公开(公告)号：US20060115745A1

公开(公告)日：2006-06-01

申请号：US11235422

申请日：2005-09-26

申请人： Hiroshi Yasuda ,  Akio Yamada

发明人： Hiroshi Yasuda ,  Akio Yamada

IPC分类号： G03F1/00 ,  G03C5/00 ,  A61N5/00 ,  G21G5/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  H01J2237/31769

摘要： An electron beam exposure system includes: an electron beam generation unit for generating an electron beam; an electron beam exposure mask having opening portions for proximity effect correction, which opening portions are arranged so that sizes of the opening portions change at a predetermined rate in order of arrangement; a mask deflection unit for deflecting the electron beam on the electron beam exposure mask; a substrate deflection unit for deflecting the electron beam passed through the exposure mask and projecting the electron beam onto a substrate; and a control unit for controlling deflection amounts in the mask deflection unit and the substrate deflection unit. The direction or directions of the change may be any one of a row direction and a column direction or may be the row and column directions.

摘要翻译： 电子束曝光系统包括：用于产生电子束的电子束产生单元; 具有用于邻近效应校正的开口部分的电子束曝光掩模，所述开口部分布置成使得开口部分的尺寸按照预定的顺序排列; 用于使电子束在电子束曝光掩模上偏转的掩模偏转单元; 用于偏转通过曝光掩模的电子束并将电子束投影到衬底上的衬底偏转单元; 以及用于控制掩模偏转单元和基板偏转单元中的偏转量的控制单元。 改变的方向或方向可以是行方向和列方向中的任何一个，或者可以是行和列方向。

公开(公告)号：US06881968B2

公开(公告)日：2005-04-19

申请号：US10422407

申请日：2003-04-23

申请人： Akio Yamada

发明人： Akio Yamada

IPC分类号： H01J37/12 ,  H01J37/14 ,  H01J37/302 ,  H01J37/304 ,  H01J37/317 ,  H01L21/027 ,  H01L21/30

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776

摘要： An electron beam exposure apparatus for exposing a wafer by an electron beam, including: an electron beam generation section for generating the electron beam; an electron beam shaping member with a plurality of openings for shaping the electron beam; a deflecting section for deflecting the electron beam which has passed through the electron beam shaping member; and a deflection correction control section for controlling the deflecting section based on a position of the opening of the electron beam shaping member through which the electron beam passes. The deflecting section deflects the electron beam and corrects distortion of an image of the electron beam on the wafer.

摘要翻译： 一种用于通过电子束曝光晶片的电子束曝光装置，包括：用于产生电子束的电子束产生部分; 具有用于使电子束成形的多个开口的电子束成形构件; 用于偏转已经通过电子束成形构件的电子束的偏转部分; 以及偏转校正控制部分，用于基于电子束通过的电子束成形构件的开口的位置来控制偏转部分。 偏转部分使电子束偏转并校正晶片上电子束图像的失真。

公开(公告)号：US20050004041A1

公开(公告)日：2005-01-06

申请号：US10496200

申请日：2002-11-21

申请人： Yoshitaka Tamura ,  Hiroshi Miyakawa ,  Akio Yamada ,  Hitoshi Saito ,  Yasushi Kawaguchi ,  Hiroshi Ochi ,  Tomoko Ide ,  Eri Inoue

发明人： Yoshitaka Tamura ,  Hiroshi Miyakawa ,  Akio Yamada ,  Hitoshi Saito ,  Yasushi Kawaguchi ,  Hiroshi Ochi ,  Tomoko Ide ,  Eri Inoue

IPC分类号： A61K38/00 ,  A61P9/00 ,  A61P9/12 ,  A61P43/00 ,  C07K5/083 ,  C07K14/47 ,  C07K5/06 ,  A61K38/05

CPC分类号： C07K14/4732 ,  A61K38/00 ,  C07K5/081

摘要： A peptide Met-Lys-Pro, which is obtained by chemical synthesis ot hydrolysis of casein, is used as the active ingredient of angiotensin converting enzyme inhibitors or hypotensive drugs.

