公开(公告)号：US08512510B2

公开(公告)日：2013-08-20

申请号：US13108612

申请日：2011-05-16

申请人： Akira Koshiishi ,  Jun Hirose ,  Masahiro Ogasawara ,  Taichi Hirano ,  Hiromitsu Sasaki ,  Tetsuo Yoshida ,  Michishige Saito ,  Hiroyuki Ishihara ,  Jun Ooyabu ,  Kohji Numata

发明人： Akira Koshiishi ,  Jun Hirose ,  Masahiro Ogasawara ,  Taichi Hirano ,  Hiromitsu Sasaki ,  Tetsuo Yoshida ,  Michishige Saito ,  Hiroyuki Ishihara ,  Jun Ooyabu ,  Kohji Numata

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： H01J37/32082 ,  H01J37/32422 ,  H01J37/32935

摘要： A plasma processing method is arranged to supply a predetermined process gas into a plasma generation space in which a target substrate is placed, and turn the process gas into plasma. The substrate is subjected to a predetermined plasma process by this plasma. The spatial distribution of density of the plasma and the spatial distribution of density of radicals in the plasma are controlled independently of each other relative to the substrate by a facing portion opposite the substrate to form a predetermined process state over the entire target surface of the substrate.

摘要翻译： 等离子体处理方法被布置成将预定的处理气体供给到其中放置目标衬底的等离子体产生空间中，并将处理气体转化为等离子体。 通过该等离子体对衬底进行预定的等离子体处理。 等离子体的密度的空间分布和等离子体中的自由基密度的空间分布相对于衬底彼此独立地通过与衬底相对的面对部分彼此独立地控制，以在衬底的整个靶表面上形成预定的工艺状态 。

公开(公告)号：US20120320612A1

公开(公告)日：2012-12-20

申请号：US13580331

申请日：2010-02-23

申请人： Yutaka Yamakura ,  Jun Hirose

发明人： Yutaka Yamakura ,  Jun Hirose

IPC分类号： B62K19/30 ,  B62J6/04

CPC分类号： B62J15/00 ,  B62J6/005 ,  B62J15/02 ,  B62J23/00 ,  B62K11/04 ,  B62K19/40

摘要： A rear portion structure (100) of a motorcycle (1) comprises a chassis frame (5); a rear wheel (17) positioned below the rear portion of the chassis frame (5); a fender main body portion (110) anchored to the rear portion of the chassis frame (5) and positioned above the rear wheel (17); a fender hanging portion (120) configured separately from the fender main body portion (110) and covering at least a portion of the rear wheel (17); and a support stay (130) anchored to the rear end portion of the chassis frame (5) (rear end frame portion (5a), extending aft approximately horizontally from the rear end portion, and supporting the fender hanging portion (120).

摘要翻译： 摩托车（1）的后部结构（100）包括底架（5）; 位于所述底盘框架（5）后部的后轮（17）。 锚固在底盘框架（5）的后部并且位于后轮（17）上方的挡泥板主体部分（110）; 翼子板悬挂部分（120），其与所述翼子板主体部分（110）分开设置并且覆盖所述后轮（17）的至少一部分; 以及支撑架（130），其支撑在底架框架（5）的后端部（后端框架部分5a），从后端部大致水平地延伸，并支撑翼子板悬挂部分（120）。

公开(公告)号：US20120292948A1

公开(公告)日：2012-11-22

申请号：US13574649

申请日：2011-01-19

申请人： Omi Iida ,  Jun Hirose ,  Shigeto Inami ,  Katsumasa Ieda

发明人： Omi Iida ,  Jun Hirose ,  Shigeto Inami ,  Katsumasa Ieda

IPC分类号： B62J17/00

CPC分类号： B62J17/02

摘要： A cowling structure includes a head pipe mounted to the front of a body frame, a steering gear held such that it is capable of pivoting about the axis of the head pipe, side cowls each arranged at the transverse outside of the body frame, together with an opening so formed in each side cowl that it communicates with the transverse outside and inside of each side cowl. When viewed in a side view, the side cowls are lengthened up to the fore of the head pipe, and the opening is in such a position that it is level with the head pipe and overlaps with the steering gear in the fore of the head pipe. Such cowling structure permits less damages to the external appearance while providing the improvement in the lightness of banking at the time in the early stage of turning of a vehicle body.

