公开(公告)号：US09960088B2

公开(公告)日：2018-05-01

申请号：US13290879

申请日：2011-11-07

申请人： Yi-Chao Mao ,  Jui-Pin Hung ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

发明人： Yi-Chao Mao ,  Jui-Pin Hung ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

IPC分类号： B24B49/10 ,  H01L21/66 ,  B24B37/013 ,  B24B7/22 ,  H01L23/31

CPC分类号： H01L22/26 ,  B24B7/228 ,  B24B37/013 ,  B24B49/10 ,  H01L22/12 ,  H01L23/3114 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method for performing grinding includes selecting a target wheel loading for wafer grinding processes, and performing a grinding process on a wafer. With the proceeding of the grinding process, wheel loadings of the grinding process are measured. The grinding process is stopped after the target wheel loading is reached. The method alternatively includes selecting a target reflectivity of wafer grinding processes, and performing a grinding process on a wafer. With a proceeding of the grinding process, reflectivities of a light reflected from a surface of the wafer are measured. The grinding process is stopped after one of the reflectivities reaches the target reflectivity.

公开(公告)号：US20130087951A1

公开(公告)日：2013-04-11

申请号：US13270957

申请日：2011-10-11

申请人： Jing-Cheng Lin ,  Hsien-Wen Liu ,  Jui-Pin Hung ,  Shin-Puu Jeng ,  Chen-Hua Yu

发明人： Jing-Cheng Lin ,  Hsien-Wen Liu ,  Jui-Pin Hung ,  Shin-Puu Jeng ,  Chen-Hua Yu

IPC分类号： H05B6/64 ,  B29C35/08

CPC分类号： B29C35/0805 ,  B29C2035/0855 ,  H01L21/565 ,  H05B6/6491 ,  H05B6/806

摘要： An embodiment is a molding chamber. The molding chamber comprises a mold-conforming chase, a substrate-base chase, a first radiation permissive component, and a microwave generator coupled to a first waveguide. The mold-conforming chase is over the substrate-base chase, and the mold-conforming chase is moveable in relation to the substrate-base chase. The first radiation permissive component is in one of the mold-conforming chase or the substrate-base chase. The microwave generator and the first waveguide are together operable to direct microwave radiation through the first radiation permissive component.

公开(公告)号：US20130001776A1

公开(公告)日：2013-01-03

申请号：US13170973

申请日：2011-06-28

申请人： Chen-Hua Yu ,  Jing-Cheng Lin ,  Nai-Wei Liu ,  Jui-Pin Hung ,  Shin-Puu Jeng

发明人： Chen-Hua Yu ,  Jing-Cheng Lin ,  Nai-Wei Liu ,  Jui-Pin Hung ,  Shin-Puu Jeng

IPC分类号： H01L23/485 ,  H01L21/28

CPC分类号： H01L21/4853 ,  H01L21/561 ,  H01L21/565 ,  H01L21/568 ,  H01L21/78 ,  H01L23/3128 ,  H01L23/481 ,  H01L23/49838 ,  H01L24/11 ,  H01L24/13 ,  H01L24/19 ,  H01L24/97 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05008 ,  H01L2224/05569 ,  H01L2224/05572 ,  H01L2224/12105 ,  H01L2224/13022 ,  H01L2224/13025 ,  H01L2224/131 ,  H01L2224/13147 ,  H01L2224/73267 ,  H01L2224/94 ,  H01L2224/96 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/0132 ,  H01L2924/014 ,  H01L2924/181 ,  H01L2224/19 ,  H01L2224/11 ,  H01L2224/03 ,  H01L2224/05552 ,  H01L2924/00 ,  H01L2224/214

摘要： A package includes a device die having a substrate. A molding compound contacts a sidewall of the substrate. A metal pad is over the substrate. A passivation layer has a portion covering an edge portion of the metal pad. A metal pillar is over and contacting the metal pad. A dielectric layer is over the passivation layer. A package material formed of a molding compound or a polymer is over the dielectric layer. The dielectric layer includes a bottom portion between the passivation layer and the package material, and a sidewall portion between a sidewall of the metal pillar and a sidewall of the package material. A polymer layer is over the package material, the molding compound, and the metal pillar. A post-passivation interconnect (PPI) extends into the polymer layer. A solder ball is over the PPI, and is electrically coupled to the metal pad through the PPI.

