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    Dispense geometery to achieve high-speed filling and throughput
    41.
    发明申请
    Dispense geometery to achieve high-speed filling and throughput 审中-公开
    分配几何，以实现高速灌装和吞吐量

    公开(公告)号：US20050106321A1

    公开(公告)日：2005-05-19

    申请号：US10714088

    申请日：2003-11-14

    申请人： Ian McMackin ,  Byung-Jin Choi ,  Sidlgata Sreenivasan ,  Ronald Voisin

    发明人： Ian McMackin ,  Byung-Jin Choi ,  Sidlgata Sreenivasan ,  Ronald Voisin

    IPC分类号： B05D5/00 ,  C08J7/18 ,  G03F7/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention is directed to a method for dispensing a plurality of spaced-apart droplets of liquid a substrate that features minimizing the distance liquid in the droplets must travel to reach an adjacent droplet to form a contiguous lay of the liquid on the substrate. As a result, when patterning the droplets with a patterned template, the time required to fill the features of the pattern and to cover the substrate is minimized. This increases the throughput of the imprinting process. To that end, the method includes disposing a plurality of spaced-apart droplets on the substrate, each of which has a unit volume associated therewith. A spacing between adjacent droplets of a subset of the plurality of droplets is selected to be a function of a smallest unit volume associated with the subset.

    摘要翻译： 本发明涉及一种用于分配液体的多个间隔开的液滴的方法，其特征在于使液滴中的液体必须行进的距离最小化以到达相邻的液滴，以在基底上形成液体的连续层。 结果，当用图案化模板图案化液滴时，填充图案的特征和覆盖基底所需的时间被最小化。 这增加了压印过程的吞吐量。 为此，该方法包括在衬底上设置多个间隔开的液滴，每个液滴具有与其相关的单位体积。 选择多个液滴的子集的相邻液滴之间的间隔是与该子集相关联的最小单位体积的函数。

    System for determining characteristics of substrates employing fluid geometries
    42.
    发明申请
    System for determining characteristics of substrates employing fluid geometries 有权
    用于确定采用流体几何形状的基板特性的系统

    公开(公告)号：US20050028618A1

    公开(公告)日：2005-02-10

    申请号：US10923628

    申请日：2004-08-20

    申请人： Byung Chol ,  Sidlgata Sreenivasan

    发明人： Byung Chol ,  Sidlgata Sreenivasan

    IPC分类号： B29C41/52 ,  B81C99/00 ,  G01M99/00 ,  G01N19/00 ,  G01N21/00 ,  G03F20060101 ,  G03F7/00 ,  H01L21/027

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention provides a technique for determining characteristics of substrates, such as the presence of contaminants, shape, as well as the spatial relationships between spaced-apart substrates. The spatial relationships include distance and angular orientation, between first and second spaced apart substrates. The technique includes forming a volume of fluid on the second substrate, with the volume of fluid having an area associated therewith. The volume of fluid is compressed between the first and second substrates to effectuate a change in properties of the area, defining changed properties. The changed properties are sensed, and the characteristics of the first and second substrates are determined as a function of the changed properties.

    摘要翻译： 本发明提供了一种用于确定衬底的特性的技术，例如污染物的存在，形状以及间隔开的衬底之间的空间关系。 空间关系包括第一和第二间隔开的基底之间的距离和角度取向。 该技术包括在第二基板上形成一定体积的流体，其中流体的体积具有与其相关的区域。 流体的体积在第一和第二基底之间被压缩，以实现该区域的性质的变化，从而限定改变的特性。 检测到改变的特性，并且确定第一和第二基板的特性作为改变的特性的函数。

    Method for Imprint Lithography Utilizing an Adhesion Primer Layer
    44.
    发明申请
    Method for Imprint Lithography Utilizing an Adhesion Primer Layer 有权
    使用粘合底漆层的印记平版印刷方法

    公开(公告)号：US20070212494A1

    公开(公告)日：2007-09-13

    申请号：US11734542

    申请日：2007-04-12

    申请人： Frank Xu ,  Sidlgata Sreenivasan ,  Edward Fletcher

    发明人： Frank Xu ,  Sidlgata Sreenivasan ,  Edward Fletcher

    IPC分类号： B05D1/00

    CPC分类号： C08L59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G11B5/855 ,  Y10T428/31663 ,  Y10T428/31678 ,  Y10T428/31692

    摘要： The invention provides a method of applying an adhesion primer layer for an imprint lithography process that includes contacting a fluid with a surface of a substrate in a coating process and initiating a chemical reaction that forms a covalent bond between a component in the fluid and the surface of the substrate such that an adhesion primer layer is adhered to the surface of the substrate. A polymeric layer may be adhered to the surface of the substrate coated with the adhesion primer layer. The method allows adhesion primer coating for double-sided imprinting applications including patterned magnetic media.

