公开(公告)号：US20050107421A1

公开(公告)日：2005-05-19

申请号：US11004674

申请日：2004-12-03

Applicant: John Gerster ,  Kyle Lindstrom ,  Stephen Crooks ,  Philip Heppner ,  Gregory Marszalck ,  Peter Maye ,  Bryon Merrill ,  John Mickelson ,  Michael Rice

Inventor： John Gerster ,  Kyle Lindstrom ,  Stephen Crooks ,  Philip Heppner ,  Gregory Marszalck ,  Peter Maye ,  Bryon Merrill ,  John Mickelson ,  Michael Rice

IPC: A61K31/4375 ,  A61K31/4439 ,  A61K31/444 ,  A61K31/4745 ,  A61K31/522 ,  A61P7/00 ,  A61P17/00 ,  A61P29/00 ,  A61P31/12 ,  A61P33/00 ,  A61P35/00 ,  A61P37/02 ,  A61P43/00 ,  C07D213/00 ,  C07D233/00 ,  C07D257/00 ,  C07D401/04 ,  C07D471/04 ,  C07D471/14 ,  C07D471/22 ,  C07D519/00

CPC classification number: C07D471/04 ,  A61K31/4745 ,  A61K45/06 ,  C07D471/14 ,  A61K2300/00

Abstract: Imidazonaphthyridine and tetrahydroimidazonaphthyridine compounds induce the biosynthesis of cytokines such as interferon and tumor necrosis factor. The compounds exhibit antiviral and antitumor properties. Methods of preparing the compounds and intermediates useful in the preparation of the compounds are also disclosed.

公开(公告)号：US06556887B2

公开(公告)日：2003-04-29

申请号：US09905091

申请日：2001-07-12

Applicant: Marvin L. Freeman ,  Jeffrey C. Hudgens ,  Damon Keith Cox ,  Chris Holt Pencis ,  Michael Rice ,  David A. Van Gogh

Inventor： Marvin L. Freeman ,  Jeffrey C. Hudgens ,  Damon Keith Cox ,  Chris Holt Pencis ,  Michael Rice ,  David A. Van Gogh

IPC: G06F700

CPC classification number: H01L21/67259 ,  B25J9/0009 ,  B25J9/107 ,  G05B19/404 ,  G05B2219/37608 ,  G05B2219/39192 ,  G05B2219/49169 ,  G05B2219/49207 ,  H01L21/67742 ,  H01L21/67748 ,  H01L21/68 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139

Abstract: Generally, a method of determining a position of a robot is provided. In one embodiment, a method of determining a position of a robot comprises acquiring a first set of positional metrics, acquiring a second set of positional metrics and resolving the position of the robot due to thermal expansion using the first set and the second set of positional metrics. Acquiring the first and second set of positional metrics may occur at the same location within a processing system, or may occur at different locations. For example, in another embodiment, the method may comprise acquiring a first set of positional metrics at a first location proximate a processing chamber and acquiring a second set of positional metrics in another location. In another embodiment, substrate center information is corrected using the determined position of the robot.

Abstract translation: 通常，提供了一种确定机器人的位置的方法。 在一个实施例中，一种确定机器人位置的方法包括获取第一组位置度量，获取第二组位置度量并且利用第一组和第二组位置来解决由于热膨胀引起的机器人的位置 指标 获取第一和第二组位置度量可以发生在处理系统内的相同位置处，或者可以在不同位置处发生。 例如，在另一个实施例中，该方法可以包括在靠近处理室的第一位置获取第一组位置度量，并在另一位置获取第二组位置度量。 在另一个实施例中，使用所确定的机器人的位置校正基板中心信息。

公开(公告)号：US06444085B1

公开(公告)日：2002-09-03

申请号：US09675319

申请日：2000-09-29

Applicant: Kenneth S. Collins ,  Michael Rice ,  John Trow ,  Douglas Buchberger ,  Craig A. Roderick

