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    METHOD AND APPARATUS FOR CONTROLLING PLASMA UNIFORMITY
    72.
    发明申请
    METHOD AND APPARATUS FOR CONTROLLING PLASMA UNIFORMITY 审中-公开
    用于控制等离子体均匀性的方法和装置

    公开(公告)号：US20090197015A1

    公开(公告)日：2009-08-06

    申请号：US12344210

    申请日：2008-12-24

    申请人： Jozef Kudela ,  Gaku Furuta ,  Carl A. Sorensen ,  Soo Young Choi ,  John M. White

    发明人： Jozef Kudela ,  Gaku Furuta ,  Carl A. Sorensen ,  Soo Young Choi ,  John M. White

    IPC分类号： C23C16/513

    CPC分类号： H01J37/32623 ,  C23C16/345 ,  C23C16/5096 ,  H01J37/32082

    摘要： Systems, methods, and apparatus involve a plasma processing chamber for depositing a film on a substrate. The plasma processing chamber includes a lid assembly having a ground plate, a backing plate, and a non-uniformity existing between the ground plate and the backing plate. The non-uniformity may interfere with RF wave uniformity and cause an impedance imbalance between portions of the ground plate and backing plate. The non-uniformity may include a structure or a reduced spacing of non-uniform surfaces. A reduced spacing of non-uniform surfaces may exist where a first distance between the ground plate and the backing plate at a first end is different from a second distance between the ground plate and the backing plate at a second end. The structure may be from 2 cm to 10 cm thick, cover from 20% to 50% of the backing plate, and be located away from a discontinuity existing inside the chamber.

    摘要翻译： 系统，方法和装置包括用于在基板上沉积膜的等离子体处理室。 等离子体处理室包括具有接地板，背板和存在于接地板和背板之间的不均匀性的盖组件。 不均匀性可能会干扰RF波均匀性，并导致接地板和背板的部分之间的阻抗不平衡。 不均匀性可以包括非均匀表面的结构或减小的间隔。 存在不均匀表面的减小的间隔，其中在第一端处的接地板和背板之间的第一距离在第二端处不同于接地板和背板之间的第二距离。 该结构可以是2cm至10cm厚，覆盖背板的20％至50％，并且位于远离存在于腔室内的不连续处。

    Blue printing ink for color filter applications
    73.
    发明授权
    Blue printing ink for color filter applications 失效
    用于滤色器应用的蓝色印刷油墨

    公开(公告)号：US07544723B2

    公开(公告)日：2009-06-09

    申请号：US11182491

    申请日：2005-07-15

    申请人： Lizhong Sun ,  Quanyuan Shang ,  John M. White

    发明人： Lizhong Sun ,  Quanyuan Shang ,  John M. White

    IPC分类号： C09D11/00

    CPC分类号： C09D11/322

    摘要： Blue inks for displays are provided. In one aspect, the blue inks include one or more blue organic pigments, one or more monomers, one or more polymeric dispersants, and one or more organic solvents. In another aspect, the blue inks include one or more blue organic pigments, one or more violet pigments, one or more monomers, one or more polymeric dispersants, and one or more organic solvents. Methods of forming displays that include dispensing the blue inks by inkjetting onto a substrate and displays that include the blue inks are also provided.

    摘要翻译： 提供用于显示器的蓝色墨水。 一方面，蓝色油墨包括一种或多种蓝色有机颜料，一种或多种单体，一种或多种聚合物分散剂和一种或多种有机溶剂。 另一方面，蓝色油墨包括一种或多种蓝色有机颜料，一种或多种紫色颜料，一种或多种单体，一种或多种聚合物分散剂和一种或多种有机溶剂。 形成显示器的方法包括通过喷墨到基板上分配蓝色墨水并且还提供包括蓝色墨水的显示器。

    OFFSET LINER FOR CHAMBER EVACUATION
    74.
    发明申请
    OFFSET LINER FOR CHAMBER EVACUATION 审中-公开
    用于室内休闲的偏心衬里

    公开(公告)号：US20090107955A1

    公开(公告)日：2009-04-30

    申请号：US12205414

    申请日：2008-09-05

    申请人： ROBIN L. TINER ,  Suhail Anwar ,  Gaku Furuta ,  Young Jin Choi ,  Beom Soo Park ,  Soo Young Choi ,  John M. White

    发明人： ROBIN L. TINER ,  Suhail Anwar ,  Gaku Furuta ,  Young Jin Choi ,  Beom Soo Park ,  Soo Young Choi ,  John M. White

