公开(公告)号：US06068769A

公开(公告)日：2000-05-30

申请号：US135840

申请日：1998-08-18

申请人： Akira Iio ,  Masayuki Hattori ,  Masayuki Motonari

发明人： Akira Iio ,  Masayuki Hattori ,  Masayuki Motonari

IPC分类号： B01F3/12 ,  B01F7/00 ,  B01F7/30 ,  B24B37/04 ,  B24B57/02 ,  C09D17/00 ,  C09K3/14 ,  B01D24/00 ,  B01D37/00 ,  B03B1/00 ,  C04B33/00

CPC分类号： B24B37/04 ,  B01F3/1221 ,  B01F3/1271 ,  B01F7/30 ,  B24B57/02 ,  C09D17/004 ,  C09K3/1463 ,  B01F2215/0031 ,  B01F2215/005 ,  B01F7/00991

摘要： The present invention provides aqueous dispersion slurry of inorganic particles which is so stable as not to increase in viscosity, gel or sediment even if stored for a long time and therefore can be used as raw materials for, for example, cosmetics, paint, coating materials and lapping slurry for semiconductor wafers, and production method of such aqueous dispersion slurry. The aqueous dispersion slurry according to the present invention has the number of particles whose a particle diameter of 1.3 .mu.m or more is 180,000 or less per mL in terms of 30 wt % in concentration, and the average particle diameter thereof is in a range of 0.05-0.9 .mu.m. The number of particles having aparticle diameter of 1.3 .mu.m or more is counted by using Particle Sensor KS-60, which is a light extinction type sensor for detecting particles, and Particle Counter KL-11, which is a particle counter, both of which made by the same manufacturer, Rion Electro Corp. The average particle diameter is measured by using Laser Particle Analyzer System Par-III made by Otsuka Denshi Co., Ltd.

摘要翻译： 本发明提供无机颗粒的水性分散体浆料，其即使长时间贮存也非常稳定，不会增加粘度，凝胶或沉淀物，因此可用作例如化妆品，油漆，涂料的原料 和研磨用于半导体晶片的浆料，以及这种水分散浆料的制造方法。 本发明的水性分散体浆料的粒径为1.3μm以上的粒子数为30,000重量％以下，其浓度为30重量％，平均粒径为 0.05-0.9亩。 通过使用作为用于检测粒子的消光型传感器的粒子传感器KS-60和作为粒子计数器的粒子计数器KL-11，对具有1.3μm以上的粒径的粒子的数量进行计数 由同一制造商Rion Electro Corp.制造。平均粒径通过使用由Otsuka Denshi Co.，Ltd制造的激光粒子分析仪系统Par-III来测量。

公开(公告)号：US5854384A

公开(公告)日：1998-12-29

申请号：US719544

申请日：1996-09-25

申请人： Kyoko Kuroda ,  Masayuki Hattori ,  Yoshitaka Yamakawa ,  Kenya Makino ,  Toshio Hayashi

发明人： Kyoko Kuroda ,  Masayuki Hattori ,  Yoshitaka Yamakawa ,  Kenya Makino ,  Toshio Hayashi

IPC分类号： A61K9/16 ,  C08G69/10 ,  C08G69/00

CPC分类号： A61K9/1641 ,  C08G69/10

摘要： A process for preparing poly-.alpha.-amino acid particles comprising polymerizing an .alpha.-amino acid-N-carboxy anhydride using a polymerization initiator in an organic solvent in which both the solubility of the .alpha.-amino acid-N-carboxy anhydride and the solubility of the produced poly-.alpha.-amino acid are 0.1 g/100 ml or less at 25.degree. C. Polyamino acid particles having a high molecular weight and a small bulk specific gravity can be manufactured very easily without requiring specific procedures. The polyamino acid particles can be used as a coating material for papers, resins, rubbers, and fibers; particles for cosmetics; particles for diagnostic drugs; fillers for chromatography; and an encapsulating material for drugs, fertilizers, and perfumes.

