公开(公告)号：US08871655B2

公开(公告)日：2014-10-28

申请号：US13726778

申请日：2012-12-26

Applicant: Tokyo Electron Limited

Inventor： Keisuke Suzuki ,  Kentaro Kadonaga ,  Byoung Hoon Lee ,  Eun Jo Lee ,  Sung Duk Son ,  Jae Hyuk Jang ,  Do Hyun Park

IPC: H01L21/31 ,  H01L21/02 ,  C23C8/34 ,  C23C16/24 ,  C23C16/56 ,  C23C28/04 ,  C23C28/00

CPC classification number: H01L21/31 ,  C23C8/34 ,  C23C16/24 ,  C23C16/56 ,  C23C28/04 ,  C23C28/42 ,  H01L21/02126 ,  H01L21/022

Abstract: The method of forming a silicon oxycarbonitride film on a base includes stacking a silicon carbonitride film and a silicon oxynitride film on the base to form the silicon oxycarbonitride film.

Abstract translation: 在基底上形成硅碳氮氧化物膜的方法包括在基底上堆叠碳氮化硅膜和氧氮化硅膜以形成硅碳氮氧化物膜。

公开(公告)号：US08852305B2

公开(公告)日：2014-10-07

申请号：US13375570

申请日：2010-05-28

Applicant: Jon Andersson ,  Rachid M'Saoubi ,  Hindrik Engstrom ,  Mats Johansson

Inventor： Jon Andersson ,  Rachid M'Saoubi ,  Hindrik Engstrom ,  Mats Johansson

IPC: C23C14/00 ,  C04B41/52 ,  C04B41/00 ,  C04B41/89 ,  C23C14/06 ,  C23C28/00 ,  C23C30/00 ,  C23C28/04

CPC classification number: C04B41/52 ,  B23B2222/36 ,  B23B2224/24 ,  B23B2228/08 ,  B23B2228/10 ,  C04B41/009 ,  C04B41/89 ,  C23C14/0641 ,  C23C28/042 ,  C23C28/044 ,  C23C28/42 ,  C23C30/005 ,  Y10T29/49995 ,  Y10T407/27 ,  Y10T428/24975 ,  Y10T428/265 ,  C04B41/4529 ,  C04B41/5063 ,  C04B41/5068 ,  C04B41/5062 ,  C04B41/5066 ,  C04B35/00 ,  C04B35/5831

Abstract: A cutting tool insert for machining by chip removal includes a body of a hard alloy of cemented carbide, cermet, ceramics, cubic boron nitride based material or high speed steel, onto which a hard and wear resistant coating is deposited by physical vapor deposition. The coating includes a polycrystalline nanolaminated structure of alternating layers A and B where layer A is (Ti,Al,Me1)N and Me1 is optionally one or more of the metal elements from group 3, 4, 5 or 6 in the periodic table, layer B is (Ti,Si,Me2)N and Me2 is optionally one or more of the metal elements from group 3, 4, 5 or 6 in the periodic table including Al with a thickness between 0.5 and 20 μm and method of making the same. This insert is particularly useful in metal cutting applications generating high temperatures with improved edge integrity, machining of super alloys, stainless and hardened steels.

Abstract translation: 用于通过切屑去除加工的切削刀具刀片包括硬质合金，金属陶瓷，陶瓷，立方氮化硼基材料或高速钢的硬质合金的主体，通过物理气相沉积在其上沉积硬且耐磨的涂层。 涂层包括交替层A和B的多晶Naminaminated结构，其中层A是（Ti，Al，Me1）N，Me1任选地是周期表中第3,4,5或6族中的一种或多种金属元素， B层是（Ti，Si，Me2）N，Me2任选地是周期表中的第3,4,5或6族中的一种或多种金属元素，包括厚度在0.5和20μm之间的Al，以及使 相同。 该插入件特别适用于金属切割应用，产生高温，改善边缘完整性，超合金，不锈钢和硬化钢的加工。

公开(公告)号：US20140272391A1

公开(公告)日：2014-09-18

申请号：US13837028

申请日：2013-03-15

Applicant: KENNAMETAL INC.

