公开(公告)号：US20170323807A1

公开(公告)日：2017-11-09

申请号：US15363334

申请日：2016-11-29

申请人： K.C.Tech Co., Ltd.

发明人： Young Kyu Kweon ,  Joon Ho An ,  Byoung Chaul Son ,  Jin Sung Rho

IPC分类号： H01L21/67 ,  H01L21/673

CPC分类号： H01L21/67023 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/67075 ,  H01L21/67126 ,  H01L21/67161 ,  H01L21/67219 ,  H01L21/67288 ,  H01L21/67326 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/68707

摘要： Provided is a substrate processing system and a substrate processing method. The substrate processing system includes a polishing part for performing a Chemical Mechanical Polishing (CMP) process on a substrate, a cleaning part for cleaning the substrate on which the polishing process is performed, and a substrate transferring part for transferring the substrate to the cleaning part before polishing the substrate in the polishing part. The substrate may be preparatorily cleaned in the cleaning part before the polishing process, and then enters the polishing part.

公开(公告)号：US09748127B2

公开(公告)日：2017-08-29

申请号：US14649090

申请日：2012-12-04

申请人： MIRAIAL CO., LTD.

发明人： Ryuuji Fukuda

IPC分类号： H01L21/673 ,  B65D85/48 ,  F16B11/00 ,  F16B17/00

CPC分类号： H01L21/67379 ,  B65D85/48 ,  F16B11/006 ,  F16B17/008 ,  H01L21/67326 ,  H01L21/67386

摘要： The upper wall is provided with a recess indented from the outside toward the inside of the container main body, and a protrusion projecting outward on the inside of the recess. The top flange is provided with an insertion part which can be inserted into the recess from the outside of the upper wall. The insertion part is provided with a through-hole capable of penetrating from the side further from the upper wall to the side nearer the upper wall. With the recess in the upper wall opening upward and the insertion part of the top flange inserted into the recess, a molten resin poured into the through-hole of the insertion part from above fills the recess from the bottom surface thereof up to the outer peripheral surface of the protrusion and the inner peripheral surface of the through-hole.

公开(公告)号：US20170244006A1

公开(公告)日：2017-08-24

申请号：US15506133

申请日：2015-09-01

申请人： APPLIED MATERIALS, INC.

发明人： BRIAN H. BURROWS ,  NILESH BAGUL ,  SUMEDH ACHARYA ,  BAHUBALI UPADHYE ,  LANCE A. SCUDDER ,  ROGER N. ANDERSON

IPC分类号： H01L31/18 ,  H01L21/673 ,  C23C16/54 ,  C23C16/458 ,  C23C16/455 ,  H01L21/67 ,  C23C16/44

CPC分类号： H01L31/1876 ,  C23C16/4408 ,  C23C16/45519 ,  C23C16/45523 ,  C23C16/4585 ,  C23C16/4586 ,  C23C16/4587 ,  C23C16/481 ,  C23C16/54 ,  H01L21/67115 ,  H01L21/67173 ,  H01L21/67326 ,  H01L21/6773 ,  H01L31/18 ,  Y02E10/50 ,  Y02P70/521

摘要： In some embodiments, an inline substrate processing tool may include a substrate carrier having a plurality of slots configured to retain a plurality of substrates parallel to each other when disposed in the slots, a first substrate processing module and a second substrate processing module disposed in a linear arrangement, wherein each substrate processing module includes an enclosure and a track that supports the substrate carrier and provides a path for the substrate carrier to move linearly through the first and second substrate processing modules, and a first gas cap disposed between the first and second substrate processing modules, wherein the first gas cap includes a first process gas conduit to provide a first process gas to the first substrate processing module, and a second process gas conduit to provide a second process gas to the second substrate processing module.

公开(公告)号：US20170243774A1

公开(公告)日：2017-08-24

申请号：US15506814

申请日：2015-09-04

申请人： APPLIED MATERIALS, INC.

发明人： Takao YONEHARA ,  Matthew SIMAS ,  Jonathan S. FRANKEL

IPC分类号： H01L21/673 ,  C25D11/00 ,  C25D17/06 ,  H01L21/3063 ,  C25D11/32

CPC分类号： H01L21/67326 ,  C25D11/005 ,  C25D11/32 ,  C25D17/06 ,  C25F3/12 ,  C25F7/00 ,  H01L21/3063

摘要： Methods and apparatus for forming porous silicon layers are provided. In some embodiments, an anodizing bath includes: a housing having a first volume to hold a chemical solution; a cathode disposed within the first volume at a first side of the housing; an anode disposed within the first volume at a second side of the housing, opposite the first side, wherein a face of each of the cathode and the anode have a given surface area; a substrate holder configured to retain a plurality of substrates along a perimeter thereof within the first volume in a plurality of substrate holding positions, a plurality of vent openings fluidly coupled to the first volume to release process gases, wherein a top of each of the plurality of vent openings are disposed above a chemical solution fill level in the first volume.

