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公开(公告)号:US10466414B2
公开(公告)日:2019-11-05
申请号:US15594886
申请日:2017-05-15
Applicant: Gigaphoton Inc.
Inventor: Hirotaka Miyamoto , Osamu Wakabayashi
IPC: G02B5/18 , G02B6/12 , B44C1/22 , F21V8/00 , H01S3/1055 , H01S3/225 , G02B6/00 , G02B26/08 , H01S3/08
Abstract: A grating for line-narrowing a laser beam that is outputted from a laser apparatus at a wavelength in a vacuum ultraviolet region may include: a grating substrate; a first aluminum metal film formed above the grating substrate, the first aluminum metal film having grooves in a surface thereof; and a first protective film formed by an ALD method above the first aluminum metal film.
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公开(公告)号:US10394133B2
公开(公告)日:2019-08-27
申请号:US15914299
申请日:2018-03-07
Applicant: GIGAPHOTON INC.
Inventor: Yuji Minegishi , Yutaka Igarashi , Takeshi Ohta
Abstract: A laser unit management system may include a server configured to hold first information provided with access limitation that allows an access with a first access authorization, second information provided with access limitation that allows an access with a second access authorization, and third information provided with access limitation that allows both an access with the first access authorization and an access with the second access authorization; and a laser unit including a laser output section and a controller, the laser output section being configured to output pulsed laser light toward an exposure unit that is configured to perform wafer exposure, the controller being configured to store the first information, the second information, and the third information in the server. The second information may include wafer-exposure-related information on the exposure unit and laser-control-related information on the laser unit that are in association with each other.
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公开(公告)号:US20190237928A1
公开(公告)日:2019-08-01
申请号:US16375591
申请日:2019-04-04
Applicant: Gigaphoton Inc.
Inventor: Masanori YASHIRO , Hiroaki TSUSHIMA , Osamu WAKABAYASHI
CPC classification number: H01S3/036 , C01B7/20 , H01S3/03 , H01S3/09705 , H01S3/104 , H01S3/2258
Abstract: A laser gas regeneration system for an excimer laser includes a first pipe capable of supplying a laser chamber with a first laser gas, a second pipe capable of supplying the laser chamber with a second laser gas having a halogen gas concentration higher than that of the first laser gas, a third pipe allowing a gas exhausted from the laser chamber to pass therethrough, a gas refiner that refines the gas having passed through the third pipe, a branch that causes the refined gas to divide and flow into a fourth pipe and a fifth pipe, a first regenerated gas supplier that supplies the first pipe with a gas having divided and flowed into the fourth pipe, and a second regenerated gas supplier that adds a halogen gas to a gas having divided and flowed into the fifth pipe and supplies the second pipe with the halogen-added gas.
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公开(公告)号:US10288484B2
公开(公告)日:2019-05-14
申请号:US16004942
申请日:2018-06-11
Applicant: Cymer, LLC
Inventor: Zhongquan Zhao , Brian Edward King , Thomas Patrick Duffey
IPC: G01J1/42 , G01J3/50 , G01J3/02 , G01J3/26 , G01J11/00 , G03F7/20 , H01S4/00 , H01S3/23 , G01J1/04 , H01S3/08 , H01S3/225 , H01S3/00
Abstract: A metrology system is used for measuring a spectral feature of a pulsed light beam. The metrology system includes: a beam homogenizer in the path of the pulsed light beam, the beam homogenizer having an array of wavefront modification cells, with each cell having a surface area that matches a size of at least one of the spatial modes of the light beam; an optical frequency separation apparatus in the path of the pulsed light beam exiting the beam homogenizer, wherein the optical frequency separation apparatus is configured to interact with the pulsed light beam and to output a plurality of spatial components that correspond to the spectral components of the pulsed light beam; and at least one sensor that receives and senses the output spatial components.
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公开(公告)号:US10234765B2
公开(公告)日:2019-03-19
申请号:US15613662
申请日:2017-06-05
Applicant: COHERENT LASERSYSTEMS GMBH & CO. KG
Inventor: Igor Bragin
Abstract: Excimer laser annealing apparatus includes and excimer laser delivering laser-radiation pulses to a silicon layer supported on a substrate translated with respect to the laser pulses such that the consecutive pulses overlap on the substrate. The energy of each of the laser-radiation pulses is monitored, transmitted to control-electronics, and the energy of a next laser pulse is adjusted by a high-pass digital filter.
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公开(公告)号:US10170883B1
公开(公告)日:2019-01-01
申请号:US15851484
申请日:2017-12-21
Applicant: Robert O. Hunter, Jr.
Inventor: Robert O. Hunter, Jr.