Inventor： Vineet Kumar ,  Ronald Penich ,  Yixiong Liu

IPC: B23B27/14 ,  C23C28/04

CPC classification number: C23C28/044 ,  C23C28/042 ,  C23C28/42 ,  Y10T428/265 ,  Y10T428/31678

Abstract: Refractory coatings for cutting tool applications and methods of making the same are described herein which, in some embodiments, permit incorporation of increased levels of aluminum into nitride coatings while reducing or maintaining levels of hexagonal phase in such coatings. Coatings and methods described herein, for example, employ cubic phase forming compositions for limiting hexagonal phase in nitride coatings of high aluminum content.

Abstract translation: 本文描述了用于切削刀具应用的耐火涂层及其制造方法，在一些实施例中，其允许将增加水平的铝结合到氮化物涂层中，同时降低或维持这种涂层中的六方相的水平。 例如，本文所述的涂层和方法使用立方相形成组合物来限制高铝含量的氮化物涂层中的六方相。

公开(公告)号：US20140272344A1

公开(公告)日：2014-09-18

申请号：US13841371

申请日：2013-03-15

Applicant: GENERAL ELECTRIC COMPANY

Inventor： Julin Wan ,  Milivoj Konstantin Brun ,  Peter Joel Meschter ,  Reza Sarrafi-Nour ,  Don Mark Lipkin

IPC: C09D5/08 ,  C23C16/42 ,  C23C16/34 ,  B05D7/00

CPC classification number: C09D5/084 ,  B05D7/52 ,  C04B41/009 ,  C04B41/5066 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C23C28/044 ,  C23C28/048 ,  C23C28/42 ,  F01D5/288 ,  F05D2230/90 ,  F05D2300/177 ,  Y10T428/2495 ,  C04B35/565 ,  C04B35/806 ,  C04B35/584 ,  C04B35/58085 ,  C04B41/4529 ,  C04B41/5071

Abstract: An article includes a substrate and a coating provided on a surface of the substrate. The coating includes at least one metal silicide layer consisting essentially of MoSi2 or WSi2 or (Mo, W)Si2 or a platinum group metal silicide and at least one layer consisting essentially of Si3N4.

Abstract translation: 一种制品包括基材和设置在基材表​​面上的涂层。 涂层包括至少一个金属硅化物层，其基本上由MoSi 2或WSi 2或（Mo，W）Si 2或铂族金属硅化物和至少一个由Si 3 N 4组成的层组成。

公开(公告)号：US20140224517A1

公开(公告)日：2014-08-14

申请号：US14127375

申请日：2012-06-21

Applicant: Akira Hasegawa

Inventor： Akira Hasegawa

IPC: C09D5/00 ,  H05K7/06

CPC classification number: C09D5/00 ,  B32B9/04 ,  C23C16/18 ,  C23C16/401 ,  C23C16/505 ,  C23C16/52 ,  C23C16/545 ,  C23C28/04 ,  C23C28/42 ,  G02B1/105 ,  G02B1/14 ,  H01L31/0481 ,  H01L51/0097 ,  H01L51/5253 ,  H05K7/06 ,  Y02E10/549 ,  Y10T428/265 ,  Y10T428/31663

Abstract: Provided is a laminated film comprising a substrate, and at least one layer of film layer that is formed on at least one surface of the substrate, wherein at least one layer of the film layer contains silicon, oxygen, and hydrogen, a ratio of a total value of Q1, Q2, and Q3 peak areas to a Q4 peak area on the basis of an abundance ratio of silicon atoms having different bonding states to oxygen atoms, which are obtained by 29Si solid-state NMR measurement of the film layer, satisfies the following conditional expression (I): (total value of Q1, Q2, and Q3 peak areas)/(Q4 peak area)

