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    Compound mold and structured surface articles containing geometric structures with compound faces and method of making same
    51.
    发明授权
    Compound mold and structured surface articles containing geometric structures with compound faces and method of making same 有权
    复合模具和包含具有复合面的几何结构的结构化表面制品及其制造方法

    公开(公告)号：US08852722B2

    公开(公告)日：2014-10-07

    申请号：US13761518

    申请日：2013-02-07

    申请人： 3M Innovative Properties Company

    发明人： Gerald M. Benson ,  Kenneth L. Smith

    IPC分类号： B32B3/00 ,  B29C59/02 ,  B32B3/28 ,  G02B5/124 ,  B29D11/00 ,  B29C33/38 ,  B29C33/42 ,  B32B3/30 ,  H01Q15/18 ,  B29L11/00

    CPC分类号： B32B3/28 ,  B29C33/3842 ,  B29C33/42 ,  B29C59/02 ,  B29C59/022 ,  B29C59/026 ,  B29D11/00605 ,  B29L2011/0091 ,  B32B3/30 ,  G02B5/124 ,  H01Q15/18 ,  Y10T428/24479 ,  Y10T428/24521 ,  Y10T428/2457 ,  Y10T428/24612

    摘要： Structured surface articles such as molds or sheeting are formed on a compound substrate including a machined substrate and a replicated substrate. In one embodiment, the structured surface is a cube corner element on a compound substrate. In another embodiment, the structured surface is a geometric structure that has a plurality of faces, where one face is located on the machined substrate and another face is located on the replicated substrate. In yet another embodiment, at least some of the faces include a compound face with a portion formed on the machined substrate and a portion formed on the replicated substrate. The method of making a structured surface article including a geometric structure having a plurality of faces includes forming an array of geometric structures in a first surface of a machined substrate; passivating selected locations of the first surface of the machined substrate; forming a replicated substrate of the machined substrate to form a compound substrate; forming an array of second geometric structures on a second surface opposite the first surface on the machined substrate; and removing selected portions from the second surface of the machined substrate.

    摘要翻译： 在包括机加工衬底和复制衬底的复合衬底上形成诸如模具或片材的结构化表面制品。 在一个实施例中，结构化表面是复合衬底上的立体角元件。 在另一个实施例中，结构化表面是具有多个面的几何结构，其中一个面位于加工衬底上，另一个面位于复制衬底上。 在另一个实施例中，至少一些表面包括具有形成在机加工衬底上的部分和形成在复制衬底上的部分的复合面。 制造包括具有多个面的几何结构的结构化表面制品的方法包括在加工的基底的第一表面中形成几何结构的阵列; 钝化加工基板的第一表面的选定位置; 形成所述加工基板的复制基板以形成复合基板; 在与加工的基底上的第一表面相对的第二表面上形成第二几何结构的阵列; 以及从加工的基板的第二表面移除所选择的部分。

    EMBOSSED MICRO-STRUCTURE WITH CURED TRANSFER MATERIAL METHOD
    53.
    发明申请
    EMBOSSED MICRO-STRUCTURE WITH CURED TRANSFER MATERIAL METHOD 有权
    固化微结构与固化转移材料方法

    公开(公告)号：US20140262452A1

    公开(公告)日：2014-09-18

    申请号：US13833244

    申请日：2013-03-15

    申请人： RONALD STEVEN COK ,  Shelby Forrester Nelson

    发明人： RONALD STEVEN COK ,  Shelby Forrester Nelson

    IPC分类号： B29C59/02 ,  H05K1/02

    CPC分类号： B29C59/026 ,  B29C2035/0822 ,  B29C2035/0827 ,  B29C2035/0833 ,  B29C2059/023 ,  H05K1/0296 ,  H05K3/1258 ,  H05K2201/0108 ,  H05K2201/09036 ,  H05K2203/0108 ,  H05K2203/0537 ,  Y10T428/2462

    摘要： A method of making an embossed micro-structure includes providing a transfer substrate, an emboss substrate, and an embossing stamp having one or more stamp structures. Transfer material is coated on the transfer substrate. The transfer material on the transfer substrate is contacted with the stamp structures to adhere transfer material to the stamp structures. A curable emboss layer is coated on the emboss substrate. The stamp structures and adhered transfer material are contacted to the curable emboss layer on the emboss substrate to emboss a micro-structure in the curable emboss layer and transfer the transfer material to the embossed micro-structure. The curable emboss layer is cured to form a cured emboss layer having embossed micro-structures corresponding to the stamp structures and having transfer material in the embossed micro-structures. The stamp structures is removed from the cured emboss layer, substantially leaving the transfer material in the micro-structure.

