公开(公告)号：US07279690B2

公开(公告)日：2007-10-09

申请号：US11094490

申请日：2005-03-31

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

IPC分类号： H05H3/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

摘要翻译： 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

公开(公告)号：US07167232B2

公开(公告)日：2007-01-23

申请号：US10747613

申请日：2003-12-30

申请人： Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Lucas Henricus Johannes Stevens

发明人： Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Lucas Henricus Johannes Stevens

IPC分类号： G03B27/42

CPC分类号： G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.

摘要翻译： 公开了一种光刻设备。 光刻设备包括产生EUV辐射的辐射源，提供由辐射源产生的EUV辐射束的照明系统和支持图案形成结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 辐射源包括减轻在生成EUV辐射期间形成的碎片颗粒的碎片减轻系统。 碎片减轻系统被配置为提供用于与碎屑颗粒相互作用的附加颗粒。

公开(公告)号：US08368040B2

公开(公告)日：2013-02-05

申请号：US12832258

申请日：2010-07-08

申请人： Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin ,  Dennis De Graaf ,  Uwe Bruno Heini Stamm

发明人： Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin ,  Dennis De Graaf ,  Uwe Bruno Heini Stamm

IPC分类号： G21K5/04 ,  H01J35/20

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.

摘要翻译： 辐射系统包括被配置为沿着轨迹提供目标材料的液滴的目标材料供应，以及包括放大器和光学器件的激光系统。 光学器件被配置成建立穿过放大器并通过轨迹上的第一位置的第一光束路径，并且建立穿过放大器并通过轨迹上的第二位置的第二光束路径。 激光系统被配置为当从放大器发射的光子在轨迹上的第一位置处通过目标材料的液滴沿着第一光束路径反射时，产生激光辐射的第一脉冲。 激光系统被配置为当从放大器发射的光子在轨道上的第二位置处由靶材料的液滴沿着第二光束路径反射时，产生激光辐射的第二脉冲。

公开(公告)号：US08279397B2

公开(公告)日：2012-10-02

申请号：US12469546

申请日：2009-05-20

申请人： Dirk Heinrich Ehm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Vadim Banine ,  Vladimir Vitalevitsch Ivanov

发明人： Dirk Heinrich Ehm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Vadim Banine ,  Vladimir Vitalevitsch Ivanov

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70925

摘要： A method and an optical arrangement for removing contamination on optical surfaces (26), which are arranged in a vacuum environment in an optical arrangement, preferably in a projection exposure apparatus (1) for EUV lithography. The method includes generating a residual gas atmosphere containing molecular hydrogen (18) and at least one inert gas (17) in the vacuum environment, generating inert gas ions (21) by ionization of the inert gas (17), preferably with EUV radiation (20), and generating atomic hydrogen (27) by acceleration of the inert gas ions (21) in the residual gas atmosphere, to remove the contamination.

摘要翻译： 一种用于去除在光学装置的真空环境中布置的光学表面（26）上的污染的方法和光学装置，优选在用于EUV光刻的投影曝光装置（1）中。 该方法包括在真空环境中产生含有分子氢（18）和至少一种惰性气体（17）的残余气体气氛，通过惰性气体（17）的电离产生惰性气体离子（21），优选用EUV辐射 20），并且通过加热惰性气体离子（21）在残留气体气氛中产生原子氢（27），以除去污染物。

公开(公告)号：US20100288302A1

公开(公告)日：2010-11-18

申请号：US12662840

申请日：2010-05-06

申请人： Dirk Heinrich Ehm ,  Arnold Storm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Thomas Stein ,  Edwin te Sligte

发明人： Dirk Heinrich Ehm ,  Arnold Storm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Thomas Stein ,  Edwin te Sligte