Abstract translation: 提供了一种层叠膜，其包括基板和形成在基板的至少一个表面上的至少一层膜层，其中至少一层膜层包含硅，氧和氢， 基于通过膜层的29Si固态NMR测量获得的具有与氧原子不同的键合状态的硅原子的丰度比，Q1，Q2和Q3的峰值面积与Q4峰面积的总和满足 以下条件式（I）:( Q1，Q2和Q3的峰面积的总数）/（Q4峰面积）<1.0（I）其中Q1表示与一个中性氧原子键合的硅原子和三个羟基 Q2表示与两个中性氧原子和两个羟基键合的硅原子，Q3表示与三个中性氧原子和一个羟基键合的硅原子，Q4表示与四个中性氧键合的硅原子 原子

公开(公告)号：US08790479B2

公开(公告)日：2014-07-29

申请号：US14012504

申请日：2013-08-28

Applicant: FUJIFILM Corporation

Inventor： Eijiro Iwase

IPC: B05D7/00 ,  C23C28/00 ,  C23C16/34 ,  C23C16/02 ,  C23C16/56 ,  C23C16/54 ,  C08J7/04

CPC classification number: B05D7/56 ,  B05D7/04 ,  B05D7/58 ,  B05D2350/60 ,  C08J7/045 ,  C23C16/0272 ,  C23C16/345 ,  C23C16/545 ,  C23C16/56 ,  C23C28/00 ,  C23C28/42

Abstract: An object is to provide a manufacturing method of a functional film where it is possible to stably manufacture a functional film which favorably exhibits the intended function and has excellent optical characteristics. The problem is solved by forming an uppermost organic layer of an organic layer with a thickness of 30 to 300 nm by using a coating material containing a surfactant where the content is 0.01 to 10 mass % when the uppermost organic layer is formed.

Abstract translation: 本发明的目的在于提供功能性膜的制造方法，其中可以稳定地制造有利地具有预期功能并且具有优异的光学特性的功能膜。 通过在形成最上层的有机层时，使用含有表面活性剂的含量为0.01〜10质量％的表面活性剂的涂料，通过形成厚度为30〜300nm的有机层的最上层有机层来解决问题。

公开(公告)号：US08784977B2

公开(公告)日：2014-07-22

申请号：US13380411

申请日：2009-06-22

Applicant: Hiroyuki Miura

Inventor： Hiroyuki Miura

IPC: B23B27/14 ,  C23C28/04 ,  C23C14/00 ,  C04B35/5831 ,  C23C14/06

CPC classification number: C23C14/0036 ,  C04B35/5831 ,  C04B41/009 ,  C04B41/52 ,  C04B41/89 ,  C04B2235/386 ,  C04B2235/3886 ,  C04B2235/402 ,  C23C14/0641 ,  C23C28/042 ,  C23C28/044 ,  C23C28/42 ,  Y10T428/24975 ,  Y10T428/265 ,  Y10T428/31678 ,  C04B41/4529 ,  C04B41/5063 ,  C04B41/5068 ,  C04B41/5066 ,  C04B41/522 ,  C04B41/5062 ,  C04B41/5133 ,  C04B41/5155 ,  C04B41/5061 ,  C04B41/5031

Abstract: A cubic boron nitride sintered substrate has a coating with lower and upper layers. The upper layer has an average layer thickness of 0.5 to 3.0 μm and is formed from a compound of a compositional formula Mα, where M represents one or more of Ti, V, Zr, Nb, Mo, Al, Si, and α is one or more of C, N, B and O. The lower layer has an average thickness of 0.5 to 3.0 μm and has alternated first and second thin layers. The first thin layer is formed from a compound with compositional formula (Ti(1-x)Lx)β, where L is one or more of Al, B and Si, and β is C or N, or both. The second thin layer is formed with compositional formula (Al(1-y)Jy)γ, where J represents one or more of Ti, V, Cr, Zr, Nb and Mo, and γ is C or N, or both.