Inventor： Kenneth S. Collins ,  Michael Rice ,  John Trow ,  Douglas Buchberger ,  Craig A. Roderick

IPC: C23C1600

CPC classification number: H01J37/32458 ,  B01D53/22 ,  B01D53/226 ,  B01D53/268 ,  C23C16/517 ,  H01F2029/143 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/32146 ,  H01J37/32165 ,  H01J37/32467 ,  H01J37/32522 ,  H01J37/32688 ,  H01J37/32706 ,  H01J37/32871 ,  H01J2237/3343 ,  H01J2237/3345 ,  H01J2237/3346 ,  H01L21/31116 ,  H01L21/6831

Abstract: The invention is embodied in an inductively coupled RF plasma reactor including a reactor chamber enclosure defining a plasma reactor chamber and a support for holding a workpiece inside the chamber, a non-planar inductive antenna adjacent the reactor chamber enclosure, the non-planar inductive antenna including inductive elements spatially distributed in a non-planar relative to a plane of the workpiece to compensate for a null in an RF inductive pattern of the antenna, and a plasma source RF power supply coupled to the non-planar inductive antenna. The planar inductive antenna may be symmetrical or non-symmetrical, although it preferably includes a solenoid winding such as a vertical stack of conductive windings. In a preferred embodiment, the windings are at a minimum radial distance from the axis of symmetry while in an alternative embodiment the windings are at a radial distance from the axis of symmetry which is a substantial fraction of a radius of the chamber.

Abstract translation: 本发明体现在电感耦合RF等离子体反应器中，其包括限定等离子体反应器室的反应室外壳和用于将工件保持在室内的支撑件，邻近反应室壳体的非平面感应天线，非平面感应天线 包括相对于工件的平面空间分布在非平面中的电感元件，以补偿天线的RF感应图案中的零点，以及耦合到非平面感应天线的等离子体源RF电源。 平面感应天线可以是对称的或非对称的，尽管它优选地包括诸如导电绕组的垂直堆叠的螺线管绕组。 在优选实施例中，绕组处于距对称轴的最小径向距离，而在替代实施例中，绕组处于与对称半径相当大的部分的对称轴的径向距离处。

公开(公告)号：US06165311A

公开(公告)日：2000-12-26

申请号：US648254

申请日：1996-05-13

Applicant: Kenneth S. Collins ,  Michael Rice ,  John Trow ,  Douglas Buchberger ,  Craig A. Roderick

Inventor： Kenneth S. Collins ,  Michael Rice ,  John Trow ,  Douglas Buchberger ,  Craig A. Roderick

IPC: H05H1/46 ,  B01D53/22 ,  B01D53/26 ,  C23C16/517 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/683 ,  C23F1/02

CPC classification number: H01J37/32458 ,  B01D53/22 ,  B01D53/226 ,  B01D53/268 ,  C23C16/517 ,  H01F2029/143 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/32146 ,  H01J37/32165 ,  H01J37/32467 ,  H01J37/32522 ,  H01J37/32688 ,  H01J37/32706 ,  H01J37/32871 ,  H01J2237/3343 ,  H01J2237/3345 ,  H01J2237/3346 ,  H01L21/31116 ,  H01L21/6831

Abstract: The invention is embodied in an inductively coupled RF plasma reactor including a reactor chamber enclosure defining a plasma reactor chamber and a support for holding a workpiece inside the chamber, a non-planar inductive antenna adjacent the reactor chamber enclosure, the non-planar inductive antenna including inductive elements spatially distributed in a non-planar manner relative to a plane of the workpiece to compensate for a null in an RF inductive pattern of the antenna, and a plasma source RF power supply coupled to the non-planar inductive antenna. The planar inductive antenna may be symmetrical or non-symmetrical, although it preferably includes a solenoid winding such as a vertical stack of conductive windings. In a preferred embodiment, the windings are at a minimum radial distance from the axis of symmetry while in an alternative embodiment the windings are at a radial distance from the axis of symmetry which is a substantial fraction of a radius of the chamber.

