公开(公告)号：US08501277B2

公开(公告)日：2013-08-06

申请号：US12151323

申请日：2008-05-05

Applicant: Boris Kobrin ,  Dangaria Nikunji Hirji ,  Romuald Nowak ,  Michael T. Grimes

Inventor： Boris Kobrin ,  Dangaria Nikunji Hirji ,  Romuald Nowak ,  Michael T. Grimes

IPC: C23C16/00

CPC classification number: H01L23/564 ,  B81B3/0075 ,  B81B2207/115 ,  B81C1/00206 ,  B81C1/0038 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/02214 ,  H01L21/02271 ,  H01L21/02304 ,  H01L21/3127 ,  H01L21/3141 ,  H01L21/31604 ,  H01L21/31612 ,  H01L21/3162 ,  H01L23/29 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/00

Abstract: A method of providing a durable protective coating structure which comprises at least three layers, and which is stable at temperatures in excess of 400° C., where the method includes vapor depositing a first layer deposited on a substrate, wherein the first layer is a metal oxide adhesion layer selected from the group consisting of an oxide of a Group IIIA metal element, a Group IVB metal element, a Group VB metal element, and combinations thereof; vapor depositing a second layer upon said first layer, wherein said second layer includes a silicon-containing layer selected from the group consisting of silicon oxide, silicon nitride, and silicon oxynitride; and vapor depositing a third layer upon said second layer, wherein said third layer is a functional organic-comprising layer. Numerous articles useful in electronics, MEMS, nanoimprinting lithography, and biotechnology applications can be fabricated using the method.

Abstract translation: 一种提供耐久保护涂层结构的方法，其包括至少三层，并且在超过400℃的温度下是稳定的，其中所述方法包括气相沉积沉积在基底上的第一层，其中所述第一层为 金属氧化物粘附层，其选自由IIIA族金属元素的氧化物，IVB族金属元素，VB族金属元素及其组合组成的组中; 在所述第一层上气相沉积第二层，其中所述第二层包括选自氧化硅，氮化硅和氮氧化硅的含硅层; 并在所述第二层上气相沉积第三层，其中所述第三层是含功能的有机物层。 可以使用该方法制造在电子，MEMS，纳米压印光刻和生物技术应用中有用的许多制品。

公开(公告)号：US08388908B2

公开(公告)日：2013-03-05

申请号：US12789186

申请日：2010-05-27

Applicant: Iuliu I. Blaga ,  Stevan B. Jovanovich ,  Boris Kobrin ,  Ezra Van Gelder

Inventor： Iuliu I. Blaga ,  Stevan B. Jovanovich ,  Boris Kobrin ,  Ezra Van Gelder

IPC: G01N15/06 ,  G01N33/00 ,  G01N33/48

CPC classification number: F16K99/0015 ,  B01L3/502707 ,  B01L3/50273 ,  B01L3/502738 ,  B01L7/52 ,  B01L2300/0816 ,  B01L2300/0864 ,  B01L2300/0867 ,  B01L2300/0883 ,  B01L2300/0887 ,  B01L2400/0481 ,  B01L2400/0638 ,  B33Y80/00 ,  F16K99/0001 ,  F16K2099/0073 ,  Y10T137/0318 ,  Y10T137/2224 ,  Y10T137/87716 ,  Y10T156/10 ,  Y10T436/11 ,  Y10T436/2575

Abstract: This invention provides fluidic devices, in particular microfluidic devices, with diaphragm valves having low failure rates. Low failure rates are achieved by inhibiting sticking of the diaphragm to functional surfaces such as valve seats, valve chamber and fluidic channels and conduits. One way to implement this is to provide exposed surfaces facing the diaphragm, particularly valve seats, with a low energy material, such as a noble metal, a perfluorinated polymer, a self-assembled monolayer, hard diamond, diamond-like carbon or a metal oxide. In other embodiments, the valves are provided with ridges and the diaphragm is adhered to the fluidic or actuation layer with an adhesive material.