Abstract translation: 立方氮化硼烧结基板具有下层和上层的涂层。 上层的平均层厚为0.5〜3.0μm，由组成式Mα的化合物形成，其中M表示Ti，V，Zr，Nb，Mo，Al，Si中的一种或多种，​​α为1 或更多的C，N，B和O.下层具有0.5至3.0μm的平均厚度并具有交替的第一和第二薄层。 第一薄层由具有组成式（Ti（1-x）Lx）＆bgr的化合物形成，其中L是Al，B和Si中的一种或多种，​​并且＆bgr; 是C或N，或两者。 第二薄层由组成式（Al（1-y）Jy）γ形成，其中J表示Ti，V，Cr，Zr，Nb和Mo中的一种或多种，​​γ为C或N，或两者均为。

公开(公告)号：US20140178659A1

公开(公告)日：2014-06-26

申请号：US14138427

申请日：2013-12-23

Applicant: Shanghua WU ,  Ying LONG ,  Qimin WANG ,  Chengyong WANG

Inventor： Shanghua WU ,  Ying LONG ,  Qimin WANG ,  Chengyong WANG

IPC: B23B27/14

CPC classification number: C23C28/42 ,  C04B35/584 ,  C04B35/587 ,  C04B35/593 ,  C04B41/009 ,  C04B41/5031 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C04B2235/3225 ,  C04B2235/3886 ,  C23C14/081 ,  C23C28/04 ,  C23C28/042 ,  C23C28/044 ,  Y10T428/24975 ,  Y10T428/265 ,  C04B41/4529 ,  C04B41/5063 ,  C04B41/5068 ,  C04B41/53 ,  C04B41/5346

Abstract: The present invention provides an Al2O3 coated Si3N4 cutting tool comprising a Si3N4 based substrate body and a coating layer on the substrate body, wherein the coating layer has at least one Al2O3 coating layer consisting of amorphous Al2O3 or nanocrystalline α-, γ-, or κ-Al2O3. The hard and wear resistant refractory coating is deposited onto the Si3N4-based substrate body by reactive sputtering using bipolar pulsed DMS technique or dual magnetron sputtering method at substrate temperatures of 300-700° C. During the deposition, preferably, the substrate temperature is controlled to achieve the desired crystal structure of the coating. To form amorphous Al2O3 coating on the surface of the substrates, the deposition temperature can be controlled from 300 to 500° C.; on the other hand, to form nanocrystalline α-, γ-, or κ-Al2O3, the deposition temperature can be controlled in the range of 500-700° C. The coated cutting tools of the present invention are suitable for high-speed machining of metals by turning, milling, drilling or by other similar chip-forming machining methods.

Abstract translation: 本发明提供了一种Al 2 O 3涂覆的Si 3 N 4切削工具，其包括基于Si 3 N 4的基底主体和在基底主体上的涂层，其中该涂层具有至少一个由无定形Al 2 O 3或纳米晶体α-，γ-或γ- ; -Al2O3。 通过使用双极脉冲DMS技术或双重磁控溅射法在300-700℃的基板温度下，通过反应溅射将耐磨耐磨涂层沉积到基于Si 3 N 4的基板主体上。在沉积期间，优选地，控制基板温度 以实现涂层的所需晶体结构。 为了在基板的表面上形成非晶Al2O3涂层，可以将沉积温度控制在300-500℃; 另一方面，为了形成α-，γ-，或-Al 2 O 3的纳米晶体，淀积温度可以控制在500-700℃的范围内。本发明的涂层切割工具适用于高速 通过车削，铣削，钻孔或其他类似的切屑加工方法来加工金属。

公开(公告)号：US20140178637A1

公开(公告)日：2014-06-26

申请号：US13724403

申请日：2012-12-21

Applicant: EXXONMOBIL RESEARCH AND ENGINEERING

Inventor： Srinivasan Rajagopalan ,  Tabassumul Haque ,  Mehmet Deniz Ertas ,  Adnan Ozekcin ,  HyunWoo Jin ,  Bo Zhao

IPC: C23C14/32 ,  C25F3/16 ,  C23C16/48 ,  C23C16/44 ,  C23C16/50 ,  C23C14/35 ,  C23C14/22

CPC classification number: C25F3/16 ,  C23C14/024 ,  C23C14/0605 ,  C23C16/0272 ,  C23C16/26 ,  C23C28/044 ,  C23C28/046 ,  C23C28/322 ,  C23C28/343 ,  C23C28/347 ,  C23C28/42 ,  E21B10/00 ,  E21B17/00 ,  Y10T428/24355 ,  Y10T428/24975