摘要翻译： 一种制备聚-α-氨基酸颗粒的方法，包括在有机溶剂中使用聚合引发剂聚合α-氨基酸-N-羧酸酐，其中α-氨基酸-N-羧酸酐的溶解度和溶解度 的制备的聚-α-氨基酸在25℃下为0.1g / 100ml或更少。具有高分子量和小堆积比重的聚氨基酸颗粒可以非常容易地制造，而不需要特定的程序。 聚氨基酸颗粒可用作纸，树脂，橡胶和纤维的涂料; 化妆品颗粒 用于诊断药物的颗粒; 色谱填料; 以及用于药物，肥料和香水的包封材料。

公开(公告)号：US5814687A

公开(公告)日：1998-09-29

申请号：US791745

申请日：1997-01-30

申请人： Kiyoshi Kasai ,  Masayuki Hattori ,  Kakun Han

发明人： Kiyoshi Kasai ,  Masayuki Hattori ,  Kakun Han

IPC分类号： A61K47/30 ,  C08F2/44 ,  C08K3/22 ,  C08L31/02 ,  C08L31/04 ,  C08L33/04 ,  C08L33/14 ,  H01F1/44 ,  C08K7/16

CPC分类号： H01F1/445 ,  C08K3/22 ,  C08K2003/2268 ,  C08K2003/2272 ,  C08K2003/2275

摘要： Novel magnetic polymer particles which resists precipitation in an aqueous medium. The novel magnetic polymer particles can be widely used as carriers for diagnostics and immobilized enzymes, carriers for bacterial isolation, carriers for cell segregation, carriers for isolation and purification of ribonucleic acids and proteins, carriers for drug deliveries, and are usable as material for magnetic toners, magnetic inks, and magnetic coatings. The process for manufacturing the magnetic polymer particles comprising; dispersing a monomer mixture including a hydrophobic monomer containing more than 50% by weight of (meth)acrylic ester and a superparamagnetic substance in an aqueous medium to prepare an suspension, and polymerizing the monomers.

摘要翻译： 抗水性介质中的沉淀的新型磁性聚合物颗粒。 新型磁性聚合物颗粒可广泛用作诊断和固定化酶的载体，用于细菌分离的载体，用于细胞分离的载体，用于分离和纯化核糖核酸和蛋白质的载体，用于药物递送的载体，并且可用作磁性材料 调色剂，磁性油墨和磁性涂料。 制造磁性聚合物颗粒的方法包括： 将包含超过50重量％的（甲基）丙烯酸酯和超顺磁性物质的疏水性单体的单体混合物在水性介质中分散以制备悬浮液，并使单体聚合。

公开(公告)号：US5262705A

公开(公告)日：1993-11-16

申请号：US914270

申请日：1992-07-15

申请人： Masayuki Hattori

发明人： Masayuki Hattori

IPC分类号： G05F1/577 ,  G05F1/62 ,  G11B19/20 ,  H02P7/288 ,  G05F5/00

CPC分类号： G05F1/577 ,  G05F1/62 ,  G11B19/20 ,  H02P7/288

摘要： Here is disclosed an IC for controlling the spindle motor of a small hard disk drive unit, characteristic in being provided with a voltage detection circuit for a control circuit driving power source, responsive to the voltage at the connecting terminal of the control circuit driving power source for generating a signal to control the operation of the spindle motor; a voltage detection circuit for a motor driving power source, responsive to the voltage at the connecting terminal of the motor driving power source for controlling the operation of the motor; and further provided with a logic circuit for keeping valid the output signal of the voltage detecting circuit for said motor driving power source from the time the voltage at the motor driving power source terminal rises above a prescribed voltage higher than the upper limit of the prescribed voltage range of the control circuit power source until the time it falls below another prescribed voltage lower than the lower limit of said prescribed voltage range.The IC can be used in a single voltage mode, in which a single voltage power source corresponding to the control circuit driving power source is connected to the control circuit power source terminal and the motor driving power source terminal, or in a dual voltage mode, in which power sources of two different voltages can be connected to these power source terminals, it increases the freedom of design.

