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    CHARGED PARTICLE BEAM DEVICE, FIELD CURVATURE CORRECTOR, AND METHODS OF OPERATING A CHARGED PARTICLE BEAM DEVICE
    53.
    发明申请
    CHARGED PARTICLE BEAM DEVICE, FIELD CURVATURE CORRECTOR, AND METHODS OF OPERATING A CHARGED PARTICLE BEAM DEVICE 审中-公开

    公开(公告)号：US20200126751A1

    公开(公告)日：2020-04-23

    申请号：US16165193

    申请日：2018-10-19

    Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

    Inventor： Thomas Kemen ,  Benjamin John Cook ,  Roman Barday

    IPC: H01J37/07 ,  H01J37/28

    Abstract: A charged particle beam device is described, which includes: a beam source configured to generate a charged particle beam propagating along an optical axis (A); an aperture device with a plurality of apertures configured to create a plurality of beamlets from the charged particle beam; and a field curvature corrector. The field curvature corrector includes: a first multi-aperture electrode with a first plurality of openings having diameters that vary as a function of a distance from the optical axis (A); a second multi-aperture electrode with a second plurality of openings; and an adjustment device configured to adjust at least one of a first electrical potential (U1) of the first multi-aperture electrode and a second electrical potential (U2) of the second multi-aperture electrode. Further, a field curvature corrector and methods of operating a charged particle beam device are described.

    Cathode operating temperature adjusting method, and writing apparatus
    57.
    发明授权
    Cathode operating temperature adjusting method, and writing apparatus 有权
    阴极工作温度调节方法和书写装置

    公开(公告)号：US09082586B2

    公开(公告)日：2015-07-14

    申请号：US14186366

    申请日：2014-02-21

    Applicant: NuFlare Technology, Inc.

    Inventor： Nobuo Miyamoto

    IPC: H01J37/304 ,  H01J37/317 ,  H01J3/26 ,  H01J37/07 ,  H01J37/06 ,  B82Y10/00 ,  B82Y40/00

    CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/06 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0653 ,  H01J2237/24585 ,  H01J2237/30461

    Abstract: A cathode operating temperature adjusting method includes acquiring an approximate equation approximating a correlation between an emission current value in an electron beam source using a cathode and an operating temperature of the cathode at which a bias voltage becomes saturated at the emission current, measuring a current density of an electron beam from the cathode when in the state where an n-th emission current value and an n-th cathode operating temperature are set in the electron beam source, determining whether the measured current density is within a first tolerance range, changing the n-th emission current value to an (n+1)th emission current value when the measured current density is not within the first tolerance range, calculating an operating temperature of the cathode corresponding to the (n+1)th emission current value by the approximate equation, and setting the calculated operating temperature, as an (n+1)th cathode operating temperature, in the electron beam source.

    Abstract translation: 阴极工作温度调节方法包括获取接近于使用阴极的电子束源中的发射电流值与在发射电流下偏置电压饱和的阴极的工作温度之间的相关性的近似方程，测量电流密度 当在电子束源中设置第n个发射电流值和第n个阴极操作温度的状态下，确定所测量的电流密度是否处于第一公差范围内，从而改变阴极的电子束 当测量的电流密度不在第一公差范围内时，将第n发射电流值设置为第（n + 1）个发射电流值，通过以下方式计算与第（n + 1）个发射电流值对应的阴极的工作温度： 近似等式，并将计算出的工作温度设定为电子束源中的第（n + 1）个阴极工作温度。

    Electron gun and electron beam device
    58.
    发明授权
    Electron gun and electron beam device 有权
    电子枪和电子束装置

    公开(公告)号：US09070527B2

    公开(公告)日：2015-06-30

    申请号：US14000988

    申请日：2011-02-25

    Applicant: Hiroshi Yasuda

    Inventor： Hiroshi Yasuda

    IPC: H01J29/48 ,  H01J1/148 ,  H01J1/26 ,  H01J37/075 ,  H01J37/317 ,  H01J37/065 ,  H01J37/07 ,  H01J37/26 ,  B82Y10/00 ,  B82Y40/00

    CPC classification number: H01J29/485 ,  B82Y10/00 ,  B82Y40/00 ,  H01J1/148 ,  H01J1/26 ,  H01J37/065 ,  H01J37/07 ,  H01J37/075 ,  H01J37/26 ,  H01J37/3174

    Abstract: An electron gun cathode (104) is column shaped, and emits electrons by being heated. A holder (103), which covers the bottom and sides of the electron gun cathode, has electrical conductivity and holds the electron gun cathode, and is composed of a material that does not easily react with the electron gun cathode when in a heated state, is provided. The tip of the electron gun cathode (104) protrudes from the holder (103) so as to be exposed, and electrons are emitted from the tip toward the front by applying an electric field to the tip.

