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71.发明授权Method for treating surface of construction material for vacuum apparatus, and the material treated thereby and vacuum treatment apparatus having the treated material 失效用于处理真空装置的建筑材料的表面的方法，以及由此处理的材料和具有处理过的材料的真空处理装置
公开(公告)号：US4732792A
公开(公告)日：1988-03-22
申请号：US783478
申请日：1985-10-03
申请人： Yasutomo Fujiyama
发明人： Yasutomo Fujiyama
摘要： The surface of an element of a vacuum apparatus is coated with a film formed by a flame spraying method.
摘要翻译： 真空装置的元件的表面涂覆有通过火焰喷涂法形成的膜。
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公开(公告)号：US3696245A
公开(公告)日：1972-10-03
申请号：US3696245D
申请日：1970-04-28
申请人： ASS ELECT IND
CPC分类号： H01J37/224 , H01J37/16
摘要： An electron microscope comprising a microscope chamber having a viewing screen positioned within the chamber and mounted for movement to at least a first position away from a beam of electrons or a second position in which electrons passing through an object or specimen are intercepted by the viewing screen to thereby produce an image. A drive motor is coupled to the viewing screen for moving the screen to either the first or the second position.
摘要翻译： 一种电子显微镜，包括具有位于所述室内的观察屏幕的显微镜室，并安装成用于移动至远离电子束的至少第一位置或第二位置，其中通过物体或样品的电子被观察屏幕截取 从而产生图像。 驱动马达耦合到观察屏幕，用于将屏幕移动到第一或第二位置。
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公开(公告)号：US3529122A
公开(公告)日：1970-09-15
申请号：US3529122D
申请日：1967-01-06
申请人： SMITH CORP A O
发明人： HINRICHS JOHN F
CPC分类号： H01J37/16 , B23K15/0093
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公开(公告)号：US3485591A
公开(公告)日：1969-12-23
申请号：US3485591D
申请日：1966-02-07
CPC分类号： H01J37/32 , C01B32/956 , H01J37/16 , H01J37/321 , H01J2237/338 , H05H1/42
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75.发明授权Electron beam devices having plural chambers designed to be assembled and disassembled 失效具有设计成组装和拆卸的多个室的电子束装置
公开(公告)号：US3248542A
公开(公告)日：1966-04-26
申请号：US26662163
申请日：1963-03-20
申请人： HILGER & WATTS LTD
CPC分类号： H01J37/02 , H01J29/82 , H01J37/15 , H01J37/16 , H01J37/3005
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公开(公告)号：US2347328A
公开(公告)日：1944-04-25
申请号：US44905542
申请日：1942-06-30
申请人： RCA CORP
发明人： LADISLAUS MARTON
IPC分类号： H01J37/06 , H01J37/16 , H01J37/248
CPC分类号： H01J37/248 , H01J37/06 , H01J37/16
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公开(公告)号：US20180088472A1
公开(公告)日：2018-03-29
申请号：US15564564
申请日：2016-04-15
申请人： NIKON CORPORATION
发明人： Yuichi SHIBAZAKI
IPC分类号： G03F7/20
CPC分类号： G03F7/70808 , G03F7/20 , H01J37/16 , H01J37/20 , H01J37/3174 , H01J2237/0216 , H01J2237/20292 , H01L21/027 , H01L21/677
摘要： An exposure system is equipped with: a first row of chambers that are arranged to be adjacent to a C/D provided on a floor surface F on a +X side; a second row of chambers arranged on the −Y side facing the first row of chambers; and a first control rack adjacent to the to the second row of chambers on a −X side and is arranged on the −Y side facing the C/D. Inside at least a part of the plurality of chambers, exposure chambers where exposure is performed are formed and the first control rack distributes utilities supplied from the below the floor surface to the first and the second rows of chambers.
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公开(公告)号：US09911571B2
公开(公告)日：2018-03-06
申请号：US15486880
申请日：2017-04-13
发明人： Yosef Basson
IPC分类号： G01F23/00 , H01J37/20 , H01J37/18 , H01J37/248 , H01J37/28
CPC分类号： H01J37/20 , H01J37/09 , H01J37/16 , H01J37/18 , H01J37/226 , H01J37/248 , H01J37/28 , H01J2237/0206 , H01J2237/0262 , H01J2237/038 , H01J2237/049 , H01J2237/20292 , H01J2237/2813
摘要： A high voltage inspection system that includes a vacuum chamber; electron optics that is configured to direct an electron beam towards an upper surface of a substrate; a substrate support module that comprises a chuck and a housing; wherein the chuck is configured to support a substrate; wherein the housing is configured to surround the substrate without masking the electron beam, when the substrate is positioned on the chuck during a first operational mode of the high voltage inspection system; and wherein the substrate, the chuck and the housing are configured to (a) receive a high voltage bias signal of a high voltage level that exceeds ten thousand volts, and (b) to maintain at substantially the high voltage level during the first operational mode of the high voltage inspection system.
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公开(公告)号：US09741526B2
公开(公告)日：2017-08-22
申请号：US14912521
申请日：2014-03-10
CPC分类号： H01J37/16 , H01J37/18 , H01J37/20 , H01J37/263 , H01J37/28 , H01J2237/164 , H01J2237/202 , H01J2237/28
摘要： Disclosed is a charged particle beam apparatus wherein a partitioning film capable of transmitting a charged particle beam is provided between a charged particle optical system and a sample, said charged particle beam apparatus eliminating a contact between the sample and the partitioning film even in the cases where the sample has recesses and protrusions. On the basis of detection signals or an image generated on the basis of the detection signals, a distance between a sample and a partitioning film is monitored, said detection signals being outputted from a detector that detects secondary charged particles discharged from the sample due to irradiation of a primary charged particle beam.
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公开(公告)号：US20170061947A1
公开(公告)日：2017-03-02
申请号：US15251040
申请日：2016-08-30
发明人： Daisuke MUTOU , Shuichi NAKAGAWA , Masaki MIZUOCHI , Toshihiko SHIMIZU , Hirofumi MOTOSHIROMIZU , Eisuke KAMIDE
IPC分类号： G10K11/162 , H01J37/16 , H01J37/26
CPC分类号： H01J37/16 , G10K11/16 , H01J2237/0216
摘要： To provide a charged particle radiation apparatus including a soundproof cover that highly realizes both suppression of image defects due to a specific frequency and improvement in quake resistance. A charged particle radiation apparatus including a box-shaped soundproof cover having a plurality of wall surfaces, the soundproof cover including a plurality of columnar bodies forming a frame of the box shape body and a box-shaped acoustic energy absorbing structure provided in a connecting part of the plurality of columnar bodies and attached to support at least the two columnar bodies, is proposed.
摘要翻译： 为了提供一种包括隔音罩的带电粒子辐射装置，其高度实现由于特定频率而抑制图像缺陷以及改善耐震性。 一种带电粒子辐射装置，包括具有多个壁面的箱形隔音罩，隔音盖包括形成盒形体的框架的多个柱状体和设置在连接部分中的盒状吸声结构 的多个柱状体，并且至少支撑着两个柱状体。
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