摘要翻译： 这里公开了一种用于控制小型硬盘驱动单元的主轴电机的IC，其特征在于，具有控制电路驱动电源的电压检测电路，响应控制电路驱动电源的连接端的电压 用于产生用于控制主轴电动机的操作的信号; 用于电动机驱动电源的电压检测电路，响应于电动机驱动电源的连接端的电压，用于控制电动机的运行; 并且还设有逻辑电路，用于在电动机驱动电源端子的电压升高到高于规定电压的上限的规定电压以上时，保持电动机驱动电源的电压检测电路的输出信号有效 控制电路电源的范围，直到其下降到比规定电压范围的下限低的另一规定电压为止。 该IC可以在单电压模式下使用，其中对应于控制电路驱动电源的单电压电源连接到控制电路电源端子和电动机驱动电源端子，或以双电压模式连接， 其中两个不同电压的电源可以连接到这些电源端子，这增加了设计的自由度。

公开(公告)号：US5216096A

公开(公告)日：1993-06-01

申请号：US764444

申请日：1991-09-24

申请人： Masayuki Hattori ,  E. David Sudol ,  Mohamed S. El-Aasser

发明人： Masayuki Hattori ,  E. David Sudol ,  Mohamed S. El-Aasser

IPC分类号： C08F2/04 ,  C08F2/08 ,  C08F2/10 ,  C08F12/00 ,  C08F20/10 ,  C08F212/04 ,  C08F220/04 ,  C08F220/06 ,  C08F220/18 ,  C08F220/28

CPC分类号： C08F2/08

摘要： A process for the preparation of highly crosslinked polymer particles from polymerizable vinyl monomers comprising 15% by weight or more of a crosslinking vinyl monomer. The process comprises: providing an organic solvent, a mixture of organic solvents, or a mixture of at least one organic solvent and water which can dissolve the polymerizable vinyl monomers but cannot dissolve the polymer which is produced by the polymerization of the polymerizable vinyl monomers, the solubility in water of the polymerizable vinyl monomer being not more than 30% by weight, dispersing the polymerizable vinyl monomers into the organic solvent, the mixture of organic solvents, or the mixture of the at least one organic solvent and water, and polymerizing the polymerizable vinyl monomers in the presence of a dispersion stabilizer and a radical polymerization initiator. The crosslinked polymer particles have a comparatively uniform particle size within the particle size range of 0.1-10 .mu.m. They are useful as a slip property improver for plastic films, a spacer for liquid crystal display devices, a carrier for chromatography, and a standard sample for microscopic examination.

公开(公告)号：US07153369B2

公开(公告)日：2006-12-26

申请号：US10200504

申请日：2002-07-23

申请人： Masayuki Motonari ,  Masayuki Hattori ,  Nobuo Kawahashi

发明人： Masayuki Motonari ,  Masayuki Hattori ,  Nobuo Kawahashi

IPC分类号： C23G1/14 ,  C09G1/02 ,  C09K3/14 ,  H01L21/321

CPC分类号： C09K3/1463 ,  C09G1/02 ,  H01L21/3212 ,  Y10S134/902

摘要： It is an object of the invention to provide an aqueous dispersion for CMP that produces no scratches on polishing surfaces and that polishes with an adequate rate, when used for polishing of copper and the like. The aqueous dispersion of the invention contains water and polymer particles composed of a polymer with a specific functional group, and it may also contain a complexing agent, a compound that forms a passivation film on polishing surfaces and/or an oxidizing agent. The specific functional group is a functional group that can react with the metals of polishing surfaces or that can form a cation, and it is preferably selected from among amino, pyridyl and acrylamide groups. The polymer can be obtained using a initiator and/or monomer possessing the specific functional group. The polymer may also have a crosslinked structure.

