Abstract:
A method and apparatus for achieving a level exposed surface of a viscous material pool for applying viscous material to at least one semiconductor component by contacting at least a portion of the semiconductor component with viscous material within a reservoir. A level viscous material exposed surface is achieved by using at least one mechanism in association with the reservoir. The mechanism is configured to level the exposed surface of viscous material and maintain the exposed surface at a substantially constant level. The reservoir may be shaped such that the exposed surface of viscous material is supplied to a precise location.
Abstract:
An apparatus and method for depositing flowable solids onto articles located on a moving conveyor. A flowable solid is placed on a vibrating trough and dispensed to an article on the moving conveyor through a slot in the trough. A third planar surface placed beneath the slot receives the flowable solid from the slot and provides an even dispersing pattern of the flowable solid onto the articles.
Abstract:
The invention pertains to a pressure chamber scraper for application of a liquid medium onto a rotating drum, said pressure chamber scraper having an axially extending scraper head, that together with an axially extending dosing scraper touching the mantle surface of the drum and with a sealing scraper forms a chamber in the circumferential direction, in said chamber there is an axially extending displacement element to form a pressure compartment and an outlet compartment and leaving an application gap to the mantle surface of the drum, and the liquid medium for wetting of the mantle surface flows through said gap, wherein the medium is supplied through an inlet opening into the pressure compartment. According to the invention, it is proposed that the displacement element and scraper head have mutually facing contact surfaces which bound at least one gap between them which opens into the pressure compartment and connects it to the inlet opening, so that the medium can move into the pressure compartment. With this kind of design it is possible to configure the gap as narrow as desired.
Abstract:
A transport object support means (40) is rotated about an anteroposterior axis (39) by a rotary control means (30), whereby a transport object (85) supported by the transport object support means (40) can be displaced in the vertical direction and the orientation of the transport object (85) can be varied during the vertical displacement without moving the carriage (10). As a result, the distance needed to displace the transport object (85) in the vertical direction can be dispensed with, the section (apparatus) for treating the transport object (85) can be shortened and made more compact, and the varying orientation of the transport object (85) can be utilized to perform a variety of treatments smoothly and efficiently without affecting the environment.
Abstract:
A catalyst composition is applied to an interior of a hollow substrate. The composition is coated on the substrate by immersing the substrate into a vessel containing a bath of coating slurry. A vacuum is then applied to the partially immersed substrate. The intensity of the vacuum and its application time is sufficient to draw the coating slurry upwardly from the bath into each of a plurality of channels located in the interior of the hollow substrate. After removing the substrate from the bath it is rotated 180null. A blast of pressurized air is applied at an intensity and for a time sufficient to distribute the coating slurry within the channels of the substrate to form a uniform coating profile therein.
Abstract:
The invention relates to a method for introducing and removing workpieces, especially vehicle bodies, into or from a treatment area (20) by rotational movements, whereby the treatment area serves for treating surfaces of the workpieces (1). A workpiece (1) is detachably fixed at a holding frame (2) which is moved together with at least one workpiece that is situated thereon at an essentially constant speed and by a continuous translation. The workpiece (1) is rotated around a rotational axle (6) at least at the beginning and end of the treatment area (20) and simultaneously with the translation movement. The rotational axle (6) is orientated vertically in relation to the moving direction of the holding frame (2) and is lifted and lowered during rotation.
Abstract:
An apparatus including: a tank with a closed base end and an open top end, and adapted to contain a coating formulation; and a receiver member with at least a cone shape, where the base of the cone is attached to the interior and to the base end of the tank and adapted to receive an article for coating.
Abstract:
A method for forming a low k dielectric constant material over a substrate. According to one embodiment, the method includes combining, in a mixing apparatus fluidly coupled to a solution applicator, an organo silicate glass (OSG) precursor, a solvent and a surfactant with water and an acid catalyst to form a coating solution; aging the coating solution in the mixing apparatus to form an aged coating solution; transporting the aged coating solution to the solution applicator; and then applying the aged coating solution to the substrate with the applicator.
Abstract:
A system for processing a workpiece includes a base having a bowl or recess for holding a liquid. A process reactor or head holds a workpiece between an upper rotor and a lower rotor. A head lifter lowers the head holding the workpiece into contact with the liquid. The head spins the workpiece during or after contact with the liquid. The upper and lower rotors have side openings for loading and unloading a workpiece into the head. The rotors are axially moveable to align the side openings.
Abstract:
A plurality of baths for dipping and the like is arranged in series so that these baths contact one another, and a conveyor 2 is linearly arranged above the dipping bath in one plane. A workpiece 1 is tact-conveyed on the conveyor 2 in a floor conveyor position. The workpiece 1 is stopped at each bath for dipping and the like, wherein when the workpiece 1 is rotated horizontally about 180null to change its position to an overhead conveyor position, it is immersed in the corresponding bath for dipping and the like for dipping treatment.