公开(公告)号：US09698032B2

公开(公告)日：2017-07-04

申请号：US14857949

申请日：2015-09-18

申请人： siconnex customized solutions GmbH

发明人： Wolfgang Moesenbichler ,  Stefan Muehlbauer ,  Bernhard Kuestner

IPC分类号： H01L21/67 ,  H01L21/673 ,  H01L21/677

CPC分类号： H01L21/67326 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67313 ,  H01L21/67754 ,  H01L21/67781

摘要： A mounting system includes retaining bars which are structurally independent of one another, which can be optionally directly disconnected and directly connected relative to a support device through coupling devices that are activatable and deactivatable without tools. Using the mounting system, a method for charging a treatment device can also be carried out, with which the retaining bars are directly connected to a first support device, and following this, the retaining bars are directly connected to a second support device, in particular a rotor that is arranged in the treatment device. Following that, the mechanical connection between the first support device and the retaining bars is directly disconnected.

公开(公告)号：US09611548B2

公开(公告)日：2017-04-04

申请号：US15076684

申请日：2016-03-22

申请人： GlobalWafers Co., Ltd.

发明人： Yuan-Hao Chang ,  Te-Hao Lee ,  Ying-Ru Shih ,  Wen-Ching Hsu

IPC分类号： C23C18/16 ,  H01L21/67 ,  H01L21/673 ,  H01L21/68

CPC分类号： C23C18/163 ,  H01L21/67057 ,  H01L21/67326 ,  H01L21/68

摘要： A wafer rotating apparatus includes a base, a carrying device, a first shaft gear, a power unit, a roller, a second shaft gear and a driving assembly. The base has an accommodating space which the carrying device is disposed in to accommodate the wafer. The first shaft gear is disposed on a side surface of the base. The power unit is assembled to a top of the base and connected to the first shaft gear. The roller is located under the carrying device and supports an edge of the wafer. The second shaft gear is disposed on the side surface of the base and connected to the roller. The driving assembly is connected between the first shaft gear and the second shaft gear. The power unit provides a power through the first gear, the driving unit and the second shaft gear to drive the roller to rotate the wafer.

公开(公告)号：US20160322244A1

公开(公告)日：2016-11-03

申请号：US15076684

申请日：2016-03-22

申请人： GlobalWafers Co., Ltd.

发明人： Yuan-Hao Chang ,  Te-Hao Lee ,  Ying-Ru Shih ,  Wen-Ching Hsu

IPC分类号： H01L21/673 ,  C23C18/16 ,  H01L21/67

CPC分类号： C23C18/163 ,  H01L21/67057 ,  H01L21/67326 ,  H01L21/68

摘要： A wafer rotating apparatus includes a base, a carrying device, a first shaft gear, a power unit, a roller, a second shaft gear and a driving assembly. The base has an accommodating space which the carrying device is disposed in to accommodate the wafer. The first shaft gear is disposed on a side surface of the base. The power unit is assembled to a top of the base and connected to the first shaft gear. The roller is located under the carrying device and supports an edge of the wafer. The second shaft gear is disposed on the side surface of the base and connected to the roller. The driving assembly is connected between the first shaft gear and the second shaft gear. The power unit provides a power through the first gear, the driving unit and the second shaft gear to drive the roller to rotate the wafer.

摘要翻译： 晶片旋转装置包括基座，承载装置，第一轴齿轮，动力单元，滚子，第二轴齿轮和驱动组件。 底座具有容纳空间，承载装置设置在其中以容纳晶片。 第一轴齿轮设置在基座的侧表面上。 动力单元组装到基座的顶部并连接到第一轴齿轮。 辊位于承载装置的下方并支撑晶片的边缘。 第二轴齿轮设置在基座的侧表面上并连接到滚子。 驱动组件连接在第一轴齿轮和第二轴齿轮之间。 功率单元通过第一齿轮，驱动单元和第二轴齿轮提供动力，以驱动辊来旋转晶片。

