公开(公告)号：US20160172144A1

公开(公告)日：2016-06-16

申请号：US14904945

申请日：2014-06-12

Applicant: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY

Inventor： Tomohiro NISHITANI

IPC: H01J1/34 ,  H01J37/06

CPC classification number: H01J1/34 ,  H01J37/06 ,  H01J37/073 ,  H01J2237/06333 ,  H01J2237/2602

Abstract: This invention provides a treatment device for lowering electron affinity, said treatment device being capable of performing an EA surface treatment on a photocathode material or an EA surface retreatment on a photocathode, and an electron-beam device provided with said treatment device. An activation chamber (20) used in a treatment device for lowering electron affinity by vaporizing a surface-treatment material (30) and using the vaporized surface-treatment material (30) to perform an electron-affinity lowering treatment on a photocathode material (52) or an electron-affinity lowering retreatment on a photocathode (52), said activation chamber (20) being characterized by containing holes through which electrons can pass.

Abstract translation: 本发明提供了一种用于降低电子亲和力的处理装置，所述处理装置能够对光电阴极材料进行EA表面处理或在光电阴极上进行EA表面再处理，以及设置有所述处理装置的电子束装置。 一种用于通过汽化表面处理材料（30）并使用气化表面处理材料（30）对光电阴极材料（52）进行电子亲和力降低处理的处理装置中用于降低电子亲和力的活化室（20） ）或在光电阴极（52）上的电子亲和力降低再处理，所述活化室（20）的特征在于包含电子可以通过的空穴。

公开(公告)号：US09269527B2

公开(公告)日：2016-02-23

申请号：US14653138

申请日：2014-02-14

Applicant: Lawrence Livermore National Security, LLC

Inventor： Bryan W. Reed ,  William J. DeHope ,  Glenn Huete ,  Thomas B. LaGrange ,  Richard M. Shuttlesworth

IPC: H01J37/075 ,  H01J37/073 ,  H01J37/21 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/073 ,  H01J37/10 ,  H01J37/147 ,  H01J37/21 ,  H01J37/22 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/06333 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/2626 ,  H01J2237/2802

Abstract: An electron microscope is disclosed which has a laser-driven photocathode and an arbitrary waveform generator (AWG) laser system (“laser”). The laser produces a train of temporally-shaped laser pulses each being of a programmable pulse duration, and directs the laser pulses to the laser-driven photocathode to produce a train of electron pulses. An image sensor is used along with a deflector subsystem. The deflector subsystem is arranged downstream of the target but upstream of the image sensor, and has a plurality of plates. A control system having a digital sequencer controls the laser and a plurality of switching components, synchronized with the laser, to independently control excitation of each one of the deflector plates. This allows each electron pulse to be directed to a different portion of the image sensor, as well as to enable programmable pulse durations and programmable inter-pulse spacings.

Abstract translation: 公开了一种具有激光驱动光电阴极和任意波形发生器（AWG）激光系统（“激光”）的电子显微镜。 激光器产生一系列时间成形的激光脉冲，每个激光脉冲具有可编程脉冲持续时间，并将激光脉冲引导到激光驱动的光电阴极以产生一系列电子脉冲。 图像传感器与偏转器子系统一起使用。 偏转器子系统布置在目标的下游，但是在图像传感器的上游，并且具有多个板。 具有数字定序器的控制系统控制激光器和与激光器同步的多个开关部件，以独立地控制每个偏转板的激励。 这允许每个电子脉冲被引导到图像传感器的不同部分，以及使能可编程脉冲持续时间和可编程脉冲间隔。

公开(公告)号：US09263228B2

公开(公告)日：2016-02-16

申请号：US14202646

申请日：2014-03-10

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Ravi K. Bonam

IPC: H01J37/073 ,  H01J1/34 ,  H01J9/12 ,  H01J37/317

CPC classification number: H01J1/34 ,  H01J9/12 ,  H01J37/073 ,  H01J37/3174 ,  H01J2237/06333 ,  H01J2237/31774 ,  H01J2237/31779

