Plasma processing apparatus of batch type
    61.
    发明授权
    Plasma processing apparatus of batch type 有权
    批式等离子体处理装置

    公开(公告)号:US08166914B2

    公开(公告)日:2012-05-01

    申请号:US12219218

    申请日:2008-07-17

    CPC classification number: H01L21/67757 H01J37/32091 H01J37/32779

    Abstract: A plasma processing apparatus of the batch type includes a tubular process container having a closed end and an open end opposite to each other, and a process field for accommodating target substrates, the process container including a tubular insulating body. The apparatus further includes a holder configured to hold the target substrates at intervals, a loading mechanism configured to load and unload the holder into and from the process container, and a lid member connected to the loading mechanism and configured to airtightly close the open end. A first electrode is disposed at the closed end of the process container, and a second electrode is disposed at the lid member, to constitute a pair of parallel-plate electrodes. An RF power supply is connected to one of the first and second electrodes and configured to apply an RF power for plasma generation.

    Abstract translation: 批量型的等离子体处理装置包括具有彼此相对的封闭端和开口端的管状处理容器,以及用于容纳目标基板的处理区域,所述处理容器包括管状绝缘体。 该装置还包括一个保持器,其被构造成间隔地保持目标基板;一个装载机构,其构造成将夹持器装载和卸载到处理容器中;以及盖构件,其连接到装载机构并构造成气密地封闭开口端。 第一电极设置在处理容器的封闭端,并且第二电极设置在盖构件上,以构成一对平行板电极。 RF电源连接到第一和第二电极中的一个并被配置为施加用于等离子体产生的RF功率。

    IMPROVEMENTS IN THE MANUFACTURE OF B-STAGE RESIN IMPREGNATED PAPERS OR NON-WOVENS
    63.
    发明申请
    IMPROVEMENTS IN THE MANUFACTURE OF B-STAGE RESIN IMPREGNATED PAPERS OR NON-WOVENS 审中-公开
    B级树脂印刷纸或非织造布制造工艺的改进

    公开(公告)号:US20110159208A1

    公开(公告)日:2011-06-30

    申请号:US12599282

    申请日:2008-05-07

    CPC classification number: D21H17/56 B44C5/0469 D21H17/57

    Abstract: A method of manufacturing a b-stage resin impregnated décor paper that is suitable for inclusion in a decorative or industrial laminate, includes impregnating a décor print base paper with a resin carried by a solvent, which resin includes one or more of melamine formaldehyde, urea formaldehyde, and phenol formaldehyde or any combination of these. Thereafter the resin impregnated paper is irradiated with near infra-red (NIR) radiation selected to partially remove solvent by evaporation of the solvent, whereby to produce a partially dried and partially cured printable b-stage resin impregnated paper. The partially dried and partially cured printable b-stage resin impregnated paper is then printed to obtain a décor paper suitable for subsequent final curing in the formation of a decorative or industrial laminate. Apparatus is also disclosed, as is a method that entails impregnating a paper with an aqueous urea solution and irradiating the wet impregnated paper with near infra-red (NIR) radiation.

    Abstract translation: 一种制造适用于装饰或工业层压体的b阶树脂浸渍的装饰纸的方法包括用装有树脂的溶剂浸渍装饰印刷原纸,该树脂包括一种或多种三聚氰胺甲醛,尿素 甲醛和苯酚甲醛或这些的任何组合。 此后,用近红外(NIR)辐射照射树脂浸渍纸,通过蒸发溶剂来部分地除去溶剂,从而制备部分干燥和部分固化的可印刷的b阶级树脂浸渍纸。 然后印刷部分干燥和部分固化的可印刷b阶树脂浸渍纸,以获得适于随后最后固化形成装饰或工业层压板的装饰纸。 还公开了装置,以及使尿素水溶液浸渍纸张并用近红外(NIR)辐射照射湿浸渍纸的方法也是如此。

    SPRAY COATING SYSTEM
    64.
    发明申请
    SPRAY COATING SYSTEM 审中-公开
    喷涂系统

    公开(公告)号:US20110117283A1

    公开(公告)日:2011-05-19

    申请号:US12618464

    申请日:2009-11-13

    CPC classification number: H01L21/6715

    Abstract: A spray coating system is provided. The spray coating system includes a spin support for supporting and spinning the substrate; a sprayer for applying a material to an upper surface of the substrate; a cup surrounding a lateral and lower region of the spin support, wherein an opening is located in an upper central region of the cup; an air supply mechanism for supplying air flows to a back surface of the substrate to prevent the material from adhering thereto, and an exhaust zone disposed below a slanted surface of the cup for exhausting the air flow and material.