摘要翻译： 整流罩结构包括安装在主体框架的前部的头管，舵机被保持成使得其能够围绕头管的轴线枢转，每个排列在主体框架的横向外侧的侧罩，以及 在每个侧罩中形成的开口，其与每个侧罩的横向外侧和内侧连通。 当从侧视图看时，侧罩被延长到头管的前部，并且开口处于与头管平齐并且与头管的前部处的舵机重叠的位置 。 这样的整流罩结构允许对外观的损害较小，同时在车身转向的早期阶段提供银行业的轻盈性。

公开(公告)号：US20120031500A1

公开(公告)日：2012-02-09

申请号：US13203866

申请日：2009-11-06

申请人： Jun Hirose ,  Kazuyuki Tezuka ,  Yohei Uchida ,  Mutsunori Koyonogi ,  Takahiro Matsuda ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

发明人： Jun Hirose ,  Kazuyuki Tezuka ,  Yohei Uchida ,  Mutsunori Koyonogi ,  Takahiro Matsuda ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

IPC分类号： F17D1/16

CPC分类号： C23C16/45561 ,  H01L21/67017 ,  Y10T137/0396

摘要： To provide a fluid control apparatus capable of reducing the space, while reducing the cost.A fluid control apparatus 1 has a fluid controlling unit 2 and a fluid introducing unit 3. The fluid introducing unit 3 is divided into three parts: a first and a second inlet-side shutoff/open parts 5, 6 disposed on the inlet side, each made up of 2×N/2 on-off valves 23, and a fluid controlling unit-side shutoff/open part 7 made up of 4×M on-off valves 23, disposed between the first and second inlet-side shutoff/open parts 5, 6 and the fluid controlling unit 2.

摘要翻译： 提供能够减少空间的流体控制装置，同时降低成本。 流体控制装置1具有流体控制单元2和流体引入单元3.流体引入单元3被分成三部分：设置在入口侧的第一和第二入口侧截止/打开部分5,6， 每个都由2×N / 2开关阀23和由4×M开关阀23构成的​​流体控制单元侧关闭/打开部分7，其设置在第一和第二入口侧截止阀/ 打开部分5,6和流体控制单元2。

公开(公告)号：US07494561B2

公开(公告)日：2009-02-24

申请号：US11137492

申请日：2005-05-26

申请人： Akira Koshiishi ,  Jun Hirose ,  Masahiro Ogasawara ,  Taichi Hirano ,  Hiromitsu Sasaki ,  Tetsuo Yoshida ,  Michishige Saito ,  Hiroyuki Ishihara ,  Jun Ooyabu ,  Kohji Numata

发明人： Akira Koshiishi ,  Jun Hirose ,  Masahiro Ogasawara ,  Taichi Hirano ,  Hiromitsu Sasaki ,  Tetsuo Yoshida ,  Michishige Saito ,  Hiroyuki Ishihara ,  Jun Ooyabu ,  Kohji Numata

IPC分类号： C23C16/00 ,  H01L21/306 ,  C23F1/00

CPC分类号： H01J37/32449 ,  H01J37/32027 ,  H01J37/32091 ,  H01J37/32174 ,  H01J37/32541 ,  H01J37/3255 ,  H01J37/32587

摘要： A plasma processing apparatus includes a process container configured to have a vacuum atmosphere therein. A first upper electrode is disposed to have a ring shape and to face a target substrate placed within the process container. A second upper electrode is disposed radially inside the first upper electrode and electrically insulated therefrom. A first electric feeder is configured to supply a first RF output from a first RF power supply to the first upper electrode at a first power value. A second electric feeder branches from the first electric feeder and is configured to supply the first RF output from the first RF power supply to the second upper electrode at a second power value smaller than the first power value.