Abstract: A scalable, integrated photoemitter device and method of manufacture using conventional CMOS manufacturing techniques. The photoemitter device has a first semiconductor substrate having a plurality of photonic sources formed on top in a first material layer, the plurality of photonic sources and the material layer forming a planar surface. A second substrate is bonded to the planar surface, the second substrate having a plurality of photoemitter structures formed on top in a second material layer, each photoemitter structure in alignment with a respective photonic source of the first substrate and configured to generate particle beams responsive to light from a respective light source. Additionally provided is a multi-level photoemitter of tapered design for implementation in the scalable, integrated photoemitter device. Conventional CMOS manufacturing techniques are also implemented to build the multi-level photoemitter of tapered design.

Abstract translation: 可扩展的集成光电发生器装置和使用常规CMOS制造技术的制造方法。 光电发射器件具有第一半导体衬底，其具有形成在第一材料层的顶部上的多个光子源，多个光子源和材料层形成平坦表面。 第二衬底被结合到平面表面，第二衬底具有形成在第二材料层顶部的多个光发射器结构，每个光发射器结构与第一衬底的相应光子源对准，并且被配置为产生响应于 来自相应光源的光。 另外提供了一种用于在可扩展的集成光电发生器装置中实现的锥形设计的多级光电发生器。 还实现了传统的CMOS制造技术来构建锥形设计的多级光电发生器。

公开(公告)号：US09024256B2

公开(公告)日：2015-05-05

申请号：US14453235

申请日：2014-08-06

Applicant: Board of Trustees of Michigan State University

Inventor： Chong-Yu Ruan ,  Martin Berz ,  Zhensheng Tao

IPC: H01J37/26 ,  G01N21/65 ,  G01N23/04 ,  G01N23/08 ,  H01J37/073 ,  H01J37/04 ,  H01J37/065 ,  H01J37/22 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/263 ,  H01J37/045 ,  H01J37/065 ,  H01J37/073 ,  H01J37/1471 ,  H01J37/228 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0432 ,  H01J2237/06333 ,  H01J2237/2802

Abstract: An electron microscope is provided. In another aspect, an electron microscope employs a radio frequency which acts upon electrons used to assist in imaging a specimen. Furthermore, another aspect provides an electron beam microscope with a time resolution of less than 1 picosecond with more than 105 electrons in a single shot or image group. Yet another aspect employs a super-cooled component in an electron microscope.

Abstract translation: 提供电子显微镜。 在另一方面，电子显微镜使用射频，其作用于用于辅助成像试样的电子。 此外，另一方面提供一种电子束显微镜，其单次或图像组中的时间分辨率小于1皮秒，超过105个电子。 另一方面在电子显微镜中使用超冷却组分。

公开(公告)号：US20140346368A1

公开(公告)日：2014-11-27

申请号：US14284128

申请日：2014-05-21

Applicant: NATIONAL UNIVERSITY OF SINGAPORE

Inventor： Anjam KHURSHEED

IPC: H01J3/18 ,  H01J3/20

CPC classification number: H01J3/18 ,  H01J3/021 ,  H01J3/027 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/26 ,  H01J2237/06333 ,  H01J2237/0635 ,  H01J2237/1534

Abstract: A gun configured to generate charged particles, comprising a ring-cathode (200) electrically configured to generate a charged particle beam; a lens arranged to focus the charged particle beam on a specimen; and at least one correction focusing electrode (1406) arranged to generate at least one electrostatic/magnetic field to further divergently/convergently focus the charged particle beam for correcting in-plane geometric aberrations associated with the lens, the focusing being based on the in-plane geometric aberrations associated with the lens. A related method is also disclosed.