Abstract translation: 本发明体现在电感耦合RF等离子体反应器中，其包括限定等离子体反应器室的反应室外壳和用于将工件保持在室内的支撑件，邻近反应室壳体的非平面感应天线，非平面感应天线 包括相对于工件的平面以非平面方式空间分布的电感元件，以补偿天线的RF感应图案中的零点，以及耦合到非平面感应天线的等离子体源RF电源。 平面感应天线可以是对称的或非对称的，尽管它优选地包括诸如导电绕组的垂直堆叠的螺线管绕组。 在优选实施例中，绕组处于距对称轴的最小径向距离，而在替代实施例中，绕组处于与对称半径相当大的部分的对称轴的径向距离处。

公开(公告)号：US06063233A

公开(公告)日：2000-05-16

申请号：US733555

申请日：1996-10-21

Applicant: Kenneth Collins ,  Michael Rice ,  Eric Askarinam ,  Douglas Buchberger ,  Craig Roderick

Inventor： Kenneth Collins ,  Michael Rice ,  Eric Askarinam ,  Douglas Buchberger ,  Craig Roderick

IPC: H05H1/46 ,  C23C16/517 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/683 ,  C23F1/02 ,  C23C16/00

CPC classification number: H01J37/32458 ,  C23C16/517 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/32146 ,  H01J37/32165 ,  H01J37/32467 ,  H01J37/32522 ,  H01J37/32688 ,  H01J37/32706 ,  H01J37/32871 ,  H01L21/31116 ,  H01L21/6831 ,  H01F2029/143 ,  H01J2237/3343 ,  H01J2237/3345 ,  H01J2237/3346

Abstract: The invention is embodied in a plasma reactor including a plasma reactor chamber and a workpiece support for holding a workpiece near a support plane inside the chamber during processing, the chamber having a reactor enclosure portion facing the support, a cold body overlying the reactor enclosure portion, a plasma source power applicator between the reactor enclosure portion and the cold body and a thermally conductor between and in contact with the cold body and the reactor enclosure. The thermal conductor and the cold sink define a cold sink interface therebetween, the reactor preferably further including a thermally conductive substance within the cold sink interface for reducing the thermal resistance across the cold sink interface. The thermally conductive substance can be a thermally conductive gas filling the cold body interface. Alternatively, the thermally conductive substance can be a thermally conductive solid material. The reactor can include a gas manifold in the cold body communicable with a source of the thermally conductive gas an inlet through the cold body from the gas manifold and opening out to the cold body interface. The reactor can further include an O-ring apparatus sandwiched between the cold body and the thermal conductor and defining a gas-containing volume in the cold body interface of nearly infinitesimal thickness in communication with the inlet from the cold body. More generally, the reactor can include the facilitation of thermal transfer across an interface between a hot and/or cold sink and any part exposed to the reactor chamber interior atmosphere, such as the ceiling, wall or polymer-hardening precursor ring, for example, by the insertion into that interface of a thermally conductive gas or substance.

公开(公告)号：US5990017A

公开(公告)日：1999-11-23

申请号：US104550

申请日：1998-06-25

Applicant: Kenneth Collins ,  Michael Rice ,  David Groechel ,  Gerald Yin ,  Jon Mohn ,  Craig Roderick ,  Douglas Buchberger ,  Chan-Lon Yang ,  Jerry Wong ,  Jeffrey Marks ,  Peter Keswick

Inventor： Kenneth Collins ,  Michael Rice ,  David Groechel ,  Gerald Yin ,  Jon Mohn ,  Craig Roderick ,  Douglas Buchberger ,  Chan-Lon Yang ,  Jerry Wong ,  Jeffrey Marks ,  Peter Keswick

IPC: H01L21/302 ,  H01J37/32 ,  H01L21/02 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/00