Abstract translation: 本发明提供具有低故障率的隔膜阀的流体装置，特别是微流体装置。 通过抑制膜片到诸如阀座，阀室和流体通道和管道的功能表面的粘附来实现低故障率。 实现这一点的一种方法是提供面向隔膜，特别是阀座的暴露表面，其具有低能材料，例如贵金属，全氟化聚合物，自组装单层，硬金刚石，类金刚石碳或金属 氧化物。 在其他实施例中，阀设置有脊，并且隔膜用粘合剂材料粘附到流体或致动层。

公开(公告)号：US08236379B2

公开(公告)日：2012-08-07

申请号：US11904522

申请日：2007-09-26

Applicant: Boris Kobrin ,  Jeffrey D. Chin ,  Benigno A. Janeiro ,  Romuald Nowak

Inventor： Boris Kobrin ,  Jeffrey D. Chin ,  Benigno A. Janeiro ,  Romuald Nowak

IPC: B05D1/12 ,  C23C16/00 ,  C23C16/30 ,  C23C16/40

CPC classification number: B05D5/083 ,  B05D1/34 ,  B05D1/60 ,  B05D5/08 ,  C23C16/401 ,  C23C16/403 ,  Y10T428/256

Abstract: The present invention is related to a chemical vapor deposition method of depositing layers of materials to provide super-hydrophilic surface properties, or super-hydrophobic surface properties, or combinations of such properties at various locations on a given surface. The invention also relates to electronic applications which make use of super-hydrophobic surface properties, and to biological applications which make use of super-hydrophilic surface properties.

Abstract translation: 本发明涉及沉积材料层以提供超亲水表面性质或超疏水性表面性质的化学气相沉积方法，或者给定表面上各种位置处的这些性质的组合。 本发明还涉及利用超疏水表面性质的电子应用以及利用超亲水表面性质的生物应用。

公开(公告)号：US08192920B2

公开(公告)日：2012-06-05

申请号：US12386899

申请日：2009-04-24

Applicant: Boris Kobrin

Inventor： Boris Kobrin

IPC: G03F7/20 ,  G03B27/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/26 ,  G03F1/50 ,  G03F1/60 ,  G03F7/2014

Abstract: Embodiments of the invention relate to lithography method useful for patterning at sub-micron resolution. This method comprised of deposition and patterning self-assembled monolayer resists using rolling applicator and rolling mask exposure apparatus. Typically the application of these self-assembled monolayers involves contacting substrate materials with a rotatable applicator in the shape of cylinder or cone wetted with precursor materials. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact with self-assembled monolayer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating mask surface comprises metal nano holes or nanoparticles.

Abstract translation: 本发明的实施例涉及用于以亚微米分辨率进行图案化的光刻方法。 该方法包括使用滚动涂布器和滚动掩模曝光装置沉积和图案化自组装单层抗蚀剂。 通常，这些自组装单层的应用包括使基材与可旋转的涂布器接触，其以前体材料润湿的圆柱体或锥体的形状。 纳米图案技术利用近场光刻技术，其中用于图案衬底的掩模与自组装单层接触。 近场光刻可以使用弹性体相移掩模，或者可以采用表面等离子体激元技术，其中旋转掩模表面包括金属纳米孔或纳米颗粒。

公开(公告)号：US08182982B2

公开(公告)日：2012-05-22

申请号：US12384167

申请日：2009-04-01

Applicant: Boris Kobrin

Inventor： Boris Kobrin

IPC: G03F7/20 ,  G03B27/00

CPC classification number: G03B27/00 ,  B82Y10/00 ,  G03F7/201 ,  G03F7/70325 ,  G03F7/7035 ,  G11B5/743 ,  G11B5/82 ,  G11B5/855

Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of rotationally symmetric disk materials, like magnetic and optical disks, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cone. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the disk is in contact or close proximity with the disk. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cone surface comprises metal nano holes or nanoparticles.

