公开(公告)号：US08343578B2

公开(公告)日：2013-01-01

申请号：US11554079

申请日：2006-10-30

申请人： Ho-Cheol Kim ,  Charles Thomas Rettner

发明人： Ho-Cheol Kim ,  Charles Thomas Rettner

IPC分类号： B05D5/00 ,  B05D3/02 ,  B05D3/12

CPC分类号： C08L53/00 ,  C08L2666/02

摘要： A method and associated structure. A substrate is provided. The substrate has an energetically neutral corrugated surface layer. A film is formed on the corrugated surface layer. The film includes a combination of a di-block copolymer and a stiffening compound. The di-block copolymer includes lamellar microdomains of a first polymer block and lamellar microdomains of a second polymer block. The stiffening compound is dissolved within the first polymer block. At least one lamellar microdomain is removed from the film such that an oriented structure remains on the surface layer.

摘要翻译： 一种方法和相关结构。 提供基板。 衬底具有能量中性的波纹表面层。 在波纹表面层上形成膜。 该膜包括二嵌段共聚物和硬化化合物的组合。 二嵌段共聚物包括第一聚合物嵌段的层状微区和第二聚合物嵌段的层状微区。 硬化化合物溶解在第一聚合物嵌段内。 从薄膜中去除至少一个层状微畴，使得取向结构保留在表面层上。

公开(公告)号：US08247904B2

公开(公告)日：2012-08-21

申请号：US12540759

申请日：2009-08-13

申请人： Sarunya Bangsaruntip ,  Daniel C. Edelstein ,  William D. Hinsberg ,  Ho-Cheol Kim ,  Steven Koester ,  Paul M. Soloman

发明人： Sarunya Bangsaruntip ,  Daniel C. Edelstein ,  William D. Hinsberg ,  Ho-Cheol Kim ,  Steven Koester ,  Paul M. Soloman

IPC分类号： H01L23/48

CPC分类号： H01L21/76816 ,  H01L21/31144 ,  H01L21/76838 ,  H01L21/76897 ,  H01L2924/0002 ,  H01L2924/00

摘要： An interconnection between a sublithographic-pitched structure and a lithographic pitched structure is formed. A plurality of conductive lines having a sublithographic pitch may be lithographically patterned and cut along a line at an angle less than 45 degrees from the lengthwise direction of the plurality of conductive lines. Alternately, a copolymer mixed with homopolymer may be placed into a recessed area and self-aligned to form a plurality of conductive lines having a sublithographic pitch in the constant width region and a lithographic dimension between adjacent lines at a trapezoidal region. Yet alternately, a first plurality of conductive lines with the sublithographic pitch and a second plurality of conductive lines with the lithographic pitch may be formed at the same level or at different.

摘要翻译： 形成了亚光刻间距结构和光刻凸出结构之间的互连。 具有亚光刻间距的多条导线可以被光刻图案化并且沿着与多根导线的长度方向成小于45度的角度的切割。 或者，与均聚物混合的共聚物可以放置在凹陷区域中并自对准以形成在恒定宽度区域具有亚光刻间距的多条导线，以及在梯形区域处的相邻线之间的光刻尺寸。 或者，具有亚光刻间距的第一多个导线和具有光刻间距的第二多个导线可以形成在相同的水平或不同的位置。

公开(公告)号：US20120183743A1

公开(公告)日：2012-07-19

申请号：US13432036

申请日：2012-03-28

申请人： Timothy J. Dalton ,  Bruce B. Doris ,  Ho-Cheol Kim ,  Carl Radens

发明人： Timothy J. Dalton ,  Bruce B. Doris ,  Ho-Cheol Kim ,  Carl Radens

IPC分类号： B32B3/30

CPC分类号： H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y30/00 ,  H01L21/0338 ,  Y10T428/24612

摘要： A first nanoscale self-aligned self-assembled nested line structure having a sublithographic width and a sublithographic spacing and running along a first direction is formed from first self-assembling block copolymers within a first layer. The first layer is filled with a filler material and a second layer is deposited above the first layer containing the first nanoscale nested line structure. A second nanoscale self-aligned self-assembled nested line structure having a sublithographic width and a sublithographic spacing and running in a second direction is formed from second self-assembling block copolymers within the second layer. The composite pattern of the first nanoscale nested line structure and the second nanoscale nested line structure is transferred into an underlayer beneath the first layer to form an array of structures containing periodicity in two directions.

公开(公告)号：US20110111339A1

公开(公告)日：2011-05-12

申请号：US12613800

申请日：2009-11-06

申请人： Joy Cheng ,  Ho-Cheol Kim ,  Hiroshi Ito ,  Atsuko Ito ,  Hoa D. Truong

发明人： Joy Cheng ,  Ho-Cheol Kim ,  Hiroshi Ito ,  Atsuko Ito ,  Hoa D. Truong

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/091 ,  G03F7/0392 ,  G03F7/095

摘要： Bilayer systems include a bottom layer formed of polydimethylglutarimide, an acid labile dissolution inhibitor and a photoacid generator. The bilayer system can be exposed and developed in a single exposure and development process.