摘要翻译： 用酪蛋白水解化学合成获得的肽Met-Lys-Pro作为血管紧张素转换酶抑制剂或降血压药物的有效成分。

公开(公告)号：US5949078A

公开(公告)日：1999-09-07

申请号：US131368

申请日：1998-08-07

申请人： Yoshihisa Ooaeh ,  Tomohiko Abe ,  Akio Yamada ,  Hiroshi Yasuda ,  Kenj Kudoh ,  Kouzi Takahata

发明人： Yoshihisa Ooaeh ,  Tomohiko Abe ,  Akio Yamada ,  Hiroshi Yasuda ,  Kenj Kudoh ,  Kouzi Takahata

IPC分类号： H01J37/07 ,  H01J37/065 ,  H01J37/24 ,  H01J37/30

CPC分类号： H01J37/241 ,  H01J37/065 ,  H01J2237/3175

摘要： An electron gun for emitting an electron beam traveling along a beam axis includes a cathode having a tip, the tip having substantially a circular conic shape and a tip surface substantially at the beam axis, the cathode being applied with a first voltage, an anode having a first aperture substantially on the beam axis and being applied with a second voltage higher than the first voltage, a control electrode having a second aperture substantially on the beam axis and being applied with a voltage lower that the first voltage to control a current of the cathode, the second aperture being larger than the tip surface, a guide electrode having a third aperture substantially on the beam axis, being arranged between the cathode and the anode, and being applied with a voltage higher than the first voltage and lower than the second voltage, the third aperture being smaller than the tip surface, and a lens electrode having a fourth aperture substantially on the beam axis, being arranged between the guide electrode and the anode, and being applied with a voltage lower than the first voltage to form a cross-over image of the electron beam, the fourth aperture being larger than the third aperture.

摘要翻译： 用于发射沿着光束轴线行进的电子束的电子枪包括具有尖端的阴极，该尖端具有基本上圆形的圆锥形形状和基本上在光束轴线处的尖端表面，阴极被施加第一电压，阳极具有 基本上在所述光束轴上的第一孔，并且施加有高于所述第一电压的第二电压;控制电极，其具有基本上在所述光束轴上的第二孔，并施加低于所述第一电压以控制所述第一电压的电流 阴极，第二孔径大于尖端表面，具有基本上在梁轴上的第三孔的引导电极设置在阴极和阳极之间，并施加有比第一电压高的电压并且低于第二电压 电压，所述第三孔小于所述尖端表面，以及透镜电极，所述透镜电极具有基本上在所述光束轴上的第四孔 引导电极和阳极，并施加低于第一电压的电压以形成电子束的交叉图像，第四孔径大于第三孔径。

公开(公告)号：US5830612A

公开(公告)日：1998-11-03

申请号：US711935

申请日：1996-09-11

申请人： Akio Yamada ,  Satoru Sagou ,  Hitoshi Watanabe ,  Satoru Yamazaki ,  Kiichi Sakamoto ,  Manabu Ohno ,  Kenichi Kawakami ,  Katsuhiko Kobayashi

发明人： Akio Yamada ,  Satoru Sagou ,  Hitoshi Watanabe ,  Satoru Yamazaki ,  Kiichi Sakamoto ,  Manabu Ohno ,  Kenichi Kawakami ,  Katsuhiko Kobayashi

IPC分类号： G03F1/00 ,  G03F1/20 ,  H01J37/304 ,  H01J37/317 ,  G03F9/00 ,  G03C5/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/86 ,  H01J37/3045 ,  H01J37/3174 ,  G03F1/20 ,  H01J2237/2817 ,  H01J2237/31794

摘要： A method of detecting deficiency of an aperture used in a charged-particle-beam exposure process employing at least two exposure columns is disclosed, where each of the two exposure columns passes a charged-particle beam through the aperture formed through a mask to shape a cross section of the charged-particle beam before exposing the charged-particle beam onto an object. The method includes the steps of mounting masks having the same aperture to the at least two exposure columns; scanning, in each of the at least two exposure columns, the charged-particle beam over an area containing a mark on a surface substantially at the same height as the object after passing the charged-particle beam through the same aperture; obtaining, in each of the at least two exposure columns, a signal waveform corresponding to the scan by detecting charged particles scattered by the mark; and comparing the signal waveform between the at least two exposure columns.

摘要翻译： 公开了一种检测在使用至少两个曝光柱的带电粒子束曝光工艺中使用的孔的缺陷的方法，其中两个曝光柱中的每一个通过带电粒子束穿过通过掩模形成的孔以形成 在将带电粒子束暴露在物体上之前的带电粒子束的横截面。 该方法包括以下步骤：将具有相同孔径的掩模安装到至少两个曝光柱; 在所述至少两个曝光柱中的每一个中，在将带电粒子束通过相同的孔之后，将包含在与物体基本上处于相同高度的表面上的标记的区域上的带电粒子束扫描; 在所述至少两个曝光列中的每一个中，通过检测由所述标记散射的带电粒子来获得对应于所述扫描的信号波形; 以及比较所述至少两个曝光列之间的信号波形。

