公开(公告)号：US09617640B2

公开(公告)日：2017-04-11

申请号：US14435070

申请日：2014-02-20

申请人： Joseph Yudovsky ,  Kevin Griffin ,  Kaushal Gangakhedkar

发明人： Joseph Yudovsky ,  Kevin Griffin ,  Kaushal Gangakhedkar

IPC分类号： C23C16/00 ,  C23C16/52 ,  C23C16/455 ,  C23C16/458 ,  H01L21/66 ,  H01L21/02 ,  H01L21/285

CPC分类号： C23C16/52 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/4583 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/28556 ,  H01L22/10

摘要： Described are apparatus and methods for processing a semiconductor wafer in which the gap between the wafer surface and the gas distribution assembly remains uniform and of known thickness. The wafer is positioned within a susceptor assembly and the assembly is lifted toward the gas distribution assembly using actuators. The wafer can be lifted toward the gas distribution assembly by creating a fluid bearing below and/or above the wafer.

公开(公告)号：US20130263944A1

公开(公告)日：2013-10-10

申请号：US13827510

申请日：2013-03-14

申请人： Faruk Gungor ,  Dien-Yeh Wu ,  Joseph Yudovsky ,  Mei Chang

发明人： Faruk Gungor ,  Dien-Yeh Wu ,  Joseph Yudovsky ,  Mei Chang

IPC分类号： F17D3/00

CPC分类号： F17D3/00 ,  F17C1/00 ,  F17C2270/0518 ,  Y10T137/7833 ,  Y10T137/8593 ,  Y10T137/87249

摘要： Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.

摘要翻译： 提供了具有输送通道的气体分配设备，其具有入口端，出口端和沿着该长度间隔开的多个孔。 入口端可连接到入口气体源，出口端可与真空源连接。 还提供了具有螺旋输送通道的气体分配设备，缠绕在一起的螺旋输送通道，分流输送通道，合并输送通道和成形输送通道，其中入口端和出口端构造成用于在输送通道内快速交换气体。

公开(公告)号：US20130196078A1

公开(公告)日：2013-08-01

申请号：US13754771

申请日：2013-01-30

申请人： Joseph Yudovsky ,  Nag B. Patibandla ,  Pravin K. Narwankar ,  Li-Qun Xia ,  Toshiaki Fujita ,  Ralf Hofmann ,  Jeonghoon Oh ,  Srinivas Satya ,  Banqiu Wu

发明人： Joseph Yudovsky ,  Nag B. Patibandla ,  Pravin K. Narwankar ,  Li-Qun Xia ,  Toshiaki Fujita ,  Ralf Hofmann ,  Jeonghoon Oh ,  Srinivas Satya ,  Banqiu Wu

IPC分类号： C23C16/458

CPC分类号： C23C16/4584 ,  C23C16/45519 ,  C23C16/45551 ,  C23C16/54 ,  H01L21/67742

摘要： A substrate processing system for processing multiple substrates is provided and generally includes at least one substrate processing platform and at least one substrate staging platform. The substrate processing platform includes a rotary track system capable of supporting multiple substrate support assemblies and continuously rotating the substrate support assemblies, each carrying a substrate thereon. Each substrate is positioned on a substrates support assembly disposed on the rotary track system and being processed through at least one shower head station and at least one buffer station, which are positioned atop the rotary track system of the substrate processing platform. Multiple substrates disposed on the substrate support assemblies are processed in and out the substrate processing platform. The substrate staging platform includes at least one dual-substrate processing station, each dual-substrate processing station includes two substrate support assemblies for supporting two substrates thereon.

