Coated Speaker Dome
    33.
    发明申请
    Coated Speaker Dome 有权
    涂层扬声器圆顶

    公开(公告)号:US20080130937A1

    公开(公告)日:2008-06-05

    申请号:US11813959

    申请日:2006-01-12

    IPC分类号: H04R1/02

    CPC分类号: H04R7/127 Y10T428/12431

    摘要: A rigid three-dimensional component such as a speaker dome is formed of diamond, preferably fabricated to net shape by CVD diamond synthesis, and includes a coating on one or more major surfaces thereof. The coating is designed to enhance the performance and/or to alter the appearance of the component. In particular, the coating is designed to act as a damping medium and/or provide aesthetic qualities to the component.

    摘要翻译: 诸如扬声器拱顶的刚性三维部件由金刚石形成,优选通过CVD金刚石合成制成网状,并且在其一个或多个主表面上包括涂层。 该涂层被设计成增强部件的性能和/或改变部件的外观。 特别地,涂层被设计成用作阻尼介质和/或提供元件的美学品质。

    Detector for ionising radiation
    36.
    发明授权
    Detector for ionising radiation 失效
    电离辐射检测器

    公开(公告)号:US06707045B1

    公开(公告)日:2004-03-16

    申请号:US09719242

    申请日:2001-07-05

    IPC分类号: G01T124

    CPC分类号: G01T1/26

    摘要: A detector for ionising radiation comprises first (10) and second (12) diamond detector elements which are connected to a common contact (14). The two detector elements are of differing thickness and are optimised for the detection of different types of radiation, so that the detector simultaneously provides two output signals indicative of different kinds of radiation incident on the detector.

    摘要翻译: 用于电离辐射的检测器包括连接到公共接触件(14)的第一(10)和第二(12)个金刚石检测器元件。 两个检测器元件具有不同的厚度并且被优化用于检测不同类型的辐射,使得检测器同时提供指示入射在检测器上的不同种类的辐射的两个输出信号。

    Microwave plasma reactors and substrates for synthetic diamond manufacture
    40.
    发明授权
    Microwave plasma reactors and substrates for synthetic diamond manufacture 有权
    微波等离子体反应器和合成金刚石制造用基材

    公开(公告)号:US08859058B2

    公开(公告)日:2014-10-14

    申请号:US13994813

    申请日:2011-12-14

    摘要: A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapor deposition, the microwave plasma reactor comprising: a microwave generator configured to generate microwaves at a frequency f; a plasma chamber comprising a base, a top plate, and a side wall extending from said base to said top plate defining a resonance cavity for supporting a microwave resonance mode between the base and the top plate; a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate; and a substrate disposed on the supporting surface, the substrate having a growth surface on which the synthetic diamond material is to be deposited in use, wherein the substrate dimensions and location within the resonance cavity are selected to generate a localized axisymmetric Ez electric field profile across the growth surface in use, the localized axisymmetric Ez electric field profile comprising a substantially flat central portion bound by a ring of higher electric field, the substantially flat central portion extending over at least 60% of an area of the growth surface of the substrate and having an Ez electric field variation of no more than ±10% of a central Ez electric field strength, the ring of higher electric field being disposed around the central portion and having a peak Ez electric field strength in a range 10% to 50% higher than the central Ez electric field strength.

    摘要翻译: 一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器,所述微波等离子体反应器包括:微波发生器,其被配置为以频率f产生微波; 等离子体室,其包括基底,顶板和从所述底座延伸到所述顶板的侧壁,所述侧壁限定用于在所述基底和所述顶板之间支撑微波共振模式的共振腔; 用于将微波从微波发生器馈送到等离子体室中的微波耦合配置; 用于将工艺气体进料到等离子体室中并从中除去它们的气体流动系统; 衬底保持器,其设置在所述等离子体室中并且包括用于支撑衬底的支撑表面; 以及设置在所述支撑表面上的基板,所述基板具有生长表面,所述合成金刚石材料将在其上沉积在所述生长表面上,其中所述共振腔内的所述基板尺寸和位置被选择以产生局部轴对称Ez电场分布 在使用中的生长表面,局部轴对称Ez电场分布包括由较高电场环结合的基本上平坦的中心部分,基本上平坦的中心部分延伸至衬底的生长表面的至少60%的面积; 具有不大于中心Ez电场强度的±10%的Ez电场变化,较高电场的环设置在中心部分周围,并且具有10%至5​​0%以上范围内的峰值Ez电场强度 比中央Ez电场强度高。