公开(公告)号：US5808313A

公开(公告)日：1998-09-15

申请号：US892976

申请日：1997-07-15

申请人： Akio Yamada ,  Hiroshi Yasuda ,  Hidefumi Yabara ,  Atsushi Saito

发明人： Akio Yamada ,  Hiroshi Yasuda ,  Hidefumi Yabara ,  Atsushi Saito

IPC分类号： H01L21/027 ,  H01J37/304 ,  H01J37/317 ,  H01J37/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174

摘要： The object of the present invention is to ensure a correct exposure even when a single exposure apparatus is used to expose a predetermined pattern, and an exposure apparatus therefor. According to the present invention, a charged particle beam exposure method, wherein a charged particle beam having a predetermined shape is irradiated to a sample to have the surface of the sample be exposed, comprises the steps of: storing a record of a first quantity of reflected electrons or a first sample current, which is detected in accordance with the charged particle beam irradiatd to the sample when a first exposure pattern is formed in a first area of the sample; and comparing a second quantity of reflected electrons or a second sample current, which is detected in accordance with the charged particle beam irradiated to the sample when the first exposure pattern is formed in a second area of the sample, with the first quantity of the reflected electrons or the first sample current which is stored when the first area is exposed, and generating a matched or unmatched signal therefor.

摘要翻译： 本发明的目的在于即使使用单一的曝光装置来曝光预定图案也能确保正确的曝光及其曝光装置。 根据本发明，一种带电粒子束曝光方法，其中对样品照射具有预定形状的带电粒子束以暴露样品的表面，包括以下步骤：将第一量的 反射电子或第一样品电流，当在样品的第一区域中形成第一曝光图案时，其根据被照射到样品的带电粒子束来检测; 并且比较第二量的反射电子或第二样品电流，其在样品的第二区域中形成第一曝光图案时根据照射到样品的带电粒子束检测到的第一数量的反射电子或第二样品电流， 电子或第一采样电流，其在第一区域被暴露时存储，并且产生匹配或不匹配的信号。

公开(公告)号：US5657415A

公开(公告)日：1997-08-12

申请号：US365001

申请日：1994-12-28

申请人： Akio Yamada

发明人： Akio Yamada

IPC分类号： H04N7/14 ,  H04N7/16 ,  H04N19/00 ,  H04N19/42 ,  H04N19/423 ,  H04N19/46 ,  H04N19/503 ,  H04N19/51 ,  H04N19/70 ,  H04N19/85 ,  H04N21/435 ,  H04N5/76 ,  H04N5/93

CPC分类号： H04N19/537 ,  H04N19/20

摘要： A moving picture reproduction apparatus is disclosed which can reproduce successive moving pictures representing an appropriate movement only by extracting, from within motion information inputted as fragmentary movements, a small number of particular motion parameters of such movement as, for example, a turning movement of the face of a person or a movement of the mouth. The moving picture reproduction apparatus comprises a motion parameter extraction circuit for extracting a motion parameter from motion information of an inputted picture, a video sequence storage circuit for storing a plurality of video sequences which are series of moving pictures individually corresponding to a plurality of motion parameters, and a moving picture production circuit for reading out, in accordance with the motion parameter extracted by the motion parameter extraction means, a corresponding video sequence from the video sequence storage means and producing a reproduced moving picture from the video sequence.

摘要翻译： 公开了一种运动图像再现装置，其可以仅通过从作为部分运动输入的运动信息内提取少量的特定运动参数来再现表示适当运动的连续运动图像，例如，运动信息的转动运动 一个人的脸或嘴的运动。 运动图像再现装置包括用于从输入图像的运动信息中提取运动参数的运动参数提取电路，用于存储多个视频序列的视频序列存储电路，所述多个视频序列是分别对应于多个运动参数的运动图像 以及运动图像制作电路，用于根据运动参数提取装置提取的运动参数从视频序列存储装置中读出相应的视频序列，并从视频序列中产生再现的运动图像。

公开(公告)号：US5631113A

公开(公告)日：1997-05-20

申请号：US435157

申请日：1995-05-05

申请人： Takamasa Satoh ,  Hiroshi Yasuda ,  Akio Yamada ,  Junichi Kai ,  Yoshihisa Oae ,  Keiji Yamada ,  Toru Oshima

发明人： Takamasa Satoh ,  Hiroshi Yasuda ,  Akio Yamada ,  Junichi Kai ,  Yoshihisa Oae ,  Keiji Yamada ,  Toru Oshima

IPC分类号： H01L21/027 ,  H01J37/153 ,  G03L5/00 ,  H01J37/00

CPC分类号： H01J37/153 ,  H01J2237/1504 ,  H01J2237/1532 ,  H01J2237/3175

摘要： An electron-beam exposure system includes an astigmatic compensation circuit that increases a voltage applied across a pair of electrodes forming an electrostatic sub-deflector and simultaneously decreases a voltage applied across another pair of electrodes forming the same electrostatic sub-deflector with a same magnitude as in the case of increasing the voltage, wherein the magnitude of the voltage change is changed in response to the deflection of the electron-beam caused by a main deflector.

