Semiconductor device and manufacturing method thereof
    48.
    发明授权
    Semiconductor device and manufacturing method thereof 有权
    半导体装置及其制造方法

    公开(公告)号:US07923348B2

    公开(公告)日:2011-04-12

    申请号:US12480752

    申请日:2009-06-09

    IPC分类号: H01L21/30

    摘要: It is an object of the present invention to provide a peeling method that causes no damage to a layer to be peeled and to allow not only a layer to be peeled with a small surface area but also a layer to be peeled with a large surface area to be peeled entirely. Further, it is also an object of the present invention to bond a layer to be peeled to various base materials to provide a lighter semiconductor device and a manufacturing method thereof. Particularly, it is an object to bond various elements typified by a TFF, (a thin film diode, a photoelectric conversion element comprising a PIN junction of silicon, or a silicon resistance element) to a flexible film to provide a lighter semiconductor device and a manufacturing method thereof.

    摘要翻译: 本发明的目的是提供一种不会对被剥离层造成损伤的剥离方法,并且不仅使表面积小的层被剥离,而且还允许具有大表面积的被剥离层 要完全去皮。 此外,本发明的另一个目的是将要剥离的层粘合到各种基材上以提供更轻的半导体器件及其制造方法。 特别地,目的是将由TFF代表的各种元件(薄膜二极管,包含硅的PIN结的光电转换元件或硅电阻元件)粘合到柔性膜上以提供更轻的半导体器件和 其制造方法。