    IPC分类号： B44C1/22 ,  C23C16/455 ,  C23C16/44 ,  C23F1/08

    CPC分类号： H01J37/32357 ,  C23C16/4404 ,  H01J37/32449 ,  H01J37/32623 ,  H01J37/32834

    摘要： The present invention generally includes a chamber liner spaced from a chamber wall to permit processing gases to be pulled between the chamber liner and the chamber wall when withdrawing gases from the processing chamber. When the vacuum pump is below the susceptor, processing gases will be drawn below the susceptor and may lead to undesired deposition onto process chamber components. Additionally, the processing gases will be pulled past the slit valve opening and potentially deposit within the slit valve opening. When material deposits in the slit valve opening, flaking may occur and contaminate the substrates. By drawing the processing gases along the sidewalls other than the one having the slit valve opening therethrough, undesired deposition on the slit valve opening may be reduced.

    摘要翻译： 本发明通常包括与室壁间隔开的腔室衬套，以便当从处理腔室排出气体时允许处理气体在腔室衬套和室壁之间被拉动。 当真空泵在基座下方时，处理气体将被拉到基座下方，并可能导致不希望的沉积到处理室部件上。 此外，处理气体将被拉过狭缝阀开口并可能沉积在狭缝阀开口内。 当材料沉积在狭缝阀开口中时，会发生剥落并污染基板。 通过沿着具有狭缝阀开口的侧壁以外的侧壁吸收处理气体，可以减少狭缝阀开口上的不期望的沉积。

    Methods and apparatus for symmetrical and/or concentric radio frequency matching networks
    76.
    发明授权
    Methods and apparatus for symmetrical and/or concentric radio frequency matching networks 有权
    用于对称和/或同心的射频匹配网络的方法和装置

    公开(公告)号：US07518466B2

    公开(公告)日：2009-04-14

    申请号：US11507649

    申请日：2006-08-21

    申请人： Carl Sorensen ,  John M. White

    发明人： Carl Sorensen ,  John M. White

    IPC分类号： H03H7/38

    CPC分类号： H01J37/32183 ,  H01J37/32082 ,  H05H1/46

    摘要： Apparatus and methods are provided that are adapted to match the impedance of an electrical load to an impedance of an electrical signal generator. The invention includes providing a plurality of electrical components adapted to collectively match the impedance of the electrical load to the impedance of the electrical signal generator. The electrical components are arranged symmetrically and concentrically about an axis. Additionally, the invention may also include a first connector adapted to electrically couple the electrical signal generator to the electrical components. Additionally, the invention may also include a second connector adapted to electrically couple the load to the electrical components. Numerous other aspects are provided.

    摘要翻译： 提供了适于将电负载的阻抗与电信号发生器的阻抗相匹配的装置和方法。 本发明包括提供多个电气部件，其适于将电负载的阻抗统一地匹配到电信号发生器的阻抗。 电气部件围绕轴对称地并且同心地布置。 另外，本发明还可以包括适于将电信号发生器电耦合到电气部件的第一连接器。 另外，本发明还可以包括适于将负载电耦合到电气部件的第二连接器。 提供了许多其他方面。

    SOURCE GAS FLOW PATH CONTROL IN PECVD SYSTEM TO CONTROL A BY-PRODUCT FILM DEPOSITION ON INSIDE CHAMBER
    78.
    发明申请
    SOURCE GAS FLOW PATH CONTROL IN PECVD SYSTEM TO CONTROL A BY-PRODUCT FILM DEPOSITION ON INSIDE CHAMBER 有权
    PECVD系统中的源气体流路控制，用于控制室内副产物膜沉积

    公开(公告)号：US20090064934A1

    公开(公告)日：2009-03-12

    申请号：US12205363

    申请日：2008-09-05

    申请人： BEOM SOO PARK ,  Young Jin Choi ,  Robin L. Tiner ,  Sam H. Kim ,  Soo Young Choi ,  John M. White ,  Dong-Kil Yim

    发明人： BEOM SOO PARK ,  Young Jin Choi ,  Robin L. Tiner ,  Sam H. Kim ,  Soo Young Choi ,  John M. White ,  Dong-Kil Yim

    IPC分类号： C23C16/513

    CPC分类号： C23C16/45502 ,  C23C16/4401

    摘要： The present invention generally comprises a method and an apparatus for guiding the flow of processing gases away from chamber walls and slit valve opening. By controlling the flow path of the process gases within a processing chamber, undesirable deposition upon chamber walls and within slit valve openings may be reduced. By reducing deposition in slit valve openings, flaking may be reduced. By reducing deposition on chamber walls, the time between chamber cleaning may be increased. Thus, guiding the flow of processing gases within the processing chamber may increase substrate throughput.

