摘要:
Methods and apparatuses for generating microscopic patterns of macromolecules such as proteins on a solid surface are described. Pulsed laser light is used to alter surface portions of a solid surface substrate in a predetermined pattern, by removing macromolecules from surface portions of the substrate where the light is focused. The same wavelength light at lower intensity can be used to visualize the removal by its reflection from the specimen surface along the path to the detector. Select macromolecules introduced to the substrate selectively adhere to select surface portions, thereby depositing macromolecules in the predetermined pattern on the solid surface.
摘要:
A method of preparing negative-working, single-layer imageable elements improves their storage stability in a humid environment. The method includes enclosing the coated imageable elements in a water-impermeable sheet material that substantially inhibits the transfer of moisture to and from the imageable element. Such imageable elements include a radiation-sensitive composition that includes a radically polymerizable component, an initiator composition to provide radicals upon exposure to imaging radiation, a radiation absorbing compound, and a polymeric binder having poly(alkylene glycol) side chains.
摘要:
To provide a positive type photoresist composition which is capable of forming a resist pattern having an excellent adhesion to a substrate, a positive type photoresist composition comprising a polymer containing a specified amount of a polypropylene oxide group and a polyethylene oxide group is provided.
摘要:
A silver halide light-sensitive material comprises a support, a hardening layer and a light-sensitive layer in order. The light-sensitive layer contains silver halide and a hydrophilic polymer. The hardening layer or the light-sensitive layer contains a reducing agent. The hardening layer contains a mixture of a polymer (A) and a polymer (B). The mixture contains the polymer (A) in an amount of 5 to 70 wt. % and the polymer (B) in an amount of 30 to 95 wt. %. The polymer (A) comprises repeating units of (A1) in an amount of not less than 95 mol %. The polymer (B) comprises repeating units of (B1) in an amount of 10 to 90 mol % and repeating units of (B2) in an amount of 10 to 90 mol %. ##STR1##
摘要:
Disclosed is a method of forming a pattern, comprising the steps of forming an underlying film on a semiconductor substrate, bringing a vapor of a neutralizer, which generates an acid upon exposure to light, into contact with the surface of the underlying film so as to form a primer layer, coating the primer layer with a chemical amplification resist, and selectively exposing the resist layer to light, followed by developing to form a resist pattern.
摘要:
In a bi-layer lift-off process, the adhesion characteristics of a PMGI release layer are substantially improved by the use of ortho-hydroxy substituted 4-phenylazo compounds (azo dyes), a class of nonactinic dyes, as an adhesion promoter additive. These azo dyes, due to their chemical structure, exhibit selective binding to various metals by acting as a chelating ligand to the metal surface. Formulations of a specific azo dye, Sudan Orange G, at concentrations from 0.25 to 1.0 percent (by weight) in PMGI exhibits no loss of adhesion at prebake temperature in the range of 120 to 160 degrees C.
摘要:
Novel compositions are provided for use in the vapor priming of substrates used in the preparation and production of microelectronic devices comprising a first component comprising an organosilane having a hydrolyzable silicon-nitrogen bond and a second component selected from the group consisting of a second organosilane different from the first component having a hydrolyzable silicon-nitrogen bond, a hydrocarbon, an ether, a disiloxane and an alkoxysilane in which all components have substantially the same boiling points at atmospheric pressure. These compositions which are vaporized and transported to an area of silylation on a substrate by an inert gas, silylate the substrate surface and provide for uniform successful coating with organic films. These organosilane mixtures allow for rapid vapor priming and silylation steps in the manufacture of microelectronic devices with successful subsequent coating of the substrates with uniform organic films.
摘要:
A negative type photosensitive electrodepositing resin composition comprising (a) a polymer obtained by neutralizing a copolymer of acrylic or methacrylic acid and having an acid number of 20 to 300 with a basic organic compound, (b) a non-water-soluble monomer having two or more photopolymerizable unsaturated bonds in the molecule, (c) a non-water-soluble photoinitiator, and (d) a benzotriazole derivative having one or more carboxyl groups, is effective for giving electrodeposited films with a low voltage or low electric current in a short time, and usable for forming resist patterns with high degree of resolution.
摘要:
This is a device and method of forming such, wherein the device has an amorphous "TEFLON" (TFE AF) layer. The method comprising: depositing an TFE AF layer 36 on a substrate; combining a fluorosurfactant with a first material to produce a second material 38; and depositing the second material 38 on the TFE AF layer 36. The method may include: patterning and etching the second material; removing the second material; and forming a third material 42 on the TFE AF layer 44. The third material may be a metal or a semiconductor. The ZFSNF fluorosurfactant may be combined with a photoresist and then patterned and etched. The TFE AF layer may also be heated. A second coating of the second material may also be added.
摘要:
A positive type photosensitive composition capable of improving the drawback in the conventional positive type photosensitive resin composition, improving adhesion between the positive type photoresist and the substrate and improving developability is provided by incorporating benzotriazole carboxylic acids in the positive type photoresist.