    Abstract translation: 电子枪阴极（104）为柱状，通过加热发射电子。 覆盖电子枪阴极的底部和侧面的保持器（103）具有导电性并保持电子枪阴极，并且由处于加热状态时不易与电子枪阴极反应的材料构成， 被提供。 电子枪阴极（104）的尖端从保持器（103）突出以露出，并且通过向尖端施加电场，从尖端向前方发射电子。

    ELECTRON BEAM APPARATUS AND A DEVICE MANUFACTURING METHOD BY USING SAID ELECTRON BEAM APPARATUS
    59.
    发明申请
    ELECTRON BEAM APPARATUS AND A DEVICE MANUFACTURING METHOD BY USING SAID ELECTRON BEAM APPARATUS 有权
    电子束装置和使用电子束装置的装置制造方法

    公开(公告)号：US20130032716A1

    公开(公告)日：2013-02-07

    申请号：US12007511

    申请日：2008-01-11

    Applicant: Mamoru Nakasuji ,  Takao Kato ,  Nobuharu Noji ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe

    Inventor： Mamoru Nakasuji ,  Takao Kato ,  Nobuharu Noji ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe

    IPC: H01J37/07

    CPC classification number: H01J3/10 ,  B82Y10/00 ,  B82Y40/00 ,  G01N23/225 ,  H01J3/021 ,  H01J37/063 ,  H01J37/073 ,  H01J37/1471 ,  H01J37/1472 ,  H01J37/3174 ,  H01J2237/06316 ,  H01J2237/2817

    Abstract: An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.

    Abstract translation: 电子束装置，其中从具有阴极和阳极的电子枪发射的电子束被聚焦并照射到样品上，并且从样品发出的二次电子被引导到检测器中，该装置还包括用于优化照射的装置 从电子枪发射到样品上的电子束的优化装置可以是设置在电子枪附近的两级偏转器，其偏转并引导沿特定方向发射的电子束以与光学器件对准 电子束装置的轴方向，由于在所述阴极的晶体取向中具有更高水平的特定晶体取向的事实，在特定方向上发射的电子束相对于光轴成一定角度 电子束发射与光轴方向不对准。

    Charged-particle-beam exposure device and charged-particle-beam exposure method
    60.
    发明授权
    Charged-particle-beam exposure device and charged-particle-beam exposure method 有权
    带电粒子束曝光装置和带电粒子束曝光方法

    公开(公告)号：US5949078A

    公开(公告)日：1999-09-07

    申请号：US131368

    申请日：1998-08-07

    Applicant: Yoshihisa Ooaeh ,  Tomohiko Abe ,  Akio Yamada ,  Hiroshi Yasuda ,  Kenj Kudoh ,  Kouzi Takahata

    Inventor： Yoshihisa Ooaeh ,  Tomohiko Abe ,  Akio Yamada ,  Hiroshi Yasuda ,  Kenj Kudoh ,  Kouzi Takahata

    IPC: H01J37/07 ,  H01J37/065 ,  H01J37/24 ,  H01J37/30

    CPC classification number: H01J37/241 ,  H01J37/065 ,  H01J2237/3175

    Abstract: An electron gun for emitting an electron beam traveling along a beam axis includes a cathode having a tip, the tip having substantially a circular conic shape and a tip surface substantially at the beam axis, the cathode being applied with a first voltage, an anode having a first aperture substantially on the beam axis and being applied with a second voltage higher than the first voltage, a control electrode having a second aperture substantially on the beam axis and being applied with a voltage lower that the first voltage to control a current of the cathode, the second aperture being larger than the tip surface, a guide electrode having a third aperture substantially on the beam axis, being arranged between the cathode and the anode, and being applied with a voltage higher than the first voltage and lower than the second voltage, the third aperture being smaller than the tip surface, and a lens electrode having a fourth aperture substantially on the beam axis, being arranged between the guide electrode and the anode, and being applied with a voltage lower than the first voltage to form a cross-over image of the electron beam, the fourth aperture being larger than the third aperture.

    Abstract translation: 用于发射沿着光束轴线行进的电子束的电子枪包括具有尖端的阴极，该尖端具有基本上圆形的圆锥形形状和基本上在光束轴线处的尖端表面，阴极被施加第一电压，阳极具有 基本上在所述光束轴上的第一孔，并且施加有高于所述第一电压的第二电压;控制电极，其具有基本上在所述光束轴上的第二孔，并施加低于所述第一电压以控制所述第一电压的电流 阴极，第二孔径大于尖端表面，具有基本上在梁轴上的第三孔的引导电极设置在阴极和阳极之间，并施加有比第一电压高的电压并且低于第二电压 电压，所述第三孔小于所述尖端表面，以及透镜电极，所述透镜电极具有基本上在所述光束轴上的第四孔 引导电极和阳极，并施加低于第一电压的电压以形成电子束的交叉图像，第四孔径大于第三孔径。

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