CPC classification number: H01J37/321 ,  H01J37/32082 ,  H01J37/32146 ,  H01J37/32165 ,  H01J37/32458 ,  H01J37/32467 ,  H01J37/32522 ,  H01J37/32688 ,  H01J37/32706 ,  H01J37/32871 ,  H01L21/31116 ,  H01F2029/143 ,  H01J2237/3343 ,  H01J2237/3345 ,  H01J2237/3346 ,  H01J2237/3382

Abstract: A general method of the invention is to provide a polymer-hardening precursor piece (such as silicon, carbon, silicon carbide or silicon nitride, but preferably silicon) within the reactor chamber during an etch process with a fluoro-carbon or fluoro-hydrocarbon gas, and to heat the polymer-hardening precursor piece above the polymerization temperature sufficiently to achieve a desired increase in oxide-to-silicon etch selectivity. Generally, this polymer-hardening precursor or silicon piece may be an integral part of the reactor chamber walls and/or ceiling or a separate, expendable and quickly removable piece, and the heating/cooling apparatus may be of any suitable type including apparatus which conductively or remotely heats the silicon piece.

公开(公告)号：US5477975A

公开(公告)日：1995-12-26

申请号：US138060

申请日：1993-10-15

Applicant: Michael Rice ,  Jeffrey Marks ,  David W. Groechel ,  Nicolas J. Bright

Inventor： Michael Rice ,  Jeffrey Marks ,  David W. Groechel ,  Nicolas J. Bright

IPC: C23F4/00 ,  B44C1/22 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H05H1/00

CPC classification number: H01J37/32871 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/32165 ,  H01J37/32458 ,  H01J37/32522 ,  H01J2237/3343 ,  H01J2237/3346 ,  Y10S438/909

Abstract: The invention is embodied in a method of operating a plasma etch reactor, consisting of introducing a gas into the reactor which disassociates as a plasma into an etch species which etches oxide films on a work piece in the reactor and a non-etching species combinable with the etch species into an etch-preventing polymer condensable onto the work piece below a characteristic deposition temperature, providing an interior wall comprising a material which scavenges the etching species, and maintaining a temperature of the interior wall above the deposition temperature.

公开(公告)号：US08137269B2

公开(公告)日：2012-03-20

申请号：US11724642

申请日：2007-03-15

Applicant: Hamid Sheikhzadeh-Nadjar ,  Robert L. Brennan ,  Michael Rice

Inventor： Hamid Sheikhzadeh-Nadjar ,  Robert L. Brennan ,  Michael Rice

IPC: A61B5/00

CPC classification number: G10L21/0208 ,  A61B7/04 ,  G10L25/00 ,  H03H21/0012 ,  H03H2021/0041

Abstract: A method and system for managing physiological systems is provided. The physiological system management (PSM) system includes one or more signal acquisition blocks to collect physiological information. The PSM system includes oversampled filterbanks for transferring one or more input signal related to the physiological information into subband signals, and a subband processing scheme for processing the outputs from the oversampled filterbanks for event detection in one or more physiological systems. The PSM system includes an adaptive controller which decides on the proper control measure and delivers the measure to the one or more physiological systems.

Abstract translation: 提供了一种用于管理生理系统的方法和系统。 生理系统管理（PSM）系统包括一个或多个收集生理信息的信号采集块。 PSM系统包括用于将与生理信息相关的一个或多个输入信号转换为子带信号的过采样滤波器组，以及用于处理来自过采样滤波器组的输出的子带处理方案，用于在一个或多个生理系统中进行事件检测。 PSM系统包括一个自适应控制器，该控制器决定适当的控制措施并将测量结果传递给一个或多个生理系统。

公开(公告)号：US20120040450A1

公开(公告)日：2012-02-16

申请号：US13265959

申请日：2010-04-29

Applicant: Dominic M. Clarke ,  Ian B. Nicoud ,  Aby J. Mathew ,  Michael Rice

Inventor： Dominic M. Clarke ,  Ian B. Nicoud ,  Aby J. Mathew ,  Michael Rice

IPC: C12M1/00

CPC classification number: A01N1/0242 ,  A01N1/0268 ,  B01L3/50851 ,  B01L2300/042 ,  B01L2300/046 ,  B01L2300/1894