IPC: H01S3/10 , H01S3/00 , H01S3/102 , H01S3/30 , H01S3/22 , H01S3/094 , H01S3/0943 , H01S3/23 , H01S3/108 , H01S3/225
Abstract: The present architecture utilizes a Nonlinear Scattering Aperture Combiner that does not need to be optically multiplexed and then drives a Direct Compressor stage that produces a large temporal compression ratio to pump a Fast Compressor. This eliminates the need for a separate array of ATDMs, multiplexing optical elements, and, at the approximate 107 joule energy output required for ICF, reduces the number of mechanical elements and gas interfaces from the order of 103 to about 10. In addition, this provides a large reduction of the volume of the gas containment region. In order to accomplish this, a technique for transversely segmenting by color and/or polarization of the optical extraction beams of the Direct Compressor has been invented. In particular, it emphasizes the simplicity and uniqueness of design of the Direct Compressor. The Direct Compressor is unique in terms of high fluence, high temporal compression ratios, and high stage gain, leading to a very large reduction in laser costs. It may separately have many other applications than ICF.
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公开(公告)号:US10103509B2
公开(公告)日:2018-10-16
申请号:US15836878
申请日:2017-12-10
Applicant: Gigaphoton, Inc.
Inventor: Kouji Kakizaki , Akira Suwa , Osamu Wakabayashi , Hiroshi Umeda
Abstract: The excimer laser device receives data on a target value of pulse energy from an external device and outputs a pulse laser beam. The excimer laser device includes a master oscillator, at least one power amplifier including a chamber provided in an optical path of the pulse laser beam outputted from the master oscillator, a pair of electrodes provided in the chamber, and an electric power source configured to apply voltage to the pair of electrodes, and a controller configured to control the electric power source of one power amplifier of the at least one power amplifier to stop applying the voltage to the pair of electrodes based on the target value of the pulse energy.
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公开(公告)号:US10096966B2
公开(公告)日:2018-10-09
申请号:US15290518
申请日:2016-10-11
Applicant: Gigaphoton Inc.
Inventor: Akira Suwa , Kouji Kakizaki , Hiroaki Tsushima , Tomoyuki Ohkubo , Hiroshi Umeda , Hisakazu Katsuumi
IPC: H01S3/097 , H01G4/14 , H01G4/258 , H01G4/30 , H01S3/041 , H01S3/225 , H01S3/03 , H01S3/036 , H01S3/038
Abstract: A gas laser device may include: a laser chamber containing laser gas; a first discharge electrode disposed in the laser chamber; a second discharge electrode disposed to face the first discharge electrode in the laser chamber; and a condenser including a polyimide dielectric and configured to supply power to between the first discharge electrode and the second discharge electrode.
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公开(公告)号:US10061197B2
公开(公告)日:2018-08-28
申请号:US15326207
申请日:2015-07-09
Applicant: USHIO DENKI KABUSHIKI KAISHA
Inventor: Tatsushi Owada , Shinji Suzuki
CPC classification number: G03F7/2004 , G03F7/0002 , G03F7/165 , G03F7/168 , G03F7/70016 , G03F7/70041 , G03F7/7015 , G03F7/7035 , G03F7/70466 , G03F7/70933 , H01J61/16 , H01J61/368 , H01J61/545 , H01J61/86 , H01J61/90 , H01L21/0274 , H01S3/225 , H01S3/2253 , H01S3/2255 , H05B41/34
Abstract: Disclosed herein a vacuum ultra violet light source device that is capable of suppressing an amount of ozone generation when the vacuum ultra violet light is emitted into an atmosphere containing oxygen, a light irradiation device incorporating the vacuum ultra violet light device, and a method of patterning a self-assembled monolayer employing the light irradiation device. The light irradiation device is configured to irradiate a self-assembled monolayer (SAM) formed on a workpiece with light containing vacuum ultra violet light through a mask M on which a prescribed pattern is formed so as to perform a patterning process of the SAM. The light containing the vacuum ultra violet light to be irradiated onto the SAM is light that is pulsed light and has a duty ratio of light emission equal to or greater than 0.00001 and equal to or less than 0.01.
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公开(公告)号:US09991665B2
公开(公告)日:2018-06-05
申请号:US15713761
申请日:2017-09-25
Applicant: Gigaphoton Inc.
Inventor: Hiroshi Umeda , Takeshi Asayama , Osamu Wakabayashi
IPC: H01S3/097 , B23K26/00 , H01L21/67 , H01S3/139 , H01L21/02 , H01S3/23 , H01S3/225 , H01S3/104 , H01S3/00 , H01S3/13
CPC classification number: H01S3/09702 , B23K26/00 , B23K26/0608 , H01L21/02686 , H01L21/67115 , H01S3/0057 , H01S3/104 , H01S3/1305 , H01S3/1394 , H01S3/225 , H01S3/2308 , H01S3/2383
Abstract: The laser system may include a delay circuit unit, first and second trigger-correction units, and a clock generator. The delay circuit unit may receive a trigger signal, output a first delay signal obtained by delaying the trigger signal by a first delay time, and output a second delay signal obtained by delaying the trigger signal by a second delay time. The first trigger-correction unit may receive the first delay signal and output a first switch signal obtained by delaying the first delay signal by a first correction time. The second trigger-correction unit may receive the second delay signal and output a second switch signal obtained by delaying the second delay signal by a second correction time. The clock generator may generate a clock signal that is common to the delay circuit unit and the first and second trigger-correction units.
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