公开(公告)号：US5596596A

公开(公告)日：1997-01-21

申请号：US573593

申请日：1995-12-15

申请人： Osamu Wakabayashi ,  Masahiko Kowaka ,  Yukio Kobayashi

发明人： Osamu Wakabayashi ,  Masahiko Kowaka ,  Yukio Kobayashi

IPC分类号： G03F7/20 ,  H01S3/08 ,  H01S3/1055 ,  H01S3/225

CPC分类号： G03F7/70025 ,  H01S3/08009 ,  H01S3/1055 ,  H01S3/225

摘要： A narrow-band excimer laser employing a diffraction grating as a wavelength selective element, which is particularly suited for a light source of a reduction projection aligner. The grating used in the narrow-band excimer laser of the invention is so disposed that the ruling direction of the grating is nearly perpendicular to the direction of laser discharge. When a beam expander is used to expand laser beam falling on the beam expander is so disposed that the direction of beam expansion is nearly perpendicular to that of discharge of the laser. Further, when an aperture is to be used in the laser cavity, the aperture is placed so that the longitudinal direction may be parallel to the direction of laser discharge. Moreover, the front mirror of the laser cavity is a cylindrical one, whose mechanical axis is in parallel with the direction of laser discharge. This makes it possible to provide a narrow-band excimer laser having very high efficiency and excellent durability.

摘要翻译： 采用衍射光栅作为波长选择元件的窄带准分子激光器，其特别适用于还原投影对准器的光源。 在本发明的窄带准分子激光器中使用的光栅被布置成使得光栅的光栅方向几乎垂直于激光放电的方向。 当使用光束扩展器来扩展落在光束扩展器上的激光束时，光束扩展的方向几乎垂直于激光放电的方向。 此外，当在激光腔中使用孔时，孔被放置成使得纵向方向可以平行于激光放电的方向。 此外，激光腔的前镜是圆柱形的，其机械轴与激光放电的方向平行。 这使得可以提供非常高的效率和优异的耐久性的窄带准分子激光器。

公开(公告)号：US09570884B2

公开(公告)日：2017-02-14

申请号：US13817817

申请日：2012-01-25

申请人： Krzysztof Nowak ,  Osamu Wakabayashi

发明人： Krzysztof Nowak ,  Osamu Wakabayashi

IPC分类号： H01S5/06 ,  B82Y20/00 ,  G03F7/20 ,  H01S3/23 ,  H01S5/062 ,  H01S3/13 ,  H01S3/223 ,  H01S5/065 ,  H01S5/14 ,  H01S5/34 ,  H01S5/40 ,  H05G2/00

CPC分类号： H01S5/06 ,  B82Y20/00 ,  G03F7/70025 ,  G03F7/70033 ,  H01S3/1305 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S5/0612 ,  H01S5/06216 ,  H01S5/0622 ,  H01S5/0653 ,  H01S5/0654 ,  H01S5/141 ,  H01S5/3402 ,  H01S5/4025 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate, the master oscillator including at least one semiconductor laser apparatus; at least one amplifier configured to amplify the pulsed laser beam from the master oscillator, the at least one amplifier being configured to include at least one gain bandwidth; and a controller for controlling a parameter affecting an output wavelength of the pulsed laser beam from the master oscillator such that a wavelength chirping range of the pulsed laser beam from the master oscillator overlaps at least a part of the at least one gain bandwidth.

摘要翻译： 激光装置可以包括：主振荡器，其被配置为以重复频率输出脉冲激光束，所述主振荡器包括至少一个半导体激光装置; 至少一个放大器被配置为放大来自所述主振荡器的所述脉冲激光束，所述至少一个放大器被配置为包括至少一个增益带宽; 以及控制器，用于控制影响来自主振荡器的脉冲激光束的输出波长的参数，使得来自主振荡器的脉冲激光束的波长啁啾范围与至少一个增益带宽的至少一部分重叠。

公开(公告)号：US08804778B2

公开(公告)日：2014-08-12

申请号：US12580523

申请日：2009-10-16

申请人： Osamu Wakabayashi ,  Akira Endo ,  Krzysztof Nowak ,  Takashi Suganuma ,  Masato Moriya

