mesh grids or a combination of grids and continuous foils. The quadrupole lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The quadrupole lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

Abstract translation: 一种通过将四极透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。 照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。 四极透镜阵列可以是三个或更多个网格或网格和连续箔片的组合。 四极透镜阵列形成大量类似于光学“飞眼”透镜的微透镜。 四极透镜阵列将输入的固体电子束分裂成多个子束，使得输出光束发射不同于入射光束发射，而光束总电流保持不变。 该方法和装置允许对束电流和光束发射的独立控制，这在SCALPEL照明系统中是有益的。