Abstract translation: 一种配置成产生带电粒子的枪，包括电气配置以产生带电粒子束的环形阴极（200）; 透镜，布置成将带电粒子束聚焦在样本上; 以及至少一个校正聚焦电极（1406），其布置成产生至少一个静电/磁场，以进一步发散/收敛地聚焦带电粒子束，用于校正与透镜相关联的面内几何像差， 与透镜相关的平面几何像差。 还公开了相关方法。

公开(公告)号：US20140346355A1

公开(公告)日：2014-11-27

申请号：US14453235

申请日：2014-08-06

Applicant: Board of Trustees of Michigan State University

Inventor： Chong-Yu Ruan ,  Martin Berz ,  Zhensheng Tao

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/073 ,  H01J37/22 ,  H01J37/147

CPC classification number: H01J37/263 ,  H01J37/045 ,  H01J37/065 ,  H01J37/073 ,  H01J37/1471 ,  H01J37/228 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0432 ,  H01J2237/06333 ,  H01J2237/2802

Abstract: An electron microscope is provided. In another aspect, an electron microscope employs a radio frequency which acts upon electrons used to assist in imaging a specimen. Furthermore, another aspect provides an electron beam microscope with a time resolution of less than 1 picosecond with more than 105 electrons in a single shot or image group. Yet another aspect employs a super-cooled component in an electron microscope.

Abstract translation: 提供电子显微镜。 在另一方面，电子显微镜使用射频，其作用于用于辅助成像试样的电子。 此外，另一方面提供一种电子束显微镜，其单次或图像组中的时间分辨率小于1皮秒，超过105个电子。 另一方面在电子显微镜中使用超冷却组分。

公开(公告)号：US08895922B2

公开(公告)日：2014-11-25

申请号：US14003030

申请日：2012-03-15

Applicant: Jean Berney

Inventor： Jean Berney

IPC: G21K5/04 ,  H01J37/073

CPC classification number: G21K5/04 ,  H01J37/073 ,  H01J2201/342 ,  H01J2237/06333 ,  H01J2237/065

Abstract: A method suitable for preparing a specimen for inspection, the method comprising the steps of: irradiating a photocathode so that the photocathode emits electrons from a surface of the photocathode, wherein the emitted electrons each follow a trajectory, and the trajectories of the electrons are such that they can be extrapolated to intersect at a region within the photocathode, the region defining a virtual source, and wherein the photocathode comprises a rounded tip which has a radius of curvature; configuring the emitted electrons so that they form an electron beam; focusing the electron beam onto a specimen to form an image of the virtual source on the specimen. There is further provided a corresponding electron beam apparatus.

Abstract translation: 一种适于制备用于检查的样品的方法，所述方法包括以下步骤：照射光电阴极，使得光电阴极从光电阴极的表面发射电子，其中发射的电子各自遵循轨迹，并且电子的轨迹为 它们可以外推到在光电阴极内的区域相交，所述区域限定虚拟源，并且其中所述光电阴极包括具有曲率半径的圆形尖端; 配置发射的电子，使它们形成电子束; 将电子束聚焦到样本上以形成样本上的虚拟源的图像。 还提供了相应的电子束装置。

公开(公告)号：US08680482B2

公开(公告)日：2014-03-25

申请号：US13962346

申请日：2013-08-08

Applicant: Jabez J. McClelland ,  Brenton J. Knuffman ,  Adam V. Steele

Inventor： Jabez J. McClelland ,  Brenton J. Knuffman ,  Adam V. Steele

IPC: H01J27/24

CPC classification number: H01J27/022 ,  G21K1/00 ,  H01J27/24 ,  H01J37/065 ,  H01J37/08 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/0815 ,  H05H3/02

Abstract: A method for aligning the axis of an atom beam with the orientation of an electric field at a particular location within an enclosure for use in creating a charged particle source by photoionizing a cold atom beam. The method includes providing an atom beam in the enclosure, providing a plurality of electrically conductive devices in said enclosure, evacuating the enclosure to a pressure below about 10−6 millibar, and aligning the axis of the atom beam with the orientation of the electric field, relative to each other, within less than about two degrees. Alignment may be facilitated by applying at least one voltage to the electrically conductive devices, mechanically tilting the atom beam's axis orientation of the electric field relative to each other and/or causing a deflection of the atom beam.