摘要翻译： 提供了用于处理多个基板的基板处理系统，并且通常包括至少一个基板处理平台和至少一个基板分段平台。 基板处理平台包括能够支撑多个基板支撑组件并且连续旋转基板支撑组件的旋转轨道系统，每个基板支撑组件在其上承载基板。 每个基板定位在设置在旋转轨道系统上的基板支撑组件上，并且通过位于基板处理平台的旋转轨道系统顶部的至少一个喷头站和至少一个缓冲站进行处理。 设置在基板支撑组件上的多个基板在基板处理平台内进出处理。 衬底分级平台包括至少一个双衬底处理站，每个双衬底处理站包括用于在其上支撑两个衬底的两个衬底支撑组件。

公开(公告)号：US20120269967A1

公开(公告)日：2012-10-25

申请号：US13437567

申请日：2012-04-02

申请人： Joseph Yudovsky ,  Garry K. Kwong ,  Dieter Haas ,  Steven D. Marcus ,  Timothy W. Weidman

发明人： Joseph Yudovsky ,  Garry K. Kwong ,  Dieter Haas ,  Steven D. Marcus ,  Timothy W. Weidman

IPC分类号： C23C16/455 ,  B05B1/14

CPC分类号： C23C16/45551 ,  C23C16/452 ,  C23C16/45544

摘要： Provided are gas distribution plates for atomic layer deposition apparatus including a hot wire or hot wire unit which can be heated to excite gaseous species while processing a substrate. Methods of processing substrates using a hot wire to excite gaseous precursor species are also described.

摘要翻译： 提供了用于原子层沉积设备的气体分配板，其包括热线或热丝单元，其可以在加工基板的同时被加热以激发气态物质。 还描述了使用热丝处理衬底以激发气态前体物质的方法。

公开(公告)号：US20120225206A1

公开(公告)日：2012-09-06

申请号：US13037430

申请日：2011-03-01

申请人： Joseph Yudovsky

发明人： Joseph Yudovsky

IPC分类号： C23C16/458 ,  C23C16/455

CPC分类号： C23C16/45551 ,  C23C16/4583 ,  H01L21/67715 ,  H01L21/6776 ,  H01L21/67784

摘要： Provided are atomic layer deposition apparatus and methods including a gas cushion plate comprising a plurality of openings configured to create a gas cushion adjacent the gas cushion plate so that a substrate can be moved through a processing chamber.

摘要翻译： 本发明提供了一种原子层沉积装置和方法，其包括气垫板，其包括多个开口，其被配置为产生邻近气垫板的气垫，使得基板能够移动通过处理室。

公开(公告)号：US20100305884A1

公开(公告)日：2010-12-02

申请号：US12781353

申请日：2010-05-17

申请人： Joseph Yudovsky ,  Jeffrey Tobin ,  Patricia M. Liu ,  Faruk Gungor ,  Tai T. Ngo ,  Travis Tesch ,  Kenric Choi

发明人： Joseph Yudovsky ,  Jeffrey Tobin ,  Patricia M. Liu ,  Faruk Gungor ,  Tai T. Ngo ,  Travis Tesch ,  Kenric Choi

IPC分类号： G01N7/00

CPC分类号： C23C16/4481

摘要： Methods of determining an amount of precursor in an ampoule have been provided herein. In some embodiments, a method for determining an amount of solid precursor in an ampoule may include determining a first pressure in an ampoule having a first volume partially filled with a solid precursor; flowing an amount of a first gas into the ampoule to establish a second pressure in the ampoule; determining a remaining portion of the first volume based on a relationship between the first pressure, the second pressure, and the amount of the first gas flowed into the ampoule; and determining the amount of solid precursor in the ampoule based on the first volume and the remaining portion of the first volume.

摘要翻译： 本文提供了确定安瓿中前体的量的方法。 在一些实施方案中，用于测定安瓿中的固体前体的量的方法可包括确定具有部分填充有固体前体的第一体积的安瓿中的第一压力; 将一定量的第一气体流入安瓿中以在安瓿中建立第二压力; 基于第一压力，第二压力和流入安瓿的第一气体的量之间的关系来确定第一容积的剩余部分; 并且基于第一体积和第一体积的剩余部分确定安瓿中的固体前体的量。

公开(公告)号：US20100273334A1

公开(公告)日：2010-10-28

申请号：US12834620

申请日：2010-07-12

申请人： Blake Koelmel ,  Robert C. McIntosh ,  David DL Larmagnac ,  Alexander N. Lerner ,  Abhilash J. Mayur ,  Joseph Yudovsky