摘要翻译： 一种等离子体处理装置，包括被配置为在其中具有真空气氛的处理容器。 第一上电极被设置成具有环形并且面对放置在处理容器内的目标衬底。 第二上电极径向设置在第一上电极内并与其电绝缘。 第一馈电器被配置为以第一功率值将第一RF电源的第一RF输出提供给第一上电极。 第二馈电器从第一馈电器分支并且被配置为以小于第一功率值的第二功率值将第一RF电源的第一RF输出提供给第二上电极。

公开(公告)号：US20070169891A1

公开(公告)日：2007-07-26

申请号：US10933383

申请日：2004-09-03

申请人： Akira Koshiishi ,  Hideaki Tanaka ,  Nobuyuki Okayama ,  Masaaki Miyagawa ,  Shunsuke Mizukami ,  Wataru Shimizu ,  Jun Hirose ,  Toshikatsu Wakaki ,  Tomonori Miwa ,  Jun Ooyabu ,  Daisuke Hayashi

发明人： Akira Koshiishi ,  Hideaki Tanaka ,  Nobuyuki Okayama ,  Masaaki Miyagawa ,  Shunsuke Mizukami ,  Wataru Shimizu ,  Jun Hirose ,  Toshikatsu Wakaki ,  Tomonori Miwa ,  Jun Ooyabu ,  Daisuke Hayashi

IPC分类号： C23F1/00

CPC分类号： H01L21/68735 ,  H01J37/32642 ,  H01L21/68757

摘要： A focus ring and a plasma processing apparatus capable of improving an in-surface uniformity of a surface and reducing occurrences of deposition on a backside surface of a peripheral portion of a semiconductor wafer compared to a conventional case are provided. Installed in a vacuum chamber is a susceptor for mounting the semiconductor wafer thereon and a focus ring is installed to surround the semiconductor wafer mounted on the susceptor. The focus ring includes an annular lower member made of a dielectric, and an annular upper member made of a conductive material and mounted on the lower member. The upper member includes a flat portion which is an outer peripheral portion having a top surface positioned higher than a surface to be processed of the semiconductor wafer W, and an inclined portion which is an inner peripheral portion inclined inwardly.

摘要翻译： 提供了一种聚焦环和等离子体处理装置，其能够改善表面的表面均匀性并减少与常规情况相比在半导体晶片的周边部分的背面上沉积的情况。 安装在真空室中的是用于在其上安装半导体晶片的基座，并且安装聚焦环以围绕安装在基座上的半导体晶片。 聚焦环包括由电介质制成的环形下部构件和由导电材料制成并安装在下部构件上的环形上部构件。 上部构件包括平坦部，该平坦部是具有位于比半导体晶片W的待加工表面高的顶面的外周部，以及作为向内倾斜的内周部的倾斜部。

公开(公告)号：US07025554B2

公开(公告)日：2006-04-11

申请号：US10614777

申请日：2003-07-07

申请人： Jun Ozawa ,  Jun Hirose ,  Masaki Narushima

发明人： Jun Ozawa ,  Jun Hirose ,  Masaki Narushima

IPC分类号： B65G49/07

CPC分类号： H01L21/67161 ,  H01L21/67167 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67745 ,  Y10S414/139

摘要： A vacuum process system comprises: a load port on which an object to be processed is set; a common transfer chamber disposed adjacent to the load port, having an internal space set at an atmospheric pressure level, and including a first transfer device that is movable and transfers the object into/from the load port, the first transfer device being disposed within the internal space; and a process unit having one process chamber for subjecting the object to a predetermined process, and a vacuum transfer chamber connected to the process chamber, having an internal space set at a vacuum pressure level, and including a second transfer device for transferring the object into/from the process chamber, the second transfer device being disposed within the internal space. The process units are individually connected to the common transfer chamber such that the process units are substantially parallel to each other. The vacuum chamber of each process unit is connected to the common transfer chamber. Each process unit extends linearly in a direction substantially perpendicular to the common transfer chamber. The object is transferred into/from the vacuum transfer chamber by means of the first transfer device.

