公开(公告)号：US20190256805A1

公开(公告)日：2019-08-22

申请号：US16348063

申请日：2017-10-24

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Tatsuo GOTO ,  Kenji SEKI

IPC分类号： C11D7/08 ,  C11D7/32 ,  C11D7/50

摘要： A cleaning solution that is used, inter alia, for removal of residue of a photoresist pattern or etching residue, and has exceptional anticorrosion properties with respect to silicon nitride; and a method for cleaning a substrate using the cleaning solution. In a cleaning solution containing a hydrofluoric acid and a solvent, a polymer that includes units derived from a compound of a specific structure having a carboxylic acid amide bond (—CO—N

公开(公告)号：US10385422B2

公开(公告)日：2019-08-20

申请号：US14909852

申请日：2014-07-30

申请人： BASF SE

发明人： Jens Rudolph ,  Rainer Papp

IPC分类号： B08B9/08 ,  B08B3/08 ,  C22B3/00 ,  B01J19/00 ,  B01J19/24 ,  C07C45/50 ,  C11D7/08 ,  C11D11/00 ,  C22B3/44 ,  C22B7/00

摘要： Method of removing cobalt deposits in a reactor for the cobalt-catalyzed high-pressure hydroformylation of olefins by treatment with aqueous nitric acid, wherein the reactor is at least partly filled with aqueous nitric acid and the temperature of the aqueous nitric acid is increased during the treatment.

公开(公告)号：US10385256B2

公开(公告)日：2019-08-20

申请号：US15484834

申请日：2017-04-11

申请人： ENVIRONMENTAL DEVELOPMENT PRODUCTS (ENDEVPRO), LIMITED

发明人： Rixio Egardo Reyes Lopez ,  Osmerio Enrique Labarca Finol

IPC分类号： C09K8/52 ,  C09K8/524 ,  C09K3/32 ,  C09K8/60 ,  E21B21/06 ,  C09K8/035 ,  C10G33/04 ,  C10G1/04 ,  C10G29/06 ,  C10G29/12 ,  C10G29/20 ,  C10G29/22 ,  C10G29/28 ,  C11D7/06 ,  C11D7/08 ,  C11D7/10 ,  C11D7/24 ,  C11D7/26 ,  E21B37/06 ,  E21B43/16

摘要： Compounds of biodegradable surfactants useful for optimizing the separation of impurities typical of hydrocarbons, and designed to intervene and stabilize the molecular structure of crude oil, with no significant alterations of the crude's intrinsic composition are disclosed. The biodegradable surfactants compounds coexist with a non-ionic surfactant and an organic mix in emulsion form with the purpose of isolating crude from the pipeline, reduce friction to improve crude flow and to enter the crude macromolecule to modify the hydrocarbon chain to reduce its density and thus its viscosity; including compounds of biodegradable surfactants that comprise sodium hydroxide 1N, potassium chloride, sulphonic acid, dodecanoic acid, nonylphenol, terpene-1 and water, preferably hard water.

公开(公告)号：US20190198315A1

公开(公告)日：2019-06-27

申请号：US16265709

申请日：2019-02-01

申请人： Samsung Electronics Co., Ltd. ,  Soulbrain Co., Ltd.

发明人： Hoyoung KIM ,  Hyo-Sun LEE ,  Soojin KIM ,  Keonyoung KIM ,  JINHYE BAE ,  HOON HAN ,  Tae Soo KWON ,  Jung Hun LIM

IPC分类号： H01L21/02 ,  C11D7/08 ,  C11D7/26 ,  C11D7/32 ,  H01L21/683 ,  H01L23/00 ,  C11D11/00

CPC分类号： H01L21/02068 ,  C11D7/08 ,  C11D7/261 ,  C11D7/264 ,  C11D7/266 ,  C11D7/3209 ,  C11D7/3218 ,  C11D11/0047 ,  H01L21/02057 ,  H01L21/304 ,  H01L21/30604 ,  H01L21/30625 ,  H01L21/6835 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/81 ,  H01L2221/68327 ,  H01L2221/68381 ,  H01L2224/03002 ,  H01L2224/0401 ,  H01L2224/0557 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/06181 ,  H01L2224/1181 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2224/16145 ,  H01L2224/16227 ,  H01L2224/17181 ,  H01L2224/81193 ,  H01L2224/81815 ,  H01L2224/94 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06565 ,  H01L2924/10252 ,  H01L2924/10253 ,  H01L2924/15311 ,  H01L2924/3512 ,  H01L2924/37001 ,  H01L2224/11 ,  H01L2224/03