    摘要翻译： 制造压花微结构的方法包括提供转印衬底，压花衬底和具有一个或多个印模结构的压花印模。 转印材料涂覆在转印衬底上。 转印基材上的转印材料与印模结构接触以将转印材料粘附到印模结构上。 将可固化的压花层涂覆在压花基材上。 印模结构和粘附的转印材料与压花基材上的可固化压花层接触以压印可固化压花层中的微结构并将转印材料转印到压花微结构。 可固化压花层被固化以形成具有对应于印模结构并且在压花微结构中具有转印材料的压花微结构的固化压印层。 从固化的压花层去除印模结构，基本上留下微结构中的转印材料。

    Method of forming resist pattern by nanoimprint lithography
    54.
    发明授权
    Method of forming resist pattern by nanoimprint lithography 有权
    通过纳米压印光刻形成抗蚀剂图案的方法

    公开(公告)号：US08828304B2

    公开(公告)日：2014-09-09

    申请号：US12303434

    申请日：2007-05-30

    申请人： Kazufumi Sato ,  Tomotaka Yamada

    发明人： Kazufumi Sato ,  Tomotaka Yamada

    IPC分类号： B29C59/02 ,  B29C71/04 ,  G03F7/00 ,  G03F7/038 ,  G03F7/075 ,  B82Y40/00 ,  B82Y10/00 ,  B29K85/00 ,  B29C35/08

    CPC分类号： B29C59/026 ,  B29C71/04 ,  B29C2035/0827 ,  B29K2085/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0382 ,  G03F7/0757 ,  Y10S977/887

    摘要： A method of forming a resist pattern of high aspect ratio excelling in etching resistance by the use of nanoimprint lithography. The method of forming a resist pattern by nanoimprint lithography comprises the steps of disposing organic layer (4) on support (1); providing resist layer (2) on the organic layer (4) with the use of chemical amplification type negative resist composition containing silsesquioxane resin (A); pressing light transmission allowing mold (3) with partial light shielding portion (5) against the resist layer (2) and thereafter carrying out exposure from the upside of the mold (3); and detaching the mold (3).

    摘要翻译： 通过使用纳米压印光刻法形成耐蚀刻性优异的高纵横比的抗蚀剂图案的方法。 通过纳米压印光刻形成抗蚀剂图案的方法包括将有机层（4）放置在载体（1）上的步骤; 使用包含倍半硅氧烷树脂（A）的化学放大型负光刻胶组合物在有机层（4）上提供抗蚀剂层（2）; 按压光透射，允许具有部分遮光部分（5）的模具（3）抵靠抗蚀剂层（2），然后从模具（3）的上侧进行曝光; 并拆卸模具（3）。

    PATTERN TRANSFERRING APPARATUS AND PATTERN TRANSFERRING METHOD
    55.
    发明申请
    PATTERN TRANSFERRING APPARATUS AND PATTERN TRANSFERRING METHOD 审中-公开
    图案转印装置和图案转印方法

    公开(公告)号：US20140151936A1

    公开(公告)日：2014-06-05

    申请号：US14091773

    申请日：2013-11-27

    申请人： CANON KABUSHIKI KAISHA

    发明人： Kazuyuki KASUMI ,  Hirohisa OTA ,  Eigo KAWAKAMI ,  Takashi NAKAMURA ,  Toshinobu TOKITA

    IPC分类号： B29C59/02

    CPC分类号： B29C59/026 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： A pattern transferring apparatus is disclosed which can prevent damage to a transferred pattern and realize fast mold release regardless of the type of resist. The pattern transferring apparatus transfers a pattern formed on a mold to an object by bringing the mold into contact with the apparatus has a deformer which causes deformation in the mold for releasing the mold from the object. The apparatus transfers a pattern formed on a mold to a photo-curing resin by bringing the mold into contact with the photo-curing resin and applying light thereto to cure the photo-curing resin. The apparatus has an optical system which applies light at an irradiation light intensity to a non-transfer area other than a transfer area where the pattern is to be transferred in the photo-curing resin, the intensity being different from an irradiation light intensity of light applied to the transfer area.

    摘要翻译： 公开了一种图案转印装置，其可以防止对转印图案的损坏，并且实现快速脱模，而不管抗蚀剂的类型如何。 图案转印装置通过使模具与装置接触而将模具上形成的图案转印到物体上，具有变形部，该变形部使得模具中的变形从物体脱模。 该装置通过使模具与光固化树脂接触并向其施加光以将光固化树脂固化，将形成在模具上的图案转印到光固化树脂上。 该装置具有将照射光强度的光照射到光固化树脂中要转印图案的转印区域以外的非转印区域的光学系统，其强度与光的照射光强度不同 应用于转移区域。

    IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD
    56.
    发明申请
    IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD 审中-公开
    印刷装置和制品制造方法