公开(公告)号：US07090786B2

公开(公告)日：2006-08-15

申请号：US10878052

申请日：2004-06-29

申请人： Masayuki Hattori ,  Nobuo Kawahashi

发明人： Masayuki Hattori ,  Nobuo Kawahashi

IPC分类号： C09K13/06

CPC分类号： C09K3/1463 ,  C09G1/02

摘要： The aqueous dispersion comprising (A) abrasive grains, (B) at least one compound selected from the group consisting of 2-bromo-2-nitro-1,3-propanediol, 2-bromo-2-nitro-1, 3-butanediol, 2,2-dibromo-2-nitroethanol, and 2,2-dibromo-3-nitrilopropionamide, and (C) an organic component other than the compounds of component (B) is disclosed. The aqueous dispersion has no problem of rotting even if stored or used in a neutral pH region and produces an excellent polished surface with almost no dishing or scratches, when applied particularly to the STI process for manufacturing of semiconductor devices.

摘要翻译： 所述水性分散体包含（A）磨粒，（B）至少一种选自2-溴-2-硝基-1,3-丙二醇，2-溴-2-硝基-1,3-丁二醇， ，2,2-二溴-2-硝基乙醇和2,2-二溴-3-硝基丙酰胺，和（C）除了组分（B）的化合物之外的有机组分。 即使在中性pH区域中储存或使用时，水性分散体也没有腐烂的问题，特别是在用于制造半导体器件的STI工艺时，产生几乎没有凹陷或划痕的抛光表面。

公开(公告)号：US07005382B2

公开(公告)日：2006-02-28

申请号：US10694890

申请日：2003-10-29

申请人： Kazuo Nishimoto ,  Tatsuaki Sakano ,  Akihiro Takemura ,  Masayuki Hattori ,  Nobuo Kawahashi ,  Naoto Miyashita ,  Atsushi Shigeta ,  Yoshitaka Matsui ,  Kazuhiko Ida

发明人： Kazuo Nishimoto ,  Tatsuaki Sakano ,  Akihiro Takemura ,  Masayuki Hattori ,  Nobuo Kawahashi ,  Naoto Miyashita ,  Atsushi Shigeta ,  Yoshitaka Matsui ,  Kazuhiko Ida

IPC分类号： B24B1/00

CPC分类号： H01L21/3212 ,  C09G1/02 ,  H01L21/02024

摘要： Provided are an aqueous dispersion for chemical mechanical polishing, which planarizes a surface to be polished and has high shelf stability, a chemical mechanical polishing process excellent in selectivity when surfaces of different materials are polished, and a production process of a semiconductor device. A first aqueous dispersion contains a water-soluble quaternary ammonium salt, an inorganic acid salt, abrasive grains and an aqueous medium. A second aqueous dispersion contains at least a water-soluble quaternary ammonium salt, another basic organic compound other than the water-soluble quaternary ammonium salt, an inorganic acid salt, a water-soluble polymer, abrasive grains and an aqueous medium. The second aqueous dispersion is composed of a first aqueous dispersion material (I) obtained by mixing a water-soluble quaternary ammonium salt and an inorganic acid salt into an aqueous medium, and a second aqueous dispersion material (II) obtained by mixing a water-soluble polymer and another basic organic compound other than the water-soluble quaternary ammonium salt into an aqueous medium. Abrasive grains are contained in at least one of the aqueous dispersion materials.

摘要翻译： 提供了用于化学机械抛光的水分散体，其平坦化待抛光的表面并具有高的储存稳定性，当抛光不同材料的表面时选择性优异的化学机械抛光工艺以及半导体器件的生产工艺。 第一种水性分散体含有水溶性季铵盐，无机酸盐，磨粒和水性介质。 第二水性分散体至少包含水溶性季铵盐，除水溶性季铵盐以外的其它碱性有机化合物，无机酸盐，水溶性聚合物，磨料颗粒和水性介质。 第二水性分散体由通过将水溶性季铵盐和无机酸盐混合到水性介质中而得到的第一水分散体（I）和第二水分散体（II） 水溶性聚合物和除了水溶性季铵盐之外的另一种碱性有机化合物转化成水性介质。 磨粒在至少一种水分散体中含有。

