Abstract:
The invention involves an image sensor camera module and a method of fabricating the image sensor camera module. The image sensor camera module uses a single-body type lens holder defined by a hollow cylindrical body having a shoulder protruding radially inwardly from an inner surface thereof. First and second lenses therein are spaced apart by a first spacer and a filter therein is spaced from the second lens by a second spacer. An image sensor is adhered to a lower rim of the body, and the filter is adhered to an upper rim thereof. All optical elements within the lens holder thus are affixed in fixed relative position compatible with a predefined focal length and axis. Moreover, the adhesively sealed interior of the body of the image sensor camera module prevents particulate contamination.
Abstract:
A chip package, an image sensor module including the same and a manufacturing method thereof. The chip package includes an image sensor chip having a plurality of bonding pads, a packaging substrate having a plurality of connection pads, an adhesive insulator, a plurality of conductive fillers, and a sealing insulator. The packaging substrate is mounted on the image sensor chip through the adhesive insulator, so that a light receiving area of the image sensor chip and an opening of the packaging substrate are vertically aligned. A plurality of through holes are formed to penetrate from portions of the connection pads to the packaging substrate. The through holes may be filled with the conductive fillers that are electrically connected between the bonding pads and the connection pads. The sealing insulator may protect the connective fillers.
Abstract:
There is provided a method for fabricating a ferroelectric capacitor which comprises the steps of: forming a bottom electrode over a substrate on which a predetermined lower structure is formed; forming a thin film of polycrystalline strontium bismuth tantalate (SBT) over the entire structure; forming an amorphous thin film of SBT on the polycrystalline film of SBT; and forming an upper electrode on the amorphous film of SBT. Though the amorphous thin film of SBT is lower in dielectric constant than the polycrystalline thin film of SBT so as not to have the properties of ferroelectric, it does not have crystalline grain boundary and, thus, does not form the path for transferring material. Therefore, the amorphous thin film of SBT can block the path of leakage current. It also results in complement of bismuth lost in the processes of deposition and thermal treatment for crystallization of the ferroelectric film of SBT at a high temperature.
Abstract:
A three-dimensional semiconductor device is provided as follows. A substrate includes a contact region, a dummy region, and a cell array region. A stack structure includes electrodes vertically stacked on the substrate. The electrodes are stacked to have a first stepwise structure on the contact region and a second stepwise structure in the dummy region. Ends of at least two adjacent electrodes in the second stepwise structure have first sidewalls vertically aligned so that horizontal positions of the first sidewalls are substantially the same.
Abstract:
Provided are methods of forming a stack of electrodes and three-dimensional semiconductor devices fabricated thereby. The device may include electrodes sequentially stacked on a substrate to constitute an electrode structure. each of the electrodes may include a connection portion protruding horizontally and outward from a sidewall of one of the electrodes located thereon and an aligned portion having a sidewall coplanar with that of one of the electrodes located thereon or thereunder. Here, at least two of the electrodes provided vertically adjacent to each other may be provided in such a way that the aligned portions thereof have sidewalls that are substantially aligned to be coplanar with each other.
Abstract:
According to example embodiments, a variable resistance memory device may include memory cells, in which contact areas between word lines and a variable resistance layer are almost constant. The variable resistance memory device may include a vertical electrode on a substrate, horizontal electrode layers and insulating layers sequentially and alternately stacked on the substrate. The horizontal electrode layers and the insulating layers may be adjacent to the vertical electrode. The variable resistance layer may be between the vertical electrode the horizontal electrode layers. A thickness of one of the horizontal electrode layers adjacent to the substrate may be thickness than a thickness of an other of the horizontal electrode layers that is spaced apart from the substrate.
Abstract:
A semiconductor package can include a substrate body having a first surface and a second surface. A semiconductor chip can be mounted on the first surface and a plurality of electrode pads can be on the second surface and selectively formed to have progressively smaller or larger sizes extending from a central region of the substrate body toward an outer edge of the substrate body based on a reflow soldering process warpage profile for the semiconductor package.
Abstract:
According to example embodiments, a variable resistance memory device may include memory cells, in which contact areas between word lines and a variable resistance layer are almost constant. The variable resistance memory device may include a vertical electrode on a substrate, horizontal electrode layers and insulating layers sequentially and alternately stacked on the substrate. The horizontal electrode layers and the insulating layers may be adjacent to the vertical electrode. The variable resistance layer may be between the vertical electrode the horizontal electrode layers. A thickness of one of the horizontal electrode layers adjacent to the substrate may be thickness than a thickness of an other of the horizontal electrode layers that is spaced apart from the substrate.
Abstract:
Disclosed is a module for measuring repulsive force for a walking robot. More specifically the module includes a base frame and plurality of installation units provided on the base frame and surrounded by a plurality of side surfaces configured as inclined surfaces having a predetermined angle and a top surface formed in a horizontal plane. The module also includes a 1-axis force sensor provided on each side surface and the top surface of the installation unit. A control unit calculates a sum force of the respective installation units from measurement data of the force sensor and calculates the ground reaction force (GRF) by integrating the sum force of the respective installation units.
Abstract:
An image sensor package assembling method includes providing a substrate on which a plurality of image sensors are mounted; providing a housing strip having a plurality of housings arranged corresponding to an arrangement of the image sensors on the substrate, each of the housings having an aperture corresponding to an active surface of the corresponding image sensor and a cavity enclosing an edge of the corresponding image sensor; attaching a transparent cover plate sealing the apertures of the housings on the housing strip after attaching the housing strip on the substrate; and separating image sensor packages from each other by successively cutting the transparent cover, the housing strip and the substrate. Increased yield and production efficiency can be realized.