IPC分类号： B08B7/00 ,  B08B5/02

CPC分类号： B08B5/02 ,  B08B7/00 ,  G03F7/70925

摘要： The invention is directed to a method for at least partially removing a contamination layer (15) from an optical surface (14a) of an EUV-reflective optical element (14) by bringing a cleaning gas into contact with the contamination layer. In the method, a jet (20) of cleaning gas is directed to the contamination layer (15) for removing material from the contamination layer (15). The contamination layer (15) is monitored for generating a signal indicative of the thickness of the contamination layer (15) and the jet (20) of cleaning gas is controlled by moving the jet (20) of cleaning gas relative to the optical surface (14a) using this signal as a feedback signal. A cleaning arrangement (19 to 24) for carrying out the method is also disclosed. The invention also relates to a method for generating a jet (20) of cleaning gas and to a corresponding cleaning gas generation arrangement.

摘要翻译： 本发明涉及通过使清洁气体与污染层接触来至少部分地从EUV反射型光学元件（14）的光学表面（14a）去除污染物层（15）的方法。 在该方法中，将清洁气体的喷嘴（20）引导到污染层（15），以从污染层（15）去除材料。 监测污染层（15）以产生指示污染层（15）的厚度的信号，并且通过相对于光学表面移动清洁气体的喷嘴（20）来控制清洁气体的喷射（20） 14a）使用该信号作为反馈信号。 还公开了一种用于执行该方法的清洁装置（19至24）。 本发明还涉及一种用于产生清洁气体的喷嘴（20）和相应的清洁气体产生装置的方法。

公开(公告)号：US07671347B2

公开(公告)日：2010-03-02

申请号：US11544931

申请日：2006-10-10

申请人： Dirk Heinrich Ehm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Marcus Gerhardus Hendrikus Meijerink ,  Thomas Stein

发明人： Dirk Heinrich Ehm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Marcus Gerhardus Hendrikus Meijerink ,  Thomas Stein

IPC分类号： G21K5/00

CPC分类号： G03F7/70925

摘要： A method to clean optical elements of an apparatus, the apparatus being configured to project a beam of radiation onto a target portion of a substrate, the apparatus comprising a plurality of optical elements arranged in sequence in the path of the radiation beam, wherein the cleaning method comprises: cleaning one or more second optical elements of the sequence, which receive one or more relatively low second radiation doses during operation of the apparatus, utilizing cumulatively shorter cleaning periods than one or more first optical elements of the sequence that receive one or more first radiation doses during operation of the apparatus, a second radiation dose being lower than each relatively high first radiation dose.

摘要翻译： 一种清洁装置的光学元件的方法，该装置被配置为将辐射束投影到基板的目标部分上，该装置包括依次布置在辐射束的路径中的多个光学元件，其中清洁 方法包括：清洁序列的一个或多个第二光学元件，其在装置的操作期间接收一个或多个相对较低的第二辐射剂量，利用比接收一个或多个序列的序列的一个或多个第一光学元件累积更短的清洁周期 在装置运行期间的第一辐射剂量，第二辐射剂量低于每个相对高的第一辐射剂量。

公开(公告)号：US20080302980A1

公开(公告)日：2008-12-11

申请号：US11808264

申请日：2007-06-07

申请人： Jan Bernard Plechelmus Van Schoot ,  Johannes Hubertus Josephina Moors

发明人： Jan Bernard Plechelmus Van Schoot ,  Johannes Hubertus Josephina Moors

IPC分类号： G21K5/00 ,  G03C5/04

CPC分类号： G03F7/70908 ,  G03F7/70191 ,  G21K1/10

摘要： An extreme ultra-violet lithographic apparatus for imaging a pattern onto a substrate includes a radiation system constructed and arranged to provide a beam of an extreme ultra-violet radiation, and an absorber arranged in the beam and constructed and arranged to absorb at least a portion of the radiation beam. The absorber has a volume configured to accommodate a flow of an absorbing gas. The flow is directed in a transverse direction with respect to the beam. The absorber includes a structure having an extreme ultra-violet radiation-transmissive beam entry area and an extreme ultra-violet radiation-transmissive beam exit area. The apparatus also includes a gas inlet actuator array configured to inject the gas into the volume and a gas outlet actuator array arranged to evacuate the gas from the volume.