    摘要翻译： 本发明通常包括一种用于将处理气体的流动引导离开室壁和狭缝阀开口的方法和装置。 通过控制处理室内的处理气体的流动路径，可以减少在室壁上和狭缝阀开口内的不期望的沉积。 通过减少狭缝阀开口中的沉积，可能会降低剥落。 通过减少室壁上的沉积，可以增加室清洁之间的时间。 因此，引导处理室内的处理气体的流动可以增加衬底生产量。

    METHODS AND APPARATUS FOR DEPOSITING A UNIFORM SILICON FILM WITH FLOW GRADIENT DESIGNS
    79.
    发明申请
    METHODS AND APPARATUS FOR DEPOSITING A UNIFORM SILICON FILM WITH FLOW GRADIENT DESIGNS 审中-公开
    用流平面设计沉积均匀硅膜的方法和装置

    公开(公告)号：US20080302303A1

    公开(公告)日：2008-12-11

    申请号：US11759599

    申请日：2007-06-07

    申请人： Soo Young Choi ,  Tae Kyung Won ,  John M. White

    发明人： Soo Young Choi ,  Tae Kyung Won ,  John M. White

    IPC分类号： C23C16/00 ,  B05B1/14

    CPC分类号： C23C16/24 ,  C23C16/45565 ,  C23C16/5096 ,  H01J37/32449

    摘要： Methods and apparatus having a flow gradient created from a gas distribution plate are provided. In one embodiment, the method and apparatus are particularly useful for, but not limited to, depositing a silicon film for solar cell applications. The apparatus for depositing a uniform film for solar cell applications includes a processing chamber, and a quadrilateral gas distribution plate disposed in the processing chamber and having at least four corners separated by four sides. The gas distribution plate further includes a first plurality of chokes formed through the gas distribution plate, the first plurality of chokes located in the corners, and a second plurality of chokes formed through the gas distribution plate, the second plurality of chokes located along the sides of the gas distribution plate between the corner regions, wherein the first plurality of chokes have a greater flow resistance than that of the second plurality of chokes.

    摘要翻译： 提供了具有由气体分配板产生的流动梯度的方法和装置。 在一个实施例中，该方法和装置特别适用于但不限于沉积太阳能电池应用的硅膜。 用于沉积用于太阳能电池应用的均匀膜的设备包括处理室和设置在处理室中的四边形气体分配板，并且具有由四个侧面分开的至少四个角。 气体分配板还包括通过气体分配板形成的第一多个扼流圈，位于角部的第一多个扼流圈，以及通过气体分配板形成的第二多个扼流圈，沿着侧面设置的第二多个扼流圈 在所述角区域之间的所述气体分配板中，所述第一多个扼流器具有比所述第二多个扼流圈更大的流动阻力。

    METHODS, APPARATUS AND SYSTEMS FOR INCREASING THROUGHPUT USING MULTIPLE PRINT HEADS ROTATABLE ABOUT A COMMON AXIS
    80.
    发明申请
    METHODS, APPARATUS AND SYSTEMS FOR INCREASING THROUGHPUT USING MULTIPLE PRINT HEADS ROTATABLE ABOUT A COMMON AXIS 审中-公开
    方法，使用多个打印头来增加通量的方法，装置和系统

    公开(公告)号：US20080186354A1

    公开(公告)日：2008-08-07

    申请号：US12013399

    申请日：2008-01-11

    申请人： John M. White

    发明人： John M. White

    IPC分类号： B41J23/00

    CPC分类号： B41J3/28 ,  B41J3/407 ,  B41J25/003 ,  G02B5/201 ,  G02F1/1303 ,  G02F1/133516

    摘要： Apparatus and methods for printing are provided. A printing apparatus includes a platform adapted to rotate about a rotational axis and a plurality of longitudinally aligned print heads coupled to the platform. In one or more embodiments, each of the plurality of print heads includes a set of nozzles arranged in a line having a nozzle line length and the print heads are separated longitudinally by a clearing distance equal to approximately an integer times the nozzle line length.

    摘要翻译： 提供了印刷装置和方法。 打印设备包括适于围绕旋转轴线旋转的平台和联接到平台的多个纵向对齐的打印头。 在一个或多个实施例中，多个打印头中的每一个包括一组喷嘴，其布置成具有喷嘴线长度的线，并且打印头沿纵向分开等于喷嘴线长度的大约整数倍的清除距离。