    Abstract translation: 提供喷涂系统。 喷涂系统包括用于支撑和旋转衬底的自旋支撑件; 用于将材料施加到所述基板的上表面的喷雾器; 围绕所述自旋支撑件的横向和下部区域的杯,其中开口位于所述杯的上中心区域中; 空气供给机构,用于向基板的后表面供给空气,以防止材料粘附到其上;排气区,设置在杯的倾斜表面下方排出气流和材料。

    Highly Viscous Material Coating Applicator
    66.
    发明申请
    Highly Viscous Material Coating Applicator 审中-公开
    高粘性材料涂布机

    公开(公告)号:US20100279127A1

    公开(公告)日:2010-11-04

    申请号:US11991783

    申请日:2005-09-13

    Abstract: The present invention provides a coating apparatus capable of coating an object with a highly viscous material at high precision in the applied amount of the highly viscous material and uniformity in the shape of the applied highly viscous material layer. The present invention relates to a coating apparatus capable of coating an object such as the metal sheet of an automobile body with a highly viscous material such as a coat type metal sheet-reinforcing material, at high precision in the applied amount (or the thickness of the applied material layer) and uniformity in the shape of the applied viscous material layer, so as to ensure the reliable reinforcing effect of the reinforcing material. The present invention also pertains to a coating method using the same apparatus, and a coated article provided by using the same apparatus.

    Abstract translation: 本发明提供一种能够在高粘度材料的施加量和高度粘性材料层的形状均匀性方面高精度地涂覆高粘度材料的涂布装置。 本发明涉及一种涂覆装置,其能够以高精度涂覆诸如涂层型金属片材增强材料的高粘度材料的汽车车身的金属片等物体(或 所施加的材料层)和所施加的粘性材料层的形状的均匀性,以确保增强材料的可靠的增强效果。 本发明还涉及使用相同装置的涂布方法和使用相同装置提供的涂覆制品。

    PLASMA SILANIZATION SUPPORT METHOD AND SYSTEM
    67.
    发明申请
    PLASMA SILANIZATION SUPPORT METHOD AND SYSTEM 审中-公开
    等离子体硅烷化支持方法和系统

    公开(公告)号:US20100098885A1

    公开(公告)日:2010-04-22

    申请号:US12255203

    申请日:2008-10-21

    CPC classification number: B05D1/62 C23C16/301 H01J37/32321 H01J37/32623

    Abstract: A plasma silanization system includes a processing vessel having a metal shelf and a non-metallic component support configured to elevate a component above the metal shelf to prevent excess silane deposition. A method of applying silane to a component in a plasma processing apparatus having a metal shelf includes placing a non-metallic component support on the metal shelf and placing a component on the non-metallic component support to prevent excess silane deposition.

    Abstract translation: 等离子体硅烷化系统包括处理容器,该处理容器具有金属架和非金属部件支撑件,其被配置为提升金属架上方的部件以防止多余的硅烷沉积。 在具有金属架的等离子体处理装置中将成分施加到组分上的方法包括将非金属成分载体放置在金属架上,并将组分放置在非金属成分载体上以防止多余的硅烷沉积。

    LITHOGRAPHIC APPARATUS AND METHOD
    69.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 有权
    LITHOGRAPHIC设备和方法

    公开(公告)号:US20100068416A1

    公开(公告)日:2010-03-18

    申请号:US12553390

    申请日:2009-09-03

    Abstract: A lithographic method includes providing particles in dry form on a substrate, or on material provided on the substrate, irradiating one or more of the particles with a dose of radiation, the dose of radiation being sufficient to ensure that at least one particle of the one or more particles is bonded to the substrate, or to the material provided on the substrate, and removing particles from the substrate, or from material provided on the substrate, that have not been bonded to the substrate, or to the material provided on the substrate.

    Abstract translation: 光刻方法包括将干燥形式的颗粒提供在基材上或者提供在基材上的材料上,用一定剂量的辐射照射一个或多个颗粒,辐射剂量足以确保至少一个颗粒的一个颗粒 或更多的颗粒结合到基板上,或者与设置在基板上的材料接合,以及从基板上提供的颗粒,或者从基板上提供的材料去除未结合到基板上的材料,或者去除设置在基板上的材料 。

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