摘要： Embodiments of the inventive concepts provide a method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer. The method includes preparing a semiconductor substrate to which an adhesive layer adheres, removing the adhesive layer from the semiconductor substrate, and applying a cleaning composition to the semiconductor substrate to remove a residue of the adhesive layer. The cleaning composition includes a solvent including a ketone compound and having a content that is equal to or greater than 40 wt % and less thaadminn 90 wt %, quaternary ammonium salt, and primary amine.

公开(公告)号：US20190177668A1

公开(公告)日：2019-06-13

申请号：US16325757

申请日：2017-08-17

申请人： Gohda Water Treatment Technology Co., Inc. ,  MAG Technology Co., Ltd.

发明人： Toshihisa Gohda ,  Jae Yong Lee

IPC分类号： C11D7/08 ,  B01F3/04 ,  C02F1/461 ,  B08B3/02 ,  B08B3/10 ,  H01L21/67 ,  H01L21/687 ,  H01L21/02 ,  C11D11/00

摘要： The present invention relates to hydrogencarbonate water and a cleaning method using the hydrogencarbonate water. Provided are hydrogencarbonate water obtained by dissolving carbon dioxide in hydrogen water having a dissolved hydrogen concentration of 0.1 ppm to 2.0 ppm; and a cleaning method comprising cleaning a substrate by immersing the substrate in the hydrogencarbonate water, or spraying the hydrogencarbonate water to the substrate.

公开(公告)号：US10307713B2

公开(公告)日：2019-06-04

申请号：US14386224

申请日：2013-04-09

申请人： KURITA WATER INDUSTRIES LTD.

发明人： Tetsuya Aoki ,  Takahiro Kawakatsu ,  Kunihiro Hayakawa

IPC分类号： B01D65/02 ,  C11D7/04 ,  C11D7/08 ,  C11D7/10 ,  C11D11/00 ,  B01D65/10 ,  C02F1/44 ,  C11D7/06 ,  C11D7/34

摘要： The invention provides cleaning agents, cleaning liquids and cleaning methods that effectively remove contaminants which are impossible to remove sufficiently with conventional cleaning liquids at the occurrence of a decrease in performances such as permeation flux and salt rejection rate due to contamination of permeable membranes, in particular aromatic polyamide RO membranes used in water treatment. Permeable membranes are cleaned with a cleaning liquid which is an aqueous solution including a chloramine compound and an alkali agent and having a pH of 10 or above. The chloramine compound is preferably one obtained by mixing a compound having a primary amino group with hypochlorous acid and/or a hypochlorite.

公开(公告)号：US10194665B2

公开(公告)日：2019-02-05

申请号：US14915211

申请日：2013-08-30

申请人： Epios Co., LTD

发明人： Yasuo Shichitani

IPC分类号： C25B1/26 ,  A61K33/20 ,  A61K33/14 ,  A01N59/00 ,  A01N59/08 ,  C02F1/467 ,  A61Q17/00 ,  A61Q19/10 ,  A61K8/20 ,  A61Q11/00 ,  C11D7/08 ,  C11D7/10

摘要： The present invention has an object to provide a highly stable cleaning solution that generates a high concentration of hypochlorous acid during cleaning, and has sterilizing and washing out activity on bacteria and viruses. As means for achieving this object, a cleaning solution has been developed which is an aqueous solution containing hypochlorous acid and hypochlorite ions produced using a diaphragm-free electrolysis process. The effective residual chlorine concentration thereof and the hydrogen ion concentration exponent thereof are adjusted to a value from 500 ppm to 2000 ppm and to a value from pH 8.5 to pH 9.5, respectively. Thus, the cleaning solution remains stable for a prolonged period of time, and exhibits high sterilizing and wash-out activity during use.