摘要翻译： 电子束曝光系统包括像散补偿电路，其增加施加在形成静电副偏转器的一对电极上的电压，并且同时降低施加在形成相同静电副偏转器的另一对电极上施加的电压，其具有与 在增加电压的情况下，其中电压变化的大小响应于由主偏转器引起的电子束的偏转而改变。

公开(公告)号：US5574062A

公开(公告)日：1996-11-12

申请号：US347467

申请日：1994-12-13

申请人： Koichi Hashimoto ,  Akio Yamada ,  Hirokazu Hamano ,  Shigehiro Mori ,  Hisako Moriuchi

发明人： Koichi Hashimoto ,  Akio Yamada ,  Hirokazu Hamano ,  Shigehiro Mori ,  Hisako Moriuchi

IPC分类号： C07D311/16 ,  C07D407/04 ,  C07D409/04 ,  A61K31/37 ,  C07D311/20

CPC分类号： C07D407/04 ,  C07D311/16 ,  C07D409/04

摘要： The present invention provides compounds having 12-lipoxygenase inhibitory effect and medicines inhibiting 12-lipoxygenase selectively, and relates to novel coumarin derivatives and medicines containing the compounds as effective ingredients. Furthermore, this invention relates to compounds capable of converting to compounds inhibiting 12-lipoxygenase activities selectively according to the cleavage of modified moieties in vivo and medicines inhibiting 12-lipoxygenase selectively, and relates to novel coumarin derivatives having acyl groups as modified moieties and medicines containing the compounds as effective ingredients. The compounds of the present invention can inhibit 12-lipoxygenase strongly and selectively, and being useful as medicines for preventing and treating various circulatory diseases such as arteriosclerosis and vasospasm and for preventing of the metastasis of some kinds of cancers, and show low toxicity and few side effects.

摘要翻译： PCT No.PCT / JP94 / 00615 Sec。 371日期1994年12月13日第 102（e）日期1994年12月13日PCT 1994年4月12日PCT PCT。 公开号WO94 / 24119 日期：1994年10月27日本发明提供具有12-脂肪氧合酶抑制作用的化合物和选择性抑制12-脂肪氧合酶的药物，涉及新型香豆素衍生物和含有该化合物作为有效成分的药物。 此外，本发明涉及能够根据体内修饰部分的切割和选择性抑制12-脂肪氧合酶的药物选择性地转化成抑制12-脂肪氧合酶活性的化合物的化合物，并且涉及具有酰基作为修饰部分的新型香豆素衍生物和含有 该化合物为有效成分。 本发明化合物能够强烈，有选择地抑制12-脂肪氧合酶，可用作预防和治疗各种循环系统疾病如动脉硬化和血管痉挛以及预防某些癌症转移的药物，并且显示低毒性和少量 副作用。

公开(公告)号：US5404018A

公开(公告)日：1995-04-04

申请号：US843172

申请日：1992-02-28

申请人： Hiroshi Yasuda ,  Yoshihisa Oae ,  Akio Yamada ,  Nobuyuki Yasutake ,  Hisayasu Nishino

发明人： Hiroshi Yasuda ,  Yoshihisa Oae ,  Akio Yamada ,  Nobuyuki Yasutake ,  Hisayasu Nishino

IPC分类号： G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  H01L21/30 ,  H01J3/26

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30483 ,  H01J2237/31764

摘要： A charged particle beam exposure apparatus employs a main deflector made of electromagnetic coils and a subdeflector made of electrostatic deflection electrodes. An exposure method used for this apparatus is capable of shortening a wait time of the main deflector. The main deflector deflects a charged particle beam in a direction X, while the subdeflector deflects the beam around the deflecting position of the main deflector to expose an object to the beam. An area to be exposed on the object is divided into thin subfields such that the width, in an X-axis direction of each subfield, is approximately 1/3 the length in a Y-axis direction of the same.

摘要翻译： 带电粒子束曝光装置采用由电磁线圈制成的主偏转器和由静电偏转电极制成的子偏转器。 用于该装置的曝光方法能够缩短主导流板的等待时间。 主偏转器使方向X上的带电粒子束偏转，而子偏转器将光束偏转在主偏转器的偏转位置附近，以将物体暴露于光束。 要曝光在物体上的区域被划分为薄的子场，使得每个子场的X轴方向上的宽度大约为其Y轴方向上的长度的1/3。