    摘要翻译： 本发明提供了一种施加用于压印光刻工艺的粘合底漆层的方法，该方法包括在涂布过程中使流体与基材的表面接触并引发在流体和表面之间形成共价键的化学反应 的基底，使得粘合底漆层粘附到基底的表面。 聚合物层可以粘附到涂覆有粘合底漆层的基材的表面上。 该方法允许用于包括图案化磁性介质的双面印刷应用的粘合底漆涂层。

    Methods of exposure for the purpose of thermal management for imprint lithography processes
    46.
    发明申请
    Methods of exposure for the purpose of thermal management for imprint lithography processes 审中-公开
    用于压印光刻工艺的热处理目的的曝光方法

    公开(公告)号：US20060115999A1

    公开(公告)日：2006-06-01

    申请号：US11292402

    申请日：2005-11-30

    申请人： Sidlgata Sreenivasan ,  Byung-jin Choi

    发明人： Sidlgata Sreenivasan ,  Byung-jin Choi

    IPC分类号： H01L21/31 ,  H01L21/324

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： The present invention is directed to a method that attenuates, if not avoids, heating of a substrate undergoing imprint lithography process and the deleterious effects associated therewith. To that end, the present invention includes a method of patterning a field of a substrate with a polymeric material that solidifies in response to actinic energy in which a sub-portion of the field is exposed sufficient to cure the polymeric material is said sub-portion followed by a blanket exposure of all of the polymeric material associated with the entire field to cure/solidify the same.

    摘要翻译： 本发明涉及一种衰减（如果不是避免）加热经历压印光刻工艺的衬底和与之有关的有害影响的方法。 为此，本发明包括使用聚合物材料对基材的场图案化的方法，该聚合物材料响应于其中暴露足够固化聚合物材料的场的部分暴露的光化能而固化，所述子部分 随后与整个场相关联的所有聚合物材料的全面曝光以固化/固化。

    Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom
    47.
    发明申请
    Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom 有权
    补偿设置在基板上的材料的体积收缩以从其形成基本上平面的结构的方法

    公开(公告)号：US20060068120A1

    公开(公告)日：2006-03-30

    申请号：US10951014

    申请日：2004-09-27

    申请人： Sidlgata Sreenivasan ,  Frank Xu

    发明人： Sidlgata Sreenivasan ,  Frank Xu

    IPC分类号： B05D3/00

    CPC分类号： G03F7/0002 ,  B29C43/003 ,  B29C2043/025 ,  H01L21/31051 ,  H01L21/312

    摘要： The present invention provides a method of planarizing a substrate with a template spaced-apart from the substrate having a liquid disposed therebetween, the method including: contacting the liquid with the template forming a first shape therein; and impinging radiation upon the liquid causing a reduction in volume of the liquid, with the first shape compensating for the reduction in volume such that upon impinging the actinic radiation upon the liquid, the liquid forms a contoured layer having a substantially planar shape.

    摘要翻译： 本发明提供了一种使衬底平面化的方法，该衬底具有与衬底间隔开的具有设置在其间的液体的模板，该方法包括：使液体与在其中形成第一形状的模板接触; 并且将液体的辐射照射在液体上，导致液体的体积减小，第一形状补偿了体积的减小，使得在将光化辐射照射在液体上时，液体形成具有基本上平面形状的轮廓层。

    Pattern reversal employing thick residual layers
    49.
    发明申请
    Pattern reversal employing thick residual layers 有权

    公开(公告)号：US20060063112A1

    公开(公告)日：2006-03-23

    申请号：US10946566

    申请日：2004-09-21

    申请人： Sidlgata Sreenivasan

    发明人： Sidlgata Sreenivasan

    IPC分类号： G03C5/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention features a method of patterning a substrate that includes forming, on the substrate, a first layer having a first pattern and selectively shifting in tone, as well as along a first direction, a subsequent pattern formed into the same layer that corresponds to the first pattern. To that end, one method of the present invention includes generating into the first layer, a second pattern having a shape inverse to the first pattern. A third pattern is then transferred into the first layer that has a shape inverse to the second pattern.

    Formation of discontinuous films during an imprint lithography process
    50.
    发明申请
    Formation of discontinuous films during an imprint lithography process 有权
    在压印光刻过程中形成不连续膜

    公开(公告)号：US20060062867A1

    公开(公告)日：2006-03-23

    申请号：US11126946

    申请日：2005-05-11

    申请人： Byung Jin Choi ,  Mario Meissl ,  Sidlgata Sreenivasan ,  Michael Watts

    发明人： Byung Jin Choi ,  Mario Meissl ,  Sidlgata Sreenivasan ,  Michael Watts

    IPC分类号： B29C35/08

    CPC分类号： G03F7/0002 ,  B29C35/0888 ,  B29C59/022 ,  B29C59/026 ,  B29C2035/0827 ,  B29C2059/023 ,  B81C1/0046 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  H01L21/0271

    摘要： The present invention is directed to a template having a body including a surface with first and second regions. The first region has first wetting characteristics for a given material and the second region has second wetting characteristics for the given material. The first wetting characteristics differ from the second wetting characteristics. Specifically, the first region is formed from a surface treatment layer with a first surface energy to provide the first wetting characteristics. The second region is exposed portions of the body, typically quartz of fused silica, having a second surface energy associated therewith. The second surface energy is greater than the first surface energy to provide the second region with the second wetting characteristics.

    摘要翻译： 本发明涉及一种具有主体的模板，该主体包括具有第一和第二区域的表面。 第一区域对于给定材料具有第一润湿特性，并且第二区域对于给定材料具有第二润湿特性。 第一润湿特性与第二润湿特性不同。 具体地说，第一区域由具有第一表面能的表面处理层形成，以提供第一润湿特性。 第二区域是具有与其相关联的第二表面能的身体的暴露部分，通常为熔融石英的石英。 第二表面能大于第一表面能量，以向第二区域提供第二润湿特性。