摘要翻译： 封装包括具有基板的器件裸片。 模塑料与基材的侧壁接触。 金属焊盘在基板上。 钝化层具有覆盖金属焊盘的边缘部分的部分。 金属支柱已经过去并与金属垫接触。 介电层位于钝化层的上方。 由模塑料或聚合物形成的包装材料在电介质层的上面。 电介质层包括位于钝化层和封装材料之间的底部，以及在金属柱的侧壁和封装材料的侧壁之间的侧壁部分。 聚合物层在包装材料，模塑料和金属支柱之上。 后钝化互连（PPI）延伸到聚合物层中。 焊球在PPI上方，并通过PPI电耦合到金属焊盘。

公开(公告)号：US08105875B1

公开(公告)日：2012-01-31

申请号：US12904835

申请日：2010-10-14

申请人： Hsien-Pin Hu ,  Chen-Hua Yu ,  Shin-Puu Jeng ,  Shang-Yun Hou ,  Jing-Cheng Lin ,  Wen-Chih Chiou ,  Hung-Jung Tu

发明人： Hsien-Pin Hu ,  Chen-Hua Yu ,  Shin-Puu Jeng ,  Shang-Yun Hou ,  Jing-Cheng Lin ,  Wen-Chih Chiou ,  Hung-Jung Tu

IPC分类号： H01L21/50

CPC分类号： H01L21/561 ,  H01L21/486 ,  H01L23/147 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L24/97 ,  H01L25/0655 ,  H01L2224/05001 ,  H01L2224/05027 ,  H01L2224/05571 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/97 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2224/81 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2224/05541 ,  H01L2224/05005 ,  H01L2224/05599 ,  H01L2224/05099

摘要： A method includes providing an interposer wafer including a substrate, and a plurality of through-substrate vias (TSVs) extending from a front surface of the substrate into the substrate. A plurality of dies is bonded onto a front surface of the interposer wafer. After the step of bonding the plurality of dies, a grinding is performed on a backside of the substrate to expose the plurality of TSVs. A plurality of metal bumps is formed on a backside of the interposer wafer and electrically coupled to the plurality of TSVs.

摘要翻译： 一种方法包括提供包括衬底的中介层晶片，以及从衬底的前表面延伸到衬底中的多个贯通衬底通孔（TSV）。 多个管芯结合到插入件晶片的前表面上。 在结合多个模具的步骤之后，在基板的背面进行研磨以暴露多个TSV。 多个金属凸块形成在插入器晶片的背面并电耦合到多个TSV。

公开(公告)号：US20120001337A1

公开(公告)日：2012-01-05

申请号：US12827563

申请日：2010-06-30

申请人： Chen-Yu Tsai ,  Shih-Hui Wang ,  Chien-Ming Chiu ,  Chia-Ho Chen ,  Fang Wen Tsai ,  Weng-Jin Wu ,  Jing-Cheng Lin ,  Wen-Chih Chiou ,  Shin-Puu Jeng ,  Chen-Hua Yu

发明人： Chen-Yu Tsai ,  Shih-Hui Wang ,  Chien-Ming Chiu ,  Chia-Ho Chen ,  Fang Wen Tsai ,  Weng-Jin Wu ,  Jing-Cheng Lin ,  Wen-Chih Chiou ,  Shin-Puu Jeng ,  Chen-Hua Yu