公开(公告)号：US20180220693A1

公开(公告)日：2018-08-09

申请号：US15945176

申请日：2018-04-04

申请人： SMARTWASH SOLUTIONS LLC

发明人： James M. BRENNAN ,  Danny Elmer LINDSTROM ,  Christopher Michael MCGINNIS ,  Eric Child WILHELMSEN

IPC分类号： A23N12/02 ,  C11D7/26 ,  A22C17/08 ,  A23B4/24 ,  B08B1/00 ,  C11D7/08 ,  A23L3/3454 ,  A23B7/10 ,  A23B4/12 ,  B08B3/08

CPC分类号： A23N12/02 ,  A22C17/08 ,  A23B4/12 ,  A23B4/24 ,  A23B7/10 ,  A23L3/3454 ,  A23V2002/00 ,  B08B1/002 ,  B08B3/042 ,  B08B3/08 ,  C11D7/08 ,  C11D7/261 ,  C11D7/265 ,  C11D11/0064 ,  Y02A40/943

摘要： A produce wash system is provided. The produce wash system includes a produce line with a short-term wash device followed by a wash device, a short-term wash treatment that is applied by the short-term wash device to a product, wherein the short-term wash treatment remains on the product for a pretreatment time that lasts until the product reaches the wash device, and a wash treatment that is applied by the wash device to the product, wherein the wash treatment rinses the short-term wash treatment from the product defining the end of the pretreatment time. The pretreatment time is set at or below a damage threshold time beyond which the short-term wash treatment damages the product beyond a damage threshold.

公开(公告)号：US09902925B2

公开(公告)日：2018-02-27

申请号：US14964267

申请日：2015-12-09

申请人： Samsung Display Co., Ltd ,  LTCAM CO., LTD.

发明人： Dong Eon Lee ,  Jin Ho Ju ,  Jun Hyuk Woo ,  Seok Ho Lee

IPC分类号： C11D7/32 ,  C11D7/08 ,  C11D7/26 ,  C11D11/00 ,  C11D3/39 ,  C11D3/395 ,  H01L21/02

CPC分类号： C11D7/3245 ,  C11D3/3947 ,  C11D3/3956 ,  C11D7/08 ,  C11D7/265 ,  C11D7/3209 ,  C11D11/0047 ,  H01L21/02057

摘要： There is provided a cleaner composition for a process of manufacturing a semiconductor and a display. The cleaner composition includes 0.01 to 5.0 wt % of amino acid-based chelating agent, 0.01 to 1.5 wt % of organic acid, 0.01 to 1.0 wt % of inorganic acid, 0.01 to 5.0 wt % of alkali compound, and the balance of deionized water and is based on acidic water with pH levels of 1 to 5. The cleaner composition may enhance metal contaminants removal capability and have a function to remove particles and organic contaminants, and prevent corrosion of copper and reverse adsorption of copper. Thus, cleaner composition may be used for various purposes of etching copper, removing residues, and a cleaner by adjusting an etch rate.

公开(公告)号：US09862190B2

公开(公告)日：2018-01-09

申请号：US15137151

申请日：2016-04-25

申请人： CANON KABUSHIKI KAISHA

发明人： Kyosuke Nagaoka

IPC分类号： H01L21/02 ,  B41J2/16 ,  B08B3/08 ,  C11D7/10 ,  C11D7/50 ,  C11D7/08

CPC分类号： B41J2/1631 ,  B41J2/1603 ,  B41J2/1623 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1639 ,  B41J2/1642 ,  B41J2/1645 ,  C11D7/08 ,  C11D7/10 ,  C11D7/5004 ,  C11D7/5009 ,  C11D7/5013 ,  C11D7/5022 ,  H01L21/02063

摘要： A method for manufacturing a liquid ejection head including a substrate having a terminal for electrical connection to an external device, an inorganic material layer on the substrate, and a flow path member disposed on the inorganic material layer and containing an organic material, and the manufacturing method includes a cleaning step of removing a silane coupling agent attached to the terminal by using a solution containing hydrogen fluoride, ammonium fluoride, and a water-soluble organic solvent.