Abstract translation: 一种用于使原子束的轴线与壳体内的特定位置处的电场的取向对准的方法，用于通过使冷原子束光电离产生带电粒子源。 该方法包括在外壳中提供原子束，在所述外壳中提供多个导电装置，将外壳抽空至低于约10-6毫巴的压力，并使原子束的轴线与电场的取向对齐 相对于彼此，在小于约2度内。 可以通过将至少一个电压施加到导电装置来机械地倾斜电场相对于彼此的原子束的轴取向和/或引起原子束的偏转来促进对准。

公开(公告)号：US20130161511A1

公开(公告)日：2013-06-27

申请号：US13665623

申请日：2012-10-31

Applicant: Ebara Corporation

Inventor： Tsutomu Karimata ,  Tatsuya Kohama ,  Shoji Yoshikawa ,  Masahiro Hatakeyama

IPC: H01J37/26

CPC classification number: H01J37/261 ,  H01J37/073 ,  H01J37/12 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/036 ,  H01J2237/062 ,  H01J2237/06333 ,  H01J2237/1205 ,  H01J2237/1518 ,  H01J2237/186 ,  H01J2237/2443 ,  H01J2237/2817

Abstract: An electron beam inspection device observes a sample by irradiating the sample set on a stage with electron beams and detecting the electron beams from the sample. The electron beam inspection device has one electron column which irradiates the sample with the electron beams, and detects the electron beams from the sample. In this one electron column, a plurality of electron beam irradiation detecting systems are formed which each form electron beam paths in which the electron beams with which the sample is irradiated and the electron beams from the sample pass. The electron beam inspection device inspects the sample by simultaneously using a plurality of electron beam irradiation detecting systems and simultaneously irradiating the sample with the plurality of electron beams.

Abstract translation: 电子束检查装置通过用电子束照射载物台上的样品并检测来自样品的电子束来观察样品。 电子束检查装置具有一个电子管，用电子束照射样品，并检测来自样品的电子束。 在该一个电子柱中，形成多个电子束照射检测系统，每个电子束照射检测系统形成电子束路径，其中照射样品的电子束和来自样品的电子束通过。 电子束检查装置通过同时使用多个电子束照射检测系统来检查样品，同时用多个电子束照射样品。

公开(公告)号：US20120223245A1

公开(公告)日：2012-09-06

申请号：US13037812

申请日：2011-03-01

Applicant: John Bennett ,  Jan P. Bennett ,  Mark Troll

Inventor： John Bennett ,  Jan P. Bennett ,  Mark Troll

IPC: G21K1/08 ,  B82Y30/00

CPC classification number: B82Y30/00 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/021 ,  H01J37/073 ,  H01J37/3177 ,  H01J2203/0244 ,  H01J2237/06333 ,  H01J2237/31779 ,  H01J2237/31784

Abstract: An embodiment includes an electron beam source system having a first electron beam source unit with a substrate having a substrate-top end and a substrate-bottom end; and a first lens coupled to the substrate-bottom end defining a first aperture and having a lens-top end and a lens-bottom end. Further embodiments comprise an electron-emission region at the substrate-bottom end and aligned with the first aperture, the electron-emission region being operable to emit one or more electrons due to one or more photons contacting the electron-emission region, which may include passing through the substrate and into the electron-emission region, wherein the electron-emission region comprises a first doped portion of the substrate.

Abstract translation: 一个实施例包括具有第一电子束源单元的电子束源系统，该第一电子束源单元具有衬底，该衬底具有衬底顶端和衬底底端; 以及耦合到所述衬底底端的第一透镜，所述第一透镜限定第一孔并且具有透镜顶端和透镜底端。 另外的实施例包括在衬底底端处并与第一孔对准的电子发射区域，电子发射区域可操作以由于与电子发射区域接触的一个或多个光子而发射一个或多个电子，其可以包括 通过衬底并进入电子发射区域，其中电子发射区域包括衬底的第一掺杂部分。