IPC分类号： H01L23/532 ,  H01L21/71 ,  H01L23/522

CPC分类号： H01L23/481 ,  H01L21/30604 ,  H01L21/6835 ,  H01L21/76831 ,  H01L21/76877 ,  H01L21/76898 ,  H01L23/544 ,  H01L2221/68327 ,  H01L2223/54426 ,  H01L2224/13

摘要： In accordance with an embodiment, a structure comprises a substrate having a first area and a second area; a through substrate via (TSV) in the substrate penetrating the first area of the substrate; an isolation layer over the second area of the substrate, the isolation layer having a recess; and a conductive material in the recess of the isolation layer, the isolation layer being disposed between the conductive material and the substrate in the recess.

摘要翻译： 根据实施例，结构包括具有第一区域和第二区域的基板; 穿过基板的第一区域的贯穿基板通孔（TSV）; 在所述衬底的所述第二区域上方的隔离层，所述隔离层具有凹部; 以及在所述隔离层的所述凹部中的导电材料，所述隔离层设置在所述凹部中的所述导电材料和所述基板之间。

公开(公告)号：US08567837B2

公开(公告)日：2013-10-29

申请号：US12954180

申请日：2010-11-24

申请人： Hsin Chang ,  Hsin-Yu Chen ,  Fang Wen Tsai ,  Jing-Cheng Lin ,  Wen-Chih Chiou ,  Shin-Puu Jeng ,  Chen-Hua Yu

发明人： Hsin Chang ,  Hsin-Yu Chen ,  Fang Wen Tsai ,  Jing-Cheng Lin ,  Wen-Chih Chiou ,  Shin-Puu Jeng ,  Chen-Hua Yu

IPC分类号： B66F19/00

CPC分类号： H01L21/6875 ,  B65G47/90 ,  H01L21/68707 ,  Y10T74/20305

摘要： An apparatus includes a robot arm, and a plurality of guide pins mounted on the robot arm. Each of the plurality of guide pins includes a plurality of wafer supports at different levels, with each of the plurality of wafer supports configured to support and center a wafer having a size different from wafers configured to be supported and centered by remaining ones of the plurality of wafer supports.

公开(公告)号：US08540506B2

公开(公告)日：2013-09-24

申请号：US12857245

申请日：2010-08-16

申请人： Jing-Cheng Lin ,  Wen-Chih Chiou ,  Shin-Puu Jeng ,  Chen-Hua Yu

发明人： Jing-Cheng Lin ,  Wen-Chih Chiou ,  Shin-Puu Jeng ,  Chen-Hua Yu

IPC分类号： H01L21/56

CPC分类号： H01L21/56 ,  H01L21/561 ,  H01L21/565 ,  H01L21/67126 ,  H01L23/3121 ,  H01L24/94 ,  H01L2224/16145 ,  H01L2224/81191 ,  H01L2224/81192 ,  H01L2224/94 ,  H01L2924/181 ,  H01L2224/81 ,  H01L2924/00

摘要： A system and method for a semiconductor molding chamber is disclosed. An embodiment comprises a top molding portion and a bottom molding portion that form a cavity between them into which a semiconductor wafer is placed. The semiconductor molding chamber has a first set of vacuum tubes which hold and fix the position of the semiconductor wafer and a second set of vacuum tubes which evacuate the cavity of extraneous ambient gasses. The encapsulant may then be placed over the semiconductor wafer in order to encapsulate the semiconductor wafer.

公开(公告)号：US20130115854A1

公开(公告)日：2013-05-09

申请号：US13290879

申请日：2011-11-07

申请人： Yi-Chao Mao ,  Jui-Pin Hung ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

发明人： Yi-Chao Mao ,  Jui-Pin Hung ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

IPC分类号： B24B49/10

CPC分类号： H01L22/26 ,  B24B7/228 ,  B24B37/013 ,  B24B49/10 ,  H01L22/12 ,  H01L23/3114 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method for performing grinding includes selecting a target wheel loading for wafer grinding processes, and performing a grinding process on a wafer. With the proceeding of the grinding process, wheel loadings of the grinding process are measured. The grinding process is stopped after the target wheel loading is reached. The method alternatively includes selecting a target reflectivity of wafer grinding processes, and performing a grinding process on a wafer. With a proceeding of the grinding process, reflectivities of a light reflected from a surface of the wafer are measured. The grinding process is stopped after one of the reflectivities reaches the target reflectivity.