Abstract: Provided are low friction coatings with improved abrasion, wear resistance and methods of making such coatings. In one form, the coating includes: i) an under layer selected from the group consisting of CrN, TiN, TiAlN, TiAlVN, TiAlVCN, TiSiN, TiSiCN, TiAlSiN and combinations thereof, wherein the under layer ranges in thickness from 0.1 to 100 μm, ii) an adhesion promoting layer selected from the group consisting of Cr, Ti, Si, W, CrC, TiC, SiC, WC, and combinations thereof, wherein the adhesion promoting layer ranges in thickness from 0.1 to 50 μm and is contiguous with a surface of the under layer, and iii) a functional layer selected from the group consisting of a fullerene based composite, a diamond based material, diamond-like-carbon and combinations thereof, wherein the functional layer ranges from 0.1 to 50 μm and is contiguous with a surface of the adhesion promoting layer.

Abstract translation: 提供具有改善的耐磨性，耐磨性的低摩擦涂层和制造这种涂层的方法。 在一种形式中，涂层包括：i）选自CrN，TiN，TiAlN，TiAlVN，TiAlVCN，TiSiN，TiSiCN，TiAlSiN及其组合的底层，其中底层的厚度范围为0.1-100μm ，ii）选自Cr，Ti，Si，W，CrC，TiC，SiC，WC及其组合的粘合促进层，其中粘合促进层的厚度范围为0.1-50μm，并且与 下层的表面，以及iii）选自由富勒烯系复合物，金刚石类材料，类金刚石碳及其组合组成的组的功能层，其中功能层的范围为0.1〜50μm，为 与粘附促进层的表面相邻。

公开(公告)号：US20140173995A1

公开(公告)日：2014-06-26

申请号：US14133902

申请日：2013-12-19

Applicant: ExxonMobil Research and Engineering Company

Inventor： Jeffrey Roberts Bailey ,  Srinivasan Rajagopalan ,  Tabassumul Haque ,  Adnan Ozekcin ,  Mehmet Deniz Ertas ,  HyunWoo Jin ,  Bo Zhao ,  Russell Robert Mueller

IPC: B24D18/00

CPC classification number: B24D18/0027 ,  C23C14/024 ,  C23C16/0272 ,  C23C28/044 ,  C23C28/046 ,  C23C28/322 ,  C23C28/343 ,  C23C28/347 ,  C23C28/42 ,  E21B10/00 ,  E21B17/10

Abstract: Provided are methods to make a drilling tool with low friction coatings to reduce balling and friction. In one form, the method includes providing one or more drilling tool components with specified locations for fitting cutters, inserts, bearings, rollers, additional non-coated components, or combinations thereof; cleaning the one or more drilling tool components; applying masking for fitting cutters, inserts, bearings, rollers, additional non-coated components or combinations thereof; applying a multi-layer low friction coating to the cleaned specified locations; removing the masking from the cleaned and coated specified locations of the one or more drilling components; inserting cutters and inserts and assembling moving parts to the cleaned and coated specified locations of the one or more drilling tool components; and assembling the one or more drilling tool components to form a drilling tool.

Abstract translation: 提供了制造具有低摩擦涂层的钻具以减少球磨和摩擦的方法。 在一种形式中，该方法包括提供具有指定位置的一个或多个钻具组件，用于装配切割器，插入件，轴承，辊，附加的未涂覆部件或其组合; 清洁一个或多个钻具组件; 施加用于装配切割器，插入件，轴承，辊，附加的未涂覆部件或其组合的掩模; 将多层低摩擦涂层施加到清洁的指定位置; 从所述一个或多个钻孔部件的清洁和涂覆的指定位置移除掩模; 插入刀具和插入件并将运动部件组装到所述一个或多个钻具组件的清洁和涂覆的指定位置; 以及组装所述一个或多个钻具组件以形成钻具。