MICROWAVE PLASMA REACTORS AND SUBSTRATES FOR SYNTHETIC DIAMOND MANUFACTURE
    2.
    发明申请
    MICROWAVE PLASMA REACTORS AND SUBSTRATES FOR SYNTHETIC DIAMOND MANUFACTURE 有权
    MICROWAVE等离子体反应器和合成金刚石制造基材

    公开(公告)号:US20140234556A1

    公开(公告)日:2014-08-21

    申请号:US13994813

    申请日:2011-12-14

    摘要: A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a microwave generator configured to generate microwaves at a frequency f; a plasma chamber comprising a base, a top plate, and a side wall extending from said base to said top plate defining a resonance cavity for supporting a microwave resonance mode between the base and the top plate; a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate; and a substrate disposed on the supporting surface, the substrate having a growth surface on which the synthetic diamond material is to be deposited in use, wherein the substrate dimensions and location within the resonance cavity are selected to generate a localized axisymmetric Ez electric field profile across the growth surface in use, the localized axisymmetric Ez electric field profile comprising a substantially flat central portion bound by a ring of higher electric field, the substantially flat central portion extending over at least 60% of an area of the growth surface of the substrate and having an Ez electric field variation of no more than ±10% of a central Ez electric field strength, the ring of higher electric field being disposed around the central portion and having a peak Ez electric field strength in a range 10% to 50% higher than the central Ez electric field strength.

    摘要翻译: 一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器,所述微波等离子体反应器包括:微波发生器,其被配置为以频率f产生微波; 等离子体室,其包括基底,顶板和从所述底座延伸到所述顶板的侧壁,所述侧壁限定用于在所述基底和所述顶板之间支撑微波共振模式的共振腔; 用于将微波从微波发生器馈送到等离子体室中的微波耦合配置; 用于将工艺气体进料到等离子体室中并从中除去它们的气体流动系统; 衬底保持器,其设置在所述等离子体室中并且包括用于支撑衬底的支撑表面; 以及设置在所述支撑表面上的基板,所述基板具有生长表面,所述合成金刚石材料将在其上沉积在所述生长表面上,其中所述共振腔内的所述基板尺寸和位置被选择以产生局部轴对称Ez电场分布 在使用中的生长表面,局部轴对称Ez电场分布包括由较高电场环结合的基本上平坦的中心部分,基本上平坦的中心部分延伸至衬底的生长表面的至少60%的面积; 具有不大于中心Ez电场强度的±10%的Ez电场变化,较高电场的环设置在中心部分周围,并且具有10%至5​​0%以上范围内的峰值Ez电场强度 比中央Ez电场强度高。

    DIAMOND BASED ELECTROCHEMICAL SENSORS
    3.
    发明申请
    DIAMOND BASED ELECTROCHEMICAL SENSORS 审中-公开
    基于钻石的电化学传感器

    公开(公告)号:US20130327640A1

    公开(公告)日:2013-12-12

    申请号:US14001451

    申请日:2012-03-15

    IPC分类号: G01N27/30

    CPC分类号: G01N27/308 G01N33/0044

    摘要: A diamond based electrochemical band sensor comprising: a diamond body; and a plurality of boron doped diamond band electrodes disposed within the diamond body, wherein at least a portion of each of the plurality of boron doped diamond band electrodes is doped with boron to a level suitable to achieve metallic conduction, the boron doped diamond electrodes being spaced apart by non-conductive intrinsic layers of diamond, wherein the diamond body comprises a front sensing surface with the plurality of boron doped diamond band electrodes being exposed at said sensing surface and extending in an elongate manner across said surface, and wherein each boron doped diamond electrode has a length/width ratio of at least 10 at the front sensing surface.

    摘要翻译: 一种基于金刚石的电化学带传感器,包括:金刚石体; 以及布置在所述金刚石体内的多个掺杂硼的金刚石电极,其中所述多个硼掺杂金刚石电极中的每一个的至少一部分掺杂有硼至适于实现金属导电的水平,所述掺杂硼的金刚石电极为 由金刚石的非导电本征层隔开,其中金刚石主体包括前感测表面,其中多个硼掺杂金刚石电极在所述感测表面处露出并且以细长方式延伸穿过所述表面,并且其中每个硼掺杂 金刚石电极在前感测表面处的长/宽比至少为10。

    POLYCRYSTALLINE DIAMOND ELEMENTS HAVING CONVEX SURFACES
    6.
    发明申请
    POLYCRYSTALLINE DIAMOND ELEMENTS HAVING CONVEX SURFACES 有权
    具有凸面的多晶金刚石元素