摘要翻译： 真空处理系统包括：设置待处理对象的装载端口; 与负载端口相邻设置的公共传送室，具有设定在大气压力水平的内部空间，并且包括第一传送装置，该第一传送装置可移动并将物体传送到/从所述装载端口传送，所述第一传送装置设置在所述传送室内 内部空间; 以及处理单元，其具有用于使物体经受预定处理的一个处理室和连接到处理室的真空传送室，其具有设置在真空压力水平的内部空间，并且包括用于将物体传送到 /从处理室，第二传送装置设置在内部空间内。 处理单元分别连接到公共传送室，使得处理单元基本上彼此平行。 每个处理单元的真空室连接到公共传送室。 每个处理单元在基本上垂直于公共传送室的方向上线性地延伸。 物体通过第一传送装置传送到/从真空传送室传送。

公开(公告)号：US20050257743A1

公开(公告)日：2005-11-24

申请号：US11137516

申请日：2005-05-26

申请人： Akira Koshiishi ,  Jun Hirose ,  Masahiro Ogasawara ,  Taichi Hirano ,  Hiromitsu Sasaki ,  Tetsuo Yoshida ,  Michishige Saito ,  Hiroyuki Ishihara ,  Jun Ooyabu ,  Kohji Numata

发明人： Akira Koshiishi ,  Jun Hirose ,  Masahiro Ogasawara ,  Taichi Hirano ,  Hiromitsu Sasaki ,  Tetsuo Yoshida ,  Michishige Saito ,  Hiroyuki Ishihara ,  Jun Ooyabu ,  Kohji Numata

IPC分类号： H05H1/46 ,  C23C16/00 ,  C23C16/509 ,  C23F4/00 ,  H01J37/32 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/311

CPC分类号： H01J37/32577 ,  H01J37/32082 ,  H01J37/32174 ,  H01L21/31116

摘要： A plasma processing apparatus includes a process container configured to have a vacuum atmosphere therein. An upper electrode is disposed to face a target substrate placed within the process container. An electric feeder includes a first cylindrical conductive member continuously connected to the upper electrode in an annular direction. The electric feeder is configured to supply a first RF output from a first RF power supply to the upper electrode.

摘要翻译： 一种等离子体处理装置，包括被配置为在其中具有真空气氛的处理容器。 上电极被设置为面对放置在处理容器内的目标衬底。 电动给料器包括在环形方向上连续地连接到上电极的第一圆柱形导电构件。 电馈送器被配置为将第一RF电源的第一RF输出提供给上电极。

公开(公告)号：US06809049B2

公开(公告)日：2004-10-26

申请号：US10296040

申请日：2002-11-21

申请人： Jun Hirose

发明人： Jun Hirose

IPC分类号： C03C808

CPC分类号： C03C8/16 ,  C03C3/19

摘要： The present invention provides glass compositions that can be used instead of known glass compositions containing a large amount of PbO in applications such as coating ceramic substrates, e.g., alumina, or sealing fluorescent tubes or the like. The invention also provides glass forming materials containing the glass compositions as a primary component for glass formation. Glass compositions provided by the present invention are comprises essentially of primary oxide components. The primary oxide components include ZnO, B2O3 and P2O5 as essential components and Al2O3, MgO, CaO and BaO as optional components. The amount of the primary oxide components is 85 wt % or more (preferably 90 wt % or more) of the total weight of the glass composition. Typically, the primary oxide components include 45 to 80% of ZnO, 5 to 45% of B2O3, 1 to 35% of P2O5, 0 to 10% of Al2O3, 0 to 15% of MgO, 0 to 10% of CaO, and 0 to 5% of BaO.

公开(公告)号：US06517460B2

公开(公告)日：2003-02-11

申请号：US09847967

申请日：2001-05-03

申请人： Kenichi Takeuchi ,  Jun Hirose

发明人： Kenichi Takeuchi ,  Jun Hirose

IPC分类号： F16H132

CPC分类号： F16H1/32

摘要： An eccentric orbiting type speed reducer for the joint of the industrial machine has a plurality of crankshafts, a rotational driving force being input into one crankshaft alone among the plurality of crankshafts, in which the bearing capacity for one crankshaft among the plurality of crankshafts is greater than the bearing capacities for other crankshafts.

摘要翻译： 用于工业机器的接头的偏心轨道式减速器具有多个曲轴，旋转驱动力被输入到多个曲轴中的单个曲轴中，其中多个曲轴中的一个曲轴的承载能力较大 比其他曲轴的承载能力。