摘要翻译： 双层体系包括由聚二甲基戊二酰亚胺形成的底层，酸不稳定溶解抑制剂和光酸产生剂。 双层系统可以在单一的曝光和开发过程中暴露和发展。

公开(公告)号：US07931829B2

公开(公告)日：2011-04-26

申请号：US12857633

申请日：2010-08-17

申请人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

发明人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

IPC分类号： H01B1/12

CPC分类号： C08L101/12 ,  H01L21/02118 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31695 ,  H01L21/76807 ,  H01L21/7682 ,  H01L2221/1047

摘要： A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.

摘要翻译： 使用该组合物制造的物质组成和结构。 所述组合物包含：树脂; 分散在树脂中的聚合物纳米颗粒，每个聚合纳米颗粒包含多臂芯聚合物和连接到多臂芯聚合物的悬置聚合物，与树脂不混溶的多臂芯聚合物和可混溶的侧链聚合物 与树脂; 和溶剂，所述溶剂在第一温度下挥发，所述树脂在第二温度下可交联，所述聚合物纳米颗粒在第三温度下可分解，所述第三温度高于所述第二温度，所述第二温度高于所述第一温度 ，其中在从第二温度到第三温度的层之间加热组合物的层的厚度收缩小于约3.5％。

公开(公告)号：US07828986B2

公开(公告)日：2010-11-09

申请号：US11926722

申请日：2007-10-29

申请人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

发明人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

IPC分类号： B44C1/22 ,  H01L21/302

CPC分类号： H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  H01L21/0271 ,  H01L21/0332

摘要： A method. A combination is provided of a block copolymer and additional material. The copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. The first polymer includes polystyrene and the second polymer includes poly(ethylene oxide). A first layer including polydimethylglutarimide is adhered onto a surface of a substrate including a dielectric coated silicon wafer. A film is formed of the combination directly onto a surface of the first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film and the first layer are simultaneously etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. Portions of the film are removed. Features remain on the surface of the first layer.

摘要翻译： 一个方法。 提供了一种嵌段共聚物和另外的材料的组合。 共聚物包括共价键合到第二聚合物的第二嵌段的第一聚合物的第一嵌段。 附加材料与第一聚合物混溶。 第一聚合物包括聚苯乙烯，第二聚合物包括聚（环氧乙烷）。 包括聚二甲基戊二酰亚胺的第一层粘附到包括电介质涂覆的硅晶片的基材的表面上。 该组合物直接由第一层的表面形成。 附加材料的纳米结构在第一聚合物嵌段内自组装。 同时蚀刻膜和第一层。 纳米结构的蚀刻速率低于嵌段共聚物的蚀刻速率，并且低于第一层的蚀刻速率。 部分电影被删除。 特征保留在第一层的表面上。

公开(公告)号：US07740933B2

公开(公告)日：2010-06-22

申请号：US11760287

申请日：2007-06-08

申请人： Ho-Cheol Kim ,  Robert Dennis Miller

发明人： Ho-Cheol Kim ,  Robert Dennis Miller

IPC分类号： B32B3/26 ,  H01L21/00 ,  C12Q1/68

CPC分类号： B82Y5/00 ,  G01N33/54393 ,  Y10T428/249953 ,  Y10T428/249961 ,  Y10T428/249979

摘要： Nanoporous structures are constructed that have hydrophilic regions separated by hydrophobic regions. The porous, hydrophilic regions have reaction sites suitable for use in a bioassay application and have a higher density of reaction sites than that of a non-porous (2-D) surface. The structure may be made by depositing a layer of a matrix material (e.g., an organosilicate) and a porogen, and then crosslinking the matrix material to form a nanohybrid composite structure. The porogen is decomposed to form pores within the matrix material, and a reactive gas phase species (e.g., ozone) is patternwise directed onto a surface of the matrix material. Ultraviolet light (directed through a mask) activates the gas phase species to form a reactive species that then reacts with the matrix material to make it hydrophilic. The porogen may be decomposed thermally or by exposing it to an oxidizing atmosphere in the presence of ultraviolet light.