发明人： Blake Koelmel ,  Robert C. McIntosh ,  David DL Larmagnac ,  Alexander N. Lerner ,  Abhilash J. Mayur ,  Joseph Yudovsky

IPC分类号： H01L21/26

CPC分类号： H01L21/67115 ,  H01L21/268 ,  H01L21/68735 ,  H01L21/68742

摘要： A method and apparatus for thermally processing a substrate is provided. A substrate is disposed within a processing chamber configured for thermal processing by directing electromagnetic energy toward a surface of the substrate. An energy blocker is provided to block at least a portion of the energy directed toward the substrate. The blocker prevents damage to the substrate from thermal stresses as the incident energy approaches an edge of the substrate.

摘要翻译： 提供了一种用于热处理衬底的方法和装置。 衬底被布置在处理室内，其被配置用于通过将电磁能量引导到衬底的表面进行热处理。 提供能量阻挡器以阻挡朝向衬底的能量的至少一部分。 当入射能量接近衬底的边缘时，阻挡剂防止由于热应力而损坏衬底。

公开(公告)号：US07798096B2

公开(公告)日：2010-09-21

申请号：US11381970

申请日：2006-05-05

申请人： Maitreyee Mahajani ,  Joseph Yudovsky ,  Brendan McDougall

发明人： Maitreyee Mahajani ,  Joseph Yudovsky ,  Brendan McDougall

IPC分类号： C23C16/00

CPC分类号： H01J37/32009 ,  C23C16/45508 ,  C23C16/45574 ,  C23C16/4583 ,  C23C16/46 ,  C23C16/509

摘要： A batch processing chamber includes a chamber housing, a substrate boat for containing a batch of substrates in a process region, and an excitation assembly for exciting species of a processing gas. The excitation assembly is positioned within the chamber housing and may include plasma, UV, or ion assistance.

摘要翻译： 批处理室包括：室壳体，用于在处理区域中容纳一批衬底的衬底舟和用于激发加工气体种类的激发组件。 激发组件定位在腔室内，并且可以包括等离子体，UV或离子辅助。

公开(公告)号：US20090032071A1

公开(公告)日：2009-02-05

申请号：US12245742

申请日：2008-10-04

申请人： Joseph Yudovsky ,  Hui Chen ,  Gary Ettinger

发明人： Joseph Yudovsky ,  Hui Chen ,  Gary Ettinger

IPC分类号： H01L21/67

CPC分类号： H01L21/67126 ,  B08B3/02 ,  B08B3/12 ,  B08B13/00 ,  H01L21/67051

摘要： A lid for a semiconductor device processing apparatus is provided. The lid comprises a cover having an opening and a wall formed around the opening, the wall adapted to prevent fluid present on the lid from entering a body of the processing apparatus through the opening, and one or more cover edges including one or more edge walls; an outer door adapted to prevent fluid from entering the body of the processing apparatus through the opening of the cover, wherein the outer door interfaces with the wall formed around the opening and the one or more edge walls; and an inner door coupled to the outer door and adapted to prevent fluid from exiting the body of the processing apparatus through the opening of the cover. Numerous other aspects are provided.

摘要翻译： 提供了一种用于半导体器件处理设备的盖子。 所述盖包括具有开口和围绕所述开口形成的壁的盖，所述壁适于防止存在于所述盖上的流体通过所述开口进入所述处理设备的主体，以及一个或多个盖边缘，包括一个或多个边缘壁 ; 外门，其适于防止流体通过盖的打开进入加工设备的主体，其中外门与围绕开口和一个或多个边缘壁形成的壁相连; 以及联接到所述外门并适于防止流体通过所述盖的打开而离开所述处理设备的主体的内门。 提供了许多其他方面。

公开(公告)号：US20080210258A1

公开(公告)日：2008-09-04

申请号：US12102846

申请日：2008-04-14

申请人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

发明人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

IPC分类号： B08B7/00 ,  A47L25/00

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.

摘要翻译： 提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器 电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器 以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度 刷子