发明人： Osamu Wakabayashi ,  Akira Endo ,  Krzysztof Nowak ,  Takashi Suganuma ,  Masato Moriya

IPC分类号： H01S3/10

CPC分类号： H01S3/2316 ,  B82Y20/00 ,  G03F7/70033 ,  H01S3/0007 ,  H01S3/107 ,  H01S3/2232 ,  H01S3/235 ,  H01S5/02284 ,  H01S5/0654 ,  H01S5/06837 ,  H01S5/0687 ,  H01S5/141 ,  H01S5/3402 ,  H01S5/4012 ,  H01S5/4062 ,  H01S5/4087

摘要： An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.

摘要翻译： 一种极紫外光源装置包括具有输出一个或多个纵模式激光灯的主振荡器的激光装置，具有分子气体的放大器作为放大器，放大其中包​​含波长的纵模式激光， 以及调节主振荡器的控制器，使得从主振荡器输出的纵模激光的波长包括在可放大线之一中，激光装置用作驱动激光器，其中激光装置照射 具有用于产生等离子体的激光的目标材料，并且从等离子体发射极紫外光并从极紫外光源装置输出。

公开(公告)号：US08759804B2

公开(公告)日：2014-06-24

申请号：US13122354

申请日：2011-03-11

申请人： Toshihiro Nishisaka ,  Yukio Watanabe ,  Tamotsu Abe ,  Osamu Wakabayashi

发明人： Toshihiro Nishisaka ,  Yukio Watanabe ,  Tamotsu Abe ,  Osamu Wakabayashi

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： H05G2/008 ,  G03B27/54 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/003

摘要： A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.

摘要翻译： 与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生极紫外光的室; 设置在室中的用于收集极紫外光的收集器反射镜; 用于将收集器镜固定到腔室的支撑件; 以及设置到室的输出端口，用于允许由集光镜收集的极紫外光通过其引入外部设备。

公开(公告)号：US08742379B2

公开(公告)日：2014-06-03

申请号：US13636038

申请日：2011-07-05

申请人： Hidenobu Kameda ,  Masato Moriya ,  Osamu Wakabayashi

发明人： Hidenobu Kameda ,  Masato Moriya ,  Osamu Wakabayashi

IPC分类号： H01S3/04

CPC分类号： H01S3/0401 ,  G02B7/008 ,  H01S3/005 ,  H01S3/2316 ,  H05G2/008 ,  Y10T137/6851

摘要： A window unit may include: a window configured to allow a laser beam to be transmitted therethrough; and a holder for holding the window at a periphery thereof, the holder being provided with a flow channel thereinside configured to allow a fluid to flow.

摘要翻译： 窗口单元可以包括：被配置为允许激光束透过其中的窗口; 以及用于在其周边保持窗口的保持器，所述保持器设置有配置成允许流体流动的内部的流动通道。

公开(公告)号：US08710474B2

公开(公告)日：2014-04-29

申请号：US13532365

申请日：2012-06-25

申请人： Takeshi Kodama ,  Osamu Wakabayashi

发明人： Takeshi Kodama ,  Osamu Wakabayashi

IPC分类号： G21K5/00 ,  G01K5/00 ,  B41C3/02

CPC分类号： H05G2/008 ,  H05G2/006

摘要： An apparatus used with an external laser apparatus for generating extreme ultraviolet light includes a target storage unit for storing a target material, a nozzle unit having a through-hole in communication with the interior of the storage unit through which the target material is outputted, an electrode having a through-hole facing the nozzle unit, and a target detector for detecting a target formed of the target material and outputting a detection signal. A direct current voltage adjuster applies and adjusts a direct current between the target material and the electrode, a pressure adjuster applies and adjusts a pressure to the target material through gas, and a controller controls at least one of the direct current voltage adjuster and the pressure adjuster based on the detection signal from the target detector.

