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    Gas management system for a laser-produced-plasma EUV light source
    71.
    发明申请
    Gas management system for a laser-produced-plasma EUV light source 有权
    用于激光产生等离子体EUV光源的气体管理系统

    公开(公告)号：US20090057567A1

    公开(公告)日：2009-03-05

    申请号：US11897644

    申请日：2007-08-31

    申请人： Alexander N. Bykanov ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David C. Brandt

    发明人： Alexander N. Bykanov ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David C. Brandt

    IPC分类号： H05G2/00 ,  H01H1/00

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008 ,  Y10S422/906

    摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.

    摘要翻译： 本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如， 激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。 对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。 可以提供泵以迫使气体通过闭环流动路径。 可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。 在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

    Laser system
    72.
    发明申请
    Laser system 有权
    激光系统

    公开(公告)号：US20080267242A1

    公开(公告)日：2008-10-30

    申请号：US11981195

    申请日：2007-10-30

    申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov

    发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov

    IPC分类号： H01S3/225

    CPC分类号： H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/10092 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/235 ,  H01S2301/02

    摘要： A method/apparatus may comprise operating a line narrowed pulsed excimer or molecular fluorine gas discharge laser system by using a seed laser oscillator to produce an output which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module; a laser amplification stage which may comprise a ring power amplification stage; the method of operation may the steps of: selecting a differential timing between an electrical discharge between a pair of electrodes in the first laser chamber and in the second laser chamber which at the same time keeps ASE below a selected limit and the pulse energy of the laser system output light beam of pulses essentially constant.

    摘要翻译： 方法/装置可以包括通过使用种子激光振荡器来操作线窄的脉冲准分子或分子氟气体放电激光系统，以产生可包括第一气体放电准分子或分子氟激光室的输出; 线缩小模块; 可以包括环功率放大级的激光放大级; 操作方法可以是：选择第一激光室中的一对电极与第二激光室中的一对电极之间的放电之间的差分定时，同时使ASE保持在选定的极限以下，并且脉冲能量 激光系统输出光束的脉冲基本恒定。

    Laser system
    73.
    发明申请
    Laser system 有权
    激光系统

    公开(公告)号：US20080225908A1

    公开(公告)日：2008-09-18

    申请号：US11981449

    申请日：2007-10-30

    申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

    发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

    IPC分类号： H01S3/225

    CPC分类号： H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/08 ,  H01S3/08059 ,  H01S3/105 ,  H01S3/2251 ,  H01S3/235 ,  H01S3/2366

    摘要： An apparatus/method which may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a seed laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser system output light beam of pulses, which may comprise a ring power amplification stage; a seed injection mechanism.

    摘要翻译： 可以包括线变窄的脉冲准分子或分子氟气体放电激光系统的装置/方法，其可以包括种子激光振荡器，其产生包括种子激光输出的脉冲光束的输出，所述种子激光输出光束可以包括第一气体放电准分子或分子氟激光 房间 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括激光系统输出光束 的脉冲，其可以包括环形功率放大级; 种子注射机制。

    EUV light source
    74.
    发明授权
    EUV light source 有权
    EUV光源

    公开(公告)号：US07411203B2

    公开(公告)日：2008-08-12

    申请号：US11647016

    申请日：2006-12-27

    申请人： Igor V. Fomenkov ,  Alexander I. Ershov

    发明人： Igor V. Fomenkov ,  Alexander I. Ershov

    IPC分类号： H01J49/00

    CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a ibeus defining a desired plasma initiation site, comprising; a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis genemily perpendicular to the target stream track from a desired stream truck intersecting the desired plasma initiation site.

    摘要翻译： 公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集 光学元件具有限定期望的等离子体起始位置的ibeus，包括： 目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中所述目标流轨迹由所述摄像机的成像速度导致太慢以不能成像形成所述目标的各个等离子体形成目标 流成像为目标流轨道; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流动车辆，在垂直于目标流轨迹的至少一个轴中至少一个轴上检测目标流轨迹的位置的误差。

    LPP EUV light source
    75.
    发明授权
    LPP EUV light source 失效
    LPP EUV光源

    公开(公告)号：US07317196B2

    公开(公告)日：2008-01-08

    申请号：US10979919

    申请日：2004-11-01

    申请人： William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  David W. Myers

    发明人： William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  David W. Myers

    IPC分类号： H01J35/20

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    摘要： An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with an initial target irradiation pulse to form an EUV generating plasma having an emission region emitting in-band EUV light; a laser plasma irradiation pulse generating mechanism irradiating the plasma with a plasma irradiation pulse after the initial target irradiation pulse so as to compress emission material in the plasma toward the emission region of the plasma. The plasma irradiation pulse may comprise a laser pulse having a wavelength that is sufficiently longer than a wavelength of the initial target irradiation pulse to have an associated lower critical density resulting in absorption occurring within the plasma in a region of the plasma defined by the wavelength of the plasma irradiation pulse sufficiently separated from an initial target irradiation site to achieve compression of the emission material, and the may compress the emission region. The laser plasma irradiation pulse may produce an aerial mass density in the ablating cloud of the plasma sufficient to confine the favorably emitting plasma for increased conversion efficiency. The deposition region for the plasma irradiation pulse may be is removed enough from the initial target surface so as to insure compression of the favorably emitting plasma. A high conversion efficiency laser produced plasma extreme ultraviolet (“EUV”) light source may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with a target irradiation pulse to form an EUV generating plasma emitting in-band EUV light; a plasma tamper substantially surrounding the plasma to constrain the expansion of the plasma.