公开(公告)号：US09324596B2

公开(公告)日：2016-04-26

申请号：US14240332

申请日：2014-01-17

申请人： SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

发明人： Jiangbo Yao ,  Chunliang Lee

IPC分类号： A47G19/08 ,  H01L21/673 ,  B25H3/04

CPC分类号： H01L21/67326 ,  B25H3/04

摘要： The present disclosure relates to a substrate storage rack, including a hollow rack body with a first, a second, a third, and a fourth lateral surfaces, wherein at least one substrate laying layer is arranged in the rack body along a vertical direction. The substrate laying layer includes: a first support connected with the rack body and arranged at the second lateral surface; first supporting bars transversely arranged on the first support and extending to the interior of the rack body; a second support connected with the rack body and arranged at the fourth lateral surface; and second supporting bars transversely arranged on the second support and extending to the interior of the rack body. Since the first and the second supporting bars are arranged on the second and the fourth lateral surfaces of the rack body respectively, storing substrates in the rack body can be ensured. Then, the first lateral surface can be used as a fetching and feeding port for an automatic manipulator arm and the fourth lateral surface can be used as a manual fetching and feeding port, so that bidirectional fetching and feeding of the substrates in the substrate storage rack can be realized, and thus the production efficiency can be effectively improved.

摘要翻译： 本公开涉及一种基板存储架，其包括具有第一，第二，第三和第四侧表面的中空框体，其中至少一个基板铺设层沿着垂直方向布置在所述齿条体中。 衬底敷设层包括：第一支撑件，其与所述齿条体连接并且布置在所述第二侧表面处; 第一支撑杆横向布置在第一支撑件上并延伸到齿条体的内部; 第二支撑件，其与所述齿条体连接并且布置在所述第四侧表面处; 横向布置在第二支撑件上并延伸到机架主体内部的第二支撑杆。 由于第一支撑杆和第二支撑杆分别布置在齿条体的第二和第四侧面上，因此可以确保在基座上存储基板。 然后，第一侧面可以用作自动操纵臂的取出和进给口，并且第四侧面可以用作手动取出和进给口，使得基板存储架中的基板的双向取入和进给 可以实现，从而可以有效地提高生产效率。

公开(公告)号：US09221603B2

公开(公告)日：2015-12-29

申请号：US13811785

申请日：2011-08-25

申请人： Yasuhiko Hashimoto ,  Shigeki Ono ,  Kenji Bando

发明人： Yasuhiko Hashimoto ,  Shigeki Ono ,  Kenji Bando

IPC分类号： H01L21/673 ,  B65G1/04

CPC分类号： B65G1/04 ,  H01L21/67313 ,  H01L21/67326 ,  H01L21/6734

摘要： A rack includes: a rack main body including a storage space configured to store a plurality of plate-shaped members and a carry-in opening; a plurality of upper supporting portions configured to respectively support upper edge portions of the plurality of plate-shaped members; lower supporting portions respectively provided under the plurality of upper supporting portions and configured to respectively support lower edge portions of the plurality of standing plate-shaped members; and lower edge portion storage portions provided to be each located at an outer side of an end of the upper supporting portion and an end of the lower supporting portion in the arrangement direction and configured to store the lower edge portions of the plate-shaped members, and at least one of the upper supporting portions is configured to be able to support the upper edge portion of the plate-shaped member.

摘要翻译： 机架包括：机架主体，包括被构造成存储多个板状构件和进入开口的存储空间; 多个上支撑部分，其构造成分别支撑所述多个板状构件的上边缘部分; 下部支撑部分分别设置在所述多个上部支撑部分下方，并且构造成分别支撑所述多个竖立板状构件的下边缘部分; 以及下边缘部收容部，其设置成位于上支撑部的端部的外侧，下部支撑部的端部沿排列方向设置，并且构造成存储板状构件的下边缘部， 并且所述上支撑部中的至少一个构造成能够支撑所述板状构件的上边缘部。

公开(公告)号：US20150340266A1

公开(公告)日：2015-11-26

申请号：US14698793

申请日：2015-04-28

申请人： Applied Materials, Inc.

发明人： Anhthu NGO ,  Zuoming ZHU ,  Balasubramanian RAMACHANDRAN ,  Paul BRILLHART ,  Edric TONG ,  Anzhong CHANG ,  Kin Pong LO ,  Kartik SHAH ,  Schubert S. CHU ,  Zhepeng CONG ,  James Francis MACK ,  Nyi O. MYO ,  Kevin Joseph BAUTISTA ,  Xuebin LI ,  Yi-Chiau HUANG ,  Zhiyuan YE

IPC分类号： H01L21/687 ,  H01L21/673

CPC分类号： H01L21/68735 ,  B05C13/00 ,  B05C13/02 ,  C23C16/4585 ,  C30B25/12 ,  H01L21/67326 ,  H01L21/6875 ,  H01L21/68785

摘要： In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim.

摘要翻译： 在一个实施例中，提供了用于热处理的基座。 基座包括围绕并连接到内部盘的外缘，外缘具有内边缘和外边缘。 所述感受器还包括一个或多个结构，用于当所述基底由所述基座支撑时减小基底和所述基座之间的接触表面积。 所述一个或多个结构中的至少一个结合到靠近外缘的内边缘的内部盘。