    公开(公告)号:US20100064538A1

    公开(公告)日:2010-03-18

    申请号:US12523291

    申请日:2008-01-18

    摘要: A diamond element (10) having a convex surface is disclosed, the convex surface including a spherical segment for which the maximum peak to valley deviation from a perfect spherical surface is less than about 5 μm. The diamond element (10) may be a solid polycrystalline diamond material and/or may comprise base material which is coated with diamond. Alternatively or in addition, the RMS deviation from a perfect spherical surface may be less than about 500 nm, or the RMS roughness less than about 30 nm. A diamond element (10) with a radius of curvature less than about 20 mm is also disclosed. In one aspect a diamond element (10) having a conical half-angle greater than about 10° is described. Diamond elements (10) of this type are intended for use as metrology tips. Key to this invention is the realization that a diamond surface, particularly a diamond surface with low Ra (roughness) and which is free of defects such as pits, digs and scratches, accumulates less material from the surface being measured, and thus provides a longer life.

    摘要翻译: 公开了具有凸面的金刚石元件(10),所述凸面包括与完美球面的最大峰谷偏差小于约5μm的球形段。 金刚石元件(10)可以是固体多晶金刚石材料和/或可以包括用金刚石涂覆的基底材料。 或者或另外,与完美球形表面的RMS偏差可以小于约500nm,或RMS粗糙度小于约30nm。 还公开了具有小于约20mm的曲率半径的金刚石元件(10)。 在一个方面,描述了具有大于约10°的锥形半角的金刚石元件(10)。 这种类型的钻石元素(10)旨在用作度量提示。 本发明的关键在于,金刚石表面,特别是具有低Ra(粗糙度)并且没有诸如凹坑,挖掘和划痕等缺陷的金刚石表面,从被测表面积累较少的材料,从而提供更长的 生活。

    DIAMOND ELECTRONIC DEVICES AND METHODS FOR THEIR MANUFACTURE
    7.
    发明申请
    DIAMOND ELECTRONIC DEVICES AND METHODS FOR THEIR MANUFACTURE 审中-公开
    钻石电子设备及其制造方法

    公开(公告)号:US20100038653A1

    公开(公告)日:2010-02-18

    申请号:US12523968

    申请日:2008-01-22

    IPC分类号: H01L29/12 H01L21/04

    摘要: The present invention relates to a diamond electronic device comprising a functional interface between two solid materials, wherein the interface is formed by a planar first surface of a first layer of single crystal diamond and a second layer formed on the first surface of the first diamond layer, the second layer being solid, non-metallic and selected from diamond, a polar material and a dielectric material, and wherein the planar first surface of the first layer of single crystal diamond has an Rq of less than 10 nm and has at least one of the following characteristics: (a) the first surface is an etched surface; (b) a density of dislocations in the first diamond layer breaking the first surface is less than 400 cm−2 measured over an area greater than 0.014 cm2; (c) a density of dislocations in the second layer breaking a notional or real surface lying within the second layer parallel to the interface and within 50 μm of the interface is less than 400 cm−2 measured over an area greater than 0.014 cm2; and (d) the first surface has an Rq less than 1 nm.

    摘要翻译: 金刚石电子器件技术领域本发明涉及一种金刚石电子器件,其包括两个固体材料之间的功能界面,其中界面由第一层单晶金刚石的平面第一表面和形成在第一金刚石层的第一表面上的第二层形成 所述第二层为固体,非金属且选自金刚石,极性材料和介电材料,并且其中所述第一层单晶金刚石的平面第一表面的Rq小于10nm,并且具有至少一个 具有以下特征:(a)第一表面是蚀刻表面; (b)破坏第一表面的第一金刚石层中的位错密度小于在大于0.014cm 2的区域上测量的400cm -2; (c)第二层中位于第二层内的位错密度在平坦于界面的第二层内并且在界面的50μm以内破坏在大于0.014cm 2的区域上测得的小于400cm -2; 和(d)第一表面具有小于1nm的Rq。

    DIAMOND COATED SURFACES
    8.
    发明申请
    DIAMOND COATED SURFACES 审中-公开
    钻石涂层表面

    公开(公告)号:US20090208666A1

    公开(公告)日:2009-08-20

    申请号:US11577766

    申请日:2005-10-20

    IPC分类号: B05D3/06

    CPC分类号: C23C16/274 C23C16/0263

    摘要: A method of producing a diamond coated surface on a substrate. A surface of the substrate is prepared by exposing it to a power beam, such as an electron beam, to increase the surface area and surface roughness. Such preparation may also provide the surface with three dimensional features onto which a diamond layer can adhere and mechanically lock. Adhesion of a diamond layer applied to the prepared surface is increased.

    摘要翻译: 一种在基材上制备金刚石涂层表面的方法。 通过将其暴露于诸如电子束的功率束来制备衬底的表面,以增加表面积和表面粗糙度。 这种制备还可以为表面提供三维特征,金刚石层可以粘附到其上并机械地锁定。 施加到制备的表面上的金刚石层的粘附性增加。