    摘要翻译： 描述了一种用于在LPP EUV光源中有效且有效地提供等离子体照射激光脉冲的装置和方法，其可以包括用初始目标照射脉冲照射等离子体引发目标的激光初始靶照射脉冲发生机构以形成产生EUV的等离子体 具有发射带内EUV光的发射区域; 激光等离子体照射脉冲发生机构在初始目标照射脉冲之后用等离子体照射脉冲照射等离子体，以将等离子体中的发射材料压缩到等离子体的发射区域。 等离子体照射脉冲可以包括具有足够长于初始靶照射脉冲的波长的波长的激光脉冲，以具有相关联的较低的临界密度，从而在由等离子体的波长定义的等离子体的区域内的等离子体内发生吸收 等离子体照射脉冲从初始目标照射位置充分分离，以实现发射材料的压缩，并且可以压缩发射区域。 激光等离子体照射脉冲可以在等离子体的消融云中产生足够的空气质量密度以限制有利的发射等离子体以提高转换效率。 可以从初始目标表面去除等离子体照射脉冲的沉积区域，以确保有利地发射等离子体的压缩。 高转换效率的激光产生的等离子体极紫外（“EUV”）光源可以包括激光初始靶照射脉冲发生机构，用目标照射脉冲照射等离子体引发目标，以形成产生EUV的发射等离子体的带内EUV光; 等离子体篡改基本上围绕等离子体以约束等离子体的膨胀。

    Line narrowed laser with spatial filter
    78.
    发明授权
    Line narrowed laser with spatial filter 有权
    线狭窄激光与空间滤波器

    公开(公告)号：US06556612B2

    公开(公告)日：2003-04-29

    申请号：US09309478

    申请日：1999-05-10

    申请人： Alexander I. Ershov ,  Igor V. Fomenkov

    发明人： Alexander I. Ershov ,  Igor V. Fomenkov

    IPC分类号： H01S308

    CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258

    摘要： A line narrowed laser system having a spatial filter to filter light at wavelengths greater and/or smaller than a desired range of wavelengths. The laser system is line narrowed with a line narrowing mechanism having a dispersive element which disperses laser light into wavelength dependent directions. By spatially filtering the resulting beam the bandwidth of the beam can be reduced substantially. There is also a reduction of beam energy as a result of the spatial filtering but this reduction is substantially less than some other known techniques for reducing bandwidths. A preferred spatial filter, for reducing the bandwidth of a line narrowed gas discharge laser, includes two cylindrical mirrors separated by a distance equal to their focal lengths with a slit aperture positioned at the common focal line.

    摘要翻译： 一种具有空间滤波器的线窄化激光系统，用于对波长较大和/或小于期望波长范围的波长进行滤光。 激光系统线条变窄，线条变窄机构具有将激光分散成波长相关方向的色散元件。 通过对所得到的光束进行空间滤波，可以显着地减小光束的带宽。 作为空间滤波的结果，还有光束能量的减少，但是这种减少远远小于用于减小带宽的一些其它已知的技术。 用于减小气体放电激光器线窄带宽的优选空间滤波器包括两个圆柱形反射镜，其间隔开等于其焦距的距离，并且狭缝孔位于公共焦线处。

    Laser System
    79.
    发明申请
    Laser System 有权
    激光系统

    公开(公告)号：US20120002687A1

    公开(公告)日：2012-01-05

    申请号：US13231882

    申请日：2011-09-13

    申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov

    发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov

    IPC分类号： H01S3/10

    CPC分类号： H01S3/225 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/2251 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2383 ,  H01S2301/02

    摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

    摘要翻译： 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束 脉冲，其可以包括环形功率放大级。

    LPP EUV light source drive laser system
    80.
    发明授权
    LPP EUV light source drive laser system 有权
    LPP EUV光源驱动激光系统

    公开(公告)号：US07928417B2

    公开(公告)日：2011-04-19

    申请号：US12288970

    申请日：2008-10-24

    申请人： Alexander I. Ershov ,  Alexander N. Bykanov ,  Oleh V. Khodykin ,  Igor V. Fomenkov

    发明人： Alexander I. Ershov ,  Alexander N. Bykanov ,  Oleh V. Khodykin ,  Igor V. Fomenkov

    IPC分类号： G01N21/00 ,  G01N21/33 ,  G01J1/00

    CPC分类号： H05G2/003 ,  H05G2/008

    摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.

    摘要翻译： 公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。 该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，使得在有效的等离子体产生能量下聚焦在小于约100μm的EUV目标液滴在所涉及的几何形状的约束条件下是不实际的 聚焦镜头。 驱动激光器可以包括CO2激光器。 驱动激光重定向机构可以包括镜子。