公开(公告)号：US06935928B2

公开(公告)日：2005-08-30

申请号：US10882362

申请日：2004-07-02

申请人： Kazuhito Uchikura ,  Kazuo Nishimoto ,  Masayuki Hattori ,  Nobuo Kawahashi ,  Hiroyuki Yano ,  Yukiteru Matsui ,  Gaku Minamihaba ,  Dai Fukushima ,  Nobuyuki Kurashima

发明人： Kazuhito Uchikura ,  Kazuo Nishimoto ,  Masayuki Hattori ,  Nobuo Kawahashi ,  Hiroyuki Yano ,  Yukiteru Matsui ,  Gaku Minamihaba ,  Dai Fukushima ,  Nobuyuki Kurashima

IPC分类号： C09G1/02 ,  C09K3/14 ,  H01L21/02 ,  H01L21/321 ,  H01L21/302 ,  H01L21/461

CPC分类号： H01L21/02074 ,  C09G1/02 ,  C09K3/1463 ,  H01L21/3212

摘要： A chemical mechanical polishing aqueous dispersion comprises a component (A) composed of abrasive grains, a component (B) composed of at least one of quinolinecarboxylic acid and pyridinecarboxylic acid, a component (C) composed of an organic acid other than quinolinecarboxylic acid and pyridinecarboxylic acid and a component (D) composed of an oxidizing agent, wherein a mass ratio (WB/WC) of the content (WB) of the component (B) to the content (WC) of the component (C) is not less than 0.01 and less than 2, and the concentration of an ammonia component composed of ammonia and ammonium ion is not more than 0.005 mol/litter. According to the chemical mechanical polishing aqueous dispersion, various layers to be processed can be polished with high efficiency, and a sufficiently planarized polished surface of high precision can be obtained.

摘要翻译： 化学机械研磨用水系分散体包含由磨粒构成的成分（A），由喹啉羧酸和吡啶羧酸中的至少一种构成的成分（B），由喹啉羧酸以外的有机酸构成的成分（C），吡啶羧酸 酸和由氧化剂组成的组分（D），其中组分（B）的含量（WB）与组分（C）的含量（WC）的质量比（WB / WC）不小于 0.01和小于2，由氨和铵离子组成的氨组分的浓度不大于0.005mol / l。 根据化学机械研磨水分散体，能够高效率地研磨各种被处理层，能够得到高精度的平坦化的抛光面。

公开(公告)号：US20050164510A1

公开(公告)日：2005-07-28

申请号：US11038190

申请日：2005-01-21

申请人： Norihiko Ikeda ,  Kazuo Nishimoto ,  Masayuki Hattori ,  Nobuo Kawahashi

发明人： Norihiko Ikeda ,  Kazuo Nishimoto ,  Masayuki Hattori ,  Nobuo Kawahashi

IPC分类号： C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306 ,  H01L21/3105 ,  H01L21/302 ,  H01L21/461

CPC分类号： C09G1/02 ,  C09K3/1463 ,  H01L21/31053

摘要： A chemical mechanical polishing aqueous dispersion comprises abrasives (A) containing ceria, an anionic water-soluble polymer (B) and a cationic surfactant (C), wherein the amount of the anionic water-soluble polymer (B) is in the range of 60 to 600 parts by mass based on 100 parts by mass of the abrasives (A) containing ceria, and the amount of the cationic surfactant (C) is in the range of 0.1 to 100 ppm based on the whole amount of the chemical mechanical polishing aqueous dispersion.

摘要翻译： 化学机械抛光水分散体包含含有二氧化铈的研磨剂（A），阴离子水溶性聚合物（B）和阳离子表面活性剂（C），其中阴离子水溶性聚合物（B）的量在60 相对于100质量份含有二氧化铈的研磨剂（A）为600质量份，阳离子性表面活性剂（C）的含量相对于化学机械研磨用水的总量为0.1〜100ppm 分散。