摘要翻译： 与用于产生极紫外光的外部激光装置一起使用的装置包括用于存储目标材料的目标存储单元，具有与被输送目标材料的存储单元的内部连通的通孔的喷嘴单元， 电极，其具有面向喷嘴单元的通孔，以及目标检测器，用于检测由目标材料形成的目标并输出检测信号。 直流电压调节器施加并调节目标材料和电极之间的直流电流，压力调节器通过气体施加和调节对目标材料的压力，并且控制器控制至少一个直流电压调节器和压力 基于来自目标检测器的检测信号的调节器。

公开(公告)号：US08698113B2

公开(公告)日：2014-04-15

申请号：US13696517

申请日：2011-12-13

申请人： Masato Moriya ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Osamu Wakabayashi

IPC分类号： H05G2/00

CPC分类号： G03F7/708 ,  G03F7/70008 ,  G03F7/70808 ,  G03F7/70833

摘要： A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.

摘要翻译： 与激光装置一起使用的室装置可以包括室，扩束光学系统和聚焦光学系统。 该室可以设置有至少一个入口，激光装置输出的激光束通过该入口被引入腔室。 扩束光学系统被配置为直径地扩大激光束。 聚焦光学系统被配置为聚焦已经扩大直径的激光束。

公开(公告)号：US08675697B2

公开(公告)日：2014-03-18

申请号：US13597556

申请日：2012-08-29

申请人： Satoshi Tanaka ,  Hiroshi Tanaka ,  Osamu Wakabayashi

发明人： Satoshi Tanaka ,  Hiroshi Tanaka ,  Osamu Wakabayashi

IPC分类号： H01S3/10

CPC分类号： H01S3/10 ,  H01S3/005 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/225 ,  H01S3/2333

摘要： A master oscillator system may include a grating configured to function as one resonator mirror in an optical resonator, a spectral bandwidth tuning unit configured to tune the spectral bandwidth of a laser beam transmitted within the optical resonator, a storage unit configured to store a control value of the spectral bandwidth tuning unit corresponding to a desired spectral bandwidth and a controller configured to control the spectral bandwidth tuning unit based on the control value stored in the storage unit.

摘要翻译： 主振荡器系统可以包括被配置为用作光学谐振器中的一个谐振器反射镜的光栅，被配置为调节在光学谐振器内传输的激光束的光谱带宽的光谱带宽调谐单元，被配置为存储控制值 的光谱带宽调谐单元，以及配置为基于存储在存储单元中的控制值来控制光谱带宽调谐单元的控制器。

公开(公告)号：US08507885B2

公开(公告)日：2013-08-13

申请号：US13494778

申请日：2012-06-12

申请人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

发明人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

IPC分类号： G21K5/04

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70575 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

摘要： The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity.

摘要翻译： 曝光装置只能将EUV辐射提供给掩模，同时消除EUV辐射以外的辐射。 在反射镜的前表面上设置由多个Mo / Si对层制成的多层，并且在该多层中形成闪耀的凹槽。 从光源装置入射的辐射入射在该反射镜上并被反射或衍射。 由于反射的EUV辐射（包括衍射的EUV辐射）和其他波长的辐射在不同的角度被反射或衍射，因此它们的进展方向是不同的。 通过用孔和/或自卸车消除其它波长的辐射，可以仅用高纯度的EUV辐射照射掩模。

公开(公告)号：US08476609B2

公开(公告)日：2013-07-02

申请号：US13306358

申请日：2011-11-29

申请人： Akira Endo ,  Krzysztof Nowak ,  Hideo Hoshino ,  Tatsuya Ariga ,  Masato Moriya ,  Osamu Wakabayashi

发明人： Akira Endo ,  Krzysztof Nowak ,  Hideo Hoshino ,  Tatsuya Ariga ,  Masato Moriya ,  Osamu Wakabayashi

IPC分类号： G02B26/02

CPC分类号： H05G2/003 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/2316 ,  H05G2/008

摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.

摘要翻译： 本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。 可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。 来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。 混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。 混合气体通过排气管道排出，并被送到热交换器。 由热交换器冷却的混合气体通过循环泵送回到SA气室。