摘要翻译： 执行磨削的方法包括：选择用于晶片研磨工艺的目标轮加载，以及对晶片进行研磨处理。 随着研磨过程的进行，测量研磨过程的轮载荷。 在达到目标轮加载后停止研磨过程。 该方法或者包括选择晶片研磨过程的目标反射率，以及对晶片进行研磨处理。 随着研磨过程的进行，测量从晶片表面反射的光的反射率。 在一个反射率达到目标反射率之后停止研磨过程。

公开(公告)号：US08319349B2

公开(公告)日：2012-11-27

申请号：US13342583

申请日：2012-01-03

申请人： Hsien-Pin Hu ,  Chen-Hua Yu ,  Shin-Puu Jeng ,  Shang-Yun Hou ,  Jing-Cheng Lin ,  Wen-Chih Chiou ,  Hung-Jung Tu

发明人： Hsien-Pin Hu ,  Chen-Hua Yu ,  Shin-Puu Jeng ,  Shang-Yun Hou ,  Jing-Cheng Lin ,  Wen-Chih Chiou ,  Hung-Jung Tu

IPC分类号： H01L23/48

CPC分类号： H01L21/561 ,  H01L21/486 ,  H01L23/147 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L24/97 ,  H01L25/0655 ,  H01L2224/05001 ,  H01L2224/05027 ,  H01L2224/05571 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/97 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2224/81 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2224/05541 ,  H01L2224/05005 ,  H01L2224/05599 ,  H01L2224/05099

摘要： A method includes providing an interposer wafer including a substrate, and a plurality of through-substrate vias (TSVs) extending from a front surface of the substrate into the substrate. A plurality of dies is bonded onto a front surface of the interposer wafer. After the step of bonding the plurality of dies, a grinding is performed on a backside of the substrate to expose the plurality of TSVs. A plurality of metal bumps is formed on a backside of the interposer wafer and electrically coupled to the plurality of TSVs.

公开(公告)号：US20120128457A1

公开(公告)日：2012-05-24

申请号：US12954180

申请日：2010-11-24

申请人： Hsin Chang ,  Hsin-Yu Chen ,  Fang Wen Tsai ,  Jing-Cheng Lin ,  Wen-Chih Chiou ,  Shin-Puu Jeng ,  Chen-Hua Yu

发明人： Hsin Chang ,  Hsin-Yu Chen ,  Fang Wen Tsai ,  Jing-Cheng Lin ,  Wen-Chih Chiou ,  Shin-Puu Jeng ,  Chen-Hua Yu

IPC分类号： B65G1/133 ,  B25J18/00

CPC分类号： H01L21/6875 ,  B65G47/90 ,  H01L21/68707 ,  Y10T74/20305

摘要： An apparatus includes a robot arm, and a plurality of guide pins mounted on the robot arm. Each of the plurality of guide pins includes a plurality of wafer supports at different levels, with each of the plurality of wafer supports configured to support and center a wafer having a size different from wafers configured to be supported and centered by remaining ones of the plurality of wafer supports

摘要翻译： 一种装置包括机器人臂和安装在机器人手臂上的多个引导销。 多个引导销中的每一个包括多个不同级别的晶片支架，其中多个晶片支撑件中的每一个被配置为支撑和定心具有不同晶圆尺寸的晶片，所述晶片被配置为被多个晶圆支撑的中心部分支撑并居中 的晶片支架