Abstract translation: 本发明的实施例涉及用于旋转对称盘材料（如磁性​​和光盘）的纳米图案化的方法和装置，其中可旋转掩模用于对辐射敏感材料成像。 通常，可旋转掩模包括锥体。 纳米图案技术利用近场光刻技术，其中用于图案盘的掩模与盘接触或接近。 近场光刻可以利用弹性体相移掩模，或者可以采用表面等离子体激元技术，其中旋转锥形表面包括金属纳米孔或纳米颗粒。

公开(公告)号：US20110210480A1

公开(公告)日：2011-09-01

申请号：US13066473

申请日：2011-04-14

Applicant: Boris Kobrin

Inventor： Boris Kobrin

IPC: B29C59/16

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  H04L9/32

Abstract: Embodiments of the invention relate to methods of anti-counterfeiting for nanostructures and nanostructured devices. Specifically we describe a method of embedding a coded micro- or nanopatterns in nanostructures fabricated using Near-field rolling mask lithography, where areas of such features can be embedded into a transparent cylindrical or conic frame, or fabricated on the surface of flexible film laminated on the surface of the frame. Alternatively, specific coded nanofeatures distribution can be created using modulation of intensity or wavelength of the light source along the width or length of such cylinder or cone, or modulation of flexible film thickness or contact pressure between the rotatable mask and a substrate.

Abstract translation: 本发明的实施方案涉及用于纳米结构和纳米结构设备的防伪方法。 具体来说，我们描述了一种在使用近场轧制掩模光刻制造的纳米结构中嵌入编码的微型或纳米图案的方法，其中这些特征的区域可以嵌入透明圆柱形或圆锥形框架中，或者在层压在柔性膜的表面上制造 框架的表面。 或者，可以使用沿着这种圆柱体或锥体的宽度或长度的光源的强度或波长的调制或可旋转掩模和基底之间的柔性膜厚度或接触压力的调制来产生特定的编码纳米尺度分布。

公开(公告)号：US07638167B2

公开(公告)日：2009-12-29

申请号：US10862047

申请日：2004-06-04

Applicant: Boris Kobrin ,  Romuald Nowak ,  Richard C. Yi ,  Jeffrey D. Chinn

Inventor： Boris Kobrin ,  Romuald Nowak ,  Richard C. Yi ,  Jeffrey D. Chinn

IPC: C23C16/00 ,  C23C14/10

CPC classification number: B82Y30/00 ,  C23C16/0227 ,  C23C16/402

Abstract: We have developed an improved vapor-phase deposition method and apparatus for the application of films/coatings on substrates. The method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. In addition to the control over the amount of reactants added to the process chamber, the present invention requires precise control over the total pressure (which is less than atmospheric pressure) in the process chamber, the partial vapor pressure of each vaporous component present in the process chamber, the substrate temperature, and typically the temperature of a major processing surface within said process chamber. Control over this combination of variables determines a number of the characteristics of a film/coating or multi-layered film/coating formed using the method. By varying these process parameters, the roughness and the thickness of the films/coatings produced can be controlled.

Abstract translation: 我们已经开发了一种改进的气相沉积方法和装置，用于在基底上施加膜/涂层。 该方法提供在涂层形成过程的单个反应步骤中添加精确量的每种待消耗的反应物。 除了控制添加到处理室中的反应物的量之外，本发明需要精确控制处理室中的总压力（其小于大气压），存在于处理室中的每种气态组分的部分蒸气压 处理室，衬底温度以及典型地在所述处理室内的主处理表面的温度。 对这种变量组合的控制决定了使用该方法形成的膜/涂层或多层膜/涂层的许多特性。 通过改变这些工艺参数，可以控制所生产的膜/涂层的粗糙度和厚度。

公开(公告)号：US20080026146A1

公开(公告)日：2008-01-31

申请号：US11906071

申请日：2007-09-28

Applicant: Boris Kobrin ,  Jeffrey Chinn ,  Romuald Nowak ,  Richard Yi

Inventor： Boris Kobrin ,  Jeffrey Chinn ,  Romuald Nowak ,  Richard Yi

IPC: C23C16/44

CPC classification number: C23C16/0227 ,  B05D1/185 ,  B05D1/60 ,  B05D3/142 ,  B05D3/145 ,  B05D7/52 ,  B05D7/56 ,  B82Y30/00 ,  B82Y40/00 ,  C03C17/42 ,  C03C23/006 ,  C23C16/0245 ,  C23C16/0272 ,  C23C16/401 ,  C23C16/402 ,  C23C16/448 ,  C23C16/4485 ,  C23C16/455 ,  C23C16/45557 ,  C23C16/56 ,  Y10T428/12618 ,  Y10T428/12632 ,  Y10T428/24 ,  Y10T428/24355 ,  Y10T428/24967 ,  Y10T428/24975 ,  Y10T428/261 ,  Y10T428/265 ,  Y10T428/31663 ,  Y10T428/31667

Abstract: An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and a SAM organic-based is directly deposited over the oxide-based layer. Typically a series of alternating layers of oxide-based layer and organic-based layer are applied.