摘要翻译： 用于将图案成像到基板上的极紫外光刻设备包括构造和布置成提供极紫外辐射光束的辐射系统和布置在光束中的构造和布置成吸收至少一部分 的辐射束。 吸收器具有构造成容纳吸收气体流的体积。 流动相对于梁的横向被引导。 吸收器包括具有极紫外辐射透射光束入射区域和极紫外辐射透射光束出射区域的结构。 该装置还包括配置成将气体注入容积的气体入口致动器阵列和布置成从体积排出气体的气体出口致动器阵列。

公开(公告)号：US20080143981A1

公开(公告)日：2008-06-19

申请号：US11854621

申请日：2007-09-13

申请人： Dirk Heinrich EHM ,  Annemieke van de Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

发明人： Dirk Heinrich EHM ,  Annemieke van de Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/52 ,  G21K5/00

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G03F7/70316 ,  G03F7/70891 ,  G03F7/70925 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

摘要： An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.

摘要翻译： 一种用于EUV光刻的光学装置，特别是投影系统，照明系统或光束整形系统，包括布置在光学装置的光束路径中并且反射软X射线或EUV中的辐射的至少一个光学元件 波长范围，其中至少在所述光学装置的操作期间，所述光束路径中至少在所述光学表面处的所述反射光学元件中的至少一个优选地各自具有大约30℃或更高的工作温度， 优选为约100℃以上，特别优选为约150℃以上，甚至更优选为约250℃以上，并且其中选择所述至少一个反射型光学元件的光学设计 其光学特性被优化以在操作温度下操作。 还提出了一种用于提供具有这种光学设计的反射光学元件的方法。

公开(公告)号：US07369216B2

公开(公告)日：2008-05-06

申请号：US10964817

申请日：2004-10-15

申请人： Johannes Hubertus Josephina Moors ,  Uwe Mickan ,  Wolfgang Singer ,  Hans-Juergen Mann

发明人： Johannes Hubertus Josephina Moors ,  Uwe Mickan ,  Wolfgang Singer ,  Hans-Juergen Mann

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70575

摘要： A lithographic system includes a radiation system configured to provide a beam of radiation; an illumination system configured to condition the beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the projection beam with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; and transmission adaptor arranged along an optical pathway. The radiation system includes a source configured to generate a beam of radiation. The transmission adaptor adapts an intensity profile as a function of wavelength of the beam of radiation and/or the patterned beam in such a way that the intensity profile equals a predetermined intensity profile.

摘要翻译： 光刻系统包括被配置为提供辐射束的辐射系统; 配置成调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述投影光束图案; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 和传输适配器沿着光学路径布置。 辐射系统包括被配置为产生辐射束的源。 传输适配器以强度分布等于预定强度分布的方式适应作为辐射束和/或图案化束的波长的函数的强度分布。

公开(公告)号：US06750949B2

公开(公告)日：2004-06-15

申请号：US10193688

申请日：2002-07-12

申请人： Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken ,  Josephus Jacobus Smits ,  Antonius Johannes Josephus Van Dijsseldonk ,  Johannes Hubertus Josephina Moors ,  Albrecht Hof ,  Günter Maul ,  Michael Mühlbeyer ,  Klaus Mehlkopp

发明人： Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken ,  Josephus Jacobus Smits ,  Antonius Johannes Josephus Van Dijsseldonk ,  Johannes Hubertus Josephina Moors ,  Albrecht Hof ,  Günter Maul ,  Michael Mühlbeyer ,  Klaus Mehlkopp

IPC分类号： G03B2742

CPC分类号： G03F7/70258 ,  G02B7/008 ,  G02B7/02 ,  G03F7/70833

摘要： A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.

摘要翻译： 根据本发明的一个实施例的光刻投影设备包括具有安装在框架上的多个光学元件或传感器的投影系统。 框架包括由热膨胀系数小于或大约等于0.1×10 -6 K -1的材料（例如玻璃陶瓷）制成的支撑部分。