Abstract: Provided are apparatuses for cryopreserving cells which include a vessel comprising a biocompatible substrate, wherein the vessel further comprises an interior and an exterior, and a mechanical ice nucleating device disposed in or on the vessel interior for initiating ice crystal formation. Also provided are kits comprising one or more apparatuses for cryopreserving cells and a biopreservation medium. Further provided are compositions comprising a vessel for holding cells, a mechanical ice nucleating device, a biopreservation medium, and cells disposed in the vessel. The apparatuses, kits, and compositions of the invention can optionally include an insulating material which is disposed on all or a portion of the vessel.

Abstract translation: 提供了用于冷冻保存细胞的装置，其包括包含生物相容性底物的容器，其中容器还包括内部和外部，以及设置在容器内部中或其上的用于引发冰晶形成的机械冰成核装置。 还提供了包含用于冷冻保存细胞的一个或多个装置和生物保存培养基的试剂盒。 还提供了包含用于保持细胞的容器，机械冰成核装置，生物保存介质和设置在容器中的细胞的组合物。 本发明的装置，试剂盒和组合物可任选地包括设置在容器的全部或一部分上的绝缘材料。

公开(公告)号：US07743728B2

公开(公告)日：2010-06-29

申请号：US12106824

申请日：2008-04-21

Applicant: Tetsuya Ishikawa ,  Rick J. Roberts ,  Helen R. Armer ,  Leon Volfovski ,  Jay D. Pinson ,  Michael Rice ,  David H. Quach ,  Mohsen S. Salek ,  Robert Lowrance ,  John A. Backer ,  William Tyler Weaver ,  Charles Carlson ,  Chongyang Wang ,  Jeffrey Hudgens ,  Harald Herchen ,  Brian Lue

Inventor： Tetsuya Ishikawa ,  Rick J. Roberts ,  Helen R. Armer ,  Leon Volfovski ,  Jay D. Pinson ,  Michael Rice ,  David H. Quach ,  Mohsen S. Salek ,  Robert Lowrance ,  John A. Backer ,  William Tyler Weaver ,  Charles Carlson ,  Chongyang Wang ,  Jeffrey Hudgens ,  Harald Herchen ,  Brian Lue

IPC: B05C13/02 ,  C23C14/00 ,  H01L21/677

CPC classification number: H01L21/67225 ,  G03B27/32 ,  G03D13/006 ,  G03F7/40 ,  G05B19/41825 ,  G05B2219/40476 ,  G05B2219/45031 ,  G05B2219/49137 ,  H01L21/67109 ,  H01L21/6715 ,  H01L21/67161 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67754 ,  H01L21/6831 ,  H01L21/6838 ,  H01L21/68707 ,  H01L22/26 ,  Y02P90/087 ,  Y10S414/135 ,  Y10S414/136 ,  Y10T29/53187 ,  Y10T29/5323

Abstract: Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool). In one embodiment, the cluster tool is adapted to perform a track lithography process in which a photosensitive material is applied to a substrate, patterned in a stepper/scanner, and then removed in a developing process completed in the cluster tool. In one embodiment of the cluster tool, substrates are grouped together in groups of two or more for transfer or processing to improve system throughput, reduce the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, and thus increase system reliability. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.

Abstract translation: 实施例通常提供使用多室处理系统（例如，集群工具）来处理衬底的装置和方法。 在一个实施例中，簇工具适于执行轨道光刻工艺，其中感光材料被施加到基板上，在步进/扫描器中图案化，然后在以集群工具完成的显影过程中去除。 在集群工具的一个实施例中，将基板分成两组或更多组以进行传送或处理，以提高系统吞吐量，减少机器人必须在处理室之间传送一批衬底的移动次数，从而减少 提高系统可靠性。 实施例还提供了用于增加衬底转移过程以减少系统停机时间的可靠性的方法和装置。