Abstract translation: 描述了一种用于在基底上施加多层膜/涂层的改进的气相沉积方法和装置。 该方法用于沉积与衬底直接接触的氧化物基层的厚度作为衬底的化学组成的函数来控制多层涂层，由此随后沉积的层更好地结合到氧化物基层。 改进的方法用于沉积多层涂层，其中氧化物基层直接沉积在衬底上，并且基于SAM的有机基层直接沉积在氧化物基层上。 通常，应用一系列交替层的氧化物基层和基于有机的层。

公开(公告)号：US20060088666A1

公开(公告)日：2006-04-27

申请号：US11295129

申请日：2005-12-05

Applicant: Boris Kobrin ,  Jeffrey Chinn ,  Romuald Nowak

Inventor： Boris Kobrin ,  Jeffrey Chinn ,  Romuald Nowak

IPC: C23C16/00

CPC classification number: B05D1/60 ,  B05D3/064 ,  B82Y30/00

Abstract: We have developed an improved vapor-phase deposition method and apparatus for the application of layers and coatings on various substrates. The method and apparatus are useful in the fabrication of biofunctional devices, Bio-MEMS devices, and in the fabrication of microfluidic devices for biological applications. In one important embodiment, a siloxane substrate surface is treated using a combination of ozone and UV radiation to render the siloxane surface more hydrophilic, and subsequently a functional coating is applied in-situ over the treated surface of the siloxane substrate.

Abstract translation: 我们已经开发了一种改进的气相沉积方法和装置，用于在各种基底上施加层和涂层。 该方法和装置可用于制造生物功能装置，生物MEMS装置以及制造用于生物应用的微流体装置。 在一个重要的实施方案中，使用臭氧和UV辐射的组合处理硅氧烷底物表面，以使硅氧烷表面更亲水，随后在硅氧烷底物的处理表面上原位施加功能性涂层。

公开(公告)号：US20060029732A1

公开(公告)日：2006-02-09

申请号：US10912656

申请日：2004-08-04

Applicant: Boris Kobrin ,  William Ashurst ,  Jeffrey Chinn ,  Romuald Nowak

Inventor： Boris Kobrin ,  William Ashurst ,  Jeffrey Chinn ,  Romuald Nowak

IPC: C23C16/00

CPC classification number: C23C16/0272 ,  B05D1/185 ,  B05D1/60 ,  B05D3/142 ,  C23C16/45525 ,  C23C16/45544 ,  C23C16/56

Abstract: We have developed an improved vapor-phase deposition method and apparatus for the application of organic films/coatings containing a variety of functional groups on substrates. Most substrates can be coated using the method of the invention. The substrate surface is halogenated using a vaporous halogen-containing compound, followed by a reaction with at least one organic molecule containing at least one nucleophilic functional group capable of reacting with a halogenated substrate surface. The halogenation of the substrate surface and the subsequent reaction with the organic molecule nucleophilic functional group are carried out in the same process chamber in a manner such that the halogenated substrate surface does not lose its functionality prior to reaction with the nucleophilic functional group(s) on the organic molecule. Typically the process chamber is operated under a pressure ranging from about 1 mTorr to about 10 Torr.

Abstract translation: 我们已经开发了一种改进的气相沉积方法和装置，用于在基底上应用含有各种官能团的有机膜/涂层。 可以使用本发明的方法涂覆大多数基底。 使用含卤素的化合物将底物表面卤化，然后与至少一种含有至少一个能够与卤化基质表面反应的亲核官能团的有机分子反应。 衬底表面的卤化和随后与有机分子亲核官能团的反应在相同的处理室中进行，使得卤化的衬底表面在与亲核官能团反应之前不失去其官能团， 在有机分子上。 通常，处理室在约1mTorr至约10Torr的压力下操作。