    公开(公告)号：US20140145370A1

    公开(公告)日：2014-05-29

    申请号：US14171909

    申请日：2014-02-04

    申请人： Canon Kabushiki Kaisha

    发明人： Masayuki TANABE ,  Yasuyuki TAMURA ,  Yukio HANYU

    IPC分类号： B29C59/00

    CPC分类号： B29C43/56 ,  B29C33/00 ,  B29C43/021 ,  B29C59/00 ,  B29C59/02 ,  B29C59/026 ,  B29C59/16 ,  B29C2043/566 ,  B29K2101/00 ,  B29L2031/34 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： An imprint apparatus of the present invention that molds and cures an imprint material on a substrate using a mold to form a pattern on the substrate. The imprint apparatus includes a supply unit configured to supply a gas into a gap between the imprint material on the substrate and the mold. The supply unit is configured to supply a mixed gas in which a permeable gas, which permeates at least one of the mold, the imprint material and the substrate, and a condensable gas, which is liquefied under a pressure generated by the molding, is mixed with each other.

    摘要翻译： 本发明的压印装置使用模具在基板上模压和固化压印材料，以在基板上形成图案。 压印装置包括供给单元，其构造成将气体供应到基板上的压印材料和模具之间的间隙中。 供给单元被配置为供给混合气体，在该混合气体中渗入至少一个模具，压印材料和基材的渗透气体和在由模制产生的压力下液化的可冷凝气体混合 与彼此。

    MIRROR-SURFACE SHEET COMPRISING TRANSPARENT PROJECTIONS HAVING AN INDEPENDENT STRUCTURE AND PRODUCTION METHOD THEREFOR
    59.
    发明申请
    MIRROR-SURFACE SHEET COMPRISING TRANSPARENT PROJECTIONS HAVING AN INDEPENDENT STRUCTURE AND PRODUCTION METHOD THEREFOR 审中-公开
    包含具有独立结构的透明投影的镜面表及其生产方法

    公开(公告)号：US20130295336A1

    公开(公告)日：2013-11-07

    申请号：US13979760

    申请日：2012-02-17

    申请人： Jung-Eun Ha ,  Moon-Ki Yea ,  Ji-Yong Park

    发明人： Jung-Eun Ha ,  Moon-Ki Yea ,  Ji-Yong Park

    IPC分类号： G02B5/08

    CPC分类号： G02B5/08 ,  B29C35/08 ,  B29C59/026 ,  B29C2035/0827 ,  B29C2035/0877 ,  B29D11/00596 ,  B44C5/04 ,  B44F1/02 ,  G02B5/10 ,  Y10T428/24612

    摘要： Disclosed is a minor-surface sheet comprising transparent projections having an independent structure, and the minor-surface sheet has outstanding resistance to fingerprints even after formation by deep drawing and gives an appealing impression by imparting an impression of depth. The mirror-surface sheet according to the present invention, which has outstanding resistance to fingerprints and can impart an extreme impression of depth, comprises: a transparent film layer; a printed layer which is formed on the lower part of the transparent film layer; and a transparent projection layer which comprises a plurality of transparent projections that are attached, spaced apart from each other on the upper part, of the transparent film layer.

    摘要翻译： 公开了一种具有独立结构的透明突起的次表面片，并且即使在通过深拉成形之后，次表面片也具有突出的耐指纹性，并且通过赋予深度印象而赋予吸引人的印象。 根据本发明的具有突出的耐指纹性并且可以赋予深度印象的镜面片包括：透明膜层; 印刷层，形成在透明膜层的下部; 以及透明突起层，其包括在透明膜层上彼此间隔开地安装的多个透明突起。

    NANOIMPRINTING METHOD
    60.
    发明申请
    NANOIMPRINTING METHOD 审中-公开
    纳米法

    公开(公告)号：US20130292877A1

    公开(公告)日：2013-11-07

    申请号：US13932688

    申请日：2013-07-01

    申请人： FUJIFILM Corporation

    发明人： Atsushi TATSUGAWA ,  Masafumi YOSHIDA

    IPC分类号： B29C59/02

    CPC分类号： B29C59/026 ,  B29C37/0067 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： A mold equipped with a substrate having a fine pattern of protrusions and recesses and a mold release layer formed along the pattern of protrusions and recesses on the surface thereof is employed to press resist coated on a substrate, to form a resist pattern, to which the pattern of protrusions and recesses is transferred. The thickness of the mold release layer and the pressing force with which the mold is pressed against the resist are controlled such that the line width of the resist pattern becomes a desired value. The width of the lines of the resist pattern is controlled by this configuration.

    摘要翻译： 采用具有突起和凹陷的精细图案的基板和沿其表面上的突起和凹陷的图案形成的脱模层的模具来压制涂覆在基板上的抗蚀剂，以形成抗蚀剂图案， 转移突起和凹陷的图案。 控制脱模层的厚度和将模具压在抗蚀剂上的压力使得抗蚀剂图案的线宽变为期望值。 通过该结构来控制抗蚀剂图案的线的宽度。