摘要翻译： 构建了具有疏水区域分离的亲水区域的纳米孔结构。 多孔亲水区域具有适用于生物测定应用的反应位点，并具有比无孔（2-D）表面更高的反应位点密度。 该结构可以通过沉积基质材料（例如有机硅酸盐）和致孔剂层，然后交联基质材料以形成纳米杂化复合结构来制备。 造孔剂在基质材料内分解形成孔隙，反应性气相物质（如臭氧）以图形方式导向基质材料的表面。 紫外线（通过掩模引导）激活气相物质以形成反应物质，然后与基质材料反应以使其亲水。 造孔剂可能会被热分解，或者在紫外光的存在下暴露于氧化气氛。

公开(公告)号：US20090181171A1

公开(公告)日：2009-07-16

申请号：US12060516

申请日：2008-04-01

申请人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

发明人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

IPC分类号： B44C1/22 ,  C08F283/10 ,  B05D5/00

CPC分类号： C08L63/00 ,  B05D5/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C08F283/10 ,  C08L53/00 ,  C09D125/14 ,  G03F7/0002 ,  G03F7/038 ,  Y10S264/901 ,  Y10S428/91 ,  Y10T428/24942

摘要： A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.

摘要翻译： 公开了一种定向微相分离的结构域的方法，包括施加包含取向控制组分的组合物和包含具有至少两个微相分离结构域的嵌段共聚物的嵌段共聚物组合组分，其中取向控制组分与 嵌段共聚物组合物组分; 以及从所述组合物在所述基材的表面上形成组成上垂直分离的膜。 取向控制成分和嵌段共聚物在成膜时分离，在基板表面形成组成垂直分离的膜，其中取向控制成分相邻于与基板表面相邻的组成偏析膜的表面富集， 并且嵌段共聚物组件在空气 - 表面界面处富集。

公开(公告)号：US20090170342A1

公开(公告)日：2009-07-02

申请号：US11499132

申请日：2006-08-03

申请人： Ho-Cheol Kim ,  Robert D. Miller

发明人： Ho-Cheol Kim ,  Robert D. Miller

IPC分类号： H01L21/47 ,  H01L23/58

CPC分类号： H01L21/02118 ,  H01L21/02126 ,  H01L21/02167 ,  H01L21/0217 ,  H01L21/312 ,  H01L21/3121 ,  H01L21/3122 ,  H01L21/3124 ,  H01L21/3125 ,  H01L21/7682 ,  H01L23/5222 ,  H01L23/5329 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/09701 ,  Y10S977/70 ,  H01L2924/00

摘要： The present invention relates to dielectric nanostructures useful in semiconductor devices and other electronic devices and methods for manufacturing the dielectric nanostructures. The nanostructures generally comprises an array of isolated pillars positioned on a substrate. The methods of the present invention involve using semiconductor technology to manufacture the nanostructures from a mixture of a crosslinkable dielectric material and an amphiphilic block copolymer.

摘要翻译： 本发明涉及可用于半导体器件和其它电子器件的电介质纳米结构以及用于制造电介质纳米结构的方法。 纳米结构通常包括位于基底上的分离柱的阵列。 本发明的方法涉及使用半导体技术从可交联介电材料和两亲性嵌段共聚物的混合物制造纳米结构。

公开(公告)号：US07354777B2

公开(公告)日：2008-04-08

申请号：US11184702

申请日：2005-07-19

申请人： Mark Whitney Hart ,  Ho-Cheol Kim ,  Robert Dennis Miller ,  Gregory Michael Wallraff

发明人： Mark Whitney Hart ,  Ho-Cheol Kim ,  Robert Dennis Miller ,  Gregory Michael Wallraff

IPC分类号： H01L21/00

CPC分类号： B01L3/5085 ,  B01J2219/00619 ,  B01J2219/00621 ,  B01J2219/00644 ,  B01L2200/12 ,  B01L2300/0609 ,  B01L2300/069 ,  B01L2300/0829 ,  B01L2300/0851 ,  B01L2300/165 ,  B01L2300/168 ,  C40B60/08

摘要： A biomolecular array includes a substrate across which is distributed an array of discrete regions of a porous substance formed from a porogen-containing organosilicate material. The porous substance is designed to bind chemical targets useful in biotechnology applications, such as gene expression, protein, antibody, and antigen experiments. The regions are preferably optically isolated from each other and may be shaped to enhance detection of optical radiation emanating from the porous substance, e.g., as a result of irradiation of the regions with ultraviolet light. The discrete regions may be configured as microscopic wells within the substrate, or they may reside on top of the substrate in the form of microscopic mesas.

摘要翻译： 生物分子阵列包括基底，其上分布有由含致孔剂的有机硅酸盐材料形成的多孔物质的离散区域的阵列。 多孔物质被设计用于结合可用于生物技术应用的化学靶，例如基因表达，蛋白质，抗体和抗原实验。 这些区域优选地彼此光学隔离，并且可以被成形为增强从多孔物质发出的光辐射的检测，例如，作为由紫外线照射该区域的结果。 离散区域可以被配置为衬底内的微观阱，或者它们可以以微观台面的形式驻留在衬底的顶部上。